专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011016650A3 METHOD AND APPARATUS FOR PACKAGING A LIGHT-TRANSMITTING UNIT FOR AN OPTICAL ELEMENT 审中-公开
标题翻译：用于包装光学元件的光发射单元的方法和设备
公开(公告)号：WO2011016650A3
公开(公告)日：2011-04-28
申请号：PCT/KR2010005032
申请日：2010-07-30
申请人： DONGJIN SEMICHEM CO LTD , SON JUNG-HYUN , JOO HAN-BOK , PARK JONG-DAI , KIM JAE-HYUN
发明人： SON JUNG-HYUN , JOO HAN-BOK , PARK JONG-DAI , KIM JAE-HYUN
IPC分类号： H01L33/48 , G02F1/13357
CPC分类号： H01L51/5253 , G02F1/133603 , G02F2001/133607
摘要： The present invention relates to a method and apparatus for packaging a light-transmitting unit for an optical element, and more particularly, to a method and apparatus for packaging a light-transmitting unit, which involve forming a light-transmitting unit for encapsulating a portion or the entirety of a periphery of a light-receiving unit or a light-emitting unit for an optical element having the light-receiving unit or the light-emitting unit, wherein the method for packaging a light-transmitting unit comprises: a step of preparing an optical element array in which a plurality of optical elements are arranged on a plane; a step of preparing a screen having image units corresponding to the respective optical elements; and a step of screen-printing a light-transmitting resin in a vacuum state through the screen to form the light-transmitting unit. As described above, the method of the present invention involves implementing a vacuum screen-printing process to form a uniform organic film (i.e., a dome-shaped light-transmitting unit) on a substrate with a large area (in particular, a substrate applied in fabricating a BLU for an LCD consisting of LEDs) in a short amount of time, to thereby shorten a process time, minimize the generation of pores in the light-transmitting unit, and form the light-transmitting unit with fewer pores even when the light-transmitting unit may have various shapes in accordance with meshes of the screen and patterns. Accordingly, the formation of the light-transmitting unit enables light extraction efficiency and the diffusivity of light to be controlled, thereby obtaining optical elements with uniform light characteristics.
摘要翻译：用于封装光学元件的光发射单元的方法和设备技术领域本发明涉及用于封装光学元件的光发射单元的方法和设备，并且更具体地涉及用于封装光发射单元的方法和设备，所述方法和设备包括形成用于封装部分或者具有所述受光部或者所述发光部的光学元件的受光部或者发光部的周边整体，其特征在于，所述光发送部的封装方法包括：制备其中多个光学元件排列在平面上的光学元件阵列; 准备具有对应于各个光学元件的图像单元的屏幕的步骤; 以及通过丝网丝网印刷处于真空状态的光透射树脂以形成光发射单元的步骤。如上所述，本发明的方法包括实施真空丝网印刷工艺以在大面积的衬底（特别是，衬底施加的）上形成均匀的有机膜（即，圆顶形的光透射单元）在制造用于由LED组成的LCD的BLU时），从而缩短处理时间，最小化光发射单元中的孔隙的产生，并且形成具有更少孔隙的光透射单元，即使当根据屏幕和图案的网格，光发射单元可以具有各种形状。因此，透光单元的形成使得能够控制光提取效率和光的扩散率，由此获得具有均匀光特性的光学元件。

