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1. 发明申请

WO0177402A3 METHOD AND APPARATUS FOR MAGNETRON SPUTTERING 审中-公开
标题翻译： MAGNETRON SPUTTERING的方法和装置
公开(公告)号：WO0177402A3
公开(公告)日：2002-03-28
申请号：PCT/CA0100413
申请日：2001-03-30
申请人： SURFACE ENGINEERED PRODUCTS CO , TZATZOV KONSTANTIN K , GORODETSKY ALEXANDER S
发明人： TZATZOV KONSTANTIN K , GORODETSKY ALEXANDER S
IPC分类号： C23C14/04 , C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/046 , C23C14/3407 , C23C14/35 , H01J37/3405
摘要： A cathode assembly for magnetron sputtering of a workpiece, and sputtering apparatus and methods of sputtering using same are provided. The cathode assembly includes a tubular cathode, which may be cylindrical in cross section along its length, or which may be curved or flexible, depending on the shape of workpiece that is to be sputtered, and which has a sputtering length of Ls. The cathode assembly also includes a magnet package, or a plurality of spaced magnet packages, each magnet package including either one magnet or a plurality of spaced magnets of alternating polarity, and having a magnet package length Lpkg which is less than Ls. The cathode assembly further includes one or more means for positioning, and preventing radial displacement of, the cathode along the axis of symmetry of the cathode. The magnet package is held within the cathode such that a driving force applied to the magnet package or to the cathode, or to both independently, imparts relative longitudinal movement between the magnet package and the cathode. The cathode assembly preferably includes cooling means. Furthermore, the magnet package(s) is preferably held within the cathode for shuttle movement. The cathode assembly allows for variations of one or more of the magnet package length, number, and spacing, and the relative displacement distance or shuttle distance, in order to tailor the erosion profile along the axis of symmetry of the cathode.
摘要翻译：提供了一种用于工件的磁控溅射的阴极组件，以及溅射装置以及使用其的溅射方法。阴极组件包括管状阴极，其可以沿其长度呈圆柱形的横截面，或者可以是弯曲的或柔性的，这取决于待溅射的工件的形状，并且具有Ls的溅射长度。阴极组件还包括磁体封装或多个间隔开的磁体封装，每个磁体封装包括具有交替极性的一个磁体或多个间隔开的磁体，并且具有小于Ls的磁体封装长度Lpkg。阴极组件还包括用于定位并防止阴极沿着阴极对称轴的径向位移的一个或多个装置。磁体封装被保持在阴极内，使得施加到磁体封装或阴极的驱动力或独立地施加到磁体封装和阴极之间的相对纵向运动。阴极组件优选地包括冷却装置。此外，磁体包装优选地保持在阴极内用于梭子运动。阴极组件允许磁体封装长度，数量和间距中的一个或多个的变化以及相对位移距离或穿梭距离的变化，以便沿着阴极的对称轴定制侵蚀廓线。

