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1. 发明申请

WO2011009007A2 IMPROVED LIFT PIN GUIDES 审中-公开
标题翻译：改进的提升引脚指南
公开(公告)号：WO2011009007A2
公开(公告)日：2011-01-20
申请号：PCT/US2010042199
申请日：2010-07-15
申请人： APPLIED MATERIALS INC , PAI UDAY , LOPEZ OSCAR , OH JEONGHOON , CHO TOM K , WHITE JOHN M , JAMES SILJA , POLYAK ALEXANDER S
发明人： PAI UDAY , LOPEZ OSCAR , OH JEONGHOON , CHO TOM K , WHITE JOHN M , JAMES SILJA , POLYAK ALEXANDER S
IPC分类号： H01L21/68 , G02F1/13 , H01L21/205
CPC分类号： H01L21/68742 , C23C14/50 , C23C16/4586
摘要： Lift pin guides include bearing elements with rollers having liners comprised of a material that provides both self lubrication and cushioning in order to prevent lift pin binding and extend the life of the lift pins and the lift pin guides. In one embodiment, each lift pin guide includes an upper bearing element near the upper surface of a substrate support and a lower bearing element disposed a distance beneath the substrate support in order to reduce stresses experienced by the lift pin. The lift pin guides may be used in a vacuum deposition chamber adapted to deposit materials onto substrates to form electronic devices such as thin film transistors, organic light emitting diodes, photovoltaic devices or solar cells, including chemical vapor deposition chambers and physical vapor deposition chambers. The lift pin guides may also be used in load lock chambers, etching chambers or other applications where lift pins are utilized.
摘要翻译：升降销引导件包括具有滚子的轴承元件，滚子具有由既提供自润滑又提供缓冲的材料组成的衬垫，以防止提升销结合并延长提升销和提升销引导件的寿命。在一个实施例中，每个提升销引导件包括靠近衬底支撑件的上表面的上支撑元件和布置在衬底支撑件下方一段距离处的下支撑元件，以便减少提升销所经受的应力。提升销引导件可以用于真空沉积室中，该真空沉积室适于将材料沉积到基底上以形成电子装置，例如薄膜晶体管，有机发光二极管，光伏装置或太阳能电池，包括化学气相沉积室和物理气相沉积室。升降杆引导件也可用于负载锁定室，蚀刻室或使用升降杆的其他应用场合。

2. 发明申请

WO2011008805A3 PROCESSING CHAMBER WITH TRANSLATING WEAR PLATE FOR LIFT PIN 审中-公开
标题翻译：带升降磨损板的升降室
公开(公告)号：WO2011008805A3
公开(公告)日：2011-05-05
申请号：PCT/US2010041895
申请日：2010-07-14
申请人： APPLIED MATERIALS INC , WHITE JOHN M , OH JEONGHOON , CHO TOM K , JAMES SILJA , PAI UDAY , LOPEZ OSCAR , POLYAK ALEXANDER S
发明人： WHITE JOHN M , OH JEONGHOON , CHO TOM K , JAMES SILJA , PAI UDAY , LOPEZ OSCAR , POLYAK ALEXANDER S
IPC分类号： H01L21/68 , G02F1/13 , H01L21/02 , H01L21/683
CPC分类号： H01L21/68742
摘要： Embodiments of a method and apparatus for processing large area substrates including a translational wear plate and/or bushing assembly are provided for reducing the stress on a lift pin used to space substrates from a substrate support in a processing or other type of chamber. In another embodiment, an apparatus for processing substrates includes processing chamber comprising a substrate support disposed in a chamber body. A bushing assembly is disposed in the substrate support. A lift pin is disposed through the bushing assembly. A wear plate is provided that is coupled to the chamber body and aligned with the lift pin. The wear plate is movable laterally relative to a centerline of the chamber body to accommodate lateral motion of the lift pin when contacting the wear plate.
摘要翻译：提供了用于处理包括平移磨损板和/或衬套组件的大面积衬底的方法和装置的实施例，用于减小用于在衬底支撑件上在处理室或其他类型的室中间隔衬底的提升销上的应力。在另一个实施例中，一种用于处理基板的装置包括处理室，该处理室包括设置在室体中的基板支撑件衬套组件设置在衬底支撑件中。升降销穿过套管组件布置。提供磨损板，该磨损板联接到腔体并与升降销对齐。耐磨板可相对于腔室主体的中心线横向移动，以在接触耐磨板时适应提升销的横向运动。

