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1. 发明申请

WO2007041056A2 CRITICAL DIMENSION EFFECTS CORRECTION IN RASTER PATTERN GENERATOR 审中-公开
标题翻译： RASTER模式发生器的关键尺寸效应校正
公开(公告)号：WO2007041056A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/037216
申请日：2006-09-26
申请人： APPLIED MATERIALS, INC. , LOZES, Richard, L. , BULLER, Benyamin
发明人： LOZES, Richard, L. , BULLER, Benyamin
IPC分类号： G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31769 , Y10S430/143
摘要： A method for generating a flash. The method includes computing dose correction multipliers taking into account fogging scattering effects, backscattering effects and fast secondary scattering effects; and using the dose correction multipliers to generate the flash.
摘要翻译：一种产生闪光灯的方法。该方法包括考虑雾化散射效应，后向散射效应和快速二次散射效应的计算剂量校正乘数; 并使用剂量校正乘数来产生闪光。

2. 发明申请

WO2007041033A1 PLACEMENT EFFECTS CORRECTION IN RASTER PATTERN GENERATOR 审中-公开
标题翻译：放射影像发生器校正效应
公开(公告)号：WO2007041033A1
公开(公告)日：2007-04-12
申请号：PCT/US2006/037038
申请日：2006-09-25
申请人： APPLIED MATERIALS, INC. , LOZES, Richard, L. , BULLER, Benjamin
发明人： LOZES, Richard, L. , BULLER, Benjamin
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31769 , H01J2237/31796 , Y10S430/143
摘要： A method for generating a flash. The method includes computing a displacement vector to resist charging. The displacement vector is defined as δ c = dP®K , where δ c represents the displacement vector, d represents dose correction multipliers, P represents a pattern and K represents a Poisson kernel converted to a spatial domain. The method further includes using the displacement vector to modify the positioning of the flash.
摘要翻译：一种产生闪光灯的方法。该方法包括计算位移矢量以抵抗充电。位移矢量被定义为d

3. 发明申请

WO2007041530A3 WRITING A CIRCUIT DESIGN PATTERN WITH SHAPED PARTICLE BEAM FLASHES 审中-公开
公开(公告)号：WO2007041530A3
公开(公告)日：2007-04-12
申请号：PCT/US2006/038515
申请日：2006-10-02
申请人： APPLIED MATERIALS, INC. , BULLER, Benyamin , LOZES, Richard, L. , SILLS, Robert, M.
发明人： BULLER, Benyamin , LOZES, Richard, L. , SILLS, Robert, M.
IPC分类号： H01J37/317
摘要： A shaped particle beam writing strategy is used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted polygons which are represented by a location coordinate, at least two dimension coordinates, and at least one external edge indicator. The restricted polygons are tiled into a set of tiles comprising interior tiles and external edge tiles. Flash data is assigned for each tile such that the interior tiles are assigned a first flash area and the external edge tiles are assigned a second smaller flash area, and the flash data is arranged in a selected order to write the pattern with a modulated particle beam, such as an electron beam, on a substrate.

