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1. 发明申请

WO03056056A2 SPUTTER DEPOSITION PROCESS FOR ELECTROLUMINESCENT PHOSPHORS 审中-公开
标题翻译：用于电致发光磷光体的溅射沉积工艺
公开(公告)号：WO03056056A2
公开(公告)日：2003-07-10
申请号：PCT/CA0201894
申请日：2002-12-10
申请人： IFIRE TECHNOLOGY INC , KOSYACHKOV ALEXANDER
发明人： KOSYACHKOV ALEXANDER
IPC分类号： H05B33/10 , C09K11/00 , C09K11/02 , C09K11/64 , C09K11/77 , C09K11/80 , C09K11/84 , C23C14/00 , C23C14/06 , C23C14/34 , H05B33/14 , C09K11/46 , C09K11/463 , C09K11/465
CPC分类号： C23C14/0057 , C09K11/7706 , C23C14/0623 , C23C14/3464 , H05B33/14
摘要： The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications. The method is a dual source sputtering method for the deposition of a thin film phosphor composition onto a substrate and comprises providing a metal as a first source; providing a sulfur bearing compound as a second source; doping the first or second source with a rare earth activator; and applying sufficient current to the first and second sources in a sulfur containing atmosphere to effect sputtering of the first and second targets and deposition of the phosphor composition onto the substrate.
摘要翻译：本发明是用于薄膜荧光体的新型溅射沉积工艺，其提供电视应用所需的高亮度和颜色。该方法是用于将薄膜荧光粉组合物沉积到基底上的双源溅射方法，并且包括提供金属作为第一源; 提供含硫化合物作为第二来源; 用稀土活化剂掺杂第一或第二源; 以及在含硫气氛中向第一和第二源施加足够的电流以实现第一和第二靶的溅射以及磷光体组合物沉积到基板上。

2. 发明申请

WO2004021745A1 FINE-GRAINED RARE EARTH ACTIVATED ZINC SULFIDE PHOSPHORS FOR ELECTROLUMINESCENT DISPLAYS 审中-公开
标题翻译：精细稀土激活的锌电镀磷光体用于电致发光显示器
公开(公告)号：WO2004021745A1
公开(公告)日：2004-03-11
申请号：PCT/CA2003/001266
申请日：2003-08-25
申请人： IFIRE TECHNOLOGY INC. , LIU, Guo , KOSYACHKOV, Alexander , XU, Helen , STILES, Jim
发明人： LIU, Guo , KOSYACHKOV, Alexander , XU, Helen , STILES, Jim
IPC分类号： H05B33/10
CPC分类号： H05B33/22 , C09K11/7702 , C09K11/773 , C09K11/7745 , H05B33/10 , H05B33/14 , Y10S428/917 , Y10T428/26
摘要： An improved fine grained zinc sulfide phosphor is provided for use in ac electroluminescent displays. The fine-grained zinc sulfide phosphor film exhibits improved luminance and may be used in conjunction with a structure or substance to minimize or prevent reaction of the fine grained phosphor with oxygen. The invention is particularly applicable to zinc sulfide phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.
摘要翻译：提供了一种用于交流电致发光显示器的改进的细粒度硫化锌荧光体。细粒度的硫化锌荧光体膜显示出改善的亮度，并且可以与结构或物质结合使用以最小化或防止细粒磷光体与氧的反应。本发明特别适用于采用在高处理温度下形成并激活荧光膜的厚电介质层的电致发光显示器中的硫化锌荧光粉。

3. 发明申请

WO2004025999A1 SILICON OXYNITRIDE PASSIVATED RARE EARTH ACTIVATED THIOALUMINATE PHOSPHORS FOR ELECTROLUMINESCENT DISPLAYS 审中-公开
标题翻译：硅氧化物钝化稀土激活的硫酸铝荧光体用于电致发光显示器
公开(公告)号：WO2004025999A1
公开(公告)日：2004-03-25
申请号：PCT/CA2003/001367
申请日：2003-09-09
申请人： IFIRE TECHNOLOGY INC. , KOSYACHKOV, Alexander
发明人： KOSYACHKOV, Alexander
IPC分类号： H05B33/14
CPC分类号： H05B33/14 , C09K11/7703 , C09K11/7706 , C09K11/7718 , C09K11/7721 , C09K11/7731 , C09K11/7734 , C09K11/7746 , C09K11/7749 , C09K11/886 , H05B33/10 , H05B33/22 , Y10S428/917
摘要： A novel structure is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and a silicon oxynitride layer provided directly adjacent the top and/or bottom of the phosphor thin film layer, wherein said silicon oxynitride layer comprises a composition of Si 3 N x O y H z where 2 ≤ x ≤ 4,0
摘要翻译：提供了一种新颖的结构来改善在ac厚膜电介质电致发光显示器中使用的硫铝酸盐基磷光体的操作稳定性。新颖结构包括稀土活化的碱土金属硫铝酸盐荧光体薄膜层和直接邻近荧光体薄膜层的顶部和/或底部设置的氧氮化硅层，其中所述氧氮化硅层包含Si 3 N x O y H z的组成，其中2 < x <= 4,0

