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1. 发明申请

WO2009023571A1 COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR GENERATING A METROLOGY SAMPLING PLAN 审中-公开
标题翻译：计算机实现方法，载体介质和用于生成计量采样计划的系统
公开(公告)号：WO2009023571A1
公开(公告)日：2009-02-19
申请号：PCT/US2008/072636
申请日：2008-08-08
申请人： KLA-TENCOR CORPORATION , PARK, Allen , CHANG, Ellis
发明人： PARK, Allen , CHANG, Ellis
IPC分类号： H01L21/66
CPC分类号： G05B23/0221
摘要： Various computer-implemented methods, carrier media, and systems for generating a metrology sampling plan are provided. One computer-implemented method for generating a metrology sampling plan includes identifying one or more individual defects that have one or more attributes that are abnormal from one or more attributes of a population of defects in which the individual defects are included. The population of defects is located in a predetermined pattern on a wafer. The method also includes generating the metrology sampling plan based on results of the identifying step such that one or more areas on the wafer in which the one or more identified individual defects are located are sampled during metrology.
摘要翻译：提供了各种计算机实现的方法，载体介质和用于生成计量抽样计划的系统。用于生成计量取样计划的一种计算机实现的方法包括从包含各个缺陷的缺陷群体的一个或多个属性识别具有一个或多个属性异常的一个或多个单个缺陷。缺陷的群体位于晶片上的预定图案中。该方法还包括基于识别步骤的结果生成计量取样计划，使得在测量期间采样一个或多个所识别的单个缺陷所在的晶片上的一个或多个区域。

2. 发明申请

WO2008137922A1 COMPUTER-IMPLEMENTED METHODS, SYSTEMS, AND COMPUTER-READABLE MEDIA FOR DETERMINING A MODEL FOR PREDICTING PRINTABILITY OF RETICLE FEATURES ON A WAFER 审中-公开
标题翻译：计算机实现的方法，系统和计算机可读介质，用于确定用于预测WAFER中的特征的可打印性的模型
公开(公告)号：WO2008137922A1
公开(公告)日：2008-11-13
申请号：PCT/US2008/062875
申请日：2008-05-07
申请人： KLA-TENCOR CORPORATION , SU, Bo , VERMA, Gaurav , DU, Hong , SHI, Rui-fang , ANDREWS, Scott
发明人： SU, Bo , VERMA, Gaurav , DU, Hong , SHI, Rui-fang , ANDREWS, Scott
IPC分类号： G03F1/14 , G03F7/20
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/68
摘要： Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer are provided. One method includes generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions. The method also includes determining one or more characteristics of the reticle features of the simulated images. In addition, the method includes comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process. The method further includes selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.
摘要翻译：提供了用于确定用于预测晶片上的掩模版特征的可印刷性的模型的计算机实现的方法，系统和计算机可读介质。一种方法包括使用针对一组不同曝光条件值的不同生成模型产生印刷在晶片上的掩模版特征的模拟图像。该方法还包括确定模拟图像的掩模版特征的一个或多个特征。此外，该方法包括使用光刻工艺将模拟图像的掩模版特征的一个或多个特征与印刷在晶片上的掩模版特征的一个或多个特性进行比较。该方法还包括基于比较步骤的结果，选择不同的生成模型中的一个作为用于预测标线图特征的可印刷性的模型。

3. 发明申请

WO2008109820A1 METHODS FOR IDENTIFYING ARRAY AREAS IN DIES FORMED ON A WAFER AND METHODS FOR SETTING UP SUCH METHODS 审中-公开
标题翻译：用于识别在波形上形成的阵列中的阵列区域的方法和用于设置这些方法的方法
公开(公告)号：WO2008109820A1
公开(公告)日：2008-09-12
申请号：PCT/US2008/056212
申请日：2008-03-07
申请人： KLA-TENCOR CORPORATION , CHEN, Chien-huei (adam) , GUPTA, Ajay , WALLINGFORD, Richard , NAMJOSHI, Kaustubh , VAN RIET, Mike , COOK, Michael
发明人： CHEN, Chien-huei (adam) , GUPTA, Ajay , WALLINGFORD, Richard , NAMJOSHI, Kaustubh , VAN RIET, Mike , COOK, Michael
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： Methods for identifying array areas in dies formed on a wafer and methods for setting up such methods are provided. One method for identifying array areas in dies formed on a wafer includes comparing an array pattern in a template image acquired in one of the array areas to a search area image acquired for the wafer. The method also includes determining areas in the search area image in which a pattern is formed that substantially matches the array pattern in the template image based on results of the comparing step. In addition, the method includes identifying the array areas in the dies formed on the wafer based on results of the determining step.
摘要翻译：提供了用于识别在晶片上形成的模具中的阵列区域的方法以及用于设置这种方法的方法。用于识别在晶片上形成的管芯中的阵列区域的一种方法包括将在一个阵列区域中获取的模板图像中的阵列图案与为晶片获取的搜索区域图像进行比较。该方法还包括基于比较步骤的结果来确定在其中形成图案的搜索区域图像中的与模板图像中的阵列图案基本匹配的区域。此外，该方法包括基于确定步骤的结果识别在晶片上形成的管芯中的阵列区域。

