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1. 发明申请

WO0028580A3 METHOD AND APPARATUS FOR CLEANING THE EDGE OF A THIN DISC 审中-公开
标题翻译：用于清洁薄盘边缘的方法和设备
公开(公告)号：WO0028580A3
公开(公告)日：2000-07-27
申请号：PCT/US9926067
申请日：1999-11-04
申请人： APPLIED MATERIALS INC
发明人： FISHKIN BORIS , BROWN BRIAN J , TANG JIANSHE
IPC分类号： H01L21/00
CPC分类号： H01L21/67057 , Y10S134/902
摘要： A method and apparatus for cleaning wafer edges is provided. The inventive wafer cleaner employs a transducer equal in length to the diameter of a wafer to be cleaned, and positioned to direct sonic energy in line with the wafer's edge. Supporting and rotating mechanisms are positioned along the wafer's edge, outside of the transducer's high energy field, and preferably such that approximately 50 percent of the wafer is positioned between the wafer supports and the transducer. Therefore, minimal sonic energy is blocked from reaching the wafer's surface. The transducer dimensions relative to the wafer, and the positioning of the wafer supports relative to the transducer enable the system to achieve an approximately 50 percent edge cleaning duty cycle as the wafer is rotated.
摘要翻译：提供了用于清洁晶片边缘的方法和设备。本发明的晶片清洁器采用长度与待清洁晶片的直径相等的换能器，并且定位成引导与晶片边缘一致的声能。支撑和旋转机构沿晶片的边缘位于换能器的高能量场之外，并且优选地使得大约50％的晶片位于晶片支撑件和换能器之间。因此，最小的声能被阻止到达晶片表面。相对于晶片的换能器尺寸以及晶片支架相对于换能器的定位使得系统能够在晶片旋转时实现大约50％的边缘清洁占空比。

2. 发明申请

WO0028579A9 METHOD AND APPARATUS FOR CLEANING THE EDGE OF A THIN DISC 审中-公开
标题翻译：清洁薄片边缘的方法和装置
公开(公告)号：WO0028579A9
公开(公告)日：2000-11-02
申请号：PCT/US9925988
申请日：1999-11-03
申请人： APPLIED MATERIALS INC
发明人： FISHKIN BORIS , TANG JIANSHE , BROWN BRIAN J
IPC分类号： H01L21/00
CPC分类号： H01L21/67051 , H01L21/67046 , Y10S134/902
摘要： An inventive edge cleaning device is provided for cleaning the edge of a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include deionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.
摘要翻译：提供了一种创新的边缘清洁装置，用于清洁诸如半导体晶片的薄盘的边缘。本发明的边缘清洁装置具有定位成在薄盘的边缘表面处引导液体射流的声波喷嘴。优选地，声波喷嘴与薄盘的边缘径向间隔开，使得当由声波喷嘴清洁薄盘边缘时，可以在薄盘的主表面上同时进行洗涤，旋转漂洗或旋转清洁。液体射流可以包括去离子水，NH 4 OH，KOH，TMAH，HF，柠檬酸，表面活性剂或其他类似的清洁溶液，并且当薄盘旋转时喷嘴可以保持静止，或者喷嘴可以扫描薄盘的圆周以清洁薄片的整个边缘。

