专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2013013947A3 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE METHOD 审中-公开
标题翻译：微波投影曝光装置的光学系统和微观曝光方法
公开(公告)号：WO2013013947A3
公开(公告)日：2013-05-02
申请号：PCT/EP2012063102
申请日：2012-07-05
申请人： ZEISS CARL SMT GMBH , SAENGER INGO , ZIMMERMANN JOERG , RUOFF JOHANNES , MEIER MARTIN , SCHLESENER FRANK , HENNERKES CHRISTOPH
发明人： SAENGER INGO , ZIMMERMANN JOERG , RUOFF JOHANNES , MEIER MARTIN , SCHLESENER FRANK , HENNERKES CHRISTOPH
IPC分类号： G03F7/20 , G02B5/09 , G02B27/10 , G02B27/28
CPC分类号： G03F7/70191 , G02B27/283 , G03F7/70108 , G03F7/70116 , G03F7/70566
摘要： The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element (110, 310, 410, 510, 706), which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray (S101, S301, S401, S501, S701) and a second partial ray (S102, S302, S402, S502, S702), with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element (205, 206, 330, 340, 350, 360, 370, 470, 530, 540, 710, 720, 730, 810, 820, 830) for generating a desired polarized illumination setting from the first partial ray (S101, S301, S401, S501, S701) and the second partial ray (S102, S302, S402, S502, S702), wherein the ray-splitting optical element (110, 310, 410, 510, 706) is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.
摘要翻译：本公开涉及微光刻投影曝光装置的光学系统以及微光刻曝光方法。根据本公开的一个方面，光学系统具有光源，当投影曝光装置处于其中时分裂入射在该元件上的光线的分光光学元件（110,310,410,510,706）在第一和第二部分光线具有相互正交的偏振方向的情况下，操作成第一部分光线（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702）至少一个光线偏转光学元件（205,206,330,340,350,360,370,470,530,540,710,720,730,810,820,830,830），用于从第一（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702），其中，所述分光光学元件（110,310,410,510,706）使得当投影曝光装置运行时入射在该分光光学元件上的光具有小于1的偏振度。

2. 发明申请

WO2011154227A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2011154227A1
公开(公告)日：2011-12-15
申请号：PCT/EP2011/058040
申请日：2011-05-18
申请人： CARL ZEISS SMT GMBH , SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
发明人： SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system of a microlithographic projection exposure apparatus comprising at least one mirror arrangement (200) having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement, and a polarisation-influencing optical arrangement (300, 800, 900) comprising a first lambda/2 plate (310, 810, 910) and at least one second lambda/2 plate (320, 820, 920).
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，该光学系统包括至少一个具有多个反射镜元件的反射镜装置（200），所述多个反射镜装置可互相独立地移位，以改变由反射镜装置反射的光的角分布，偏振影响光学布置（300,800,900）包括第一λ/ 2板（310,810,910）和至少一个第二λ/ 2板（320,820,920）。

3. 发明申请

WO2013135500A1 METHOD FOR ADJUSTING AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：调整微观投影曝光装置光学系统的方法
公开(公告)号：WO2013135500A1
公开(公告)日：2013-09-19
申请号：PCT/EP2013/054167
申请日：2013-03-01
申请人： CARL ZEISS SMT GMBH , SAENGER, Ingo , TRAUTER, Bastian
发明人： SAENGER, Ingo , TRAUTER, Bastian
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70191 , G02B26/0833 , G02B27/286 , G03F7/70116 , G03F7/70141 , G03F7/70566
摘要： The invention relates to a method for adjusting an optical system in a microlithographic projection exposure apparatus, wherein the optical system comprises a mirror arrangement with a plurality of mirror elements, which can be adjusted independently from one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement which has at least one polarization-influencing component, wherein it is possible to set in variable fashion a degree of overlap between the polarization-influencing component and the mirror arrangement by displacing this polarization-influencing component. A method according to the invention comprises the following steps: establishing, for a given actual position of the polarization-influencing component (111, 112, 113, 310, 320, 411, 511), a distribution of IPS values in a pupil plane of the projection exposure apparatus, wherein each IPS value denotes the degree of realization of a predetermined polarization state for a light ray reflected at a respective mirror element of the mirror arrangement (120, 200, 400, 500), and changing the position of the polarization-influencing component on the basis of the established distribution.
摘要翻译：本发明涉及一种用于在微光刻投影曝光装置中调整光学系统的方法，其中光学系统包括具有多个反射镜元件的反射镜装置，其可以彼此独立地调节，以改变反射光的角度分布以及具有至少一个偏振影响分量的偏振影响光学装置，其中可以以可变的方式设置偏振影响部件和反射镜装置之间的重叠程度，影响组件。根据本发明的方法包括以下步骤：针对偏振影响分量（111,112,113,310,320,411,511）的给定实际位置建立IPS值在瞳孔平面中的分布投影曝光装置，其中每个IPS值表示在反射镜装置（120,200,400,500）的各个反射镜元件处反射的光线的预定偏振态的实现程度，并且改变偏振的位置在确定的分配的基础上的影响组件。

4. 发明申请

WO2009034109A2 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2009034109A2
公开(公告)日：2009-03-19
申请号：PCT/EP2008062007
申请日：2008-09-10
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , WALLDORF DANIEL , SAENGER INGO
发明人： FIOLKA DAMIAN , WALLDORF DANIEL , SAENGER INGO
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70116 , G03F7/70566
摘要： The invention concerns an illumination system of a microlithographic projection exposure apparatus comprising a mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940) which has a plurality of mirror units (141, 142, 143, 341, 342, 343, 541, 542, 543), wherein said mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940), and at least one element (20, 42a, 44, 51, 62, 64, 71, 81, 91, 130, 200, 260, 330, 530, 930) arranged in front of the mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940) in the light propagation direction for producing at least two different states of polarization incident on different mirror units.
摘要翻译：本发明涉及一种微光刻投影曝光装置的照明系统，其包括具有多个反射镜单元（141,43）的反射镜装置（21,43,45,52,63,84,93,140,250,340,540,940），142,143,341,342,343,541,542,543），其中所述镜单元可彼此独立地移位以改变由所述反射镜装置（21,43,45,52,543）反射的光的角度分布，以及至少一个元件（20,42a，44,51,62,64,71,81,91,130,200,260,330,530），以及至少一个元件，930），其布置在光传播方向上的反射镜装置（21,43,45,52,63,84,93,140,250,340,540,940）的前面，用于产生至少两个不同的偏振态入射在不同的镜子单位。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式