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1. 发明申请

WO2011049769A3 METHODS AND APPARATUS FOR TUNING MATCHING NETWORKS 审中-公开
标题翻译：用于调整匹配网络的方法和设备
公开(公告)号：WO2011049769A3
公开(公告)日：2011-07-28
申请号：PCT/US2010052203
申请日：2010-10-11
申请人： APPLIED MATERIALS INC , ZHANG CHUNLEI , SHOJI SERGIO F , SEMENIN ANDREY , RAMASWAMY KARTIK , CRUSE JAMES P , LIAO BRYAN
发明人： ZHANG CHUNLEI , SHOJI SERGIO F , SEMENIN ANDREY , RAMASWAMY KARTIK , CRUSE JAMES P , LIAO BRYAN
IPC分类号： H05H1/46 , H03H7/40
CPC分类号： H03H7/40 , H01J37/32183 , H01J37/32935 , H05H1/46
摘要： Methods and apparatus for tuning matching networks are provided herein. A method of tuning a matching network includes providing a matching network coupling an RF source to a load, the matching network having a tunable element disposed at a first set point; increasing a value of the tunable element by a first step above the first set point; sensing a first adjusted value of a reflected RF power; decreasing the value of the tunable element by the first step below the first set point; sensing a second adjusted value of the reflected RF power; comparing the first and the second adjusted values of the reflected RF power; and moving the tunable element to a second set point that corresponds to a position having a lowest adjusted value of the reflected RF power. The method may be repeated until the reflected RF power falls within an acceptable reflected RF power range.
摘要翻译：本文提供了用于调谐匹配网络的方法和设备。调整匹配网络的方法包括提供将RF源耦合到负载的匹配网络，所述匹配网络具有布置在第一设定点处的可调谐元件; 通过高于第一设定点的第一步增加可调元件的值; 感测反射RF功率的第一调整值; 在第一设定点以下的第一步骤减小可调元件的值; 感测反射的RF功率的第二调整值; 比较反射RF功率的第一和第二调整值; 以及将可调元件移动到第二设定点，该第二设定点对应于具有反射RF功率的最低调整值的位置。该方法可以重复，直到反射的RF功率落入可接受的反射RF功率范围内。

2. 发明申请

WO2011149790A3 COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DUTY CYCLE CONTROL 审中-公开
标题翻译：通过冷却液流量控制和加热器占空比控制的组件温度控制
公开(公告)号：WO2011149790A3
公开(公告)日：2012-01-26
申请号：PCT/US2011037436
申请日：2011-05-20
申请人： APPLIED MATERIALS INC , MAHADESWARASWAMY CHETAN , RAMASWAMY KARTIK , LIAO BRYAN , SHOJI SERGIO , NGUYEN DUY D , NOORBAKHSH HAMID , PALAGASHVILI DAVID
发明人： MAHADESWARASWAMY CHETAN , RAMASWAMY KARTIK , LIAO BRYAN , SHOJI SERGIO , NGUYEN DUY D , NOORBAKHSH HAMID , PALAGASHVILI DAVID
IPC分类号： H05H1/24 , H01L21/205 , H01L21/3065
CPC分类号： G05D23/19 , G05B15/02 , H01J37/32522 , H01J37/32724 , H01J37/32908 , H01J37/3299 , H01L21/67248
摘要： Methods and systems for controlling temperatures in plasma processing chamber for a wide range of setpoint temperatures and reduced energy consumption. Temperature control is coordinated between a coolant liquid loop and a heat source by a control algorithm implemented by the plasma processing module controller. The control algorithm may completely stop the flow of coolant liquid to a temperature-controlled component in response to a feedback signal indicating an actual temperature is below the setpoint temperature. The control algorithm may further be based at least in part on a feedforward control signal derived from a plasma power or change in plasma power input into the processing chamber during process recipe execution.
摘要翻译：用于控制等离子体处理室中的温度的方法和系统，用于广泛的设定点温度和降低的能量消耗。通过等离子体处理模块控制器实现的控制算法，在冷却液回路和热源之间进行温度控制。控制算法可以响应于指示实际温度低于设定点温度的反馈信号，完全停止冷却液流向温度控制部件的流动。控制算法还可以至少部分地基于从等离子体功率导出的前馈控制信号或在处理配方执行期间输入到处理室中的等离子体功率的变化。