4. 发明申请

WO2008106577A1 METHODS FOR ACCURATE IDENTIFICATION OF AN EDGE OF A CARE AREA FOR AN ARRAY AREA FORMED ON A WAFER AND METHODS FOR BINNING DEFECTS DETECTED IN AN ARRAY AREA FORMED ON A WAFER 审中-公开
标题翻译：用于准确识别形成在水平面上的阵列区域的边缘边缘的方法和用于在WAFER中形成的阵列区域中检测出的缺陷的方法
公开(公告)号：WO2008106577A1
公开(公告)日：2008-09-04
申请号：PCT/US2008/055232
申请日：2008-02-28
申请人： KLA-TENCOR CORPORATION , CHEN, Chien-Huei (Adam) , WANG, Xiaming , SHIFRIN, Eugene , FANG, Tsung-Pao
发明人： CHEN, Chien-Huei (Adam) , WANG, Xiaming , SHIFRIN, Eugene , FANG, Tsung-Pao
IPC分类号： G06T5/00 , G06T7/00
CPC分类号： G06T7/001 , G06T7/11 , G06T7/187 , G06T2207/10056 , G06T2207/30148
摘要： Methods for identifying an edge of a care area for an array area formed on a wafer and/or for binning defects detected in the array area are provided. One method for identifying an edge of a care area for an array area formed on a wafer includes determining a value for a difference image as a function of position from a position known to be inside the array area to a position known to be outside of the array area. The method also includes identifying the position that is located closest to the inside of the array area and that has the value greater than a threshold as a position of the edge of the care area.
摘要翻译：提供了用于识别在晶片上形成的阵列区域的护理区域的边缘和/或用于组合在阵列区域中检测到的缺陷的方法。用于识别形成在晶片上的阵列区域的护理区域的边缘的一种方法包括从已知在阵列区域内的位置到已知在阵列区域外的位置确定作为位置的函数的差异图像的值阵列区域。该方法还包括识别位于最靠近阵列区域内部并且具有大于阈值的值作为护理区域的边缘的位置的位置。

5. 发明申请

WO2007106864A3 COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR CREATING A METROLOGY TARGET STRUCTURE DESIGN FOR A RETICLE LAYOUT 审中-公开
公开(公告)号：WO2007106864A3
公开(公告)日：2007-09-20
申请号：PCT/US2007/063995
申请日：2007-03-14
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , SMITH, Mark , HARDISTER, Robert , POCHKOWSKI, Mike , WIDMANN, Amir , KASSEL, Elyakim , ADEL, Mike
发明人： SMITH, Mark , HARDISTER, Robert , POCHKOWSKI, Mike , WIDMANN, Amir , KASSEL, Elyakim , ADEL, Mike
IPC分类号： G06F17/50
摘要： Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.

