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1. 发明申请

WO2009097323A2 OPTICAL ALIGNMENT SYSTEM AND ALIGNMENT METHOD FOR RADIOGRAPHIC X-RAY IMAGING 审中-公开
标题翻译：射线X射线成像的光学校准系统和校准方法
公开(公告)号：WO2009097323A2
公开(公告)日：2009-08-06
申请号：PCT/US2009/032222
申请日：2009-01-28
申请人： REFLECTIVE X-RAY OPTICS LLC , WINDT, David, L.
发明人： WINDT, David, L.
IPC分类号： A61B6/00
CPC分类号： A61B6/08 , A61B6/06 , A61B6/4035 , A61B6/4078 , A61B6/4085 , A61B6/502 , A61B6/582 , A61B6/583 , A61B6/587
摘要： An X-ray optical alignment system for X-ray imaging devices includes a visible-light point source and a multi-axis positioner therefor, fixedly mounted with respect to the X-ray focal spot. A mirror or beamsplitter is fixedly mounted with respect to the X-ray focal spot and disposed in the beam path of the X-ray source. The beamsplitter reflects light emitted from the light source and transmits X-rays emitted from the X-ray source. A first X-ray attenuating grid is fixedly but removably mountable with respect to the X-ray source, having a first X-ray attenuation pattern; and a second X-ray attenuating grid is adjustably mountable with respect to the first grid having a second X-ray attenuating pattern corresponding to the first X-ray attenuating pattern. When the grids are aligned, their attenuating patterns are also aligned and allow X-rays from the X-ray source and light reflected from the beamsplitter to pass therethrough.
摘要翻译：用于X射线成像设备的X射线光学对准系统包括固定安装在X射线焦斑上的可见光点源和用于其的多轴定位器。镜子或分束器相对于X射线焦斑固定地安装并且设置在X射线源的光束路径中。分束器反射从光源发射的光并透射从X射线源发射的X射线。第一X射线衰减网格相对于X射线源固定但可拆卸地安装，具有第一X射线衰减图案; 并且第二X射线衰减网格相对于具有对应于第一X射线衰减图案的第二X射线衰减图案的第一网格可调节地安装。当网格对齐时，它们的衰减图案也被对齐，并允许来自X射线源的X射线和从分束器反射的光通过。

2. 发明申请

WO2009043374A1 APERIODIC MULTILAYER STRUCTURES 审中-公开
标题翻译： APERIODIC多层结构
公开(公告)号：WO2009043374A1
公开(公告)日：2009-04-09
申请号：PCT/EP2007/060477
申请日：2007-10-02
申请人： CONSIGLIO NAZIONALE DELLE RICERCHE - INFM ISTITUTO NAZIONALE PER LA FISICA DELLA MATERIA , UNIVERSITA' DEGLI STUDI DI PADOVA , REFLECTIVE X-RAY OPTICS LLC. , PELIZZO, Maria-Guglielmina , NICOLOSI, Piergiorgio , SUMAN, Michele , WINDT, David L.
发明人： PELIZZO, Maria-Guglielmina , NICOLOSI, Piergiorgio , SUMAN, Michele , WINDT, David L.
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/0891 , G02B27/0012 , G03F1/24 , G03F7/70233 , G21K1/062 , G21K2201/061 , Y10T428/24612
摘要： Aperiodic mult ilayer structures An aperiodic multilayer structure (2, 2') comprising a plurality of alternating layers of a first (4, 4') and a second (6, 6') material and a capping layer (10, 10') covering these alternating layers, wherein the structure (2, 2') is characterized in that the thickness of the alternating layers chaotically varies in at least a portion of said structure (2, 2'). The invention further comprises design method comprising the step of define a time interval and a first plurality of periodic multilayer structures (A), then calculate a first merit function ( ∫ R(λ ) 10 * I(λ)dλ ) and define a first domain for each first structures. The method further includes the step of apply at least one rando m mutation to each first structures inside the associated first domain and calculate a second merit function ( ∫R(λ) 10 * I(λ)dλ for the at least one mutation. Then, the method proceeds with a co mparison of each first merit functions with the second merit function of the associated at least one mutation and if said second merit function is enhanced with respect to the first merit function, the at least one mutation is substituted for the structure of the first plurality and a second domain is defined for thw mutation, otherwise, the structure of the first plurality is maintained inside the corresponding first domain. The method further includes the step of calculate a mean value of the merit functions o f the first plurality of structures or mutations present in each first or second domain and define a threshold value to said mean value; then, for each first plurality of structures or mutations present in each first or second domain whose merit function is enhanced of the threshold with respect to the mean value, subst itute a third domain to the first or second domain unt il the corresponding merit function is enhanced of said predetermined threshold. Then, the preceding step are repeated unt il the time interval has lapsed and the merit funct ions of the first plurality of structures or mutations present in each first domain are compared and the structure or mutation whose merit function is the more enhanced is selected.
摘要翻译：非周期多层结构包括多个第一（4,4''）和第二（6,6'）材料的交替层和覆盖层（10,10'）的非周期多层结构（2,2'），覆盖这些交替层，其中所述结构（2,2'）的特征在于，所述交替层的厚度在所述结构（2,2'）的至少一部分中混沌变化。本发明还包括设计方法，包括定义时间间隔和第一多个周期性多层结构（A）的步骤，然后计算第一优值函数（ΔR（？）10 * I（？）d？）并定义每个第一个结构的第一个域。所述方法还包括对所述相关联的第一结构域内的每个第一结构应用至少一个rando m突变的步骤，并计算所述至少一个突变的第二优点函数（ΔR（α）10 * I（？）d？）。然后，该方法进行每个第一优点函数与相关联的至少一个突变的第二优值函数的比较，并且如果针对第一优值函数增强所述第二优值函数，则将至少一个突变替换为所述第一多个结构和第二结构域被定义用于突变，否则，所述第一多个结构的结构被保持在所述对应的第一域内，所述方法还包括以下步骤：计算所述第一和第二域的优点函数的平均值存在于每个第一或第二结构域中的多个结构或突变，并且对所述平均值定义阈值;然后，对于每个第一或第二结构中存在的每个第一多个结构或突变 cond域，其优点函数相对于平均值增加阈值，将第三域替换为第一或第二域，其中对应的优值函数被增强为所述预定阈值。然后，重复上述步骤，并且比较每个第一域中存在的第一多个结构或突变的优点函数，并且选择其优点功能更强的结构或突变。

