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1. 发明申请

WO2010034472A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2010034472A1
公开(公告)日：2010-04-01
申请号：PCT/EP2009/006856
申请日：2009-09-23
申请人： CARL ZEISS SMT AG , BACH, Florian , BENZ, Daniel , WALDIS, Severin , WERBER, Armin , WARM, Berndt
发明人： BACH, Florian , BENZ, Daniel , WALDIS, Severin , WERBER, Armin , WARM, Berndt
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/70141 , G03F7/70266 , G03F7/70291 , G03F7/70891
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises a primary light source (30), a system pupil surface (70) and a mirror array (46). The mirror array (46) is arranged between the primary light source (30) and the system pupil surface (70) and comprises a plurality of adaptive mirror elements (M ij ). Each mirror element (M ij ) comprises a mirror support (100) and a reflective coating (102) and is configured to direct light (34) produced by the primary light source (30) towards the system pupil surface (70). Preferably the mirror elements (M ij ) are tiltably mounted with respect to a support structure (110). According to the invention the mirror elements (M ij ) comprise structures (100, 102) having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device (90) is configured to variably modify the temperature distribution within the structures so as to change the shape of the mirror elements.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括主光源（30），系统光瞳表面（70）和反射镜阵列（46）。镜阵列（46）布置在主光源（30）和系统光瞳表面（70）之间，并且包括多个自适应镜元件（Mij）。每个镜元件（Mij）包括镜支撑件（100）和反射涂层（102），并且被配置为将由主光源（30）产生的光（34）引向系统光瞳表面（70）。优选地，镜元件（Mij）相对于支撑结构（110）可倾斜地安装。根据本发明，镜元件（Mij）包括具有不同热膨胀系数并且彼此固定地附接的结构（100,102）。温度控制装置（90）被配置为可变地修改结构内的温度分布，以便改变反射镜元件的形状。

2. 发明申请

WO2010049076A3 OPTISCHE BAUGRUPPE ZUR FÜHRUNG EINES STRAHLUNGSBÜNDELS 审中-公开
公开(公告)号：WO2010049076A3
公开(公告)日：2010-05-06
申请号：PCT/EP2009/007476
申请日：2009-10-19
申请人： CARL ZEISS SMT AG , HAUF, Markus , WALDIS, Severin , NOELL, Wilfried , PETREMEND, Yves , JASSMANN, Marco , KULZER, Lothar , ATAMAN, Caglar
发明人： HAUF, Markus , WALDIS, Severin , NOELL, Wilfried , PETREMEND, Yves , JASSMANN, Marco , KULZER, Lothar , ATAMAN, Caglar
IPC分类号： G02B7/18 , G03F7/20
摘要： Eine optische Baugruppe dient zur Führung eines EUV-Strahlungsbündels. Die optische Baugruppe hat eine evakuierbare Kammer (32) und mindestens einen in der Kammer (32) untergebrachten Spiegel. Letzterer hat eine Mehrzahl von Einzelspiegeln (27), deren Reflexionsflächen (34) sich zu einer gesamten Spiegel-Reflexionsfläche ergänzen. Eine Tragstruktur (36) ist jeweils über einen Wärmeleitungsabschnitt (37) mit einem Spiegelkörper (35) des jeweiligen Einzelspiegels (27) mechanisch verbunden. Zumindest einige der Spiegelkörper (35) haben einen zugeordneten Aktuator (50) zur vorgegebenen Verlagerung des Spiegelkörpers (35) relativ zur Tragstruktur (36) in mindestens einem Freiheitsgrad. Die Wärmeleitungsabschnitte (37) sind zur Abführung einer von den Spiegelkörpern (35) aufgenommenen thermischen Leistungsdichte von mindestens 1 kW/m 2 auf die Tragstruktur (36) ausgebildet. Bei einem Aspekt der optischen Baugruppe ist jedem der verlagerbaren Einzelspiegel (27) eine integrierte elektronische Verlagerungsschaltung räumlich benachbart zugeordnet. Eine zentrale Steuereinrichtung steht mit den integrierten elektronischen Verlagerungsschaltungen der verlagerbaren Einzelspiegel (27) bei dieser Variante in Signalverbindung. Es resultiert eine optische Baugruppe, mit der eine Beleuchtungsoptik aufgebaut werden kann, die auch bei nicht zu vernachlässigender thermischer Last auf den Einzelspiegeln einen hohen EUV-Strahlungsdurchsatz gewährleistet.

