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1. 发明申请

WO2007016218A2 INTEGRATED ELECTROLESS DEPOSITION SYSTEM 审中-公开
标题翻译：集成电沉积系统
公开(公告)号：WO2007016218A2
公开(公告)日：2007-02-08
申请号：PCT/US2006029137
申请日：2006-07-28
申请人： APPLIED MATERIALS INC , LUBOMIRSKY DMITRY , SHANMUGASUNDRAM ARULKUMAR , D AMBRA ALLEN , WEIDMAN TIMOTHY W , STEWART MICHAEL P , RABINOVICH EUGENE , SHERMAN SVETLANA , BIRANG MANOOCHER , WANG YAXIN , YANG MICHAEL X , HANSEN BRADLEY
发明人： LUBOMIRSKY DMITRY , SHANMUGASUNDRAM ARULKUMAR , D AMBRA ALLEN , WEIDMAN TIMOTHY W , STEWART MICHAEL P , RABINOVICH EUGENE , SHERMAN SVETLANA , BIRANG MANOOCHER , WANG YAXIN , YANG MICHAEL X , HANSEN BRADLEY
IPC分类号： G09G3/00 , C23C16/00 , H05H1/24
CPC分类号： H01L21/6723 , C23C18/1632 , C23C18/1653 , C23C18/1682 , C23C18/1685 , C23C18/1689 , C23C18/1889 , C25D7/123 , H01L21/67046 , H01L21/67051 , H01L21/67109
摘要： Embodiments of the invention provide methods for depositing a material onto a surface of a substrate by using one or more electroless, electrochemical plating, CVD and/or ALD processes. Embodiments of the invention provide a method for depositing a seed layer on a substrate with an electroless process and to subsequently fill interconnect features on the substrate with an ECP process on a single substrate processing platform. Other aspects provide a method for depositing a seed layer on a substrate, fill interconnect features on a substrate, or sequentially deposit both a seed layer and fill interconnect features on the substrate. One embodiment provides a method for forming a capping layer over substrate interconnects. Embodiments further provide a cluster tool configured to deposit a material onto a substrate surface by using one or more electroless, electrochemical plating, CVD and/or ALD processing chambers. In one aspect, a ruthenium-containing catalytic layer is formed.
摘要翻译：本发明的实施方案提供了通过使用一种或多种化学镀，CVD和/或ALD工艺将材料沉积到衬底的表面上的方法。本发明的实施方案提供了一种用于在基板上沉积种子层的方法，该方法具有无电解方法，并随后在单个基板处理平台上用ECP工艺填充基板上的互连特征。其它方面提供了一种用于在衬底上沉积种子层的方法，在衬底上填充互连特征，或者在衬底上顺序地沉积种子层和填充互连特征。一个实施例提供了一种在衬底互连上形成覆盖层的方法。实施例还提供了一种集群工具，其被配置为通过使用一个或多个无电镀，CVD和/或ALD处理室将材料沉积到衬底表面上。一方面，形成含钌催化剂层。

2. 发明申请

WO0079564A2 PLASMA REACTOR WITH INTERNAL INDUCTIVE ANTENNA CAPABLE OF GENERATING HELICON WAVE 审中-公开
标题翻译：具有产生赫氏波的内部感应天线的等离子体反应器
公开(公告)号：WO0079564A2
公开(公告)日：2000-12-28
申请号：PCT/US0040241
申请日：2000-06-19
申请人： APPLIED MATERIALS INC
发明人： YE YAN , D AMBRA ALLEN , MOK YEUK-FAI EDWIN , REMINGTON RICHARD E , SAMMONS JAMES E III
IPC分类号： H05H1/46 , H01J37/32 , H01L21/302 , H01J37/00
CPC分类号： H01J37/3211 , H01J37/321 , H01J37/32477
摘要： The present invention employs an internal inductive antenna capable of generating a helicon wave for generating a plasma. One embodiment of the present invention employs loop type antenna secured within a bell shaped portion of the chamber. Another embodiment employs a flat coil type antenna secured within the chamber. In the preferred embodiments, the internal antenna of the present invention is constructed to prevent sputtering of the antenna. The antenna may be formed of a non-sputtering conductive material, or may form a conductive material surrounded, completely or partially, by a non-sputtering jacket. In one embodiment, the non-sputtering jacket may be coupled to the chamber wall so that heat generated by the antenna is transferred between the jacket and the chamber wall by conduction. Preferably, the non-sputtering jacket is formed of a material that also is electrically insulative with the surface of the antenna exposed to plasma being segmented to inhibit eddy current in conductive deposits. The gaps separate the exposed surface of the antennas so that conductive deposits are inhibited from electrically joining the separated surfaces, while inhibiting plasma generation within the gaps. A portion or all of the chamber wall may be constructed of electrically and thermally conductive material.
摘要翻译：本发明采用能够产生用于产生等离子体的螺旋波的内部感应天线。本发明的一个实施例采用固定在腔室的钟形部分内的环形天线。另一实施例采用固定在腔室内的扁平线圈型天线。在优选实施例中，本发明的内部天线被构造成防止天线的溅射。天线可以由非溅射导电材料形成，或者可以通过非溅射护套形成完全或部分地包围的导电材料。在一个实施例中，非溅射护套可以耦合到室壁，使得由天线产生的热量通过传导在护套和腔室壁之间传递。优选地，非溅射护套由与绝缘等离子体的天线表面电绝缘的材料形成，以阻止导电沉积物中的涡流。间隙分开天线的暴露表面，使得阻止导电沉积物电连接分离的表面，同时抑制间隙内的等离子体产生。室壁的一部分或全部可以由导电和导热材料构成。