2. 发明申请

WO2010134741A3 CERIUM OXIDE PRODUCTION METHOD AND A SLURRY COMPOSITION COMPRISING THE SAME 审中-公开
标题翻译：氧化铈生产方法和包含其的浆料组合物
公开(公告)号：WO2010134741A3
公开(公告)日：2011-03-24
申请号：PCT/KR2010003131
申请日：2010-05-18
申请人： DONGJIN SEMICHEM CO LTD , KIM JONG-WON , LEE HO KYU , SHIN JONG CHUL , KONG HYUN GOO , PARK JONG DAI
发明人： KIM JONG-WON , LEE HO KYU , SHIN JONG CHUL , KONG HYUN GOO , PARK JONG DAI
IPC分类号： C01F17/00 , C09K3/14
CPC分类号： C09K3/1463 , C01F17/0043 , C01P2004/04 , C01P2004/30 , C09K3/1409
摘要： Disclosed are a production method for cerium oxide (ceria) powder and a slurry composition comprising the same. The slurry composition allows a high polishing rate and high polishing selectively and can reduce micro scratches in chemical-mechanical polishing. The production method for cerium oxide powder comprises the steps of: rapidly heating a cerium compound to between 700 and 1,000°C; calcining the cerium compound at between 700 and 1,000°C in order to produce calcined cerium oxide; and rapidly cooling the calcined cerium oxide to between 15 and 30°C. Here, the step of calcining the cerium compound is carried out for between 10 minutes and 2 hours and, in the rapid heating step, the cerium compound is heated at a heating rate of between 20 and 900°C/minute while, in the rapid cooling step, the calcined cerium oxide is preferably cooled at a cooling rate of between 20 and 400°C/minute.
摘要翻译：公开了一种氧化铈（二氧化铈）粉末的制造方法和包含该方法的浆料组合物。浆料组合物允许高抛光速率和高抛光选择性，并且可以减少化学机械抛光中的微小刮痕。氧化铈粉末的制造方法包括以下步骤：将铈化合物快速加热至700〜1000℃; 在700和1000℃之间煅烧铈化合物以产生煅烧的氧化铈; 并将煅烧的氧化铈快速冷却至15至30℃。这里，煅烧铈化合物的步骤进行10分钟至2小时，并且在快速加热步骤中，铈化合物以20-900℃/分钟的加热速率加热，而在快速加热冷却步骤中，煅烧的氧化铈优选以20-400℃/分钟的冷却速度冷却。

3. 发明申请

WO2010077010A2 COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING SLURRY 审中-公开
标题翻译：化学机械抛光浆料组合物
公开(公告)号：WO2010077010A2
公开(公告)日：2010-07-08
申请号：PCT/KR2009007719
申请日：2009-12-23
申请人： DONGJIN SEMICHEM CO LTD , KIM TAEK-RAE , KONG HYUN-GOO , PARK JONG-DAI
发明人： KIM TAEK-RAE , KONG HYUN-GOO , PARK JONG-DAI
IPC分类号： C09K3/14
CPC分类号： C09K3/1463 , C09G1/02
摘要： A composition for chemical-mechanical polishing slurry is disclosed, wherein the polishing rate and selectivity with respect to a metal film are improved. The composition for chemical-mechanical polishing slurry comprises an oxidant, an anticorrosive agent, an organic acid and/or organic amino compounds, water, and one or more polishing enhancers selected from a group consisting of selenium compounds, tellurium compounds, and sulfur compounds. Preferably, the content of the polishing enhancers is 0.001 to 5 wt % of the total slurry composition, and the composition for chemical-mechanical polishing slurry has a pH level of 2 to 6.
摘要翻译：公开了一种用于化学机械抛光浆料的组合物，其中提高了相对于金属膜的抛光速率和选择性。用于化学机械抛光浆料的组合物包含氧化剂，防腐剂，有机酸和/或有机氨基化合物，水和选自硒化合物，碲化合物和硫化合物的一种或多种抛光增强剂。抛光增强剂的含量优选为浆料组合物总量的0.001〜5重量％，化学机械研磨浆料的组成优选为2〜6。

4. 发明申请

WO2011034322A3 SEALING METHOD FOR A LIGHT-EMITTING DIODE, AND LIGHT-EMITTING DIODE SEALED USING SAME 审中-公开
标题翻译：用于发光二极管的密封方法和使用其密封的发光二极管
公开(公告)号：WO2011034322A3
公开(公告)日：2011-07-07
申请号：PCT/KR2010006249
申请日：2010-09-14
申请人： DONGJIN SEMICHEM CO LTD , SON JUNG-HYUN , JOO HAN-BOK , PARK JONG-DAI , KIM JAE-HYUN
发明人： SON JUNG-HYUN , JOO HAN-BOK , PARK JONG-DAI , KIM JAE-HYUN
IPC分类号： H01L33/52 , H01L33/56
CPC分类号： H01L33/56 , H01L2933/005
摘要： The present invention relates to a sealing method for a light-emitting diode, and to a light-emitting diode sealed using same, wherein the sealing method enables continuous processing by performing an exposing and photocuring process without a mask on a photocurable resin composition and optical semiconductor chips conveyed along a fluidic rail, and can improve the mass-production yield of light-emitting diodes by performing exposing and sealing processing for patterns formed as images without the use of a mask.
摘要翻译：本发明涉及一种发光二极管的密封方法和使用该密封方法密封的发光二极管，其中密封方法能够通过在光固化树脂组合物和光学上进行曝光和光固化处理而不用掩模进行连续加工半导体芯片沿着流体轨道传送，并且可以通过对形成为图像的图案进行曝光和密封处理而不使用掩模来提高发光二极管的批量生产率。