3. 发明申请

WO2012005881A3 METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING 审中-公开
标题翻译：无线电频率（RF）等离子体处理的方法和装置
公开(公告)号：WO2012005881A3
公开(公告)日：2012-04-05
申请号：PCT/US2011040189
申请日：2011-06-13
申请人： APPLIED MATERIALS INC , KAWASAKI KATSUMASA , LIAO BRYAN
发明人： KAWASAKI KATSUMASA , LIAO BRYAN
IPC分类号： H05H1/46 , H03H7/40
CPC分类号： H01J37/32082 , H01J37/32183 , H01J37/3299 , H03H7/38 , H03H7/46
摘要： Methods and apparatus for minimizing reflected radio frequency (RF) energy are provided herein. In some embodiments, an apparatus may include a first RF energy source having frequency tuning to provide a first RF energy, a first matching network coupled to the first RF energy source, one or more sensors to provide first data corresponding to a first magnitude and a first phase of a first impedance of the first RF energy, wherein the first magnitude is equal a first resistance defined as a first voltage divided by a first current and the first phase is equal to a first phase difference between the first voltage and the first current, and a controller adapted to control a first value of a first variable element of the first matching network based upon the first magnitude and to control a first frequency provided by the first RF energy source based upon the first phase.
摘要翻译：本文提供了用于使反射射频（RF）能量最小化的方法和装置。在一些实施例中，装置可以包括具有频率调谐以提供第一RF能量的第一RF能量源，耦合到第一RF能量源的第一匹配网络，一个或多个传感器，以提供对应于第一幅度的第一数据和所述第一RF能量的第一阻抗的第一相位，其中所述第一幅度等于被定义为第一电压除以第一电流的第一电阻，并且所述第一相位等于所述第一电压和所述第一电流之间的第一相位差以及控制器，其适于基于所述第一量值来控制所述第一匹配网络的第一可变元件的第一值，并且基于所述第一阶段来控制由所述第一RF能量源提供的第一频率。

4. 发明申请

WO2012005881A2 METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING 审中-公开
标题翻译：用于射频（RF）等离子体处理的方法和设备
公开(公告)号：WO2012005881A2
公开(公告)日：2012-01-12
申请号：PCT/US2011/040189
申请日：2011-06-13
申请人： APPLIED MATERIALS, INC. , KAWASAKI, Katsumasa , LIAO, Bryan
发明人： KAWASAKI, Katsumasa , LIAO, Bryan
IPC分类号： H05H1/46 , H03H7/40
CPC分类号： H01J37/32082 , H01J37/32183 , H01J37/3299 , H03H7/38 , H03H7/46
摘要： Methods and apparatus for minimizing reflected radio frequency (RF) energy are provided herein. In some embodiments, an apparatus may include a first RF energy source having frequency tuning to provide a first RF energy, a first matching network coupled to the first RF energy source, one or more sensors to provide first data corresponding to a first magnitude and a first phase of a first impedance of the first RF energy, wherein the first magnitude is equal a first resistance defined as a first voltage divided by a first current and the first phase is equal to a first phase difference between the first voltage and the first current, and a controller adapted to control a first value of a first variable element of the first matching network based upon the first magnitude and to control a first frequency provided by the first RF energy source based upon the first phase.
摘要翻译：本文提供了用于最小化反射射频（RF）能量的方法和设备。在一些实施例中，装置可以包括具有频率调谐以提供第一RF能量的第一RF能量源，耦合到第一RF能量源的第一匹配网络，提供对应于第一量值的第一数据的一个或多个传感器和所述第一RF能量的第一阻抗的第一相，其中所述第一量值等于定义为第一电压除以第一电流的第一电阻，并且所述第一相等于所述第一电压与所述第一电流之间的第一相差以及控制器，其适于基于所述第一量值来控制所述第一匹配网络的第一可变元件的第一值并且基于所述第一相位来控制由所述第一RF能量源提供的第一频率。