3. 发明申请

WO2009097533A3 MIRROR MOUNTING, ALIGNMENT AND SCANNING MECHANISM AND SCANNING METHOD FOR RADIOGRAPHIC X-RAY IMAGING, AND X-RAY IMAGING DEVICE HAVING SAME 审中-公开
公开(公告)号：WO2009097533A3
公开(公告)日：2009-08-06
申请号：PCT/US2009/032646
申请日：2009-01-30
申请人： REFLECTIVE X-RAY OPTICS LLC , WINDT, David, L.
发明人： WINDT, David, L.
IPC分类号： A61B6/00
摘要： An X-ray imaging device and alignment/scanning system include at least one multilayer X-ray mirror mounted on a multi-axis adjustable mirror mount pivotable about a scanning axis. A mirror scanner is coupled with the mirror mount and synchronized with the X-ray source so that the mirror scanner moves the mirror mount about the scanning axis. The invention may include a plurality of mirrors, optionally in a stack, and preferably including first and second mirrors respectively adapted to reflect X-rays of first and second energies. A movable attenuation plate having a window selectively allows X-rays to be transmitted by one of the mirrors and blocks X-rays from the other mirror(s). Sets of the mirrors may be configured in blocks or interspersed. The mirror scanner may be operable at variable speeds to enable selective control of the scanning speed of the mirror.

4. 发明申请

WO2009097533A2 MIRROR MOUNTING, ALIGNMENT AND SCANNING MECHANISM AND SCANNING METHOD FOR RADIOGRAPHIC X-RAY IMAGING, AND X-RAY IMAGING DEVICE HAVING SAME 审中-公开
标题翻译：射线照相X射线成像的反射镜安装，对准和扫描机构和扫描方法以及具有相同X射线成像装置的X射线成像装置
公开(公告)号：WO2009097533A2
公开(公告)日：2009-08-06
申请号：PCT/US2009032646
申请日：2009-01-30
申请人： REFLECTIVE X RAY OPTICS LLC , WINDT DAVID L
发明人： WINDT DAVID L
IPC分类号： A61B6/00
CPC分类号： G21K1/025 , A61B6/032 , A61B6/4021 , A61B6/4085 , A61B6/4291 , A61B6/482 , A61B6/502 , A61B6/5282
摘要： An X-ray imaging device and alignment/scanning system include at least one multilayer X-ray mirror mounted on a multi-axis adjustable mirror mount pivotable about a scanning axis. A mirror scanner is coupled with the mirror mount and synchronized with the X-ray source so that the mirror scanner moves the mirror mount about the scanning axis. The invention may include a plurality of mirrors, optionally in a stack, and preferably including first and second mirrors respectively adapted to reflect X-rays of first and second energies. A movable attenuation plate having a window selectively allows X-rays to be transmitted by one of the mirrors and blocks X-rays from the other mirror(s). Sets of the mirrors may be configured in blocks or interspersed. The mirror scanner may be operable at variable speeds to enable selective control of the scanning speed of the mirror.
摘要翻译： X射线成像装置和对准/扫描系统包括至少一个安装在绕扫描轴线可枢转的多轴可调镜座上的多层X射线镜。反射镜扫描器与反射镜支架耦合并与X射线源同步，使得反射镜扫描器围绕扫描轴移动反射镜支架。本发明可以包括多个反射镜，可选地以堆叠形式，并且优选地包括分别适于反射第一和第二能量的X射线的第一和第二反射镜。具有窗口的可移动衰减板选择性地允许X射线透过其中一个反射镜并阻挡来自其他反射镜的X射线。成套的镜子可以配置成块或散布。反射镜扫描仪可以以可变速度操作以实现对反射镜的扫描速度的选择性控制。