5. 发明申请

WO2011002183A3 PHOTOCURABLE RESIN COMPOSITION FOR ENCAPSULATING AN OPTICAL DEVICE 审中-公开
标题翻译：用于封装光学器件的光刻树脂组合物
公开(公告)号：WO2011002183A3
公开(公告)日：2011-04-14
申请号：PCT/KR2010004151
申请日：2010-06-25
申请人： DONGJIN SEMICHEM CO LTD , SON JUNG-HYUN , JOO HAN-BOK , LEE SANG-KYU , PARK JONG-DAI
发明人： SON JUNG-HYUN , JOO HAN-BOK , LEE SANG-KYU , PARK JONG-DAI
IPC分类号： C08L33/08 , C08K3/00 , C08K5/00 , H01L33/00
CPC分类号： H01L51/448 , C08K5/0025 , H01G9/2077 , H01L31/048 , H01L33/56 , H01L51/5246 , Y02E10/549 , C08L33/08
摘要： The present invention relates to a photocurable resin composition for encapsulating an optical device. The resin composition according to the present invention has excellent chemical resistance, and a high rate of cure to obtain superior adhesion to a panel and thus to effectively block the ingress of gas and moisture into the device, which leads to an elongated lifespan of the optical device. In addition, the resin composition of the present invention can be applied to a dispensing process to simplify the process of sealing the optical device.
摘要翻译：本发明涉及一种用于封装光学装置的光固化树脂组合物。根据本发明的树脂组合物具有优异的耐化学性，并且具有高的固化速率以获得与面板的优异的粘合性，从而有效地阻止气体和水分进入装置，这导致光学的寿命延长设备。此外，本发明的树脂组合物可以应用于分配过程以简化密封光学装置的过程。

6. 发明申请

WO2009028827A3 METHOD AND DEVICE FOR CHEMICAL MECHANICAL POLISHING OF METAL LAYER WITH SUPERCRITICAL FLUID 审中-公开
公开(公告)号：WO2009028827A3
公开(公告)日：2009-03-05
申请号：PCT/KR2008/004832
申请日：2008-08-20
申请人： DONGJIN SEMICHEM CO., LTD. , KIM, Taek-Rea , KONG, Hyun-Goo , PARK, Jong-Dai
发明人： KIM, Taek-Rea , KONG, Hyun-Goo , PARK, Jong-Dai
IPC分类号： H01L21/304
摘要： The present invention relates to a method and device for mechanical and chemical polishing of a metal layer with a supercritical fluid, the method comprising a first phase at which a supercritical fluid mixed with an oxidizing agent reacts to a metal layer of a wafer formed with the metal layer; and a second phase at which the completely reacted wafer is polished and planarized with a polishing machine. To efficiently perform a polishing operation, a pre-treated surface of the wafer is polished with a slurry (e.g., mixed with water and polishing particles) excluding an oxidizing agent to not only address errors due to stability issue of slurry in a conventional CMP operation but also to reduce various defects such as scratches, seam, corrosion, dishing and so on.

