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1. 发明申请

WO2006104748A1 ALL-REFLECTIVE OPTICAL SYSTEMS FOR BROADBAND WAFER INSPECTION 审中-公开
标题翻译：用于宽带波形检测的全反射光学系统
公开(公告)号：WO2006104748A1
公开(公告)日：2006-10-05
申请号：PCT/US2006/010042
申请日：2006-03-21
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , LANGE, Steven, R.
发明人： LANGE, Steven, R.
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G02B17/061 , G01N21/9501 , G01N2021/9563 , G01N2201/0636
摘要： All-reflective optical systems for broadband wafer inspection are provided. One system configured to inspect a wafer includes an optical subsystem. All light-directing components of the optical subsystem are reflective optical components except for one or more refractive optical components, which are located only in substantially collimated space. The refractive optical component(s) may include, for example, a refractive beamsplitter element that can be used to separate illumination and collection pupils. The optical subsystem may also include one or more reflective optical components located in substantially collimated space. The optical subsystem is configured for inspection of the wafer across a waveband of greater than 20 nm. In some embodiments, the optical subsystem is configured for inspection of the wafer at wavelengths less than and greater than 200 nm.
摘要翻译：提供了用于宽带晶圆检测的全反射光学系统。配置为检查晶片的一个系统包括光学子系统。光学子系统的所有光指向部件都是反射光学部件，除了一个或多个折射光学部件，其仅位于基本准直的空间中。折射光学部件可以包括例如可用于分离照明和收集瞳孔的折射分束器元件。光学子系统还可以包括位于基本上准直的空间中的一个或多个反射光学部件。光学子系统被配置用于跨越超过20nm的波段检查晶片。在一些实施例中，光学子系统被配置为在小于或大于200nm的波长下检查晶片。

2. 发明申请

WO2012170477A3 USING THREE-DIMENSIONAL REPRESENTATIONS FOR DEFECT-RELATED APPLICATIONS 审中-公开
标题翻译：使用缺陷相关应用的三维表示法
公开(公告)号：WO2012170477A3
公开(公告)日：2013-04-25
申请号：PCT/US2012041019
申请日：2012-06-06
申请人： KLA TENCOR CORP , PARK ALLEN , CHANG ELLIS , AJI PRASHANT A , LANGE STEVEN R
发明人： PARK ALLEN , CHANG ELLIS , AJI PRASHANT A , LANGE STEVEN R
IPC分类号： H01L21/66
CPC分类号： G06F17/5068 , G01N21/9501 , G06F17/50 , G06F17/5009 , G06F2217/12 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method for determining one or more inspection parameters for a wafer inspection recipe is described. The method comprises the steps of: generating a three-dimensional representation of one or more layers of a wafer based on design data; and determining one or more inspection parameters for a wafer inspection recipe based on the three-dimensional representation. The method is performed by a computer system.
摘要翻译：描述了一种用于确定晶片检查配方的一个或多个检查参数的方法。该方法包括以下步骤：基于设计数据生成晶片的一层或多层的三维表示; 以及基于所述三维表示确定用于晶片检查配方的一个或多个检查参数。该方法由计算机系统执行。

3. 发明申请

WO2011008964A1 OPTICAL DEFECT AMPLIFICATION FOR IMPROVED SENSITIVITY ON PATTERNED LAYERS 审中-公开
标题翻译：光学缺陷放大对改进的层的敏感性
公开(公告)号：WO2011008964A1
公开(公告)日：2011-01-20
申请号：PCT/US2010/042148
申请日：2010-07-15
申请人： KLA-TENCOR CORPORATION , LANGE, Steven, R. , DURANT, Stephane , KIRK, Gregory , DANEN, Robert, M. , AJI, Prashant
发明人： LANGE, Steven, R. , DURANT, Stephane , KIRK, Gregory , DANEN, Robert, M. , AJI, Prashant
IPC分类号： G01N21/86
CPC分类号： G01N21/95607 , Y10T428/24521 , Y10T428/31504
摘要： A method for wafer defect inspection may include, but is not limited to: providing an inspection target; applying at least one defect inspection enhancement to the inspection target; illuminating the inspection target including the at least one inspection enhancement to generate one or more inspection signals associated with one or more features of the inspection target; detecting the inspection signals; and generating one or more inspection parameters from the inspection signals. An inspection target may include, but is not limited to: at least one inspection layer; and at least one inspection enhancement layer.
摘要翻译：晶片缺陷检查的方法可以包括但不限于：提供检查目标; 对检查对象应用至少一个缺陷检查增强; 照亮包括所述至少一个检查增强的所述检查目标以产生与所述检查对象的一个或多个特征相关联的一个或多个检查信号; 检测检测信号; 以及从所述检查信号生成一个或多个检查参数。检查对象可以包括但不限于：至少一个检查层; 和至少一个检查增强层。

