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    • 10. 发明申请
    • PELLICLE MEMBRANE AND METHOD OF MANUFACTURING SAME
    • 薄膜及其制造方法
    • WO2012093834A3
    • 2012-12-06
    • PCT/KR2012000046
    • 2012-01-03
    • FINE SEMITECH CORPPARK SUNG HOYOU JANG DONG
    • PARK SUNG HOYOU JANG DONG
    • G03F1/62
    • G03F1/62
    • The present invention relates to a pellicle for lithography which is used as a dustproof membrane when a semiconductor device or a liquid crystal display is manufactured. A method of manufacturing a pellicle membrane according to the present invention includes: a step of preparing a fluorocarbon resin solution; a step of disposing and maintaining a substrate on a cooling plate having a temperature deviation of about ±0.01? or less to minimize a temperature deviation of the substrate; a step of mounting the substrate on a coating device; and a step of applying the fluorocarbon resin solution to the substrate to dry and peel the fluorocarbon resin solution. The pellicle according to the present invention has less deviation in membrane thickness and a small change of transmittance due to the deviation in membrane thickness. Thus, even though the pellicle is used for a long time to cause a deviation in membrane thickness, a deviation in transmittance may be less.
    • 本发明涉及在制造半导体器件或液晶显示器时用作防尘膜的光刻用防护薄膜。 根据本发明的制备防护膜的方法包括:制备氟碳树脂溶液的步骤; 在具有约±0.01℃的温度偏差的冷却板上布置和保持衬底的步骤。 或更小以最小化衬底的温度偏差; 将衬底安装在涂布装置上的步骤; 以及将氟碳树脂溶液涂覆到基材上以干燥和剥离碳氟树脂溶液的步骤。 根据本发明的薄膜具有较小的薄膜厚度偏差和由于薄膜厚度偏差导致的透射率变化较小。 因此,即使长时间使用薄膜以引起薄膜厚度的偏差,透射率的偏差也可能较小。