3. 发明申请

WO2011127318A3 USE OF AL BARRIER LAYER TO PRODUCE HIGH HAZE ZNO FILMS ON GLASS SUBSTRATES 审中-公开
标题翻译：使用ALBARER层在玻璃基底上生产高含量的ZNO膜
公开(公告)号：WO2011127318A3
公开(公告)日：2012-03-08
申请号：PCT/US2011031633
申请日：2011-04-07
申请人： APPLIED MATERIALS INC , BHATNAGAR YASHRAJ K , MCCOMB BRENDAN , SU XIAO MING , JADHAV DEEPAK , SUBRAMANI ANANTHA K , WANG WEI D , TANG JIANSHE
发明人： BHATNAGAR YASHRAJ K , MCCOMB BRENDAN , SU XIAO MING , JADHAV DEEPAK , SUBRAMANI ANANTHA K , WANG WEI D , TANG JIANSHE
IPC分类号： H01L31/042 , H01L31/0216 , H01L31/18
CPC分类号： H01L31/1884 , H01L31/022483 , H01L31/0392 , H01L31/04 , H01L31/076 , H01L31/1864 , Y02E10/548
摘要： Embodiments of the invention provide a method for forming a solar cell including forming a layer comprising alumina on a substrate and forming a transparent conductive layer on the layer comprising alumina. The method may also include forming a transparent conductive seed layer on the layer comprising alumina and forming a transparent conductive bulk layer on the transparent conductive seed layer. Embodiments of the invention also include photovoltaic devices having a substrate, a layer comprising alumina adjacent to the substrate, a zinc oxide-containing transparent conductive seed layer adjacent to the layer comprising alumina, and a zinc oxide-containing transparent conductive bulk layer adjacent the zinc oxide-containing transparent conductive seed layer.
摘要翻译：本发明的实施例提供了一种形成太阳能电池的方法，包括在基底上形成包含氧化铝的层，并在包含氧化铝的层上形成透明导电层。该方法还可以包括在包含氧化铝的层上形成透明导电晶种层，并在透明导电籽晶层上形成透明导电体层。本发明的实施例还包括具有基底的光伏器件，与基底相邻的氧化铝层，与氧化铝相邻的含氧化锌的透明导电籽晶层和与锌相邻的含氧化锌的透明导电体层含氧化物的透明导电种子层。

4. 发明申请

WO2007111976A3 METHODS AND APPARATUS FOR CLEANING A SUBSTRATE 审中-公开
标题翻译：清洗基板的方法和装置
公开(公告)号：WO2007111976A3
公开(公告)日：2008-10-02
申请号：PCT/US2007007199
申请日：2007-03-23
申请人： APPLIED MATERIALS INC
发明人： LU WEI , TANG JIANSHE , KO ALEXANDER SOU-KANG , YEE NELSON A , XIE BO , LEE JOHN TSENG-CHUNG , ENDO RICK R
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B08B3/024 , H01L21/6704
摘要： The present invention provides methods, apparatus, and systems for cleaning a substrate that include a controller and a nozzle coupled to the controller. The controller is adapted to direct the nozzle to dispense a uniform fluid spray pattern onto a substrate . The controller is adapted create the uniform fluid spray pattern by adjusting at least one operational parameter of the nozzle to cause a predefined percentage of droplets to be within a predetermined size range. Numerous other aspects are disclosed.
摘要翻译：本发明提供了用于清洁衬底的方法，装置和系统，其包括控制器和连接到控制器的喷嘴。控制器适于引导喷嘴将均匀的流体喷雾图案分配到基底上。通过调整喷嘴的至少一个操作参数来使控制器适应于产生均匀的流体喷射图案，以使预定百分比的液滴在预定的尺寸范围内。公开了许多其他方面。

