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1. 发明申请

WO2015144370A1 HOUSING FOR AN ARRAY OF DENSELY SPACED COMPONENTS AND ASSOCIATED MANUFACTURING METHOD 审中-公开
标题翻译：密封空间阵列的壳体和相关的制造方法
公开(公告)号：WO2015144370A1
公开(公告)日：2015-10-01
申请号：PCT/EP2015/053611
申请日：2015-02-20
申请人： ASML NETHERLANDS B.V.
发明人： BUIS, Edwin, Johan , HOL, Sven, Antoin, Johan
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G02B7/1815 , G02B7/1828 , G03F7/70116 , G03F7/70825 , G03F7/70891
摘要： Disclosed is a housing (701) for an array of densely packed components, the housing being operable to provide individual cooling to each of the components. The housing comprises an array of component apertures (705), each component aperture for receiving one of the components. The wall defining each of the component aperture comprises at least one cooling channel defined by an inner layer and an outer layer; and the outer layer of the at least one cooling channel comprises one or more fluid flow apertures enabling fluid flow between the at least one cooling channel of the component aperture and an at least one cooling channel of an adjacent component aperture. The cooling channels and fluid flow apertures define a cooling path for a coolant between an inlet and an outlet. Also disclosed is a method of manufacture of such a housing and various apparatuses comprising said housing.
摘要翻译：公开了一种用于密集组件阵列的壳体（701），该壳体可操作以向每个部件提供单独的冷却。壳体包括阵列的组件孔（705），每个组件孔用于接收组件之一。限定每个部件孔的壁包括由内层和外层限定的至少一个冷却通道; 并且所述至少一个冷却通道的外层包括一个或多个流体流动孔，使得能够在所述部件孔的所述至少一个冷却通道与相邻部件孔的至少一个冷却通道之间流体流动。冷却通道和流体流通孔限定了用于入口和出口之间的冷却剂的冷却路径。还公开了一种制造这种壳体的方法和包括所述壳体的各种装置。

2. 发明申请

WO2015104099A1 ACTUATION MECHANISM, OPTICAL APPARATUS AND LITHOGRAPHY APPARATUS 审中-公开
标题翻译：执行机构，光学装置和光刻设备
公开(公告)号：WO2015104099A1
公开(公告)日：2015-07-16
申请号：PCT/EP2014/076247
申请日：2014-12-02
申请人： ASML NETHERLANDS B.V.
发明人： HOL, Sven, Antoin, Johan , MANCUSO, Andrea, Lodovico , MEIJER, Hendricus, Johannes, Maria , REKKERS, Erik, Maria , VAN DAM, Marinus, Johannes, Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70758 , G03F7/70825 , G03F7/70941
摘要： An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields whilst also minimizing attraction between the permanent magnet (362) and the shield (820).
摘要翻译：移动例如反射镜的致动器通过改变两个电磁体（370）中的电流来提供具有至少两个自由度的运动。移动部件包括永磁体（362），其具有被限制在基本垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面。电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。铁磁屏蔽（820）设置在运动部分的周围，并且具有至少一个中断（822），以减小相邻致动器或杂散磁场的影响，同时还使永磁体（362）和屏蔽（820）之间的吸引力最小化。

3. 发明申请

WO2016087177A1 PROJECTION SYSTEM 审中-公开
标题翻译：投影系统
公开(公告)号：WO2016087177A1
公开(公告)日：2016-06-09
申请号：PCT/EP2015/076637
申请日：2015-11-16
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , KNOPS, Raoul, Maarten, Simon , STREEFKERK, Bob , VALENTIN, Christiaan, Louis , VAN SCHOOT, Jan, Bernard, Plechelmus , SIMONS, Wilhelmus, Franciscus, Johannes , MERKX, Leon, Leonardus, Franciscus , DE JONGH, Robertus, Johannes, Marinus , MERRY, Roel, Johannes, Elisabeth , YPMA, Michael, Frederik
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/706
摘要： A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1 - S4); one or more actuators (A1 - A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1 - M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.
摘要翻译：用于光刻设备的投影系统（PS1）包括：光路（100）; 多个传感器（S1-S4）; 一个或多个致动器（A1-A4）; 和控制器（CN）。光路可操作以接收输入辐射束（Bin）并将输出辐射束（Bout）投影到衬底上以形成图像。光路包括：多个光学元件（M1-M4），所述多个光学元件包括：第一组至少两个光学元件（M1，M4）和第二组至少一个光学元件（M2， M3）。每个传感器与多个光学元件中的一个相关联，并且可操作以确定该光学元件的位置。每个致动器与第二组光学元件中的一个相关联，并且可操作以调节该光学元件。控制器可操作以使用一个或多个致动器来根据所确定的第一组光学元件的位置来调整第二组光学元件，以便至少部分地补偿光学像差和/或视线由第一组光学元件的位置引起的误差。