7. 发明申请

WO2012093820A3 SILICONE RESIN COMPOSITION FOR ENCAPSULATING AN OPTICAL ELEMENT 审中-公开
标题翻译：用于封装光学元件的硅树脂组合物
公开(公告)号：WO2012093820A3
公开(公告)日：2012-12-20
申请号：PCT/KR2012000020
申请日：2012-01-02
申请人： DONGJIN SEMICHEM CO LTD , SONG SEOK-JIN , KIM JAE-HYUN , JOO HAN-BOK , PARK JONG-DAI
发明人： SONG SEOK-JIN , KIM JAE-HYUN , JOO HAN-BOK , PARK JONG-DAI
IPC分类号： C08L83/14 , C08G77/06 , C08G77/58 , C08L83/04 , H01L23/29
CPC分类号： H01L23/296 , C08G77/58 , C08L83/14 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to a silicone resin composition for encapsulating an optical element; the silicone resin composition of the present invention comprises a silicone-based macromolecular resin produced by (a) subjecting an organosilane of chemical formula 1 below to a substitution reaction with a metal (IV) alkoxide of chemical formula 2 below, thereby yielding a compound of chemical formula 3 below, and then (b) subjecting the compound of chemical formula 3 to a condensation reaction with an organosilane of chemical formula 4 below, thereby yielding a compound of chemical formula 5 below, and, after that, (c) subjecting the compound of chemical formula 5 to polycondensation in the presence of a polycondensation catalyst; and the silicone resin composition of the present invention ensures transparency while at the same time being able to provide a high refractive index and outstanding processability and can therefore be used to advantage as an encapsulating material for an optical element.
摘要翻译：本发明涉及一种用于封装光学元件的有机硅树脂组合物; 本发明的有机硅树脂组合物包含通过（a）使下述化学式1的有机硅烷与下述化学式2的金属（Ⅳ）醇化物进行取代反应制备的硅氧烷基高分子树脂，由此得到化学式3，然后（b）使化学式3的化合物与下述化学式4的有机硅烷进行缩合反应，从而得到下面化学式5的化合物，然后（c）使化学式5化合物在缩聚催化剂存在下进行缩聚; 并且本发明的有机硅树脂组合物确保透明性，同时能够提供高折射率和突出的加工性，因此可以用作光学元件的封装材料。

8. 发明申请

WO2010140788A3 CHEMICAL-MECHANICAL POLISHING SLURRY COMPOSITION COMPRISING NONIONIZED HEAT-ACTIVATED NANOCATALYST, AND POLISHING METHOD USING SAME 审中-公开
标题翻译：化学机械抛光浆料组合物，其包含非活化的活化纳米催化剂和使用其的抛光方法
公开(公告)号：WO2010140788A3
公开(公告)日：2011-03-31
申请号：PCT/KR2010003349
申请日：2010-05-27
申请人： DONGJIN SEMICHEM CO LTD , PARK JONG DAI , LIM JIN HYUK , CHOI JUNG MIN , KONG HYUN GOO , KIM JAE HYUN , PARK HYE JUNG
发明人： PARK JONG DAI , LIM JIN HYUK , CHOI JUNG MIN , KONG HYUN GOO , KIM JAE HYUN , PARK HYE JUNG
IPC分类号： C09K3/14 , H01L21/304
CPC分类号： H01L21/3212 , C09G1/02
摘要： The invention relates to a polishing slurry composition which comprises a nonionized heat-activated nanocatalyst, and which is useful for a chemical-mechanical planarization process, and to a polishing method using the composition. The chemical-mechanical polishing slurry composition comprises: a nonionized heat-activated nanocatalyst which discharges electrons and holes by the energy generated during a chemical-mechanical polishing process; an abrasive; and an oxidizing agent. The nonionized heat-activated nanocatalyst and the abrasive are different from each other. Preferably, the nonionized heat-activated nanocatalyst is a semiconductor substance which discharges, in an aqueous solution state, electrons and holes at a temperature of 10 to 100°C. Preferably, transition metal silicide selected from a group consisting of CrSi, MnSi, CoSi, ferrosilicon (FeSi) and a mixture thereof can be used as the nonionized heat-activated nanocatalyst. More preferably, a semiconductor substance such as nanoferrosilicon can be used as the nonionized heat-activated nanocatalyst. The content of the nonionized heat-activated nanocatalyst is 0.00001 to 0.1 wt % with respect to the total slurry composition.
摘要翻译：本发明涉及一种抛光浆料组合物，其包含非离子热活化纳米催化剂，并且其可用于化学机械平面化工艺，以及使用该组合物的抛光方法。化学机械抛光浆料组合物包括：非化学热活化纳米催化剂，其通过在化学机械抛光过程中产生的能量而排出电子和空穴; 研磨剂和氧化剂。非活性热活化纳米催化剂和研磨剂彼此不同。优选地，非离子化热活化纳米催化剂是在10〜100℃的温度下以水溶液状态排出电子和空穴的半导体物质。优选地，可以使用选自CrSi，MnSi，CoSi，硅铁（FeSi）及其混合物的过渡金属硅化物作为非离子化热活化纳米催化剂。更优选地，可以使用诸如纳米铁的半导体物质作为非离子化热活化纳米催化剂。非离子化热活化纳米催化剂的含量相对于总淤浆组成为0.00001〜0.1重量％。

