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    • 1. 发明申请
    • METHOD FOR MANUFACTURING A SUPERHYDROPHOBIC FILM SHEET
    • 制备超疏水性薄膜片材的方法
    • WO2013015562A3
    • 2013-03-21
    • PCT/KR2012005774
    • 2012-07-19
    • UNIV NAT CHONNAM IND FOUNDLEE DONG WEONGO GUNPARK SEUNG HWANLEE SA MYUNGPARK JONG SUNG
    • LEE DONG WEONGO GUNPARK SEUNG HWANLEE SA MYUNGPARK JONG SUNG
    • H01L21/027
    • H01L21/0273B82Y10/00B82Y40/00G03F7/00G03F7/0002G03F7/40
    • The present invention relates to a method for manufacturing a superhydrophobic film sheet, and more particularly, to a method for manufacturing a superhydrophobic film sheet by generating a structure having projections for providing a superhydrophobic effect such as that of a real lotus leaf by controlling the number of times, and the amount of time, a photoresist is baked and providing a superhydrophobic surface by coating a polydimethylsiloxane (PDMS) with a transparent material having hydrophobic qualities. The method comprises the steps of: (a) cleaning a surface of a silicon wafer; (b) coating the top of the silicon wafer with a photoresist (AZ4620) using a spin coater, and soft-baking the silicon wafer in an oven; (c) exposing a structure manufactured in step (b) using a mask aligner; (d) developing using a photoresist developing solution(AZ400K); (e) performing PDMS molding on a top of a structure manufactured in step (d); and (f) removing the photoresist (AZ4620) using acetone, thereby completing a superhydrophobic film sheet having projections on an end thereof.
    • 本发明涉及一种方法,用于通过控制数制造超疏水性膜片,更具体地,涉及一种用于通过产生具有用于提供超疏水性效果突起的结构制造超疏水性膜片的制造方法,例如,一个真正的荷叶的 次数和时间量,烘烤光刻胶并通过用具有疏水性质的透明材料涂布聚二甲基硅氧烷(PDMS)来提供超疏水表面。 该方法包括以下步骤:(a)清洁硅晶片的表面; (b)使用旋涂机在光刻胶(AZ4620)上涂布硅晶片的顶部,并在烘箱中软烘烤硅晶片; (c)使用掩模对准器曝光步骤(b)中制造的结构; (d)使用光致抗蚀剂显影液(AZ400K)显影; (e)在步骤(d)中制造的结构的顶部上进行PDMS模塑; (f)用丙酮除去光致抗蚀剂(AZ4620),从而完成在其一端具有突起的超疏水性膜片。