3. 发明申请

WO2012130768A3 MIRROR ARRAY 审中-公开
标题翻译：镜子阵列
公开(公告)号：WO2012130768A3
公开(公告)日：2013-01-10
申请号：PCT/EP2012055239
申请日：2012-03-23
申请人： ZEISS CARL SMT GMBH , WALDIS SEVERIN , LANI SEBASTIAN , KNAUF BENEDIKT
发明人： WALDIS SEVERIN , LANI SEBASTIAN , KNAUF BENEDIKT
IPC分类号： G02B7/18 , G02B26/08 , G03F7/20
CPC分类号： G02B26/0816 , G02B7/1815 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70825 , Y10T29/49117
摘要： A mirror array (22) having a total surface extending perpendicularly to a surface normal (41), comprises a multiplicity of mirror elements (23) each having a reflection surface (36) and at least one degree of freedom of displacement, wherein the totality of the mirror elements (23) form a parqueting of a total reflection surface of the mirror array (22), and wherein the mirror array (22) is embodied modularly as a tile element in such a way that the parqueting of the total reflection surface can be extended by a tiling of a plurality of such mirror arrays (22).
摘要翻译：具有垂直于表面法线（41）延伸的总表面的反射镜阵列（22）包括多个具有反射表面（36）和至少一个位移自由度的反射镜元件（23），其中，所述反射镜元件（23）形成所述反射镜阵列（22）的全反射表面的折射，并且其中所述反射镜阵列（22）被模块化地形成为瓦片元件，使得所述全反射表面可以通过多个这样的反射镜阵列（22）的平铺来延伸。

4. 发明申请

WO2012130768A2 MIRROR ARRAY 审中-公开
标题翻译：镜子阵列
公开(公告)号：WO2012130768A2
公开(公告)日：2012-10-04
申请号：PCT/EP2012/055239
申请日：2012-03-23
申请人： CARL ZEISS SMT GMBH , WALDIS, Severin , LANI, Sebastian , KNAUF, Benedikt
发明人： WALDIS, Severin , LANI, Sebastian , KNAUF, Benedikt
IPC分类号： G02B7/18
CPC分类号： G02B26/0816 , G02B7/1815 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70825 , Y10T29/49117
摘要： A mirror array (22) having a total surface extending perpendicularly to a surface normal (41), comprises a multiplicity of mirror elements (23) each having a reflection surface (36) and at least one degree of freedom of displacement, wherein the totality of the mirror elements (23) form a parqueting of a total reflection surface of the mirror array (22), and wherein the mirror array (22) is embodied modularly as a tile element in such a way that the parqueting of the total reflection surface can be extended by a tiling of a plurality of such mirror arrays (22).
摘要翻译：具有垂直于表面法线（41）延伸的总表面的反射镜阵列（22）包括多个具有反射表面（36）和至少一个位移自由度的反射镜元件（23），其中，所述反射镜元件（23）形成所述反射镜阵列（22）的全反射表面的折射，并且其中所述反射镜阵列（22）被模块化地形成为瓦片元件，使得所述全反射表面可以通过多个这样的反射镜阵列（22）的平铺来扩展。

5. 发明申请

WO2011147658A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：用于微晶投影装置的光学系统
公开(公告)号：WO2011147658A1
公开(公告)日：2011-12-01
申请号：PCT/EP2011/056830
申请日：2011-04-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement (200, 720, 730, 920) having a plurality of mirror elements (200a, 200b, 200c, 721, 722, 733, 731, 732, 733,...) which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement (200, 720, 730, 920), and at least one manipulator (300, 720, 910) which is arranged downstream of said mirror arrangement (200, 720, 730, 920) in the light propagation direction and has a raster arrangement of manipulator elements (301, 302,..., 600, 721, 722, 723,... ) in such a way that light incident on the manipulator (300, 600, 720, 910) in operation of the optical system is influenced differently in its polarisation state and/or in its intensity in dependence on the incidence location, wherein at least two mutually different illumination settings (420, 520) are adjustable by the variation in an angular distribution of the light reflected by the mirror arrangement (200), wherein said illumination settings (420, 520) differ from each other in that identical regions of a pupil plane of the illumination system (10) are illuminated with light of a different polarisation state.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。在一个实施例中，用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件（200a，200b，200c，721,722,733,731,732,920）的至少一个反射镜装置（200,720,730,920） 733，...），其可彼此独立地移位，以改变由反射镜装置（200,720,730,920）反射的光的角分布，以及至少一个操纵器（300,720,910），其是在光传播方向上布置在所述反射镜装置（200,720,730,920）的下游，并且具有光栅装置，其中所述操纵元件（301,302，...，600,721,722,723，...）入射在光学系统操作的操纵器（300,600,720,910）上的光的偏振状态和/或其强度根据入射位置受到不同的影响，其中至少两个相互不同照明设置（420,520）可通过角度dist的变化进行调节由反射镜装置（200）反射的光的贡献，其中所述照明设置（420,520）彼此不同，因为照明系统（10）的光瞳平面的相同区域被不同偏振态的光照射。

