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    • 9. 发明申请
    • AN APPARATUS FOR COATING SUBSTRATES BY PLASMA DISCHARGE
    • 用于通过等离子体放电涂覆基板的装置
    • WO1986007391A1
    • 1986-12-18
    • PCT/EP1986000332
    • 1986-06-04
    • LEYBOLD-HERAEUS GMBHHARTIG, KlausDIETRICH, Anton
    • LEYBOLD-HERAEUS GMBH
    • C23C16/50
    • B05D1/62B05D3/14C23C16/503C23C16/545H01J37/32366H01J37/32623H01J37/3266H01J37/32761
    • A method for coating substrates in constant movement comprises the precipitation of compounds of a gaseous phase by plasma discharge caused by an electrode with a chemical reaction, a magnetic system being arranged on one side of the substrate in order to generate a magnetic trap which encloses the plasma. The aim is to limit the plasma effect and the chemical reaction at the immediate vicinity of the magnetic system. To this effect, the surface of the substrate to be coated is maintained at a distance ''s1'' from the electrode smaller than the width of the dark space created in the predetermined conditions wherein the process takes place. Additionally, the magnetic trap is so arranged that it traverses the substrate and is closed on top of the substrate surface to be coated, by confining the plasma on the substrate surface to be coated.
    • 用于在恒定运动中涂布基材的方法包括通过由具有化学反应的电极引起的等离子体放电来沉淀出气相化合物,磁体系布置在基板的一侧上,以便产生磁性阱 等离子体。 目的是限制在磁力系统附近的等离子体效应和化学反应。 为此,待涂覆的基板的表面保持在比电极小的距离“s1”处,该距离小于在发生该过程的预定条件下产生的暗空间的宽度。 此外,磁捕集器被布置为使得其横穿基板并且通过将等离子体限制在待涂覆的基板表面上而封闭在待涂覆的基板表面的顶部上。