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1. 发明申请

WO2008094418A1 OFFSET MAGNET COMPENSATION FOR NON-UNIFORM PLASMA 审中-公开
标题翻译：非均匀等离子体的偏移磁体补偿
公开(公告)号：WO2008094418A1
公开(公告)日：2008-08-07
申请号：PCT/US2008/000793
申请日：2008-01-22
申请人： APPLIED MATERIALS, INC. , BOITNOTT, Christopher , MILLER, Keith, A.
发明人： BOITNOTT, Christopher , MILLER, Keith, A.
IPC分类号： C23C14/32
CPC分类号： C23C14/35 , C23C14/046 , H01J37/3408 , H01J37/3452 , H01J37/3458
摘要： A non-axisymmetric electromagnet coil (124) used in plasma processing in which at least one electromagnet coil is not symmetric with the central axis (54) of the plasma processing chamber with which it is used but is symmetric with an axis (130) offset from the central axis. When placed radially outside of an RF coil (86), it may reduce the azimuthal asymmetry in the plasma produced by the RF coil. Axisymmetric magnet arrays may include additional axisymmetric electromagnet coils (122, 126, 128). One axisymmetric coil (126) is advantageously placed radially inside of the non-axisymmetric coil to carry opposed currents. The multiple electromagnet coils may be embedded in a molded encapsulant (162) having a central bore (178) about a central axis providing the axisymmetry of the coils.
摘要翻译：用于等离子体处理中的非轴对称电磁线圈（124），其中至少一个电磁线圈与等离子体处理室的中心轴线（54）不对称，使用该等离子体处理室，但与轴（130）偏移对称从中心轴。当径向放置在RF线圈（86）的外部时，可以降低由RF线圈产生的等离子体的方位不对称性。轴对称磁体阵列可以包括附加的轴对称电磁体线圈（122,126,128）。一个轴对称线圈（126）有利地放置在非轴对称线圈的径向内部以承载相对的电流。多个电磁线圈可以嵌入模制的密封剂（162）中，所述密封剂具有围绕中心轴线的中心孔（178），从而提供线圈的轴对称性。

2. 发明申请

WO2011156534A2 MULTIPLE FREQUENCY POWER FOR PLASMA CHAMBER ELECTRODE 审中-公开
标题翻译：用于等离子体室电极的多个频率功率
公开(公告)号：WO2011156534A2
公开(公告)日：2011-12-15
申请号：PCT/US2011/039689
申请日：2011-06-08
申请人： APPLIED MATERIALS, INC.
发明人： HAMMOND, Edward, P., IV , TANAKA, Tsutomu , BOITNOTT, Christopher , KUDELA, Jozef
IPC分类号： H05H1/46 , H05H1/34 , H01L21/205
CPC分类号： H01J37/32165 , H01J37/32091 , H01J37/32137
摘要： First through fifth RF power signals are respectively coupled to first through fifth RF connection points on an electrode of a plasma chamber. The first, second and third RF power signals have distinct first, second and third frequencies, respectively. The second and fourth RF power signals have the same frequency and opposite phase. The third and fifth RF power signals have the same frequency and opposite phase. The second through fifth RF connection points are geometrically arranged as four successive vertices of a quadrilateral convex polygon. The first RF connection point is closer to the center of the electrode. The center strong spatial distribution of the electric field produced by the first RF power signal is offset by the center weak spatial distribution of the electric field produced by the second through fifth RF power signals. An alternative embodiment omits the third and fifth RF power signals and the third and fifth RF connection points.
摘要翻译：第一至第五RF功率信号分别耦合到等离子体室的电极上的第一至第五RF连接点。第一，第二和第三RF功率信号分别具有不同的第一，第二和第三频率。第二和第四RF功率信号具有相同的频率和相位相位。第三和第五RF功率信号具有相同的频率和相位相位。第二至第五RF连接点在几何上被布置为四边形凸多边形的四个连续顶点。第一RF连接点更靠近电极的中心。由第一RF功率信号产生的电场的中心强空间分布由第二至第五RF功率信号产生的电场的中心弱空间分布抵消。替代实施例省略了第三和第五RF功率信号以及第三和第五RF连接点。

3. 发明申请

WO2011088156A3 PHASE-MODULATED RF POWER FOR PLASMA CHAMBER ELECTRODE 审中-公开
公开(公告)号：WO2011088156A3
公开(公告)日：2011-07-21
申请号：PCT/US2011/021033
申请日：2011-01-12
申请人： APPLIED MATERIALS, INC.
发明人： HAMMOND IV, Edward, P. , TANAKA, Tsutomu , BOITNOTT, Christopher , KUDELA, Jozef
IPC分类号： H05H1/46 , H01L21/3065 , H05H1/34
摘要： A plurality of RF power signals have the same RF frequency as a reference RF signal and are coupled to respective RF connection points on an electrode of a plasma chamber. At least three of the RF connection points are not collinear. At least two of the RF power signals have time- varying phase offsets relative to the reference RF signal that are distinct functions of time. Such time- varying phase offsets can produce a spatial distribution of plasma in the plasma chamber having better time-averaged uniformity than the uniformity of the spatial distribution at any instant in time.

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