6. 发明申请

WO2012101080A3 OPTICAL ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND METHOD FOR COOLING AN OPTICAL COMPONENT 审中-公开
公开(公告)号：WO2012101080A3
公开(公告)日：2012-08-02
申请号：PCT/EP2012/050946
申请日：2012-01-23
申请人： CARL ZEISS LASER OPTICS GMBH , ANDERL, Willi , KIEREY, Holger , BAUER, Markus , WALDIS, Severin , MAJOR, András G.
发明人： ANDERL, Willi , KIEREY, Holger , BAUER, Markus , WALDIS, Severin , MAJOR, András G.
IPC分类号： G03F7/20 , G21K1/06
摘要： An optical arrangement (80) for an EUV projection exposure apparatus comprises an optical component (82), which has a substrate (84) and a surface (86) on a side of the substrate (84) which surface is optically operative in the EUV spectral range, and a cooling device (90) for the optical component (82), said cooling device having a cooling medium (94). The substrate (84) comprises a material having at a temperature T s 50 W -1 K -1 and a coefficient of thermal expansion of -6 K -1 , and the cooling medium (94) has a temperature of s .

7. 发明申请

WO2012101080A2 OPTICAL ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND METHOD FOR COOLING AN OPTICAL COMPONENT 审中-公开
标题翻译： EUV投影曝光装置的光学装置和冷却光学元件的方法
公开(公告)号：WO2012101080A2
公开(公告)日：2012-08-02
申请号：PCT/EP2012050946
申请日：2012-01-23
申请人： ZEISS CARL LASER OPTICS GMBH , ANDERL WILLI , KIEREY HOLGER , BAUER MARKUS , WALDIS SEVERIN , MAJOR ANDRAS G
发明人： ANDERL WILLI , KIEREY HOLGER , BAUER MARKUS , WALDIS SEVERIN , MAJOR ANDRAS G
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , B82Y10/00 , G02B5/0808 , G02B5/0891 , G02B5/10 , G02B7/008 , G21K1/062 , G21K2201/065
摘要： An optical arrangement (80) for an EUV projection exposure apparatus comprises an optical component (82), which has a substrate (84) and a surface (86) on a side of the substrate (84) which surface is optically operative in the EUV spectral range, and a cooling device (90) for the optical component (82), said cooling device having a cooling medium (94). The substrate (84) comprises a material having at a temperature Ts -1K-1 and a coefficient of thermal expansion of -6 K-1, and the cooling medium (94) has a temperature of s.
摘要翻译：用于EUV投影曝光装置的光学装置（80）包括光学部件（82），其具有基板（84）和在基板（84）侧的表面（86），该表面在EUV中是光学操作的光谱范围和用于光学部件（82）的冷却装置（90），所述冷却装置具有冷却介质（94）。衬底（84）包括具有温度Ts -1K-1和热膨胀系数-6K-1的材料，并且冷却介质（94）的温度为s。