5. 发明申请

WO2009026125A3 X-RAY MULTILAYER FILMS AND SMOOTHING LAYERS FOR X-RAY OPTICS HAVING IMPROVED STRESS AND ROUGHNESS PROPERTIES AND METHOD OF MAKING SAME 审中-公开
标题翻译：具有改进的应力和粗糙性的X射线光学元件的X射线多层膜和平滑层及其制造方法
公开(公告)号：WO2009026125A3
公开(公告)日：2009-05-07
申请号：PCT/US2008073255
申请日：2008-08-15
申请人： REFLECTIVE X RAY OPTICS LLC , WINDT DAVID L
发明人： WINDT DAVID L
IPC分类号： B32B7/02 , G02B5/08 , G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , C23C14/0036 , C23C14/0635 , C23C14/0641 , Y10T428/31678
摘要： X-ray reflective multilayer films with greatly reduced surface roughness and film stress, and smoothing layers for reducing surface roughness of X-ray reflective film substrates, are produced by reactive sputter deposition using a sputter gas having nitrogen in combination with at least one inert gas. The nitrogen is incorporated into the film in a non-stoichiometric manner. Preferably, a gas fraction of the nitrogen is between approximately 5% and approximately 25%. The inert gas is preferably argon. In one embodiment, the materials to be reactively sputtered may include tungsten and boron carbide in alternating layers of the multilayer film. Alternatively, nickel and boron carbide or cobalt and carbon may be used in alternating layers of the multilayer film. Boron carbide may serve as the material for the smoothing layer.
摘要翻译：通过使用具有氮的溅射气体与至少一种惰性气体组合的反应溅射沉积来制造具有大大降低的表面粗糙度和膜应力的X射线反射多层膜以及用于降低X射线反射膜基板的表面粗糙度的平滑层。氮以非化学计量的方式结合到膜中。优选地，氮的气体馏分在约5％和约25％之间。惰性气体优选为氩气。在一个实施例中，要反应溅射的材料可以包括多层膜交替层中的钨和碳化硼。或者，可以在多层膜的交替层中使用镍和碳化硼或钴和碳。碳化硼可以用作平滑层的材料。

6. 发明申请

WO2009026125A2 X-RAY MULTILAYER FILMS AND SMOOTHING LAYERS FOR X-RAY OPTICS HAVING IMPROVED STRESS AND ROUHGHNESS PROPERTIES AND METHOD OF MAKING SAME 审中-公开
标题翻译：具有改进的应力和韧性的X射线光学器件的X射线多层膜和平滑层及其制造方法
公开(公告)号：WO2009026125A2
公开(公告)日：2009-02-26
申请号：PCT/US2008/073255
申请日：2008-08-15
申请人： REFLECTIVE X-RAY OPTICS LLC , WINDT, David, L.
发明人： WINDT, David, L.
IPC分类号： B32B7/02 , G21K1/06 , G02B5/08
CPC分类号： G21K1/062 , B82Y10/00 , C23C14/0036 , C23C14/0635 , C23C14/0641 , Y10T428/31678
摘要： X-ray reflective multilayer films with greatly reduced surface roughness and film stress, and smoothing layers for reducing surface roughness of X-ray reflective film substrates, are produced by reactive sputter deposition using a sputter gas having nitrogen in combination with at least one inert gas. The nitrogen is incorporated into the film in a non-stoichiometric manner. Preferably, a gas fraction of the nitrogen is between approximately 5% and approximately 25%. The inert gas is preferably argon. In one embodiment, the materials to be reactively sputtered may include tungsten and boron carbide in alternating layers of the multilayer film. Alternatively, nickel and boron carbide or cobalt and carbon may be used in alternating layers of the multilayer film. Boron carbide may serve as the material for the smoothing layer.
摘要翻译：通过使用具有氮的溅射气体与至少一种惰性气体组合的反应溅射沉积来制造具有大大降低的表面粗糙度和膜应力的X射线反射多层膜以及用于降低X射线反射膜基板的表面粗糙度的平滑层。氮以非化学计量的方式结合到膜中。优选地，氮的气体馏分在约5％和约25％之间。惰性气体优选为氩气。在一个实施例中，要反应溅射的材料可以包括多层膜交替层中的钨和碳化硼。或者，可以在多层膜的交替层中使用镍和碳化硼或钴和碳。碳化硼可以用作平滑层的材料。