4. 发明申请

WO2004092716A1 METHOD AND APPARATUS FOR INSPECTING A SUBSTRATE USING A PLURALITY OF INSPECTION WAVELENGTH REGIMES 审中-公开
标题翻译：使用多个检验波长方案检查基板的方法和装置
公开(公告)号：WO2004092716A1
公开(公告)日：2004-10-28
申请号：PCT/US2004/010324
申请日：2004-04-05
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , LANGE, Steven, R.
发明人： LANGE, Steven, R.
IPC分类号： G01N21/95
CPC分类号： G01N33/54366 , G01N21/9501
摘要： A surface inspection apparatus and method are disclosed. In particular, the method and apparatus are capable of inspecting a surface in two (or more) optical regimes thereby enhancing the defect detection properties of such method and apparatus. A method involves illuminating the surface with light in a first wavelength range and a second wavelength range. The first wavelength range selected so that the surface is opaque to the light of the first wavelength range so that a resultant optical signal is produced that is predominated by diffractive and scattering properties of the surface. The second wavelength range is selected so that the surface is at least partially transmissive to light in the second wavelength range so that another resultant optical signal is produced that is predominated by thin film optical properties of the surface. The resultant optical signals are detected and processed to detect defects in the surface. Devices for implementing such methods are also disclosed.
摘要翻译：公开了一种表面检查装置和方法。特别地，该方法和装置能够在两个（或多个）光学方式中检查表面，从而增强了这种方法和装置的缺陷检测特性。一种方法包括用在第一波长范围和第二波长范围内的光来照射该表面。选择的第一波长范围使得表面对于第一波长范围的光是不透明的，使得产生以表面的衍射和散射性质为主的所得光信号。选择第二波长范围，使得表面对于第二波长范围内的光至少部分透射，从而产生以表面的薄膜光学性质为主的另外产生的光信号。检测并处理所得到的光信号以检测表面中的缺陷。还公开了用于实现这些方法的装置。

5. 发明申请

WO2012170477A2 USING THREE-DIMENSIONAL REPRESENTATIONS FOR DEFECT-RELATED APPLICATIONS 审中-公开
标题翻译：使用缺陷相关应用的三维表示法
公开(公告)号：WO2012170477A2
公开(公告)日：2012-12-13
申请号：PCT/US2012/041019
申请日：2012-06-06
申请人： KLA-TENCOR CORPORATION , PARK, Allen , CHANG, Ellis , AJI, Prashant A. , LANGE, Steven, R.
发明人： PARK, Allen , CHANG, Ellis , AJI, Prashant A. , LANGE, Steven, R.
CPC分类号： G06F17/5068 , G01N21/9501 , G06F17/50 , G06F17/5009 , G06F2217/12 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Various embodiments for using three-dimensional representations for defect-related applications are provided.
摘要翻译：提供了用于缺陷相关应用的三维表示的各种实施例。

6. 发明申请

WO2004092716B1 METHOD AND APPARATUS FOR INSPECTING A SUBSTRATE USING A PLURALITY OF INSPECTION WAVELENGTH REGIMES 审中-公开
标题翻译：使用多个检验波长方案检查基板的方法和装置
公开(公告)号：WO2004092716B1
公开(公告)日：2005-01-20
申请号：PCT/US2004010324
申请日：2004-04-05
申请人： KLA TENCOR TECH CORP , LANGE STEVEN R
发明人： LANGE STEVEN R
IPC分类号： G01N21/95 , G01N33/543 , H01L21/66
CPC分类号： G01N33/54366 , G01N21/9501
摘要： A surface inspection apparatus and method are disclosed. In particular, the method and apparatus are capable of inspecting a surface in two (or more) optical regimes thereby enhancing the defect detection properties of such method and apparatus. A method involves illuminating the surface with light in a first wavelength range and a second wavelength range. The first wavelength range selected so that the surface is opaque to the light of the first wavelength range so that a resultant optical signal is produced that is predominated by diffractive and scattering properties of the surface. The second wavelength range is selected so that the surface is at least partially transmissive to light in the second wavelength range so that another resultant optical signal is produced that is predominated by thin film optical properties of the surface. The resultant optical signals are detected and processed to detect defects in the surface. Devices for implementing such methods are also disclosed.
摘要翻译：公开了一种表面检查装置和方法。特别地，该方法和装置能够在两个（或多个）光学方式中检查表面，从而增强了这种方法和装置的缺陷检测特性。一种方法包括用在第一波长范围和第二波长范围内的光来照射该表面。选择的第一波长范围使得表面对于第一波长范围的光是不透明的，使得产生以表面的衍射和散射性质为主的所得光信号。选择第二波长范围，使得表面对于第二波长范围内的光至少部分透射，从而产生以表面的薄膜光学性质为主的另外产生的光信号。检测并处理所得到的光信号以检测表面中的缺陷。还公开了用于实现这些方法的装置。

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