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1. 发明申请

WO2010051284A3 SELF CLEANING AND ADJUSTABLE SLURRY DELIVERY ARM 审中-公开
标题翻译：自清洁和可调浆液运输ARM
公开(公告)号：WO2010051284A3
公开(公告)日：2010-07-29
申请号：PCT/US2009062242
申请日：2009-10-27
申请人： APPLIED MATERIALS INC , LEIGHTON JAMIE S , DESAI ABHIJIT Y , MCALLISTER DOUGLAS R
发明人： LEIGHTON JAMIE S , DESAI ABHIJIT Y , MCALLISTER DOUGLAS R
IPC分类号： H01L21/304
CPC分类号： B24B57/02 , B24B37/04
摘要： Embodiments of the invention provide a slurry delivery and rinse system for a chemical mechanical polishing (CMP) apparatus which is capable of self-cleaning, and which can adjustably deliver the slurry agent and rinse agent over a polishing pad. In one embodiment, the fluid delivery system has a distributed slurry delivery arm (DSDA) which contains at least one manifold, usually two or more manifolds attached to the lower surface of the delivery arm. Each DSDA manifold contains a plurality of slurry nozzles disposed along the length of the manifold. The delivery arm also contains a plurality of high pressure rinse nozzles extending from the lower surface of the delivery arm and disposed along the length of the delivery arm, parallel to each DSDA manifold. In one example, the delivery arm contains two DSDA manifolds disposed parallel to each other and a plurality of high pressure rinse nozzles disposed between the manifolds.
摘要翻译：本发明的实施方案提供了一种用于化学机械抛光（CMP）装置的浆料输送和冲洗系统，其能够自清洁，并且其可调节地将抛光剂和漂洗剂递送到抛光垫上。在一个实施例中，流体输送系统具有分布式浆料输送臂（DSDA），其包含至少一个歧管，通常两个或更多个歧管连接到输送臂的下表面。每个DSDA歧管包含沿歧管长度设置的多个浆料喷嘴。输送臂还包含从输送臂的下表面延伸并沿着输送臂的长度设置的多个高压冲洗喷嘴，其平行于每个DSDA歧管。在一个示例中，输送臂包含彼此平行设置的两个DSDA歧管和设置在歧管之间的多个高压冲洗喷嘴。

2. 发明申请

WO2010051284A2 SELF CLEANING AND ADJUSTABLE SLURRY DELIVERY ARM 审中-公开
标题翻译：自清洁和可调浆料输送臂
公开(公告)号：WO2010051284A2
公开(公告)日：2010-05-06
申请号：PCT/US2009/062242
申请日：2009-10-27
申请人： APPLIED MATERIALS, INC. , LEIGHTON, Jamie S. , DESAI, Abhijit Y. , MCALLISTER, Douglas R.
发明人： LEIGHTON, Jamie S. , DESAI, Abhijit Y. , MCALLISTER, Douglas R.
IPC分类号： H01L21/304
CPC分类号： B24B57/02 , B24B37/04
摘要： Embodiments of the invention provide a slurry delivery and rinse system for a chemical mechanical polishing (CMP) apparatus which is capable of self-cleaning, and which can adjustably deliver the slurry agent and rinse agent over a polishing pad. In one embodiment, the fluid delivery system has a distributed slurry delivery arm (DSDA) which contains at least one manifold, usually two or more manifolds attached to the lower surface of the delivery arm. Each DSDA manifold contains a plurality of slurry nozzles disposed along the length of the manifold. The delivery arm also contains a plurality of high pressure rinse nozzles extending from the lower surface of the delivery arm and disposed along the length of the delivery arm, parallel to each DSDA manifold. In one example, the delivery arm contains two DSDA manifolds disposed parallel to each other and a plurality of high pressure rinse nozzles disposed between the manifolds.
摘要翻译：本发明的实施例提供了用于化学机械抛光（CMP）设备的浆液输送和冲洗系统，其能够自清洁，并且其可以可调节地将浆液剂和冲洗剂递送到抛光垫。在一个实施例中，流体输送系统具有分布式浆料输送臂（DSDA），其包含至少一个歧管，通常两个或更多个歧管连接至输送臂的下表面。每个DSDA歧管包含沿歧管长度布置的多个浆料喷嘴。输送臂还包含多个高压冲洗喷嘴，该高压冲洗喷嘴从输送臂的下表面延伸并且沿输送臂的长度平行于每个DSDA歧管设置。在一个示例中，输送臂包含彼此平行设置的两个DSDA歧管和设置在歧管之间的多个高压冲洗喷嘴。

3. 发明申请

WO2009120641A2 IMPROVED CARRIER HEAD MEMBRANE 审中-公开
标题翻译：改进的载体膜
公开(公告)号：WO2009120641A2
公开(公告)日：2009-10-01
申请号：PCT/US2009/037992
申请日：2009-03-23
申请人： APPLIED MATERIALS, INC. , PAIK, Young, Jeen , BARRENTINE, Melvin , DESAI, Abhijit, Y. , NGUYEN, Hai , BHATNAGAR, Ashish , ALAGARSAMY, Rajkumar
发明人： PAIK, Young, Jeen , BARRENTINE, Melvin , DESAI, Abhijit, Y. , NGUYEN, Hai , BHATNAGAR, Ashish , ALAGARSAMY, Rajkumar
IPC分类号： H01L21/304
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/0201 , H01L21/30625 , Y10T428/24355 , Y10T428/24612
摘要： A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.
摘要翻译：提供了一种用于平坦化基板的方法和装置。提供了一种具有改进的用于固定基板的盖的基板载体头。盖可以具有比其配合的凹部大的凸缘，使得压缩在凹部内形成共形密封。胎圈也可以不涂覆以增强胎圈与沟槽表面的粘附。盖的表面可以被粗糙化，以减少基材与盖的粘附，而不使用不粘涂层。

