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    • 1. 发明申请
    • LOW-EMISSIVITY GLAZING
    • 低功率玻璃
    • WO2014191472A2
    • 2014-12-04
    • PCT/EP2014/061093
    • 2014-05-28
    • AGC GLASS EUROPE
    • BAUDOUIN, Anne-ChristineMAHIEU, StijnDEPAUW, Jean-MichelPURWINS, MichaelMATHIEU, EricWEIS, HansjoergMÖNNEKES, Jörg
    • C03C17/36
    • C03C17/3618C03C17/3626C03C17/3644C03C17/366
    • The invention relates to low-emissivity glazing units that are capable of undergoing a heat treatment and only change very little in properties when they are subjected to such a heat treatment. They comprise a transparent substrate provided with a stack of thin layers of the type: first dielectric coating / infrared radiation reflecting functional layer / barrier layer / second dielectric coating. They are characterised by a first dielectric coating comprising a layer made from an oxide, in direct contact with the substrate, by a barrier layer based on zinc oxide or consisting of an indium oxide possibly doped with tin, and by a second dielectric coating comprising, in order, a layer made from an oxide other than silicon oxide with a thickness greater than 5 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm.
    • 本发明涉及能够进行热处理的低发射率玻璃单元,并且当它们进行这种热处理时,其性能仅变化很小。 它们包括具有一层薄层的透明基板,其具有以下类型:第一介电涂层/红外辐射反射功能层/阻挡层/第二电介质涂层。 它们的特征在于第一介电涂层,其包括由氧化物直接接触的氧化物制成的层,所述层由基于氧化锌的阻挡层或可能掺杂有锡的氧化铟组成,以及通过第二电介质涂层, 按照厚度大于5nm的由氧化硅以外的氧化物制成的层和厚度大于10nm的氮化硅或氧化硅制成的层。