5. 发明申请

WO2011149790A2 COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DUTY CYCLE CONTROL 审中-公开
标题翻译：通过冷却液流量控制和加热器占空比控制的组件温度控制
公开(公告)号：WO2011149790A2
公开(公告)日：2011-12-01
申请号：PCT/US2011/037436
申请日：2011-05-20
申请人： APPLIED MATERIALS, INC. , MAHADESWARASWAMY, Chetan , RAMASWAMY, Kartik , LIAO, Bryan , SHOJI, Sergio , NGUYEN, Duy, D. , NOORBAKHSH, Hamid , PALAGASHVILI, David
发明人： MAHADESWARASWAMY, Chetan , RAMASWAMY, Kartik , LIAO, Bryan , SHOJI, Sergio , NGUYEN, Duy, D. , NOORBAKHSH, Hamid , PALAGASHVILI, David
IPC分类号： H05H1/24 , H01L21/3065 , H01L21/205
CPC分类号： G05D23/19 , G05B15/02 , H01J37/32522 , H01J37/32724 , H01J37/32908 , H01J37/3299 , H01L21/67248
摘要： Methods and systems for controlling temperatures in plasma processing chamber for a wide range of setpoint temperatures and reduced energy consumption. Temperature control is coordinated between a coolant liquid loop and a heat source by a control algorithm implemented by the plasma processing module controller. The control algorithm may completely stop the flow of coolant liquid to a temperature-controlled component in response to a feedback signal indicating an actual temperature is below the setpoint temperature. The control algorithm may further be based at least in part on a feedforward control signal derived from a plasma power or change in plasma power input into the processing chamber during process recipe execution.
摘要翻译：用于控制等离子体处理室中的温度的方法和系统，用于广泛的设定点温度和降低的能量消耗。通过等离子体处理模块控制器实现的控制算法，在冷却液回路和热源之间进行温度控制。控制算法可以响应于指示实际温度低于设定点温度的反馈信号，完全停止冷却液流向温度控制部件的流动。控制算法还可以至少部分地基于从等离子体功率导出的前馈控制信号或在处理配方执行期间输入到处理室中的等离子体功率的变化。

6. 发明申请

WO2011049769A2 METHODS AND APPARATUS FOR TUNING MATCHING NETWORKS 审中-公开
标题翻译：用于调谐匹配网络的方法和装置
公开(公告)号：WO2011049769A2
公开(公告)日：2011-04-28
申请号：PCT/US2010/052203
申请日：2010-10-11
申请人： APPLIED MATERIALS, INC. , ZHANG, Chunlei , SHOJI, Sergio, F. , SEMENIN, Andrey , RAMASWAMY, Kartik , CRUSE, James, P. , LIAO, Bryan
发明人： ZHANG, Chunlei , SHOJI, Sergio, F. , SEMENIN, Andrey , RAMASWAMY, Kartik , CRUSE, James, P. , LIAO, Bryan
IPC分类号： H05H1/46 , H03H7/40
CPC分类号： H03H7/40 , H01J37/32183 , H01J37/32935 , H05H1/46
摘要： Methods and apparatus for tuning matching networks are provided herein. A method of tuning a matching network includes providing a matching network coupling an RF source to a load, the matching network having a tunable element disposed at a first set point; increasing a value of the tunable element by a first step above the first set point; sensing a first adjusted value of a reflected RF power; decreasing the value of the tunable element by the first step below the first set point; sensing a second adjusted value of the reflected RF power; comparing the first and the second adjusted values of the reflected RF power; and moving the tunable element to a second set point that corresponds to a position having a lowest adjusted value of the reflected RF power. The method may be repeated until the reflected RF power falls within an acceptable reflected RF power range.
摘要翻译：本文提供了用于调整匹配网络的方法和装置。调整匹配网络的方法包括提供将RF源耦合到负载的匹配网络，所述匹配网络具有设置在第一设定点处的可调谐元件; 通过在第一设定点之上的第一步增加可调元件的值; 感测反射RF功率的第一调整值; 将可调谐元件的值降低到低于第一设定点的第一步; 感测反射RF功率的第二调整值; 比较反射RF功率的第一和第二调整值; 以及将所述可调谐元件移动到对应于具有所述反射RF功率的最低调整值的位置的第二设定点。可以重复该方法，直到反射的RF功率落在可接受的反射RF功率范围内。

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