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1. 发明申请

WO2010065474A3 MODULATION OF RF RETURNING STRAPS FOR UNIFORMITY CONTROL 审中-公开
标题翻译： RF均匀性控制回归带的调整
公开(公告)号：WO2010065474A3
公开(公告)日：2010-08-12
申请号：PCT/US2009066147
申请日：2009-11-30
申请人： APPLIED MATERIALS INC , TSO ALAN , HOFFMAN DANIEL J , TANAKA TSUTOMU TOM , TAYLOR WILLIAM NIXON JR , WANG RONGPING , WHITE JOHN M
发明人： TSO ALAN , HOFFMAN DANIEL J , TANAKA TSUTOMU TOM , TAYLOR WILLIAM NIXON JR , WANG RONGPING , WHITE JOHN M
IPC分类号： H01L21/205 , H05H1/36
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32183
摘要： Embodiments of the present invention generally relates to a method and apparatus for processing substrates using plasma. More particularly, embodiments of the present invention provide a plasma processing chamber having an electrode coupled to a plurality of RF returning straps, wherein impedance of the RF returning straps are set and/or adjusted to tune the plasma distribution during processing. In one embodiment, impedance of RF returning straps varies by changing length of the RF returning straps, by changing width of the RF returning straps, by changing spacing of the RF returning straps, by changing location of the RF returning straps, by adding a capacitor to the RF returning straps, or by combinations thereof.
摘要翻译：本发明的实施例总体上涉及使用等离子体处理衬底的方法和装置。更具体地说，本发明的实施例提供了一种等离子体处理室，其具有耦合到多个RF返回带的电极，其中RF回程带的阻抗被设置和/或调整以调整处理期间的等离子体分布。在一个实施例中，RF返回带的阻抗通过改变RF返回带的长度，通过改变RF返回带的宽度，通过改变RF返回带的间隔，通过改变RF返回带的位置，通过添加电容器到RF返回带或通过它们的组合。

2. 发明申请

WO2011041087A3 INDUCTIVELY-COUPLED PLASMA (ICP) RESONANT SOURCE ELEMENT 审中-公开
标题翻译：电感耦合等离子体（ICP）共振源元件
公开(公告)号：WO2011041087A3
公开(公告)日：2011-09-29
申请号：PCT/US2010048573
申请日：2010-09-13
申请人： APPLIED MATERIALS INC , WHITE JOHN M , BAEK JONGHOON , TANAKA TSUTOMU TOM
发明人： WHITE JOHN M , BAEK JONGHOON , TANAKA TSUTOMU TOM
IPC分类号： H05H1/46 , H05H1/34
CPC分类号： H01J37/3211 , H01J37/321 , H05H1/30 , H05H1/46 , H05H2001/4667
摘要： The present invention generally relates to an inductive-capacitive element that may be used to form a single coil within an inductively-coupled plasma apparatus. One or more elements may be used and coupled together to collectively form the coil. The coil may be coupled to a single match network. Therefore, a single input and a single output may be used for the coil so that fewer penetrations through the chamber walls may be used. The individual inductive-capacitive elements may comprise two overlapping tubes with an insulating material disposed therebetween in an overlapping area. The overlapping area forms a capacitor segment and the non-overlapping area forms an inductor segment. The tubes and insulating material may be welded together to create a resonant circuit with an impedance of zero. Thus, the inductance of the coil is low, only two wall penetrations are utilized and a single match network is utilized.
摘要翻译：本发明总体上涉及可用于在电感耦合等离子体装置内形成单个线圈的电感电容元件。一个或多个元件可以被使用并且被联接在一起以共同形成线圈。线圈可以耦合到单个匹配网络。因此，可以为线圈使用单个输入和单个输出，从而可以使用更少的通过室壁的穿透。各个感应电容元件可以包括两个重叠的管，其中在重叠区域中设置有绝缘材料。重叠区域形成电容器段，非重叠区域形成电感器段。管和绝缘材料可以焊接在一起以形成阻抗为零的谐振电路。因此，线圈的电感很低，仅利用两个壁穿透并利用单个匹配网络。

3. 发明申请

WO2011100200A3 ANTI-ARC ZERO FIELD PLATE 审中-公开
标题翻译：防弧漆田
公开(公告)号：WO2011100200A3
公开(公告)日：2011-12-22
申请号：PCT/US2011023934
申请日：2011-02-07
申请人： APPLIED MATERIALS INC , BAEK JONGHOON , SUAREZ EDWIN C , TANAKA TSUTOMU TOM , HAMMOND EDWARD P IV , OH JEONGHOON
发明人： BAEK JONGHOON , SUAREZ EDWIN C , TANAKA TSUTOMU TOM , HAMMOND EDWARD P IV , OH JEONGHOON
IPC分类号： C23C16/44 , C23C16/455 , C23C16/50
CPC分类号： C23C16/45565 , C23C16/509 , H01J37/32082 , H01J37/32431 , H01J37/3244
摘要： Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.
摘要翻译：本发明的实施例一般涉及用于减少衬底处理室中的电弧和寄生等离子体的装置。该设备通常包括处理室，其具有设置在其中的基板支撑件，背板和喷头。喷头悬挂将背板电连接到喷头。导电支架联接到背板并与喷头间隔开。导电支架可以包括板，下部，上部和垂直延伸部。导电支架接触电隔离器。

4. 发明申请

WO2010048084A3 ELECTRODE AND POWER COUPLING SCHEME FOR UNIFORM PROCESS IN A LARGE-AREA PECVD CHAMBER 审中-公开
标题翻译：大面积PECVD室内均匀处理的电极和功率耦合方案
公开(公告)号：WO2010048084A3
公开(公告)日：2010-07-29
申请号：PCT/US2009061161
申请日：2009-10-19
申请人： APPLIED MATERIALS INC , KUDELA JOZEF , TANAKA TSUTOMU TOM
发明人： KUDELA JOZEF , TANAKA TSUTOMU TOM
IPC分类号： H01L21/205 , H05H1/34
CPC分类号： H01J37/3244 , H01J37/32091
摘要： Embodiments discussed herein generally include electrodes having parallel ferrite boundaries that suppress RF currents perpendicular to the ferrite boundary and absorb magnetic field components parallel to the boundary. The ferrites cause the standing wave to stretch outside the ferrites and shrink inside the ferrite. A plurality of power sources are coupled to the electrode. The phase of the VHF current delivered from the power sources may be modulated to move the standing wave that is perpendicular to the ferrites in a direction parallel to the ferrites. Thus, the VHF current on the uncovered electrode area will be a plane wave, quasi-uniform (in a direction perpendicular to the ferrites) propagating in the direction parallel to the ferrites.
摘要翻译：这里讨论的实施例通常包括具有平行铁氧体边界的电极，其抑制垂直于铁氧体边界的RF电流并吸收平行于边界的磁场分量。铁氧体使驻波在铁氧体外部伸展并收缩在铁氧体内部。多个电源连接到电极。可以调制从电源传送的VHF电流的相位，以在平行于铁氧体的方向上移动垂直于铁氧体的驻波。因此，未覆盖电极区域上的VHF电流将是平行波，在与铁氧体平行的方向上传播的是准均匀的（沿垂直于铁氧体的方向）。

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