会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • LOW-EMISSIVITY AND ANTI-SOLAR GLAZING
    • 低功率和抗太阳能玻璃
    • WO2014191474A2
    • 2014-12-04
    • PCT/EP2014/061096
    • 2014-05-28
    • AGC GLASS EUROPE
    • MAHIEU, StijnBAUDOUIN, Anne-ChristineHAUPTMANN, MarcDEPAUW, Jean-Michel
    • C03C17/00C03C17/36
    • C03C17/366C03C17/3618C03C17/3626C03C17/3639C03C17/3644C03C17/3681C03C2217/70C03C2218/156G02B1/14G02B5/208G02B5/26
    • The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment. They comprise a stack of thin layers comprising an alternating arrangement of n infrared radiation reflecting functional layers and n + 1 dielectric coatings, and a barrier layer directly superposed on the last functional layer furthest away from the substrate, characterised in that: (i) the first dielectric coating closest to the substrate comprises a layer made from an oxide, in direct contact with the substrate, (ii) the internal dielectric coating or coatings surrounded by two functional layers comprise a layer made from a silicon nitride or a silicon oxide with a thickness greater than 5 nm surrounded on both sides by layers made from an oxide other than silicon oxide with thicknesses greater than 5 nm, (iii) the barrier layer is based on zinc oxide or consists of an indium oxide possibly doped with tin, and (iv) the last dielectric coating furthest away from the substrate comprises, in order starting from the substrate: a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm.
    • 本发明涉及低辐射率和抗太阳能玻璃窗系统,当它们进行热处理时其性能变化很小。 它们包括一叠薄层,其包括反射功能层和n + 1电介质涂层的n个红外辐射的交替布置,以及直接叠加在最远离基底的最后功能层上的阻挡层,其特征在于:(i) 最接近衬底的第一电介质涂层包括与衬底直接接触的由氧化物制成的层,(ii)由两个功能层包围的内部电介质涂层或涂层包括由氮化硅或氧化硅制成的层, 厚度大于5nm的两面由厚度大于5nm的氧化硅之外的氧化物制成的层,(iii)阻挡层基于氧化锌或由可能掺杂锡的氧化铟组成, iv)最远离衬底的最后的电介质涂层包括从衬底开始的顺序:由氧化硅以外的氧化物制成的层,其中在 厚度大于3nm的厚度和厚度大于10nm的氮化硅或氧化硅制成的层。
    • 5. 发明申请
    • LOW-EMISSIVITY GLAZING
    • 低功率玻璃
    • WO2014191472A2
    • 2014-12-04
    • PCT/EP2014/061093
    • 2014-05-28
    • AGC GLASS EUROPE
    • BAUDOUIN, Anne-ChristineMAHIEU, StijnDEPAUW, Jean-MichelPURWINS, MichaelMATHIEU, EricWEIS, HansjoergMÖNNEKES, Jörg
    • C03C17/36
    • C03C17/3618C03C17/3626C03C17/3644C03C17/366
    • The invention relates to low-emissivity glazing units that are capable of undergoing a heat treatment and only change very little in properties when they are subjected to such a heat treatment. They comprise a transparent substrate provided with a stack of thin layers of the type: first dielectric coating / infrared radiation reflecting functional layer / barrier layer / second dielectric coating. They are characterised by a first dielectric coating comprising a layer made from an oxide, in direct contact with the substrate, by a barrier layer based on zinc oxide or consisting of an indium oxide possibly doped with tin, and by a second dielectric coating comprising, in order, a layer made from an oxide other than silicon oxide with a thickness greater than 5 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm.
    • 本发明涉及能够进行热处理的低发射率玻璃单元,并且当它们进行这种热处理时,其性能仅变化很小。 它们包括具有一层薄层的透明基板,其具有以下类型:第一介电涂层/红外辐射反射功能层/阻挡层/第二电介质涂层。 它们的特征在于第一介电涂层,其包括由氧化物直接接触的氧化物制成的层,所述层由基于氧化锌的阻挡层或可能掺杂有锡的氧化铟组成,以及通过第二电介质涂层, 按照厚度大于5nm的由氧化硅以外的氧化物制成的层和厚度大于10nm的氮化硅或氧化硅制成的层。