3. 发明申请

WO0079568A3 PLASMA REACTOR WITH MULTIPLE SMALL INTERNAL INDUCTIVE ANTENNAS 审中-公开
标题翻译：具有多个小内部电感天线的等离子体反应器
公开(公告)号：WO0079568A3
公开(公告)日：2001-11-15
申请号：PCT/US0016921
申请日：2000-06-19
申请人： APPLIED MATERIALS INC
发明人： YE YAN , D AMBRA ALLEN , MOK YEUK-FAI EDWIN , REMINGTON RICHARD E , SAMMONS JAMES E III
IPC分类号： H05H1/46 , C23C16/507 , H01J37/32 , H01L21/302
CPC分类号： H01J37/321 , H01J37/32477
摘要： The present invention employs a plurality of small inductive antennas to generate a processing plasma. In one embodiment, small coil antennas are secured within the chamber so that both of the pole regions of the antennas couple power to the plasma. The antennas may be oriented so that poles regions are anywhere from perpendicular, to parallel to a chamber wall. The number, location, and orientation of the small antennas within the chamber may be selected to optimize plasma characteristics. In addition, the antennas may be secured to top, side, or bottom walls to improve plasma characteristics; and power deposition within the processing chamber may be adjusted by changing the orientation of the coils, and the magnitude and phase relationship of RF power through the individual antennas. Process gas may be selectively delivered to areas of high power deposition such as adjacent pole regions or through the center of a coil or loop antenna to control plasma characteristics. In a preferred embodiment, the antennas are formed of a conductor surrounded by a non-sputtering, electrically insulating, thermally conductive jacket coupled to an electrically conductive chamber wall. The exposed surface of the jacket may be segmented to reduce eddy currents in conductive deposits.
摘要翻译：本发明采用多个小电感天线来产生处理等离子体。在一个实施例中，小型线圈天线被固定在腔室内，使得天线的两个极区将功率耦合到等离子体。天线可以被定向成使得极区域从垂直方向到平行于室壁的任何地方。可以选择腔室内的小天线的数量，位置和取向以优化等离子体特性。此外，天线可固定到顶壁，侧壁或底壁以改善等离子体特性; 并且可以通过改变线圈的取向以及通过各个天线的RF功率的幅度和相位关系来调整处理室内的功率沉积。工艺气体可以选择性地输送到高功率沉积的区域，例如相邻的极区域或通过线圈或环形天线的中心来控制等离子体特性。在优选实施例中，天线由与由导电室壁连接的非溅射电绝缘导热套围绕的导体形成。夹套的暴露表面可以被分段以减少导电沉积物中的涡流。

4. 发明申请

WO0017906A3 RF PLASMA ETCH REACTOR WITH INTERNAL INDUCTIVE COIL ANTENNA AND ELECTRICALLY CONDUCTIVE CHAMBER WALLS 审中-公开
标题翻译：具有内部电感线圈天线和导电室壁的射频等离子体刻蚀反应器
公开(公告)号：WO0017906A3
公开(公告)日：2000-07-13
申请号：PCT/US9921740
申请日：1999-09-21
申请人： APPLIED MATERIALS INC
发明人： YE YAN , OLGADO DONALD , KUMAR ANANDA H , MOK YEUK-FAI , D AMBRA ALLEN , TEPMAN AVI , MA DIANA , YIN GERALD , LOEWENHARDT PETER , HWANG JENG , MAK STEVE
IPC分类号： H05H1/46 , B01J19/08 , H01J27/16 , H01J37/08 , H01J37/32 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/321
摘要： The present invention provides an inductive antenna secured within a processing chamber. The antenna may be constructed so that it can be attached to an electrically conductive chamber wall and so that it readily transfers heat to the chamber wall. Conductive chamber walls provide an improved anode for the bias circuit and allow for temperature regulation of the antenna. In one possible embodiment, the antenna may comprise a conductor surrounded by an electrically insulative, thermally conductive, non-sputtering material, such as ceramic, which may be attached to the chamber wall. To reduce inductive power attenuation, the exposed surface of the antenna may be separated by gaps which inhibit eddy currents from flowing in conductive deposits on the antenna. Adjacent antenna turns, as well as the turns themselves, may be separate by gaps. The dimensions and shape of the gap inhibit conductive etch byproduct from bridging the gaps. Dummy rings may be located between antenna rings and removed to facilitate cleaning. Process gases may be fed to the chamber via the gaps.
摘要翻译：本发明提供了一种固定在处理室内的感应天线。天线可以被构造成使得它可以被附接到导电室壁并且使得它容易地将热量传递到室壁。导电室壁为偏置电路提供改进的阳极并允许天线的温度调节。在一个可能的实施例中，天线可以包括被电绝缘的，导热的非溅射材料（诸如陶瓷）围绕的导体，其可以附接到腔室壁。为了减少感应功率衰减，天线的暴露表面可以被间隙隔开，这些间隙阻止涡流在天线上的导电沉积物中流动。相邻的天线转弯以及转弯本身可能由间隙分开。间隙的尺寸和形状抑制导电蚀刻副产物桥接间隙。假环可能位于天线环之间并被移除以便于清洁。工艺气体可以通过间隙供应到腔室。

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