7. 发明申请

WO2009097323A3 OPTICAL ALIGNMENT SYSTEM AND ALIGNMENT METHOD FOR RADIOGRAPHIC X-RAY IMAGING 审中-公开
标题翻译：用于放射X射线成像的光学对准系统和对准方法
公开(公告)号：WO2009097323A3
公开(公告)日：2009-10-01
申请号：PCT/US2009032222
申请日：2009-01-28
申请人： REFLECTIVE X RAY OPTICS LLC , WINDT DAVID L
发明人： WINDT DAVID L
IPC分类号： A61B6/00
CPC分类号： A61B6/08 , A61B6/06 , A61B6/4035 , A61B6/4078 , A61B6/4085 , A61B6/502 , A61B6/582 , A61B6/583 , A61B6/587
摘要： An X-ray optical alignment system for X-ray imaging devices includes a visible-light point source and a multi-axis positioner therefor, fixedly mounted with respect to the X-ray focal spot. A mirror or beamsplitter is fixedly mounted with respect to the X-ray focal spot and disposed in the beam path of the X-ray source. The beamsplitter reflects light emitted from the light source and transmits X-rays emitted from the X-ray source. A first X-ray attenuating grid is fixedly but removably mountable with respect to the X-ray source, having a first X-ray attenuation pattern; and a second X-ray attenuating grid is adjustably mountable with respect to the first grid having a second X-ray attenuating pattern corresponding to the first X-ray attenuating pattern. When the grids are aligned, their attenuating patterns are also aligned and allow X-rays from the X-ray source and light reflected from the beamsplitter to pass therethrough.
摘要翻译：用于X射线成像装置的X射线光学对准系统包括可见光点源和与其相对于X射线焦斑固定地安装的多轴定位器。镜子或分束器相对于X射线焦斑固定地安装并设置在X射线源的光束路径中。分束器反射从光源发射的光并透射从X射线源发射的X射线。第一X射线衰减格栅固定地可拆卸地相对于X射线源安装，具有第一X射线衰减图案; 并且相对于具有对应于第一X射线衰减图案的第二X射线衰减图案的第一格栅可调节地安装第二X射线衰减栅格。当格栅对准时，它们的衰减图案也对准，并且允许来自X射线源的X射线，并且从分光镜反射的光通过。

8. 发明申请

WO2009026125A8 X-RAY MULTILAYER FILMS AND SMOOTHING LAYERS FOR X-RAY OPTICS HAVING IMPROVED STRESS AND ROUGHNESS PROPERTIES AND METHOD OF MAKING SAME 审中-公开
标题翻译：用于具有改善的应力和粗糙特性的X射线光学器件的X射线多层膜和平滑层及其制造方法
公开(公告)号：WO2009026125A8
公开(公告)日：2009-06-18
申请号：PCT/US2008073255
申请日：2008-08-15
申请人： REFLECTIVE X RAY OPTICS LLC , WINDT DAVID L
发明人： WINDT DAVID L
IPC分类号： B32B7/02 , G02B5/08 , G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , C23C14/0036 , C23C14/0635 , C23C14/0641 , Y10T428/31678
摘要： X-ray reflective multilayer films with greatly reduced surface roughness and film stress, and smoothing layers for reducing surface roughness of X-ray reflective film substrates, are produced by reactive sputter deposition using a sputter gas having nitrogen in combination with at least one inert gas. The nitrogen is incorporated into the film in a non-stoichiometric manner. Preferably, a gas fraction of the nitrogen is between approximately 5% and approximately 25%. The inert gas is preferably argon. In one embodiment, the materials to be reactively sputtered may include tungsten and boron carbide in alternating layers of the multilayer film. Alternatively, nickel and boron carbide or cobalt and carbon may be used in alternating layers of the multilayer film. Boron carbide may serve as the material for the smoothing layer.
摘要翻译：通过使用具有氮的溅射气体和至少一种惰性气体的反应性溅射沉积来产生具有大大降低的表面粗糙度和膜应力的X射线反射多层膜和用于减少X射线反射膜基底的表面粗糙度的平滑层。氮以非化学计量的方式掺入膜中。优选地，氮气的气体分数在大约5％和大约25％之间。惰性气体优选为氩气。在一个实施例中，要被反应溅射的材料可以包括多层膜的交替层中的钨和碳化硼。或者，镍和碳化硼或钴和碳可用于多层膜的交替层。碳化硼可以用作平滑层的材料。

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