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    • 4. 发明申请
    • HEXAHYDROXYBENZOPHENONE SULFONATE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS AND POSITIVE PHOTORESISTS EMPLOYING SAME
    • 二苯并噻吩酮硫酸钠和正电子照相机
    • WO1994002885A1
    • 1994-02-03
    • PCT/US1993006393
    • 1993-07-01
    • MORTON INTERNATIONAL, INC.
    • MORTON INTERNATIONAL, INC.JACOVICH, Elain, C.CUNNINGHAM, Wells, C.
    • G03F07/022
    • G03F7/022C07C309/76
    • Positive photoresists formulations for producing positive photoresist images have improved thermal stability yet which allow a wide variation in resin to photoactive sensitizer compound without significant changes in photospeed, thermal behaviour, contrast or resolution and with virtually no less in unexposed areas of the photoresist and without significant outgassing or popping are provided by employing novel 1,2-diazonaphthoquinone-4- or -5-sulfonate esters of 2,3,4,3',4',5'-hexahydroxybenzophenone with a novel isomeric distribution of esters. The novel isomeric distribution of 1,2-diazonaphthoquinone-4- or -5-sulfonate esters of 2,3,4,3',4',5'-hexahydroxybenzophenone is characterized by two major isomers, together comprising at least about 70 % by weight of the photoactive compound, and wherein the least polar isomer comprises only about 40 %.
    • 用于产生正性光致抗蚀剂图像的正性光致抗蚀剂配方具有改善的热稳定性,这允许树脂对光敏化剂化合物的宽泛变化,而在感光速度,热行为,对比度或分辨率方面没有显着变化,并且在光致抗蚀剂的未曝光区域中几乎不减少, 通过使用2,3,4,3',4',5'-六羟基二苯甲酮的新的1,2-二氮杂萘醌-4-或-5-磺酸酯与酯的新异构体分布来提供脱气或脱气。 2,3,4,3',4',5'-六羟基二苯甲酮的1,2-二氮杂萘醌-4-或-5-磺酸酯的新异构体分布的特征在于两个主要的异构体,一起包含至少约70% 的光活性化合物,并且其中最小极性异构体仅包含约40%。