8. 发明申请

WO2009132756A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS COMPRISING AN ILLUMINATION OPTICS OF THIS TYPE 审中-公开
标题翻译：用于EUV微结构和照明系统的照明光学和包含这种类型的照明光学的投影曝光装置
公开(公告)号：WO2009132756A1
公开(公告)日：2009-11-05
申请号：PCT/EP2009/002584
申请日：2009-04-08
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , WARM, Berndt , STEIGERWALD, Christian , ENDRES, Martin , STÜTZLE, Ralf , OSSMANN, Jens , SCHARNWEBER, Ralf , HAUF, Markus , DINGER, Udo , WALDIS, Severin , KIRCH, Marc , HARTJES, Joachim
发明人： FIOLKA, Damian , WARM, Berndt , STEIGERWALD, Christian , ENDRES, Martin , STÜTZLE, Ralf , OSSMANN, Jens , SCHARNWEBER, Ralf , HAUF, Markus , DINGER, Udo , WALDIS, Severin , KIRCH, Marc , HARTJES, Joachim
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An illumination optics for EUV microlithography serves for guiding an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension (x) and a shorter field dimension (y), the ratio being considerably greater than 1. A field facet mirror (13) has a plurality of field facets (19) for setting defined illumination conditions in the object field. A following optics downstream of the field facet mirror (13) serves for transmitting the illumination light into the object field (5). The following optics comprises a pupil facet mirror (14) with a plurality of pupil facets (27). The field facets (19) are in each case individually allocated to the pupil facets (27) so that portions of the illumination light bundle (10) impinging upon in each case one of the field facets (19) are guided on to the object field (5) via the associated pupil facet (27). The field facet mirror (13) not only comprises a plurality of basic illumination field facets (19 G ) which provide a basic illumination of the object field (5) via associated basic illumination pupil facets (27 G ) but also a plurality of correction illumination field facets (19 K ) which provide for a correction of the illumination of the object field (5) via associated correction illumination pupil facets (27 K ). The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.
摘要翻译：用于EUV微光刻的照明光学器件用于将照明光束从辐射源引导到物场，其具有在较长场尺寸（x）和较短场尺寸（y）之间的延伸比，该比率远大于1。场面反射镜（13）具有多个场面（19），用于在对象场中设定定义的照明条件。场面反射镜（13）下游的跟随光学器件用于将照明光发射到物场（5）中。以下光学器件包括具有多个光瞳面（27）的光瞳小面镜（14）。场分面（19）在每种情况下分别被分配给光瞳面（27），使得照射光束（10）中的每一个场景面（19）中的一个照射的部分被引导到物场（5）通过相关联的光瞳面（27）。场面反射镜（13）不仅包括通过相关联的基本照明光瞳（27G）提供对象场（5）的基本照明的多个基本照明场面（19G），而且还包括多个校正照明场面（19K），其经由相关联的校正照明光瞳面（27K）提供对物场（5）的照明的校正。结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

9. 发明申请

WO2013071940A1 LIGHT MODULATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微电子投影曝光装置的光调制器和照明系统
公开(公告)号：WO2013071940A1
公开(公告)日：2013-05-23
申请号：PCT/EP2011/005737
申请日：2011-11-15
申请人： CARL ZEISS SMT GMBH , WERBER, Armin , WALDIS, Severin , BACH, Florian
发明人： WERBER, Armin , WALDIS, Severin , BACH, Florian
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70191 , G02B26/0833 , G02B26/0841 , G03F7/70058 , G03F7/70116
摘要： An illumination system of a microlithographic projection exposure apparatus comprises a light modulator (38) which includes a modulator substrate (70) and an array of mirrors (42a, 42b, 42c) that are supported by the modulator substrate (70). At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators (86, 88) that are supported by the modulator substrate (70) and are configured to tilt the mirrors (42a, 42b, 42c) individually.
摘要翻译：微光刻投影曝光装置的照明系统包括由调制器基板（70）支撑的调制器基板（70）和反射镜阵列（42a，42b，42c）的光调制器（38）。至少一些相邻的镜子部分重叠。光调制器还包括由调制器基板（70）支撑并被配置为分别倾斜反射镜（42a，42b，42c）的多个致动器（86,88）。

10. 发明申请

WO2012130768A9 MIRROR ARRAY 审中-公开
标题翻译：镜子阵列
公开(公告)号：WO2012130768A9
公开(公告)日：2013-02-28
申请号：PCT/EP2012055239
申请日：2012-03-23
申请人： ZEISS CARL SMT GMBH , WALDIS SEVERIN , LANI SEBASTIAN , KNAUF BENEDIKT
发明人： WALDIS SEVERIN , LANI SEBASTIAN , KNAUF BENEDIKT
IPC分类号： G02B7/18 , G02B26/08 , G03F7/20
CPC分类号： G02B26/0816 , G02B7/1815 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70825 , Y10T29/49117
摘要： A mirror array (22) having a total surface extending perpendicularly to a surface normal (41), comprises a multiplicity of mirror elements (23) each having a reflection surface (36) and at least one degree of freedom of displacement, wherein the totality of the mirror elements (23) form a parqueting of a total reflection surface of the mirror array (22), and wherein the mirror array (22) is embodied modularly as a tile element in such a way that the parqueting of the total reflection surface can be extended by a tiling of a plurality of such mirror arrays (22).
摘要翻译：具有垂直于表面法线（41）延伸的总表面的反射镜阵列（22）包括多个反射镜元件（23），每个反射镜元件具有反射表面（36）和至少一个位移自由度，其中总体的镜面元件（23）形成镜面阵列（22）的全反射面的镜面，并且其中镜面阵列（22）模块化地实施为砖面元件，使得全反射表面可以通过平铺多个这样的反射镜阵列（22）来扩展。

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