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    • 2. 发明申请
    • THERMOMECHANICALLY REPROCESSABLE EPOXY COMPOSITES AND PROCESSES FOR THEIR MANUFACTURING
    • 热塑性环氧复合材料及其制造方法
    • WO2015181054A1
    • 2015-12-03
    • PCT/EP2015/061311
    • 2015-05-21
    • FUNDACIÓN CIDETEC
    • ODRIOZOLA, IbonRUIZ DE LUZURIAGA, AlaitzREKONDO, AlaitzMARTÍN, RobertoMARKAIDE, NereaCABAÑERO, GermánGRANDE, Hans-Jürgen
    • C08G59/40C08J5/24
    • C08J5/24C08G59/4064C08J2363/00C08J2463/00C08K5/375C08L63/00
    • The composite comprises (i) a reinforcement phase comprising fibres, this phase being in a volume percentage comprised from 25 to 70% with respect to the total volume of the composite, and (ii) a matrix phase which is in a volume percentage comprised from 30 to 75% with respect to the total volume of the composite, being the sum of volumes of both phases forming the composite 100%, and wherein the matrixphase comprises a cured epoxy resin in a percentage comprised from 50-100% by weight with respect to the total weight of the matrix phase, and the cured epoxy resin being obtainable by: (a) mixing an epoxide-functionalised resin with a functionality equal to or higher than 2 with a cross-linking agent of formula (I), and (b) curing the reaction mixture at a temperature comprised from 10 to 200 ºC, this step being performed in the absence of a catalyst. The composite is reprocessable, reparable and recyclableand shows mechanochromic behaviour, being useful in the manufacture of an article.
    • 复合材料包括(i)包含纤维的增强相,该相的体积百分比相对于复合材料的总体积为25至70%,和(ii)基体相的体积百分比为 相对于复合材料的总体积为30〜75%,是形成复合材料的两相的体积的总和100%,并且其中基质相包含固化的环氧树脂,其含量为50-100重量%,相对于 固化的环氧树脂可以通过以下方式获得:(a)用式(I)的交联剂和(I)的交联剂将具有等于或高于2的官能团的环氧官能化树脂混合,和 b)在10至200℃的温度下固化反应混合物,该步骤在不存在催化剂的情况下进行。 复合材料是可再加工的,可修复的和可回收的,并且显示出机械色彩行为,在制造制品中是有用的。
    • 7. 发明申请
    • RECUBRIMIENTO PARA LA PROTECCIÓN FRENTE A LA CORROSIÓN
    • 涂层以防止腐蚀
    • WO2017109267A1
    • 2017-06-29
    • PCT/ES2016/070935
    • 2016-12-23
    • FUNDACIÓN CIDETEC
    • PÉREZ GARCÍA, RosalinaMUÑOZ HOYUELOS, Jose MaríaRODRÍGUEZ PARRA, Francisco JavierGABIKAETXEBARRIA MARCOS, Iker
    • C03C8/16C25D13/02
    • C03C8/16C25D13/02C25D13/10C25D13/22
    • La presente invención se refiere a una composición de esmalte que comprende: una frita; desde 0, 1 % hasta 20% en peso de un estabilizante por 100 g de la frita; desde 0,001 % hasta 1 % en peso de una sal inorgánica por 100 g de la frita; desde 0,01 % hasta 0,7% en peso de agente reductor por 100 g de la frita; desde 0% hasta 0,04% en peso de un surfactante aniónico por 100 g de la frita; desde 40 hasta 100 mL de agua por 100 g de la frita; en donde: el anión de la sal inorgánica se selecciona del grupo que consiste en nitrato, sulfato y fosfato; el agente reductor se selecciona del grupo que consiste en nitrito de metal alcalino, nitrito de metal alcalinotérreo y mezcla de los mismos; la finura de molienda de la frita está comprendido desde 0/16900 hasta 12/16900 medido mediante el ensayo de tamiz de Bayer; y con la condición de que la composición de esmalte no contiene aniones halogenados; un procedimiento para su preparación; un procedimiento para la preparación de un recubrimiento de esmalte por un procedimiento de esmaltado porcelánico electroforético usando la composición de esmalte de la invención y el recubrimiento esmaltado obtenible por el procedimiento.
