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1. 发明申请

WO2013127608A2 METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开
标题翻译：提供用于器件平版印刷的自组装嵌段共聚物的图案化化学外延模板的方法
公开(公告)号：WO2013127608A2
公开(公告)日：2013-09-06
申请号：PCT/EP2013/052306
申请日：2013-02-06
申请人： ASML NETHERLANDS B.V.
发明人： PEETERS, Emiel , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris , BRIZARD, Aurelie , BOOTS, Henri , NGUYEN, Thanh , YILDIRIM, Oktay
IPC分类号： G06F7/02
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/038 , G03F7/2002
摘要： A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.
摘要翻译：一种形成图案化学外延模板的方法，用于在基底表面上定向包含第一聚合物嵌段和第二聚合物嵌段的可自组装的嵌段共聚物，所述方法包括施加底漆组合物施加到表面，所述底漆组合物包含与第一聚合物嵌段具有化学亲和力的第一聚合物部分和与第二聚合物嵌段具有化学亲和力的第二聚合物部分，选择性地暴露表面，底漆层和任何上覆层光化辐射以提供曝光区域和未曝光区域，使曝光区域中的第一聚合物部分变得不稳定，并且从曝光区域除去不稳定的第一聚合物部分以消耗第一聚合物部分的曝光区域中的底漆层表面以形成图案化的化学外延模板。

2. 发明申请

WO2013050338A1 METHOD TO PROVIDE A PATTERNED ORIENTATION TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER 审中-公开
标题翻译：为自组装聚合物提供图案方向模板的方法
公开(公告)号：WO2013050338A1
公开(公告)日：2013-04-11
申请号：PCT/EP2012/069400
申请日：2012-10-02
申请人： ASML NETHERLANDS B.V.
发明人： NGUYEN, Thanh , FINDERS, Jozef , KETELAARS, Wilhelmus , WUISTER, Sander , VAN DER HEIJDEN, Eddy , MEESSEN, Hieronymus , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BRIZARD, Aurelie , BOOTS, Henri , DRUZHININA, Tamara , DE RUITER, Jessica
IPC分类号： B81C1/00
CPC分类号： C30B1/12 , B81C1/00031 , B81C2201/0149 , B82Y30/00 , G03F7/0002 , H01L21/0337 , Y10T117/10
摘要： A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.
摘要翻译：用于使自组装嵌段聚合物对准以将其自组装成具有平行于第一轴线延伸的不连续第一区域的平行行的二维阵列，并且沿着正交的第二轴相互间隔开并由连续的第二轴域。所述方解石模板具有第一和第二基本上平行的侧壁，所述第一和第二基本平行的侧壁平行于并限定第一轴线并且限定第一轴线并且沿着第二轴线相互间隔延伸，以提供隔室，以将自组装嵌段共聚物的至少一排不连续的第一区域保持在基板上在侧壁之间并平行于侧壁，并通过连续的第二结构域与之隔开。隔室具有图案外延成核特征，布置成将隔离物内的特定位置处的不连续的第一结构域中的至少一个定位。还公开了用于形成图案石墨模板的方法及其用于器件光刻的方法。

3. 发明申请

WO2012084558A1 METHODS FOR PROVIDING PATTERNED ORIENTATION TEMPLATES FOR SELF-ASSEMBLABLE POLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开
标题翻译：提供用于自组装聚合物的图案方向模板的方法用于器件平台的使用
公开(公告)号：WO2012084558A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072379
申请日：2011-12-09
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
发明人： PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
IPC分类号： G03F7/00
CPC分类号： C30B19/12 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
摘要翻译：公开了一种方法，其涉及在衬底上形成化学外延或者石墨电极特征之后，但在自组装聚合物的沉积和取向之前，将中性取向模板层沉积到衬底上。取向层被布置成与基底结合，但不具有某些特征，使得其可以容易地通过真空或用有机溶剂漂洗除去。中性取向层具有与自组装聚合物中的嵌段相符的化学亲和力，使得不同类型的块润湿中性取向层，使得自组装聚合物中的畴可以沿着衬底表面并排，界面垂直于衬底表面。所得到的对准和取向的自组装聚合物本身可以用作衬底的器件光刻的抗蚀剂。

4. 发明申请

WO2012175342A2 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物和方法用于光刻
公开(公告)号：WO2012175342A2
公开(公告)日：2012-12-27
申请号：PCT/EP2012/060783
申请日：2012-06-07
申请人： ASML NETHERLANDS B.V. , BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
发明人： BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

5. 发明申请

WO2012025316A1 IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM 审中-公开
标题翻译：印刷地图法和可变介质
公开(公告)号：WO2012025316A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/062553
申请日：2011-07-21
申请人： ASML NETHERLANDS B.V. , VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
发明人： VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译：公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是随后用作图案化基板的抗蚀剂。还公开了适用于该方法的压印光刻的压印介质。

6. 发明申请

WO2014023589A1 METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
标题翻译：通过嵌段共聚物自组装提供基板上的刻蚀特征的方法
公开(公告)号：WO2014023589A1
公开(公告)日：2014-02-13
申请号：PCT/EP2013/065824
申请日：2013-07-26
申请人： ASML NETHERLANDS B.V.
发明人： FINDERS, Jozef , DRUZHININA, Tamara , PEETERS, Emiel , WUISTER, Sander , VAN HEESCH, Chris , VAN DER HEIJDEN, Eddy , BOOTS, Henri
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G06F17/5009 , G06F17/5068
摘要： A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.
摘要翻译：设计外延模板以将基底上的嵌段共聚物自组装成有序目标图案的方法包括提供初级外延模板设计，然后改变设计以优化图案保真度统计量，例如放置误差，相对于通过对预测的自组装嵌段共聚物图案进行模拟和优化作为不同设计参数的函数的图案放置来实现目标图案。除了改变设计参数以优化模式保真度统计量之外，在模拟预测模式之前还包括模板设计中的随机误差，以便在实践中补偿预期的模板不准确性。除了设计参数的系统变化之外，在模板设计中包括一个现实的随机误差，可以改进模板设计优化，使得结果对于在实践中可能是不可避免的误差较不敏感。

7. 发明申请

WO2013107740A2 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物及其在LITHOGRAPHY中的使用方法
公开(公告)号：WO2013107740A2
公开(公告)日：2013-07-25
申请号：PCT/EP2013/050673
申请日：2013-01-15
申请人： ASML NETHERLANDS B.V.
发明人： VAN HEESCH, Chris , MEESSEN, Hieronymus
CPC分类号： G06T7/0008 , G01B11/03 , G03F7/0002 , G03F7/70625 , G06F17/5045 , G06T7/0006 , G06T7/001 , G06T7/60 , G06T2207/10061 , G06T2207/20032 , G06T2207/20061 , G06T2207/30108 , G06T2207/30148
摘要： A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use 5 of a Hough transform to find periodicity values and to determine placement errors.
摘要翻译：分析结构的各种尺寸参数的方法和系统，诸如自组装的嵌段共聚物结构，无论是通过石墨刻蚀或化学外延形成的。该方法包括图像处理，包括中值滤波和特征检测以确定临界尺寸信息，以及可选地使用霍夫变换的5来查找周期值并确定放置误差。

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