4. 发明申请

WO2007041101A2 BEAM EXPOSURE WRITING STRATEGY SYSTEM AND METHOD 审中-公开
标题翻译：光束曝光写作策略系统及方法
公开(公告)号：WO2007041101A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/037485
申请日：2006-09-26
申请人： APPLIED MATERIALS, INC.
发明人： BULLER, Benyamin , LOZES, Richard, L.
IPC分类号： H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/30488 , H01J2237/30494
摘要： A beam exposure writing strategy method and system are disclosed for exposing a desired pattern on a substrate, by raster scanning a beam such as a particle beam, across a major field on the substrate. The beam is also vector scanned across a minor field of the substrate superimposed along the major field raster scan. The beam is selectively blanked and unblanked as the beam is being scanned. The unblanked flashes of the beam are modulated in coordination with the raster and vector scanning to expose the desired pattern on the substrate. The disclosed system and method generating an adjustable length microvector having a maximum range of at least about N time a nominal length λ, where N is equal to four and λ is substantially equal to a dimension of a nominal flash area, the nominal flash location dimension being substantially greater than a major field cell dimension.
摘要翻译：公开了一种束曝光写入策略方法和系统，用于通过在衬底上的主场上光栅扫描诸如粒子束的光束来在衬底上暴露期望的图案。光束也沿着主场光栅扫描叠加的衬底的次视场矢量扫描。当光束被扫描时，光束被选择性地消隐并被取消闪烁。与光栅和矢量扫描协调地调制光束的未闪烁闪光以暴露衬底上的期望图案。所公开的系统和方法产生可调长度的微向量，其具有至少约N倍的标称长度α的最大范围，其中N等于4，基本上等于标称闪光面积的尺寸，标称闪光位置尺寸基本上大于主场单元尺寸。

5. 发明申请

WO2002097655A3 FAST SIGNAL CONVOLUTION USING SEPARATED -SPLINE KERNEL 审中-公开
公开(公告)号：WO2002097655A3
公开(公告)日：2002-12-05
申请号：PCT/US2002/016475
申请日：2002-05-24
申请人： APPLIED MATERIALS, INC.
发明人： COPELAND, David, Jeremy , CRANDALL, Richard, E. , HOFMANN, Ulrich , LOZES, Richard, L.
IPC分类号： G06F17/15
摘要： A fast convolution method applicable to convolving a signal (indicative of an ( n )-dimensional pattern, where ( n ) is greater than or equal to two) with a smooth kernel that can be approximated by a separated-spline kernel, and a system configured to perform such method using software or signal processing cirucitry. Unlike Fourier-based convolution methods which require on the order of ( N ) log ( N ) arithmetic operations for a signal of length ( N ), the method of the invention requires only on the order of N arithmetic operations to do so. Unlike wavelet-based convolution approximations (which typically also require more arithmetic operations than are required in accordance with the invention to convolve the same signal), the method of the invention is exact for convolution kernels which are spline kernels.

6. 发明申请

WO2002097655A2 METHOD AND APPARATUS FOR FAST SIGNAL CONVOLUTION USING SEPARATED -SPLINE KERNEL 审中-公开
标题翻译：使用分离型丝网的快速信号变换的方法和装置
公开(公告)号：WO2002097655A2
公开(公告)日：2002-12-05
申请号：PCT/US2002/016475
申请日：2002-05-24
申请人： APPLIED MATERIALS, INC.
发明人： COPELAND, David, Jeremy , CRANDALL, Richard, E. , HOFMANN, Ulrich , LOZES, Richard, L.
IPC分类号： G06F17/00
CPC分类号： G06T5/20 , G06F17/15
摘要： A fast convolution method applicable to convolving a signal (indicative of an n -dimensional pattern, where n is greater than or equal to two) with a smooth kernel that can be approximated by a separated-spline kernel, and a system configured to perform such method using software or signal processing cirucitry. Unlike Fourier-based convolution methods which require on the order of N log N arithmetic operations for a signal of length N , the method of the invention requires only on the order of N arithmetic operations to do so. Unlike wavelet-based convolution approximations (which typically also require more arithmetic operations than are required in accordance with the invention to convolve the same signal), the method of the invention is exact for convolution kernels which are spline kernels.
摘要翻译：一种快速卷积方法，适用于使用可以由分离样条内核近似的平滑内核来卷积信号（指示n维度图案，其中n大于或等于2）的信号，以及被配置为执行这样的系统的系统方法使用软件或信号处理cirucitry。与对于长度为N的信号需要N次N次算术运算的基于傅立叶的卷积方法不同，本发明的方法仅需要按N个算术运算的顺序进行。与基于小波的卷积近似（其通常还需要比根据本发明所需的更多的算术运算来卷积相同的信号），本发明的方法对于作为样条内核的卷积内核是精确的。

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