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    • 5. 发明申请
    • METHOD FOR MAKING AN OPTICAL WAVEGUIDE ASSEMBLY WITH INTEGRAL ALIGNMENT FEATURES
    • 用于制造具有整体对准特征的光波导组件的方法
    • WO2006007022A1
    • 2006-01-19
    • PCT/US2005/014609
    • 2005-04-28
    • 3M INNOVATIVE PROPERTIES COMPANY
    • SMITH, Terry, L.ZHANG, Jun-YingPARIKH, Rutesh, D.LARSEN, Jeremy, K.
    • G02B6/30
    • G02B6/30G02B6/42G02B2006/12176
    • An optical waveguide assembly (20) has integral alignment features (22) . The waveguide assembly is formed by fabricating a waveguide on a substrate (26) prior to forming the alignment features, removing a portion of the waveguide to reveal the substrate, and forming the alignment feature in the substrate. The planar waveguide assembly (20) with integral alignment features (22) is made by coating a substrate (26) with an etch stop layer (28) . An alignment feature pattern (30) is formed in the etch stop layer (28) . The alignment feature pattern (30) is fabricated using photolithography and an etch process. After the alignment feature pattern (30) is fabricated in the etch stop layer (28), the waveguides (32) are grown on top of the substrate (26) and etch stop layer (28) with alignment feature pattern (30) . The waveguides (32) are next etched in areas where the alignment feature pattern (30) was previously fabricated to expose the pattern (30) . Another etch is performed to create the precision alignment features (22) using the previously fabricated alignment feature pattern (30) . The alignment features (22) are V-grooves, U-shaped, trapezoidal or rectangular grooves.
    • 光波导组件(20)具有整体对准特征(22)。 波导组件通过在形成对准特征之前在衬底(26)上制造波导而形成,去除波导的一部分以露出衬底,以及在衬底中形成对准特征。 具有整体对准特征(22)的平面波导组件(20)通过用蚀刻停止层(28)涂覆衬底(26)来制成。 在蚀刻停止层(28)中形成对准特征图案(30)。 使用光刻和蚀刻工艺制造对准特征图案(30)。 在对准特征图案(30)制造在蚀刻停止层(28)中之后,波导(32)在具有对准特征图案(30)的衬底(26)和蚀刻停止层(28)的顶部生长。 在预先制造对准特征图案(30)以露出图案(30)的区域中接下来蚀刻波导(32)。 执行另一蚀刻以使用先前制造的对准特征图案(30)创建精密对准特征(22)。 对准特征(22)是V形槽,U形,梯形或矩形槽。