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    • 1. 发明申请
    • REDUCING-AGENT SUPPLY DEVICE AND AN EXHAUST GAS NITROGEN-REMOVAL SYSTEM USING THE SAME
    • 还原剂供应装置和使用其的排气除氮系统
    • WO2011162513A2
    • 2011-12-29
    • PCT/KR2011004480
    • 2011-06-20
    • PANASIA CO LTDLEE SOO-TAECHOI WON-SUKKANG GYEONG-WOO
    • LEE SOO-TAECHOI WON-SUKKANG GYEONG-WOO
    • B01D53/56B01D47/06B01D53/34B01D53/78
    • B01D53/74B01D53/8625B01D2251/2062F01N3/2066F01N2610/00F01N2610/02F01N2610/1466F01N2610/1493Y02T10/24
    • The present invention relates to a reducing-agent supply device and to an exhaust gas nitrogen-removal system using the same. The object of the present invention is to provide a reducing-agent supply device which comprises: a reducing-agent supply unit for supplying a reducing agent to a selective supply unit; a water supply unit for supplying water to the selective supply unit; the selective-supply unit which is for selectively supplying, to a spraying unit, one or other of the reducing agent and the water supplied from the reducing-agent supply unit and the water supply unit; and the spraying unit which is for spraying the reducing agent or the water supplied from the selective-supply unit, wherein the selective-supply unit supplies water to the spraying unit during a process in which the spraying unit continuously sprays the reducing agent or when the spraying unit is blocked due to solidification of the reducing agent which remains because of temporary malfunction of the device, thereby preventing blockage of the spraying unit. The object of the present invention is also to provide an exhaust gas nitrogen-removal system using the device.
    • 本发明涉及还原剂供给装置和使用其的排气除氮系统。 本发明的目的是提供一种还原剂供给装置,其包括:还原剂供给单元,用于向选择性供给单元供给还原剂; 用于向选择性供应单元供水的供水单元; 选择供给单元,其选择性地向喷雾单元供给从还原剂供给单元和供水单元供给的一种或多种还原剂和水; 以及用于喷射从选择供应单元供应的还原剂或水的喷射单元,其中选择供应单元在喷雾单元连续地喷射还原剂的过程中或者当 由于装置的暂时故障而使剩余的还原剂固化而使喷射装置堵塞,从而防止喷射装置的堵塞。 本发明的目的还在于提供一种使用该装置的排气除氮系统。