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1. 发明申请

WO2007040098A1 荷電粒子ビーム装置及び荷電粒子ビームの照射方法审中-公开
标题翻译：充电颗粒光束设备和用于辐射充电颗粒光束的方法
公开(公告)号：WO2007040098A1
公开(公告)日：2007-04-12
申请号：PCT/JP2006/319069
申请日：2006-09-26
申请人：エスアイアイ・ナノテクノロジー株式会社 , 杉山安彦 , 萩原良二 , 田代純一
发明人：杉山安彦 , 萩原良二 , 田代純一
IPC分类号： H01J37/305 , H01J37/12
CPC分类号： H01J37/12 , H01J37/3056 , H01J2237/24564 , H01J2237/31744 , H01J2237/31749
摘要： Charged particle beam equipment for irradiating a charged particle beam stably with low energy while reducing the beam diameter by suppressing aberration of the charged particle beam, and its irradiation method. Charged particle beam equipment in which the quantity, energy and focusing of a charged particle beam can be regulated freely, and its irradiation method are also provided. The charged particle beam equipment (1) comprises a charged particle supply section (3) applied with an acceleration voltage E, a means (4) for deriving and accelerating a charged particle beam B, and a means (5) for focusing the charged particle beam B and irradiating an earthed sample surface S with the charged particle beam B thus focused. The accelerating means (4) and the focusing means (5) comprise bipotential lenses (8, 9). An exit side electrode (8c) and an incident side electrode (9a) are connected with an intermediate acceleration power supply (14) for applying a voltage having a polarity different from that of the charged particle beam B. An incident side electrode (8a) is connected with a deriving power supply (11) and an exit side electrode (9c) is earthed.
摘要翻译：带电粒子束设备，通过抑制带电粒子束的像差，同时以低能量稳定地照射带电粒子束，同时减小光束直径及其照射方法。带电粒子束的设备能够自由调节带电粒子束的数量，能量和聚焦，并提供其照射方法。带电粒子束设备（1）包括施加有加速电压E的带电粒子供应部分（3），用于导出和加速带电粒子束B的装置（4）和用于聚焦带电粒子的装置（5）光束B并照射接地的样品表面S与被聚集的带电粒子束B. 加速装置（4）和聚焦装置（5）包括双电位透镜（8,9）。出口侧电极（8c）和入射侧电极（9a）与用于施加与带电粒子束B的极性不同的电压的中间加速电源（14）连接。入射侧电极（8a）与导出电源（11）连接，并且出射侧电极（9c）接地。

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