专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO1986007391A1 AN APPARATUS FOR COATING SUBSTRATES BY PLASMA DISCHARGE 审中-公开
标题翻译：用于通过等离子体放电涂覆基板的装置
公开(公告)号：WO1986007391A1
公开(公告)日：1986-12-18
申请号：PCT/EP1986000332
申请日：1986-06-04
申请人： LEYBOLD-HERAEUS GMBH , HARTIG, Klaus , DIETRICH, Anton
发明人： LEYBOLD-HERAEUS GMBH
IPC分类号： C23C16/50
CPC分类号： B05D1/62 , B05D3/14 , C23C16/503 , C23C16/545 , H01J37/32366 , H01J37/32623 , H01J37/3266 , H01J37/32761
摘要： A method for coating substrates in constant movement comprises the precipitation of compounds of a gaseous phase by plasma discharge caused by an electrode with a chemical reaction, a magnetic system being arranged on one side of the substrate in order to generate a magnetic trap which encloses the plasma. The aim is to limit the plasma effect and the chemical reaction at the immediate vicinity of the magnetic system. To this effect, the surface of the substrate to be coated is maintained at a distance ''s1'' from the electrode smaller than the width of the dark space created in the predetermined conditions wherein the process takes place. Additionally, the magnetic trap is so arranged that it traverses the substrate and is closed on top of the substrate surface to be coated, by confining the plasma on the substrate surface to be coated.
摘要翻译：用于在恒定运动中涂布基材的方法包括通过由具有化学反应的电极引起的等离子体放电来沉淀出气相化合物，磁体系布置在基板的一侧上，以便产生磁性阱等离子体。目的是限制在磁力系统附近的等离子体效应和化学反应。为此，待涂覆的基板的表面保持在比电极小的距离“s1”处，该距离小于在发生该过程的预定条件下产生的暗空间的宽度。此外，磁捕集器被布置为使得其横穿基板并且通过将等离子体限制在待涂覆的基板表面上而封闭在待涂覆的基板表面的顶部上。

2. 发明申请

WO1987003772A1 CONTROL DEVICE FOR A MELT ELECTRODE 审中-公开
标题翻译：用于熔融电极的控制装置
公开(公告)号：WO1987003772A1
公开(公告)日：1987-06-18
申请号：PCT/DE1986000487
申请日：1986-11-29
申请人： LEYBOLD-HERAEUS GMBH , STENZEL, Otto , THOMAS, Friedrich-Werner
发明人： LEYBOLD-HERAEUS GMBH
IPC分类号： H05B07/152
CPC分类号： H05B7/152 , Y02P10/256 , Y02P10/259
摘要： A device for controlling the gap between a melt electrode (62) and the surface of the molten mass (61) in a vacuum arc furnace. The device is based on the fact that the short-circuits generated between the melt electrode (62) and the surface of the molten mass (61) by the droplets of molten material give an indication about the electrode gap. The average drop frequency is approximately a linear function of the length of the arc, i.e. the drop rate is in hyperbolic relationship with the length of the arc. In order to obtain in these conditions a speedy control, a drop frequency controller (84) receives a signal which corresponds to the difference betweent he reciprocal value of a drop rate signal formed by a mean value generator (80) and a drop frequency set value.
摘要翻译：一种用于在真空电弧炉中控制熔融电极（62）和熔融物质（61）表面之间的间隙的装置。该装置基于以下事实：熔融电极（62）和熔融材料（61）的表面之间产生的短路由熔融材料的液滴产生关于电极间隙的指示。平均下降频率大约是电弧长度的线性函数，即下降率与电弧长度呈双曲线关系。为了在这些条件下快速控制，液滴频率控制器（84）接收对应于由平均值发生器（80）形成的液滴率信号的倒数值和下降频率设定值之间的差值的信号。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式