3. 发明申请

WO2011017226A2 COMPOUND LIFT PIN TIP WITH TEMPERATURE COMPENSATED ATTACHMENT FEATURE 审中-公开
标题翻译：具有温度补偿附件功能的复合提升针尖
公开(公告)号：WO2011017226A2
公开(公告)日：2011-02-10
申请号：PCT/US2010043956
申请日：2010-07-30
申请人： APPLIED MATERIALS INC , POLYAK ALEXANDER S , CHO TOM K , GOMEZ OSCAR
发明人： POLYAK ALEXANDER S , CHO TOM K , GOMEZ OSCAR
IPC分类号： H01L21/68 , G02F1/13 , H01L21/683
CPC分类号： C23C16/4586 , H01L21/68742
摘要： A method and apparatus for a lift pin is described. In one embodiment, a lift pin head is described. The lift pin head includes a base member having a body made of a first material having a first coefficient of thermal expansion, and a tip disposed on the base member, the base member having a body made of a second material that is flexible at room temperature and having a second coefficient of thermal expansion, the first coefficient of thermal expansion being less than the second coefficient of thermal expansion.
摘要翻译：描述了用于升降销的方法和装置。在一个实施例中，描述了提升销头。提升销头包括具有由具有第一热膨胀系数的第一材料制成的主体的基座构件和设置在基座构件上的尖端，所述基座构件具有由在室温下是柔性的第二材料制成的主体并且具有第二热膨胀系数，所述第一热膨胀系数小于所述第二热膨胀系数。

4. 发明申请

WO2010014553A3 CONCRETE VACUUM CHAMBER 审中-公开
标题翻译：混凝土真空室
公开(公告)号：WO2010014553A3
公开(公告)日：2010-04-01
申请号：PCT/US2009051860
申请日：2009-07-27
申请人： APPLIED MATERIALS INC , POLYAK ALEXANDER S , CHO TOM K , YUDOVSKY JOSEPH , VESCI ANTHONY
发明人： POLYAK ALEXANDER S , CHO TOM K , YUDOVSKY JOSEPH , VESCI ANTHONY
IPC分类号： H01L21/00 , H01L21/02 , H01L21/203 , H01L21/205 , H01L21/265 , H01L21/3065
CPC分类号： C23C14/56 , C23C16/44 , H01J37/32467 , H01L21/67236 , H01L21/67772
摘要： The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays, solar cells, or other electronic devices. The processing system and/or the vacuum chambers as well as their components and supporting structure are constructed of less costly materials and in a more energy efficient manner than that of current large area substrate processing systems. In one embodiment, the processing system chamber bodies and their supporting structures are constructed of reinforced concrete. In one embodiment, system processing chambers include a vacuum tight lining disposed inside reinforced concrete chamber bodies.
摘要翻译：本发明体现了处理系统和真空室，其被配备以处理用于平板显示器，太阳能电池或其他电子设备的基板。处理系统和/或真空室以及它们的部件和支撑结构由比当前的大面积基板处理系统更低成本的材料和更节能的方式构造。在一个实施例中，处理系统室主体及其支撑结构由钢筋混凝土构成。在一个实施例中，系统处理室包括设置在钢筋混凝土室体内的真空密封衬里。

5. 发明申请

WO2013036619A3 METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER 审中-公开
标题翻译：气体分布和等离子体在线性沉积室应用中的方法与装置
公开(公告)号：WO2013036619A3
公开(公告)日：2013-05-02
申请号：PCT/US2012053932
申请日：2012-09-06
申请人： APPLIED MATERIALS INC , MUNGEKAR HEMANT P , POLYAK ALEXANDER S , COX MICHAEL S
发明人： MUNGEKAR HEMANT P , POLYAK ALEXANDER S , COX MICHAEL S
IPC分类号： H01L21/205 , H01L31/04 , H01L31/042
CPC分类号： H01J37/3244 , C23C16/45504 , C23C16/45557 , C23C16/45563 , C23C16/4584 , C23C16/50 , C23C16/52 , C23C16/54 , H01J37/32779
摘要： A method and apparatus for processing a substrate is described. One embodiment of the invention provides an apparatus for forming thin films. The apparatus comprises a chamber defining an internal volume, a plasma source disposed within the internal volume, and at least one gas injection source disposed adjacent the plasma source within the internal volume, wherein the at least one gas injection source comprises a first channel and a second channel for delivering gases to the internal volume, the first channel delivering a gas at a first pressure or a first density and the second channel delivering a gas at a second pressure or a second density, the first pressure or the first density being different than the second pressure or the second density.
摘要翻译：描述了用于处理衬底的方法和设备。本发明的一个实施例提供一种用于形成薄膜的装置。该装置包括限定内部体积的室，设置在内部体积内的等离子体源以及在内部体积内与等离子体源相邻设置的至少一个气体注入源，其中至少一个气体注入源包括第一通道和用于将气体输送到内部容积的第二通道，所述第一通道以第一压力或第一密度输送气体，所述第二通道输送处于第二压力或第二密度的气体，所述第一压力或所述第一密度不同于第二压力或第二密度。

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