2. 发明申请

WO0194664A3 COATING SYSTEM FOR HIGH TEMPERATURE STAINLESS STEEL 审中-公开
标题翻译：高温不锈钢涂层系统
公开(公告)号：WO0194664A3
公开(公告)日：2002-08-01
申请号：PCT/CA0100848
申请日：2001-06-08
申请人： SURFACE ENGINEERED PRODUCTS CO , TZATZOV KONSTANTIN K , FISHER GARY ANTHONY , PRESCOTT ROBERT , CHEN YAN , ZHENG HANG , SUBRAMANIAN CHINNIA GOUNDER , WYSIEKIERSKI ANDREW GEORGE , MENDEZ ACEVEDO JUAN MANUEL , GORODETSKY ALEXANDER S , REDMOND EDWARD JOHN
发明人： TZATZOV KONSTANTIN K , FISHER GARY ANTHONY , PRESCOTT ROBERT , CHEN YAN , ZHENG HANG , SUBRAMANIAN CHINNIA GOUNDER , WYSIEKIERSKI ANDREW GEORGE , MENDEZ ACEVEDO JUAN MANUEL , GORODETSKY ALEXANDER S , REDMOND EDWARD JOHN
IPC分类号： C23C14/14 , C22C19/05 , C22C21/02 , C23C14/34 , C23C26/00 , C23C28/00 , C23C30/00 , C10G9/16
CPC分类号： C23C28/345 , C23C26/00 , C23C28/321 , C23C28/3215
摘要： A method for protecting carbon steel and stainless steel, and particularly high temperature stainless steel, from coking and corrosion at elevated temperatures in corrosive environments, such as during ethylene production by pyrolysis of hydrocarbons or the reduction of oxide ores, by coating the steel with a coating of MCrA1X or MCrA1XT in which M is nickel, cobalt, iron or a mixture thereof, X is yttrium, hafnium, zirconium, lanthanum, scandium or combination thereof, and T is silicon, tantalum, titanium, platinum, palladium, rhenium, molybdenum, tungsten, niobium, or combination thereof. The coating and substrate preferably are heat-treated at about 1000 to 1200 DEG C for at least about 10 minutes, preferably about 20 minutes to 24 hours, effective to metallurgically bond the overlay coating to the substrate and to form a multiphased microstructure. The coating preferably is aluminized by depositing a layer of aluminum thereon and subjecting the resulting coating to oxidation at a temperature above about 1000 DEG C for a time effective to form an alumina surface layer. An intermediary aluminum-containing interlayer may be deposited directly onto the substrate prior to deposition of the overlay coating and is heat-treated with the coating to form a protective interlayer between the stainless steel substrate and coating to disperse nitride formation at the substrate/coating interface. Also, the coating may be deposited onto and metallurgically bonded to the substrate by plasma transferred arc deposition of atomized powder of MCrA1XT, obviating the need for a separate heat treatment. Alternatively, a blended powder composition to produce a desired MCrA1XT alloy may be applied to the substrate.
摘要翻译：一种用于保护碳钢和不锈钢特别是高温不锈钢的方法，在高温下在腐蚀性环境中的焦化和腐蚀，例如通过碳氢化合物的热解生产乙烯或氧化物矿石的还原，通过用钢 MCrA1X或MCrA1XT的涂层，其中M为镍，钴，铁或其混合物，X为钇，铪，锆，镧，钪或其组合，T为硅，钽，钛，铂，钯，铼，钼，钨，铌或其组合。涂层和基材优选在约1000至1200℃下热处理至少约10分钟，优选约20分钟至24小时，有效地将覆盖涂层冶金结合到基底上并形成多相微结构。涂层优选通过在其上沉积铝层而使其镀铝，并使所得涂层在高于约1000℃的温度下氧化一段时间以有效形成氧化铝表面层。中间含铝中间层可以在沉积覆盖涂层之前直接沉积到基底上，并用涂层进行热处理，以在不锈钢基底和涂层之间形成保护性中间层，以在基底/涂层界面上分散氮化物形成。此外，可以通过等离子体转移电弧沉积MCrA1XT的雾化粉末将涂层沉积在冶金上结合到基底上，从而避免了单独的热处理的需要。或者，可以将用于产生所需MCrAlXT合金的混合粉末组合物施加到基材上。

3. 发明申请

WO0190441A2 SURFACE ALLOYED HIGH TEMPERATURE ALLOYS 审中-公开
标题翻译：表面合金高温合金
公开(公告)号：WO0190441A2
公开(公告)日：2001-11-29
申请号：PCT/CA0100755
申请日：2001-05-24
申请人： SURFACE ENGINEERED PRODUCTS CO , WYSIEKIERSKI ANDREW GEORGE , FISHER GARY ANTHONY , PETRONE SABINO STEVEN ANTHONY , MANDYAM RADHAKRISHNA CHAKRAVAR
发明人： WYSIEKIERSKI ANDREW GEORGE , FISHER GARY ANTHONY , PETRONE SABINO STEVEN ANTHONY , MANDYAM RADHAKRISHNA CHAKRAVAR
IPC分类号： C22C1/00 , C10G9/20 , C23C4/18 , C23C10/52 , C23C12/02 , C23C14/14 , C23C16/06 , C23C26/00 , C23C30/00 , C10G9/16
CPC分类号： C23C12/02 , C10G9/203 , C23C4/18 , C23C10/52 , C23C26/00 , Y10T428/12583 , Y10T428/12979
摘要： There is provided a surface alloyed component which comprises a base alloy with a diffusion barrier layer enriched in silicon and chromium being provided adjacent thereto. An enrichment pool layer is created adjacent the diffusion barrier and contains silicon and chromium and optionally titanium or aluminum. The method comprises depositing a surface alloy on the base alloy at a temperature in the range of 400 to 1000 DEG C and heat treating the surface alloy at a ramp temperature rate of at least 5 DEG C/minute, preferably 10 to 20 DEG C/minute, to a desired maximum temperature at which the surface alloyed component is maintained for a time sufficient to provide the enrichment pool or the enrichment pool with a diffusion barrier layer. A reactive gas treatment may be used to generate a replenishable protective oxide scale of alumina or chromia on the outermost surface of the surface alloyed component.
摘要翻译：提供了一种表面合金成分，其包括具有富含硅的扩散阻挡层的基底合金和与之相邻的铬。在扩散阻挡层附近产生富集池层，并且含有硅和铬以及任选的钛或铝。该方法包括在400〜1000℃的温度范围内在基体合金上沉积表面合金，并以至少5℃/分钟，优选10〜20℃/ 分钟至期望的最高温度，在此期间表面合金成分保持足以使富集池或浓缩池具有扩散阻挡层的时间。可以使用反应性气体处理来在表面合金成分的最表面上产生氧化铝或氧化铬的可补充的氧化皮保护层。

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