4. 发明申请

WO2007142850A3 GAS FLOW CONTROL BY DIFFERENTIAL PRESSURE MEASUREMENTS 审中-公开
标题翻译：通过差压测量的气体流量控制
公开(公告)号：WO2007142850A3
公开(公告)日：2008-02-21
申请号：PCT/US2007012348
申请日：2007-05-22
申请人： APPLIED MATERIALS INC , SUN DAVID P , COFFMAN DANIEL , GIANOULAKIS STEVEN E , DESAI ABHIJIT , VELASTEGUI SOPHIA M
发明人： SUN DAVID P , COFFMAN DANIEL , GIANOULAKIS STEVEN E , DESAI ABHIJIT , VELASTEGUI SOPHIA M
IPC分类号： C23C16/455 , C23C16/52
CPC分类号： C23C16/52 , C23C16/45557 , Y10T137/7761
摘要： A gas flow comparator comprises a gas control mounted on a gas tube to set a gas flow or pressure of a gas passing thorough the gas tube. A principal flow splitter comprises an inlet port connected to the gas tube. First and second flow restrictors are connected to the principal flow splitter. A pair of secondary flow splitters are each connected to a restrictor outlet of a flow restrictor. A differential pressure gauge is connected to the secondary flow splitters. A pair of nozzle holders are connected to the secondary flow splitters and are capable of being connected to first and second nozzles. In operation, the pressure differential gauge registers a pressure differential proportional to a variation in the passage of gas through the first and second nozzles.
摘要翻译：气体流量比较器包括安装在气体管上的气体控制器，以设定通过气体管道的气体的气体流量或压力。主流量分配器包括连接到气体管的入口端口。第一和第二流量限制器连接到主流量分配器。一对二次流分流器各自连接到限流器的限流器出口。差压表连接到二次分流器。一对喷嘴保持器连接到二次分流器并且能够连接到第一和第二喷嘴。在操作中，压差表记录与通过第一和第二喷嘴的气体通过的变化成比例的压力差。

5. 发明申请

WO2009120641A3 IMPROVED CARRIER HEAD MEMBRANE 审中-公开
标题翻译：改进的载体头膜
公开(公告)号：WO2009120641A3
公开(公告)日：2009-12-10
申请号：PCT/US2009037992
申请日：2009-03-23
申请人： APPLIED MATERIALS INC , PAIK YOUNG JEEN , BARRENTINE MELVIN , DESAI ABHIJIT Y , NGUYEN HAI , BHATNAGAR ASHISH , ALAGARSAMY RAJKUMAR
发明人： PAIK YOUNG JEEN , BARRENTINE MELVIN , DESAI ABHIJIT Y , NGUYEN HAI , BHATNAGAR ASHISH , ALAGARSAMY RAJKUMAR
IPC分类号： H01L21/304
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/0201 , H01L21/30625 , Y10T428/24355 , Y10T428/24612
摘要： A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.
摘要翻译：提供了用于平坦化衬底的方法和设备。提供具有用于牢固地保持衬底的改进的盖的衬底承载头。盖可以具有比其适配的凹部大的凸缘，使得压缩部在凹部内形成共形密封。珠子也可以不被涂覆以增强珠子与凹槽表面的粘附。盖的表面可以被粗糙化以减少基材对盖的粘附而不使用不粘涂层。

6. 发明申请

WO2007142850A2 GAS FLOW CONTROL BY DIFFERENTIAL PRESSURE MEASUREMENTS 审中-公开
标题翻译：通过差压测量的气体流量控制
公开(公告)号：WO2007142850A2
公开(公告)日：2007-12-13
申请号：PCT/US2007/012348
申请日：2007-05-22
申请人： APPLIED MATERIALS , SUN, David P. , COFFMAN, Daniel , GIANOULAKIS, Steven E. , DESAI, Abhijit , VELASTEGUI, Sophia M.
发明人： SUN, David P. , COFFMAN, Daniel , GIANOULAKIS, Steven E. , DESAI, Abhijit , VELASTEGUI, Sophia M.
IPC分类号： C23C16/455 , C23C16/52
CPC分类号： C23C16/52 , C23C16/45557 , Y10T137/7761
摘要： A gas flow comparator comprises a gas control mounted on a gas tube to set a gas flow or pressure of a gas passing thorough the gas tube. A principal flow splitter comprises an inlet port connected to the gas tube. First and second flow restrictors are connected to the principal flow splitter. A pair of secondary flow splitters are each connected to a restrictor outlet of a flow restrictor. A differential pressure gauge is connected to the secondary flow splitters. A pair of nozzle holders are connected to the secondary flow splitters and are capable of being connected to first and second nozzles. In operation, the pressure differential gauge registers a pressure differential proportional to a variation in the passage of gas through the first and second nozzles.
摘要翻译：气体流量比较器包括安装在气体管上的气体控制器，以设定通过气体管道的气体的气体流量或压力。主流量分配器包括连接到气体管的入口端口。第一和第二流量限制器连接到主流量分配器。一对二次流分流器各自连接到限流器的限流器出口。差压表连接到二次分流器。一对喷嘴保持器连接到二次分流器并且能够连接到第一和第二喷嘴。在操作中，压差表记录与通过第一和第二喷嘴的气体通过的变化成比例的压力差。

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