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1. 发明申请

WO2018200536A2 ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018200536A2
公开(公告)日：2018-11-01
申请号：PCT/US2018/029160
申请日：2018-04-24
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

2. 发明申请

WO2004019128A3 PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME 审中-公开
标题翻译：用于光刻和曝光装置的投影光学系统和方法及其使用方法
公开(公告)号：WO2004019128A3
公开(公告)日：2004-10-28
申请号：PCT/JP0310665
申请日：2003-08-22
申请人： NIPPON KOGAKU KK , OMURA YASUHIRO , IKEZAWA HIRONORI , WILLIAMSON DAVID M
发明人： OMURA YASUHIRO , IKEZAWA HIRONORI , WILLIAMSON DAVID M
IPC分类号： G02B13/14 , G02B13/18 , G02B13/24 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
摘要翻译：光学投影系统和光刻方法。一种用于在宽视野下以高分辨率投影图像的光刻浸没投影系统和方法。投影系统和方法包括最终透镜，其在光线进入浸没液体以撞击到图像平面之前降低光路的边缘射线角度。

3. 发明申请

WO2018208912A3 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A3
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

4. 发明申请

WO2018194975A2 FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A2
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

5. 发明申请

WO2018194975A3 FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A3
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

6. 发明申请

WO2017199096A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
标题翻译：用于密集线图案的EUV光刻系统
公开(公告)号：WO2017199096A1
公开(公告)日：2017-11-23
申请号：PCT/IB2017/000696
申请日：2017-05-19
申请人： NIKON CORPORATION , FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18
摘要： Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece (156) includes source of EUV radiation (114) : a pattern-source (144) defining ID pattern : an illumination unit (IU) configured to irradiate the pattern-source (144) : and projection optics (PO) configured to optically image, with a reduction factor N>1, the ID pattern on image surface that is optically-conjugate to the ID pattern. Irradiation of the pattern-source (144) can be on-axis or off-axis. While ID pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source (144) can be flat or curved. The IU may include a relay reflector (126). A PO' s reflector may include multiple spatially-distinct reflecting elements (130, 134) aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the ID pattern of the pattern-source (144).
摘要翻译：专门配置成在目标工件（156）上印刷一维线的极紫外（EUV）刻蚀引擎包括EUV辐射源（114）：图案源（144） ID图案;配置为照射图案源（144）的照明单元（IU）;以及被配置为以缩减因子N> 1光学地成像光学共轭的图像表面上的ID图案的投影光学器件（PO）到ID模式。图案源（144）的照射可以是同轴的或离轴的。当ID图案具有第一空间频率时，其光学图像具有第二空间频率，其至少是第一空间频率的两倍。图案源（144）可以是平坦的或弯曲的。 IU可以包括中继反射器（126）。 PO的反射器可以包括聚集地形成这种反射器的多个空间不同的反射元件（130,134）。该引擎被配置为不允许形成空间分辨率基本上等于图案源（144）的ID图案的节距的任何2D图案的光学图像。

7. 发明申请

WO2018208912A2 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A2
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

8. 发明申请

WO2018200536A3 ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018200536A3
公开(公告)日：2018-11-01
申请号：PCT/US2018/029160
申请日：2018-04-24
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

9. 发明申请

WO2018194975A8 OPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A8
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

10. 发明申请

WO2004019128A2 PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME 审中-公开
标题翻译：投影光学系统和用于光刻和曝光装置的方法和使用相同方法
公开(公告)号：WO2004019128A2
公开(公告)日：2004-03-04
申请号：PCT/JP2003/010665
申请日：2003-08-22
申请人： NIKON CORPORATION , OMURA, Yasuhiro , IKEZAWA, Hironori , WILLIAMSON, David, M.
发明人： OMURA, Yasuhiro , IKEZAWA, Hironori , WILLIAMSON, David, M.
IPC分类号： G03F
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
摘要翻译：用于光刻的光学投影系统和方法
。一种光刻浸没式投影系统和方法，用于在宽视野内以高分辨率投影图像。该投影系统和方法包括最终透镜，该透镜在光进入浸没液体之前减小光路的边缘光线角度以撞击像平面。

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