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1. 发明申请

WO2005103819A2 METHOD OF EMULATION OF LITHOGRAPHIC PROJECTION TOOLS 审中-公开
标题翻译：光刻投影工具的仿真方法
公开(公告)号：WO2005103819A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/013403
申请日：2005-04-20
申请人： LITEL INSTRUMENTS , SMITH, Adlai, H. , HUNTER, Robert, O., Jr. , BENDIK, Joseph
发明人： SMITH, Adlai, H. , HUNTER, Robert, O., Jr. , BENDIK, Joseph
IPC分类号： G03F
CPC分类号： G03F7/705 , G06F17/5009 , G06F2217/10 , G06F2217/86
摘要： Techniques for producing emulations of lithographic tools and processes using virtual wafers and lithographic libraries are described. Emulating a lithographic projection imaging machine includes determining characteristics of the imaging machine, of a reticle used in the imaging machine, and of layer specific processes. Then performing emulation on a virtual wafer using the characteristics of the imaging machine, reticle, and layer specific processes. The machine characteristics determined include characteristics of an exposure source, lens aberration, exit pupil, mechanics, vibration, calibration offsets, or resist. The reticle characteristics determined include distortion, critical dimension, phase transmission error, mask clips, as drawn specifications, or mask sites. And, the layer specific process characteristics include machine model, machine setting identification, and field exposure sequencing. Emulation results can be entered into an optimizer and optimum operating conditions related to the projection imaging machine are determined.
摘要翻译：描述了用于生产使用虚拟晶片和光刻库的光刻工具和工艺仿真的技术。仿真光刻投影成像机包括确定成像机的特征，成像机中使用的掩模版和特定于层的工艺。然后使用成像机，掩模版和层特定工艺的特性在虚拟晶片上进行仿真。所确定的机器特性包括曝光源的特性，透镜像差，出射光瞳，力学，振动，校准偏移或抗蚀剂。确定的掩模版特性包括失真，临界尺寸，相位传输误差，掩模夹，绘图规范或掩模位置。而且，层的具体过程特征包括机器模型，机器设置识别和现场曝光测序。可以将仿真结果输入到优化器中，并且确定与投影成像机相关的最佳操作条件。

2. 发明申请

WO2005103819A3 METHOD OF EMULATION OF LITHOGRAPHIC PROJECTION TOOLS 审中-公开
标题翻译：光刻投影工具的仿真方法
公开(公告)号：WO2005103819A3
公开(公告)日：2006-02-02
申请号：PCT/US2005013403
申请日：2005-04-20
申请人： LITEL INSTR INC , SMITH ADLAI H , HUNTER ROBERT O JR , BENDIK JOSEPH
发明人： SMITH ADLAI H , HUNTER ROBERT O JR , BENDIK JOSEPH
IPC分类号： G03F7/20 , G03F20060101 , G06F17/50 , G06G7/62
CPC分类号： G03F7/705 , G06F17/5009 , G06F2217/10 , G06F2217/86
摘要： Techniques for producing emulations of lithographic tools and processes using virtual wafers and lithographic libraries are described. Emulating a lithographic projection imaging machine includes determining characteristics of the imaging machine, of a reticle used in the imaging machine, and of layer specific processes. Then performing emulation on a virtual wafer using the characteristics of the imaging machine, reticle, and layer specific processes. The machine characteristics determined include characteristics of an exposure source, lens aberration, exit pupil, mechanics, vibration, calibration offsets, or resist. The reticle characteristics determined include distortion, critical dimension, phase transmission error, mask clips, as drawn specifications, or mask sites. And, the layer specific process characteristics include machine model, machine setting identification, and field exposure sequencing. Emulation results can be entered into an optimizer and optimum operating conditions related to the projection imaging machine are determined.
摘要翻译：描述了用于生产使用虚拟晶片和光刻库的光刻工具和工艺仿真的技术。仿真光刻投影成像机包括确定成像机的特征，成像机中使用的掩模版和特定于层的工艺。然后使用成像机，掩模版和层特定工艺的特性在虚拟晶片上进行仿真。所确定的机器特性包括曝光源的特性，透镜像差，出射光瞳，力学，振动，校准偏移或抗蚀剂。确定的掩模版特性包括失真，临界尺寸，相位传输误差，掩模夹，绘图规范或掩模位置。而且，层的具体过程特征包括机器模型，机器设置识别和现场曝光测序。可以将仿真结果输入到优化器中，并且确定与投影成像机相关的最佳操作条件。

3. 发明申请

WO2011028246A1 ACTIVE SPECTRAL CONTROL OF OPTICAL SOURCE 审中-公开
标题翻译：光源的主动光谱控制
公开(公告)号：WO2011028246A1
公开(公告)日：2011-03-10
申请号：PCT/US2010/002320
申请日：2010-08-24
申请人： CYMER, INC. , SEONG, Nakgeuon , LALOVIC, Ivan, B. , FARRAR, Nigel, R. , RAFAC, Robert, J. , BENDIK, Joseph, J.
发明人： SEONG, Nakgeuon , LALOVIC, Ivan, B. , FARRAR, Nigel, R. , RAFAC, Robert, J. , BENDIK, Joseph, J.
IPC分类号： H01S3/13
CPC分类号： G03F7/70575 , G03F7/70525
摘要： A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.
摘要翻译：控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。

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