4. 发明申请

WO2006045195A1 NOVEL THIOSILICATE PHOSPHOR COMPOSITIONS AND DEPOSITION METHODS USING BARIUM-SILICON VACUUM DEPOSITION SOURCES FOR DEPOSITION OF THIOSILICATE PHOSPHOR FILMS 审中-公开
标题翻译：新型硫代磷酸酯组合物和沉积方法使用硼硅酸盐沉积源沉积硫代磷酸盐膜
公开(公告)号：WO2006045195A1
公开(公告)日：2006-05-04
申请号：PCT/CA2005/001647
申请日：2005-10-28
申请人： IFIRE TECHNOLOGY CORP. , KOSYACHKOV, Alexander , PUGLIESE, Vincent, Joseph, Alfred , ACCHIONE, Joe , COOL, Stephen, Charles
发明人： KOSYACHKOV, Alexander , PUGLIESE, Vincent, Joseph, Alfred , ACCHIONE, Joe , COOL, Stephen, Charles
IPC分类号： C23C16/42
CPC分类号： C23C14/06 , C09K11/7721 , C23C14/0057 , C23C14/0623 , H05B33/10
摘要： The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapour deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.
摘要翻译：本发明涉及新的硫硅酸盐荧光体组合物。本发明还涉及用于沉积稀土活化的硫硅酸盐荧光体组合物的物理气相沉积方法，其包括提供至少一种或多种源材料，其中源材料可以包含钡硅合金，金属间钡硅化合物，受保护的钡金属和其组合; 提供活化剂种类; 并且将一种或多种源材料和活化剂物质作为薄膜磷光体组合物沉积在所选择的基底上。该方法允许沉积具有用于电视应用所需的高亮度和颜色的蓝色薄膜电致发光荧光体。

5. 发明申请

WO2004055231A2 COMPOSITE SPUTTER TARGET AND PHOSPHOR DEPOSITION METHOD 审中-公开
标题翻译：复合溅射靶和磷沉积方法
公开(公告)号：WO2004055231A2
公开(公告)日：2004-07-01
申请号：PCT/CA2003/001887
申请日：2003-12-04
申请人： IFIRE TECHNOLOGY INC. , KOSYACHKOV, Alexander
发明人： KOSYACHKOV, Alexander
IPC分类号： C23C14/00
CPC分类号： C09K11/7731 , C09K11/7729 , C23C14/0036 , C23C14/06 , C23C14/0623 , C23C14/34 , C23C14/3414 , C23C14/548
摘要： The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method comprises sputtering a single composite target in a low pressure sputtering atmosphere that comprises gases containing reactive species and non-reactive species. The composite target comprising a matrix phase and an inclusion phase, or two matrix phases, wherein one of the phases comprises one or more metallic elements that contribute to the composition of the phosphor and the other of the phases comprises the remaining elements that contribute to the composition of the phosphor. In the method the pressure of the reactive species within the sputtering atmosphere is varied to control the sputtering rate of the matrix and inclusion phases of the composite target to cause the ratio of the elements in the two phases to deposit in a desired ratio as a phosphor film on the substrate.
摘要翻译：本发明是用于厚膜电介质电致发光显示器的多元素薄膜荧光体的新型溅射靶和沉积方法，其中沉积的磷光体提供电视应用所需的高亮度和颜色。该方法包括在包含含有反应性物质和非反应性物质的气体的低压溅射气氛中溅射单一复合靶。所述复合靶包含基质相和夹杂相或两个基质相，其中所述相中的一个包括有助于所述磷光体组成的一种或多种金属元素，并且所述相中的另一种包含有助于所述荧光体的剩余元素磷光体的组成。在该方法中，改变溅射气氛中反应性物质的压力以控制复合靶材的基质和夹杂相的溅射速率，以使两相中的元素的比例以期望的比例沉积为荧光体薄膜在基材上。

6. 发明申请

WO2005085493A1 REACTIVE METAL SOURCES AND DEPOSITION METHOD FOR THIOALUMINATE PHOSPHORS 审中-公开
标题翻译：硫酸铝磷酸盐的反应性金属源和沉积方法
公开(公告)号：WO2005085493A1
公开(公告)日：2005-09-15
申请号：PCT/CA2005/000333
申请日：2005-03-04
申请人： IFIRE TECHNOLOGY CORP. , XU, Yue (Helen) , KOSYACHKOV, Alexander , GUO, Liu , XINGWEI, Wu , ACCHIONE, Joe
发明人： XU, Yue (Helen) , KOSYACHKOV, Alexander , GUO, Liu , XINGWEI, Wu , ACCHIONE, Joe
IPC分类号： C23C14/34
CPC分类号： C23C14/0623 , C23C14/0057 , C23C14/3414 , H05B33/145
摘要： A physical vapour deposition method for the deposition of thioaluminate phosphor compositions comprises providing one or more source materials comprising an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.
摘要翻译：用于沉积硫铝酸盐荧光体组合物的物理气相沉积方法包括提供一种或多种源材料，其包括金属间钡钡化合物，钡铝合金或受保护的钡金属，提供活化剂种类并实现所述一种或多种源材料的沉积和作为选择的基底上的荧光体组合物的活化剂物质。该方法允许沉积具有用于电视应用所需的高亮度和颜色的蓝色薄膜电致发光荧光体。