9. 发明申请

WO2005035688A1 ABRASIVE FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：用于化学机械抛光的磨料及其制造方法
公开(公告)号：WO2005035688A1
公开(公告)日：2005-04-21
申请号：PCT/KR2004/002584
申请日：2004-10-09
申请人： KOREA INSTITUTE OF CERAMIC ENGINEERING & TECHNOLOGY , DONGJIN SEMICHEM CO.,LTD. , CHUNG, Su-Chul , LEE, Seung-Ho , LIM, Hyung-Mi , RYU, Dae-Sun , KO, Gyong-Beum , PARK, Jong-Dai
发明人： CHUNG, Su-Chul , LEE, Seung-Ho , LIM, Hyung-Mi , RYU, Dae-Sun , KO, Gyong-Beum , PARK, Jong-Dai
IPC分类号： C09K3/14
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1445 , C09K3/1463
摘要： An abrasive for chemical mechanical polishing, which is produced by hydrothermally treating a ceria particle coated silica, is disclosed. The abrasive for chemical mechanical polishing includes a silica core, a first shell for coating the silica core; and a second shell for coating the first shell, wherein the first shell is made of ceria particles and the second shell is made of silica particles. The method for producing an abrasive for chemical mechanical polishing comprises the steps of: (a) preparing ceria particle suspension by mixing aqueous ammonia and aqueous cerous nitrate solution and stirring the solution; (b) preparing core/shell particles by adding colloidal silica slurry into the prepared ceria particle suspension and stirring the suspension; (c) washing the suspension; and (d) hydrothermally treating the washed suspension.
摘要翻译：公开了一种用于化学机械抛光的磨料，其通过水热处理二氧化铈颗粒涂覆的二氧化硅而制备。用于化学机械抛光的研磨剂包括二氧化硅芯，用于涂覆二氧化硅芯的第一壳; 以及用于涂覆所述第一壳的第二壳，其中所述第一壳由二氧化铈颗粒制成，并且所述第二壳由二氧化硅颗粒制成。制造用于化学机械抛光的研磨剂的方法包括以下步骤：（a）通过混合氨水和硝酸铈水溶液并搅拌该溶液来制备二氧化铈颗粒悬浮液; （b）通过将胶体二氧化硅浆料加入到制备的二氧化铈颗粒悬浮液中并搅拌悬浮液来制备核/壳颗粒; （c）洗涤悬浮液; 和（d）水洗处理洗涤的悬浮液。

10. 发明申请

WO2009028827A2 METHOD AND DEVICE FOR CHEMICAL MECHANICAL POLISHING OF METAL LAYER WITH SUPERCRITICAL FLUID 审中-公开
标题翻译：超临界流体化学机械抛光金属层的方法和装置
公开(公告)号：WO2009028827A2
公开(公告)日：2009-03-05
申请号：PCT/KR2008004832
申请日：2008-08-20
申请人： DONGJIN SEMICHEM CO LTD , KIM TAEK-REA , KONG HYUN-GOO , PARK JONG-DAI
发明人： KIM TAEK-REA , KONG HYUN-GOO , PARK JONG-DAI
IPC分类号： H01L21/304
CPC分类号： H01L21/3212
摘要： The present invention relates to a method and device for mechanical and chemical polishing of a metal layer with a supercritical fluid, the method comprising a first phase at which a supercritical fluid mixed with an oxidizing agent reacts to a metal layer of a wafer formed with the metal layer; and a second phase at which the completely reacted wafer is polished and planarized with a polishing machine. To efficiently perform a polishing operation, a pre-treated surface of the wafer is polished with a slurry (e.g., mixed with water and polishing particles) excluding an oxidizing agent to not only address errors due to stability issue of slurry in a conventional CMP operation but also to reduce various defects such as scratches, seam, corrosion, dishing and so on.
摘要翻译：本发明涉及一种用超临界流体对金属层进行机械和化学抛光的方法和设备，该方法包括第一阶段和第二阶段，在第一阶段，与氧化剂混合的超临界流体与形成有金属层; 以及第二阶段，在该阶段用抛光机器抛光完全反应的晶片并使其平坦化。为了有效地执行抛光操作，晶片的预处理表面用除了氧化剂之外的浆料（例如，与水和抛光颗粒混合）抛光，以不仅解决在常规CMP操作中由于浆料的稳定性问题引起的误差还可以减少各种缺陷，如划痕，接缝，腐蚀，凹陷等。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式