5. 发明申请

WO2011162865A3 A NUCLEATION PROMOTION LAYER FORMED ON A SUBSTRATE TO ENHANCE DEPOSITION OF A TRANSPARENT CONDUCTIVE LAYER 审中-公开
标题翻译：在基底上形成的增强促进层以增强透明导电层的沉积
公开(公告)号：WO2011162865A3
公开(公告)日：2012-02-16
申请号：PCT/US2011033449
申请日：2011-04-21
申请人： APPLIED MATERIALS INC , SCHUEGRAF KLAUS , BHATNAGAR YASHRAJ K , MCCOMB BRENDAN , TANG JIANSHE
发明人： SCHUEGRAF KLAUS , BHATNAGAR YASHRAJ K , MCCOMB BRENDAN , TANG JIANSHE
IPC分类号： H01L31/042 , H01L31/0216 , H01L31/18
CPC分类号： H01L31/022483 , H01L31/0392 , H01L31/056 , Y02E10/52
摘要： Methods for forming a nucleation promotion layer prior to formation of a transparent conductive layer suitable for use in PV cells are provided. In one embodiment, the method includes forming a seed layer on a substrate by materials sputtered from a first target disposed in a reactive sputter processing chamber, and forming a transparent conductive layer on the seed layer by materials sputtered from a second target disposed in the reactive sputter processing chamber, wherein the first and the second target are fabricated by a containing material having dopants formed therein and dopant concentration formed in the first target is higher than the dopant concentration formed in the second target.
摘要翻译：提供了在形成适用于PV电池的透明导电层之前形成成核促进层的方法。在一个实施例中，该方法包括通过从设置在反应溅射处理室中的第一靶溅射的材料在衬底上形成种子层，并且通过从设置在反应性反应器中的第二靶溅射的材料在种子层上形成透明导电层溅射处理室，其中通过在其中形成有掺杂剂的含有材料制造第一和第二靶，并且在第一靶中形成的掺杂剂浓度高于在第二靶中形成的掺杂浓度。

6. 发明申请

WO2008021265A3 SEMICONDUCTOR SUBSTRATE CLEANING APPARATUS 审中-公开
标题翻译：半导体基板清洗装置
公开(公告)号：WO2008021265A3
公开(公告)日：2008-10-23
申请号：PCT/US2007017837
申请日：2007-08-10
申请人： APPLIED MATERIALS INC , TANG JIANSHE , LU WEI , XIE BO , LI FRED , KO ALEX
发明人： TANG JIANSHE , LU WEI , XIE BO , LI FRED , KO ALEX
IPC分类号： B08B3/02
CPC分类号： B08B3/04 , B08B3/02 , H01L21/67028
摘要： A semiconductor substrate (78) processing apparatus and a method for processing semiconductor substrates (78) are provided. The semiconductor substrate (78) processing apparatus may include a liquid container (62) where a semiconductor substrate (78) may be immersed in a semiconductor processing liquid (64). The semiconductor substrate may then be removed from the semiconductor processing liquid while vapor (76) is directed at a surface of the semiconductor substrate (78)where the semiconductor substrate contacts a surface of the processing liquid (64).
摘要翻译：提供半导体基板（78）处理装置和半导体基板（78）的处理方法。半导体基板（78）处理装置可以包括其中可以将半导体基板（78）浸入半导体处理液体（64）中的液体容器（62）。然后可以从半导体处理液体中去除半导体衬底，同时蒸汽（76）指向半导体衬底（78）的半导体衬底与处理液体（64）的表面接触的表面。

7. 发明申请

WO0028579A2 METHOD AND APPARATUS FOR CLEANING THE EDGE OF A THIN DISC 审中-公开
标题翻译：用于清洁薄盘边缘的方法和设备
公开(公告)号：WO0028579A2
公开(公告)日：2000-05-18
申请号：PCT/US9925988
申请日：1999-11-03
申请人： APPLIED MATERIALS INC
发明人： FISHKIN BORIS , TANG JIANSHE , BROWN BRIAN J
IPC分类号： H01L21/00
CPC分类号： H01L21/67051 , H01L21/67046 , Y10S134/902
摘要： An inventive edge cleaning device is provided for cleaning the edge of a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include deionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.
摘要翻译：本发明的边缘清洁装置被设置用于清洁诸如半导体晶片的薄盘的边缘。本发明的边缘清洁装置具有声波喷嘴，该声波喷嘴被定位成将液体射流引导至薄盘的边缘表面。优选地，声波喷嘴与薄盘的边缘径向间隔开，使得当薄盘边缘由声波喷嘴清洁时，可以在薄盘的主表面上同时进行擦洗，旋转漂洗或旋转清洗。液体射流可以包括去离子水，NH 4 OH，KOH，TMAH，HF，柠檬酸，表面活性剂或其他类似的清洁溶液，并且随着薄盘旋转或喷嘴可以扫描薄圆盘的圆周，喷嘴可以保持静止清洁薄盘的整个边缘。

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