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1. 发明申请

WO2005027195A3 APPARATUS FOR CARRYING RETICLES AND METHOD OF USING THE SAME TO PROCESS RETICLES 审中-公开
标题翻译：携带反应物的装置及其使用方法
公开(公告)号：WO2005027195A3
公开(公告)日：2006-06-29
申请号：PCT/US2004028447
申请日：2004-09-01
申请人： AKRION LLC , KASHKOUSH ISMAIL , RUIZ CARLOS M
发明人： KASHKOUSH ISMAIL , RUIZ CARLOS M
IPC分类号： F16M11/00 , B05C11/00 , B05C13/00 , H01L20060101 , H01L21/673
CPC分类号： H01L21/67316
摘要： An apparatus (100) for carrying reticles during a multi-step, multi-location treatment process comprising a structural frame (10) carrying at least three holding rods (20, 23), the rods (20, 23) and/or frame (10) being constructed of a hard inner core material and a chemically resistant outer material is disclosed. The apparatus (100), in one embodiment, further comprises a plurality of slots for supporting the reticles that minimize the contact area between the reticles and the apparatus. Suitable hard inner core materials include carbon fiber, quartz, ceramic, PEEK, and silicon carbide. Suitable outer material includes fluoropolymers, such PTFE, PFA, TFM, and ECTFE. The apparatus is preferably adapted to withstand a reticle treatment process temperature between 20 - 180 °C. The rods (20-23) and frame (10) are preferably designed to minimize shadowing effects of reticles supported in the apparatus being exposed to megasonic energy. In another aspect, the invention is a method of processing reticles using the inventive apparatus.
摘要翻译：一种用于在多步多位置处理过程中承载掩模版的设备（100），包括承载至少三个保持杆（20,23）的结构框架（10），所述杆（20,23）和/或框架 10）由硬的内芯材料和耐化学腐蚀的外部材料构成。在一个实施例中，装置（100）还包括多个槽，用于支撑使掩模版和装置之间的接触面积最小化的光罩。合适的硬内芯材料包括碳纤维，石英，陶瓷，PEEK和碳化硅。合适的外部材料包括含氟聚合物，例如PTFE，PFA，TFM和ECTFE。该装置优选适于承受20-180℃之间的掩模版处理工艺温度。杆（20-23）和框架（10）优选地设计成最小化被暴露于兆声波能量的装置中支撑的标线的遮蔽效应。在另一方面，本发明是使用本发明的装置处理标线的方法。

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