7. 发明申请

WO2004055231A3 COMPOSITE SPUTTER TARGET AND PHOSPHOR DEPOSITION METHOD 审中-公开
标题翻译：复合材料溅射靶和磷沉积法
公开(公告)号：WO2004055231A3
公开(公告)日：2004-11-18
申请号：PCT/CA0301887
申请日：2003-12-04
申请人： IFIRE TECHNOLOGY INC , KOSYACHKOV ALEXANDER
发明人： KOSYACHKOV ALEXANDER
IPC分类号： C09K11/77 , C23C14/00 , C23C14/06 , C23C14/34 , C23C14/54 , C09K11/80 , C09K11/84 , H05B33/14
CPC分类号： C09K11/7731 , C09K11/7729 , C23C14/0036 , C23C14/06 , C23C14/0623 , C23C14/34 , C23C14/3414 , C23C14/548
摘要： The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method comprises sputtering a single composite target in a low pressure sputtering atmosphere that comprises gases containing reactive species and non-reactive species. The composite target comprising a matrix phase and an inclusion phase, or two matrix phases, wherein one of the phases comprises one or more metallic elements that contribute to the composition of the phosphor and the other of the phases comprises the remaining elements that contribute to the composition of the phosphor. In the method the pressure of the reactive species within the sputtering atmosphere is varied to control the sputtering rate of the matrix and inclusion phases of the composite target to cause the ratio of the elements in the two phases to deposit in a desired ratio as a phosphor film on the substrate.
摘要翻译：本发明是一种用于厚膜电介质电致发光显示器的多元件薄膜荧光体的新型溅射靶和沉积方法，其中沉积的荧光体提供电视应用所需的高亮度和颜色。该方法包括在包含含有反应性物质和非反应性物质的气体的低压溅射气氛中溅射单个复合靶。所述复合靶包含基质相和夹杂物相或两种基质相，其中所述相中的一种包含一种或多种有助于磷光体组成的金属元素，而另一种相包含有助于荧光粉的组成。在该方法中，改变溅射气氛内的反应性物质的压力以控制复合靶的基质和夹杂物相的溅射速率，以使两相中的元素的比例以所需比率沉积为磷光体基材上的薄膜。

8. 发明申请

WO2003056056A3 SPUTTER DEPOSITION PROCESS FOR ELECTROLUMINESCENT PHOSPHORS 审中-公开
公开(公告)号：WO2003056056A3
公开(公告)日：2003-07-10
申请号：PCT/CA2002/001894
申请日：2002-12-10
申请人： IFIRE TECHNOLOGY INC. , KOSYACHKOV, Alexander
发明人： KOSYACHKOV, Alexander
IPC分类号： C23C14/06
摘要： The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications. The method is a dual source sputtering method for the deposition of a thin film phosphor composition onto a substrate and comprises providing a metal as a first source; providing a sulfur bearing compound as a second source; doping the first or second source with a rare earth activator; and applying sufficient current to the first and second sources in a sulfur containing atmosphere to effect sputtering of the first and second targets and deposition of the phosphor composition onto the substrate.

9. 发明申请

WO2002097155A1 SINGLE SOURCE SPUTTERING OF THIOALUMINATE PHOSPHOR FILMS 审中-公开
标题翻译：硫酸铝磷酸膜的单源溅射
公开(公告)号：WO2002097155A1
公开(公告)日：2002-12-05
申请号：PCT/CA2002/000688
申请日：2002-05-07
申请人： IFIRE TECHNOLOGY INC. , KOSYACHKOV, Alexander
发明人： KOSYACHKOV, Alexander
IPC分类号： C23C14/06
CPC分类号： C09K11/7731 , C23C14/0057 , C23C14/0623
摘要： A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the pre-determined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl 2 S 4 :Eu), and barium magnesium thioaluminates.
摘要翻译：一种在单源溅射工艺中沉积磷光体的方法，其中磷光体选自三元，四元或更高硫代铝酸盐，硫代镓酸盐和硫酸盐磷光体及其复合物，其与选自IIA族和元素周期表IIB。荧光体是元素的预定组成。该方法包括在单一源组合物中在硫化氢气氛中溅射以将组合物沉积在基底上。与所述荧光体中的其它元素相比，单源的靶的组成相对于具有较低原子量的荧光体元素的浓度相对增加。控制相对增加使得预先确定的组合物的沉积在基材上进行。优选的磷光体是硫铝酸钡（BaAl 2 S 4：Eu）和硫铝酸钡镁。

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