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    • 2. 发明申请
    • MASS ANALYSIS VARIABLE EXIT APERTURE
    • 质量分析可变出口孔
    • WO2012161745A2
    • 2012-11-29
    • PCT/US2012000258
    • 2012-05-24
    • AXCELIS TECH INCHAMBY WILLIAMVALINSKI JOSEPH
    • HAMBY WILLIAMVALINSKI JOSEPH
    • H01J37/317H01J37/02H01J37/05H01J49/06
    • H01J37/3171H01J37/023H01J37/05H01J49/30H01J2237/0455H01J2237/055H01J2237/057H01J2237/24514
    • A method and apparatus is provided for reducing unwanted isotopes of an ion implantation species from an ion beamline. The apparatus herein disclosed is a mass analysis variable exit aperture that selectively reduces the size of an exit aperture as seen by an ion beam. In one embodiment, the variable mass analysis exit is located within the mass analyzer at a location upstream of a resolving aperture and is configured to effectively limit the size of the exit aperture to allow passage of desired implantation isotope(s) while blocking the passage of unwanted implantation isotopes. In one particular embodiment, the mass analysis variable exit aperture is mounted in the beam guide which, in turn, is mounted between the poles of the AMU magnet(s). A mechanical drive mechanism enables the blocking structure to be moved into the beam path in a graduated fashion as guided by a control unit tied to beam characteristics.
    • 提供了一种用于从离子束线减少离子注入物质的不想要的同位素的方法和装置。 本文公开的装置是质量分析可变出口孔,其选择性地减小出口孔的尺寸,如离子束所见。 在一个实施例中,可变质量分析出口位于质量分析器内的分辨孔的上游位置处,并且被配置为有效地限制出口孔的尺寸,以允许期望的植入同位素通过,同时阻止 不想要的植入同位素。 在一个特定实施例中,质量分析可变出口孔安装在梁导向件中,梁引导件又安装在AMU磁体的磁极之间。 机械驱动机构使得阻挡结构能够以分级方式移动到光束路径中,如由与光束特性相关联的控制单元引导的。