    • 本发明涉及一种搪瓷组合物,其包含:玻璃料; 每100g玻璃料0.1重量%至20重量%的稳定剂; 每100g玻璃料0.001重量%至1重量%的无机盐; 每100g玻璃料0.01重量%至0.7重量%的还原剂; 每100g玻璃料0%至0.04%重量的阴离子表面活性剂; 每100g玻璃料40至100mL的水; 其中:所述无机盐阴离子选自硝酸盐,硫酸盐和磷酸盐; 还原剂选自碱金属亚硝酸盐,碱金属亚硝酸盐及其混合物; 玻璃料的研磨细度是 由拜耳筛分测试所测得的0/16 900至12/16 900; 并且条件是搪瓷组合物不含卤化阴离子; 其制备程序; 使用本发明的搪瓷组合物和通过该方法可获得的搪瓷涂层通过电沉积工艺制备搪瓷涂层的方法。
    • 8. 发明申请
    • CHALCOGENIDE NANOOBJECTS AND USE THEREOF AS ADDITIVE
    • 作为添加剂,它可以作为添加剂使用
    • WO2016156543A1
    • 2016-10-06
    • PCT/EP2016/057161
    • 2016-03-31
    • FUNDACIÓN CIDETEC
    • GARCÍA ALONSO, IgnacioMONTES PÉREZ, SarahODRIOZOLA, IbonCABAÑERO, GermánGRANDE, Hans-JürgenTENA ZAERA, Ramón
    • C01G39/00C01G39/06C01G41/00C10M125/22
    • C01G39/06C01B19/007C01G41/00C01P2002/82C01P2002/88C01P2004/03C01P2004/04C01P2004/10C01P2004/13C01P2004/16C01P2004/24C01P2004/32C01P2004/62C01P2004/64C10M125/22C10M159/18C10M2201/065C10M2201/066C10M2227/066C10M2227/09C10N2210/06C10N2220/082C10N2230/06
    • The present invention provides a Molybdenum or Tungsten chalcogenide nanoobject having: (a) an object size comprised from 0.1 to 500 nm, and (b) from 1 to 99% by weight of molecules of formula (I) with respect to the total weight of the nanoobject, wherein: A is -OH; X is selected from: (CrC2o)alkyl optionally substituted with one or more radicals; a 2 to 20-member heteroalkyi optionally substituted with one or more radicals; and a homopolymer or copolymer comprising a polymeric chain; B is selected from: H, -OH, NH2, (Ci-C4)alkyl, halogen, phenyl substituted with one or more halogen radicals, benzyl substituted with one or more halogen radicals, -C(=O)R3, -C(=O)(R7), -OC(=O)(O)R 3 , -C(=O)(O ), -C(=O)(O)R 3 , -OR 3 , -CH(OR 3 )(OR 4 ), -C(OR 3 )(OR 4 )(R 5 ), -C(OR 3 )(OR 4 )(OR 5 ), -C(OR 3 )(OR 4 )(OR 5 )( OR 6 ), -NR 1 ,-NR 2 R 3 ,, -C(=NR 1 )(R 2 ), -C(=O)(NR 1 R 2 ), -Ν(Ο(=Ο)(^)) (C(=O)(R 2 ))(R 3 ), -O(CN), -NC(=O), -ONO 2 , -CN, -NC, -ON(=O), -NO 2 , -NO, -C 5 H 4 N, -SR 1, -SSR 1,- S)(R 1 ), - S(R 1 ), -S(=O)(OH), -S(=O)(=O)(OH), -SCN, -NCS, -C(=S)(R 1 ), -PR 1 R 2 , -P(=O)(OH) 2 , -OP(=O)(OH) 2 , -OP(=O)(OR 1 )(OR2), -B(OH), -B(OR 1 )(OR 2 ), and -B(OR 1 )(R 2 ); provided that when B is -H or (C 1 -C 4 ) alkyl, then X is a homopolymer, a copolymer, or a 2 to 20-member heteroalkyl optionally substituted with one or more radicals as defined above. The present invention also provides processes for the preparation of the nanoobjects, their use as additive for reducing the friction coefficient of a material, and compositions comprising thereof. A-X-B (I)
    • 本发明提供了一种钼或钨硫族化物纳米对象,其具有:(a)物体尺寸为0.1至500nm,和(b)1至99重量%的式(I)分子相对于 所述纳米对象,其中:A是-OH; X选自:任选被一个或多个基团取代的(C 1 -C 20)烷基; 任选被一个或多个基团取代的2至20元杂烷基; 和包含聚合物链的均聚物或共聚物; B选自:H,-OH,NH 2,(C 1 -C 4)烷基,卤素,被一个或多个卤素基取代的苯基,被一个或多个卤素基取代的苄基,-C(= O)R 3,-C( =(O)(O)R 3,-C(= O)(O) ,(OR 3)(OR 4)(R 5),-C(OR 3)(OR 4)(OR 5), - (OR 3)(OR 4)(OR 5)(OR 6),-NR 1,-NR 2 R 3,-C( =(NR 1)(R 2),-C(= O)(NR 1 R 2),-N(O(= O) NC(= O),-ONO 2,-CN,-NC,-ON(= O),-NO 2,-NO,-C 5 H 4 N,-SR 1,-SSR 1,-S)(R 1) -S(= O)(OH),-S(= O)(= O)(OH),-SCN,-NCS,-C(= S)(R1),-PR1R2,-P(= O) OH)2,-OP(= O)(OH)2,-OP(= O)(OR1)(OR2),-B(OH),-B(OR1)(OR2)和-B(OR1)( R2); 条件是当B是-H或(C 1 -C 4)烷基时,则X是任选被一个或多个上述基团取代的均聚物,共聚物或2至20元杂烷基。 本发明还提供了制备纳米体系的方法,它们作为用于降低材料的摩擦系数的添加剂的用途,以及包含它们的组合物。 A-X-B(I)