4. 发明申请

WO2016008754A1 LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
标题翻译： LITHOGRAPHY设备及其制造方法
公开(公告)号：WO2016008754A1
公开(公告)日：2016-01-21
申请号：PCT/EP2015/065346
申请日：2015-07-06
申请人： ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
发明人： VAN SCHOOT, Jan, Bernard, Plechelmus , BIELING, Stig , ENDRES, Martin , ESCALANTE MARUN, Maryana , GRUNER, Toralf , WISCHMEIER, Lars
IPC分类号： G03F7/20
CPC分类号： G03F7/70083 , G03F7/70075 , G03F7/70558
摘要： A lithography apparatus using EUV radiation has an illuminator configured to provide Kohler illumination. The illuminator comprises a field mirror (422) having a plurality of individually directable reflectors and a pupil mirror (424) having a plurality of pupil facets (4241-1 - 4241-M), wherein the individually directable reflectors are divided into sets of adjacent individually directable reflectors to form virtual field facets (50) and a pupil facet projects an image of a virtual field facet to fill an illumination field (IS). The individually directable reflectors are controlled between an inactive state and at least one active state in order to control the dose delivered to the substrate.
摘要翻译：使用EUV辐射的光刻设备具有配置成提供科勒照明的照明器。照明器包括具有多个可独立定向的反射器的反射镜（422）和具有多个光瞳面（4241-1至4241-M）的光瞳反射镜（424），其中可单独定向的反射器被分成相邻的一组单独定向的反射器以形成虚拟场面（50）并且瞳孔小面投影虚拟场面的图像以填充照明场（IS）。单独定向的反射器被控制在非活动状态和至少一个活动状态之间，以便控制递送到基底的剂量。

5. 发明申请

WO2015158487A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2015158487A1
公开(公告)日：2015-10-22
申请号：PCT/EP2015/055783
申请日：2015-03-19
申请人： ASML NETHERLANDS B.V.
发明人： DE JONGH, Robertus, Johannes, Marinus , MERKX, Leon, Leonardus, Franciscus , MERRY, Roel, Johannes, Elisabeth
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G02B7/1828 , G03F7/70258 , G03F7/70758 , G03F7/70825
摘要： A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.
摘要翻译：一种光刻设备，包括用于重定向辐射束的反射器（15），例如，一个EUV光束。使用控制器和定位系统控制反射器的位置。定位系统包括非补偿致动器装置（300）和用于补偿非补偿致动器装置的寄生力的补偿致动装置（200）。定位系统和控制器可以提供更准确的反射器位置，减少反射器的变形并减小通过反射器透射的力的大小。

6. 发明申请

WO2015124457A8 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
公开(公告)号：WO2015124457A8
公开(公告)日：2015-08-27
申请号：PCT/EP2015/052673
申请日：2015-02-10
申请人： ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
发明人： VAN SCHOOT, Jan, Bernard, Plechelmus , MIGURA, Sascha , KNEER, Bernhard
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a support structure constructed to support a mask comprising a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4x.

7. 发明申请

WO2013174646A9 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2013174646A9
公开(公告)日：2013-11-28
申请号：PCT/EP2013/059434
申请日：2013-05-07
申请人： ASML NETHERLANDS B.V.
发明人： BASELMANS, Johannes , LOOPSTRA, Erik
IPC分类号： G03F7/20
摘要： A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.

8. 发明申请

WO2011012412A1 INSPECTION METHOD FOR LITHOGRAPHY 审中-公开
标题翻译：检验方法
公开(公告)号：WO2011012412A1
公开(公告)日：2011-02-03
申请号：PCT/EP2010/059698
申请日：2010-07-07
申请人： ASML NETHERLANDS B.V. , WANG, Jiun-Cheng , VAN HAREN, Richard , VAN DER SCHAAR, Maurits , LEE, Hyun-Woo , REINER, Jungblut
发明人： WANG, Jiun-Cheng , VAN HAREN, Richard , VAN DER SCHAAR, Maurits , LEE, Hyun-Woo , REINER, Jungblut
IPC分类号： G03F7/20
CPC分类号： G03F7/70633
摘要： An mark used in the determination of overlay error comprises sub-features (46), the sub-features having a smallest pitch approximately equal to the smallest pitch of the product features. The sensitivity to distortions and aberrations is therefore the same as that for the product features. However, when the mark is developed the sub-features merge and only the outline of the larger feature is developed.
摘要翻译：用于确定覆盖误差的标记包括子特征（46），子特征具有近似等于产品特征的最小间距的最小间距。因此，畸变和像差的敏感度与产品特征的敏感性相同。然而，当标记被开发时，子特征合并，并且仅开发较大特征的轮廓。

