专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011035946A1 TIME DIFFERENTIAL RETICLE INSPECTION 审中-公开
标题翻译：时间差异检验
公开(公告)号：WO2011035946A1
公开(公告)日：2011-03-31
申请号：PCT/EP2010/060354
申请日：2010-07-16
申请人： ASML HOLDING N.V. , CATEY, Eric , HARNED, Robert , SHMAREV, Yevgeniy , THARALDSEN, Robert , JACOBS, Richard
发明人： CATEY, Eric , HARNED, Robert , SHMAREV, Yevgeniy , THARALDSEN, Robert , JACOBS, Richard
IPC分类号： G03F1/00
CPC分类号： G03F1/84 , G03F7/7065
摘要： Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.
摘要翻译：公开了用于时差标线检查的系统和方法。通过例如确定掩模版的至少一部分的第一签名与第一签名之后产生的第二签名之间的差异来检测污染物。

2. 发明申请

WO2011091877A1 HOLOGRAPHIC MASK INSPECTION SYSTEM WITH SPATIAL FILTER 审中-公开
标题翻译：具有空间滤波器的全息屏障检测系统
公开(公告)号：WO2011091877A1
公开(公告)日：2011-08-04
申请号：PCT/EP2010/067362
申请日：2010-11-12
申请人： ASML HOLDING N.V. , THARALDSEN, Robert , DEN BOEF, Arie , CATEY, Eric , SHMAREV, Yevgeniy , JACOBS, Richard
发明人： THARALDSEN, Robert , DEN BOEF, Arie , CATEY, Eric , SHMAREV, Yevgeniy , JACOBS, Richard
IPC分类号： G03H1/00 , G03H1/08 , G01N21/956 , G02B27/46 , G03F1/00 , G03F7/20
CPC分类号： G03H1/00 , G01N21/94 , G01N21/95607 , G01N21/95623 , G01N2021/95676 , G03F1/84 , G03H1/02 , G03H1/041 , G03H1/0443 , G03H1/08 , G03H2001/0204 , G03H2222/15 , G03H2222/43 , G03H2222/45 , G03H2223/12 , G03H2223/26 , G03H2223/53
摘要： Disclosed are apparatuses, methods, and lithographic systems for holographic mask inspection. A holographic mask inspection system (300, 600, 700) includes an illumination source (330), a spatial filter (350), and an image sensor (380). The illumination source being configured to illuminate a radiation beam (331) onto a target portion of a mask (310). The spatial filter (350) being arranged in a Fourier transform pupil plane of an optical system (390, 610, 710), where the spatial filter receives at least a portion of a reflected radiation beam (311) from the target portion of the mask. The optical system being arranged to combine (360, 660, 740) the portion of the reflected radiation beam (311) with a reference radiation beam (361, 331) to generate a combined radiation beam. Further, the image sensor (380) being configured to capture holographic image of the combined radiation beam. The image may contain one or more mask defects.
摘要翻译：公开了用于全息掩模检查的装置，方法和光刻系统。全息掩模检查系统（300,600,700）包括照明源（330），空间滤光器（350）和图像传感器（380）。照明源被配置为将辐射束（331）照射到掩模（310）的目标部分上。空间滤波器（350）被布置在光学系统（390,610,710）的傅立叶变换光瞳平面中，其中空间滤波器从掩模的目标部分接收反射的辐射束（311）的至少一部分，。光学系统布置成将反射的辐射束（311）的该部分与参考辐射束（361,331）组合（360,660,740）以产生组合的辐射束。此外，图像传感器（380）被配置为捕获组合的辐射束的全息图像。图像可能包含一个或多个掩模缺陷。

3. 发明申请

WO2010149403A1 OBJECT INSPECTION SYSTEMS AND METHODS 审中-公开
标题翻译：对象检查系统和方法
公开(公告)号：WO2010149403A1
公开(公告)日：2010-12-29
申请号：PCT/EP2010/054785
申请日：2010-04-13
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V. , DEN BOEF, Arie , VLADIMIRSKY, Yuli , SHMAREV, Yevgeniy , SCACCABAROZZI, Luigi , THARALDSEN, Robert , JACOBS, Richard
发明人： DEN BOEF, Arie , VLADIMIRSKY, Yuli , SHMAREV, Yevgeniy , SCACCABAROZZI, Luigi , THARALDSEN, Robert , JACOBS, Richard
IPC分类号： G01N21/94 , G01N21/956
CPC分类号： G03F1/84 , G01N21/94 , G01N21/95607 , G01N2021/95676 , G03H1/0443 , G03H2001/0264 , G03H2001/0447 , G03H2001/0456 , G03H2001/0458 , G03H2222/43 , G03H2223/12 , G03H2223/55
摘要： Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field images. The complex field image of one object is then compared with that of a reference object to determine the differences. The systems and methods have particular utility in the inspection of a reticle for defects.
摘要翻译：公开了用于物体检查的系统和方法，特别是用于光刻工艺中使用的光罩的检查。该方法包括将参考辐射束与探针辐射束干涉地组合，并存储其复杂场图像。然后将一个对象的复杂场图像与参考对象的复合场图像进行比较以确定差异。这些系统和方法在检查用于缺陷的掩模版时具有特殊的用途。

4. 发明申请

WO2013098031A1 CATADIOPTRIC OBJECTIVE FOR SCATTEROMETRY 审中-公开
标题翻译：用于分光光度法的目标目标
公开(公告)号：WO2013098031A1
公开(公告)日：2013-07-04
申请号：PCT/EP2012/073929
申请日：2012-11-29
申请人： ASML HOLDING N.V.
发明人： SMIRNOV, Stanislav , JOOBEUR, Adel , SHMAREV, Yevgeniy , VENKATARAMAN, Arun
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B17/0856 , G02B17/0892 , G03F7/70625 , G03F7/70633
摘要： System and method for correcting field curvature in a catadioptric objective that may be used within an inspection apparatus such as a scatterometer. In one embodiment, a catadioptric optical system (800) includes a first catadioptric element (801) and a second catadioptric element (803). The first catadioptric element (801) includes a first surface (809) being reflective and a second surface (807) focusing the beam reflected by the first surface. The second catadioptric element (803) receives the beam reflected by the second surface (807) of the first catadioptric element (801) and includes a third surface (804) being refractive, a fourth surface (806) being reflective and a fifth surface (808) reflecting and focusing the beam reflected by the fourth surface (806) and a sixth surface being refractive (812). The curvature of at least one surface (804, 806, 808, 812) of the second catadioptric element (803) applies a positive contribution to the field curvature associated with the first catadioptric element (801).
摘要翻译：用于校正可以在诸如散射仪的检查装置中使用的反射折射物镜中的场曲率的系统和方法。在一个实施例中，反射折射光学系统（800）包括第一反射折射元件（801）和第二反射折射元件（803）。第一反射折射元件（801）包括反射的第一表面（809）和聚焦由第一表面反射的光束的第二表面（807）。第二反射折射元件（803）接收由第一反射折射元件（801）的第二表面（807）反射的光束，并且包括被折射的第三表面（804），反射的第四表面（806）和第五表面 808）反射和聚焦由第四表面（806）反射的光束和第六表面是折射的（812）。第二反射折射元件（803）的至少一个表面（804,806,808,812）的曲率对与第一反射折射元件（801）相关联的场曲率施加正贡献。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式