9. 发明申请

WO2017125254A1 A BEAM MEASUREMENT SYSTEM, A LITHOGRAPHIC SYSTEM, AND A METHOD 审中-公开
标题翻译：光束测量系统，光刻系统和方法
公开(公告)号：WO2017125254A1
公开(公告)日：2017-07-27
申请号：PCT/EP2017/050017
申请日：2017-01-02
申请人： ASML NETHERLANDS B.V.
发明人： NI, Yongfeng
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/7085
摘要： A beam measurement system (30), a lithographic system, and a method are disclosed. In one arrangement, the beam measurement system (30) is for determining a property of one or more of a plasma (7), an image of a plasma, and a collector (5, 20), of a laser produced plasma radiation source. The beam measurement system comprises at least one sensor unit (32) configured to receive at least a portion of a radiation beam (B) output from the collector. Each sensor unit comprises a first patterned element (34), a second patterned element (36), and a detector (38) configured to detect radiation that has passed through the first patterned element and the second patterned element. The first patterned element and the second patterned element are each patterned with a spatially non-uniform transmittance and positioned relative to each other to provide a combined transmittance with a non-uniform angular dependence with respect to a direction of incidence of radiation on the sensor unit.
摘要翻译：公开了一种光束测量系统（30），光刻系统和方法。在一种布置中，射束测量系统（30）用于确定激光产生的等离子体射线源的等离子体（7），等离子体图像和收集器（5,20）中的一个或多个的属性。该射束测量系统包括至少一个传感器单元（32），该传感器单元被配置为接收从收集器输出的辐射束（B）的至少一部分。每个传感器单元包括被配置为检测已经穿过第一图案化元件和第二图案化元件的辐射的第一图案化元件（34），第二图案化元件（36）和检测器（38）。第一图案化元件和第二图案化元件各自被图案化为具有空间非均匀透射率并且相对于彼此定位以提供相对于传感器单元上的辐射的入射方向具有非均匀角度依赖性的组合透射率

10. 发明申请

WO2017076694A1 MULTILAYER REFLECTOR, METHOD OF MANUFACTURING A MULTILAYER REFLECTOR AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：多层反射器，制造多层反射器和光刻设备的方法
公开(公告)号：WO2017076694A1
公开(公告)日：2017-05-11
申请号：PCT/EP2016/075671
申请日：2016-10-25
申请人： STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , UNIVERSITEIT VAN AMSTERDAM , STICHTING VU , ASML NETHERLANDS B.V.
发明人： SAEDI, Amirmehdi , FRENKEN, Joost, Wilhelmus, Maria , SFILIGOJ, Cristina , VERHOEVEN, Jan
IPC分类号： G03F7/20 , G03F1/24 , G02B5/08 , G21K1/06
CPC分类号： G03F7/70316 , G02B5/0875 , G02B5/0891 , G03F1/24 , G03F1/52 , G03F7/70958 , G21K1/062
摘要： A multilayer reflector for use in EUV lithography, for example, comprises alternating layers of Mo and Rb x Si y . The Rb x Si y and Mo interface is thermodynamically stable, reducing intermingling of the layers and preventing reduction in reflectivity. The Rb x Si y layer can be hydrogenated to form RbSiH 3 . For the case of Mo/RbSiH 3 an interlayer of RbH between Mo and RbSiH 3 layers can be used. An Mo/RbH multilayer mirror is also useful.
摘要翻译：例如，用于EUV光刻的多层反射器包括Mo和Rb _{x _{y _{的交替层。 Rb _{Si _{和Mo界面是热力学稳定的，减少了层间的混合并防止了反射率的降低。 Rb _{x _{_{y 层可以被氢化以形成RbSiH _{3 。对于Mo / RbSiH 3/3的情况，可以使用Mo和RbSiH 3层之间的RbH中间层。 Mo / RbH多层镜也很有用。}}}}}}}}}

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