6. 发明申请

WO2007022538A2 TEST PADS, METHODS AND SYSTEMS FOR MEASURING PROPERTIES OF A WAFER, AND SYSTEMS AND METHODS FOR CONTROLLING DEPOSITION OF A CHARGE ON A WAFER FOR MEASUREMENT OF ONE OR MORE ELECTRICAL PROPERTIES OF THE WAFER 审中-公开
标题翻译：用于测量波形特性的测试垫，方法和系统，以及用于控制在波形上沉积电荷以测量一个或更多个电流特性的系统和方法
公开(公告)号：WO2007022538A2
公开(公告)日：2007-02-22
申请号：PCT/US2006/032822
申请日：2006-08-21
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , SHI, Jianou , ZHANG, Xiafang , PEI, Shiyou , HUANG, Shu, Chun , YEH, Dennis , RZEPIELA, Jeffrey, A. , FENG, Yiping , KHAN, Ahmad , KAGAN, Alexander , EDELSTEIN, Sergio
发明人： SHI, Jianou , ZHANG, Xiafang , PEI, Shiyou , HUANG, Shu, Chun , YEH, Dennis , RZEPIELA, Jeffrey, A. , FENG, Yiping , KHAN, Ahmad , KAGAN, Alexander , EDELSTEIN, Sergio
IPC分类号： G01R31/26
CPC分类号： G01R31/2831 , G01R31/2856 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： Test pads, methods, and systems for measuring properties of a wafer are provided. One test pad formed on a wafer includes a test structure configured such that one or more electrical properties of the test structure can be measured. The test pad also includes a conductive layer formed between the test structure and the wafer. The conductive layer prevents structures located under the test structure between the conductive layer and the wafer from affecting the one or more electrical properties of the test structure during measurement. One method for assessing plasma damage of a wafer includes measuring one or more electrical properties of a test structure formed on the wafer and determining an index characterizing the plasma damage of the test structure using the one or more electrical properties. In addition, systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer are provided. One system includes a corona source configured to deposit the charge on the wafer and a sensor configured to measure one or more conditions within the corona source. This system also includes a control subsystem configured to alter one or more parameters of the corona source based on the one or more conditions. Another system includes a corona source configured to deposit the charge on the wafer and a mixture of gases disposed within a discharge chamber of the corona source during the deposition of the charge. The mixture of gases alters one or more parameters of the charge deposited on the wafer.
摘要翻译：提供了用于测量晶片性能的测试垫，方法和系统。形成在晶片上的一个测试焊盘包括测试结构，其被配置为使得可以测量测试结构的一个或多个电特性。测试垫还包括在测试结构和晶片之间形成的导电层。导电层防止在测量期间位于导电层和晶片之间的测试结构下方的结构影响测试结构的一个或多个电性能。用于评估晶片的等离子体损伤的一种方法包括测量形成在晶片上的测试结构的一个或多个电特性，并使用一个或多个电性质确定表征测试结构的等离子体损伤的指标。此外，提供了用于控制晶片上的电荷沉积以测量晶片的一个或多个电性能的系统和方法。一个系统包括配置成将电荷沉积在晶片上的电晕源和配置成测量电晕源内的一个或多个条件的传感器。该系统还包括配置为基于一个或多个条件来改变电晕源的一个或多个参数的控制子系统。另一种系统包括电晕源，其被配置为在电荷沉积期间将电荷沉积在晶片上以及布置在电晕源的放电室内的气体混合物。气体混合物改变沉积在晶片上的电荷的一个或多个参数。

7. 发明申请

WO2007011630A2 SYSTEMS, CIRCUITS AND METHODS FOR REDUCING THERMAL DAMAGE AND EXTENDING THE DETECTION RANGE OF AN INSPECTION SYSTEM BY AVOIDING DETECTOR AND CIRCUIT SATURATION 审中-公开
标题翻译：通过避免检测器和电路饱和来减少热损伤和扩大检测系统的检测范围的系统，电路和方法
公开(公告)号：WO2007011630A2
公开(公告)日：2007-01-25
申请号：PCT/US2006/027129
申请日：2006-07-12
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , WOLTERS, Christian, H. , ROMANOVSKY, Anatoly , SLOBODOV, Alexander
发明人： WOLTERS, Christian, H. , ROMANOVSKY, Anatoly , SLOBODOV, Alexander
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01J1/18 , G01N21/8851 , H01J43/30
摘要： Inspection systems, circuits and methods are provided to enhance defect detection by addressing anode saturation as a limiting factor of the measurement detection range of a photomultiplier tube (PMT) detector. Inspection systems, circuits and methods are also provided to enhance defect detection by addressing saturation levels of the amplifier and analog-digital circuitry as a limiting factor of the measurement detection range of an inspection system. In addition, inspection systems, circuits, and methods are provided to enhance defect detection by reducing thermal damage to large particles by dynamically altering the incident laser beam power level supplied to the specimen during a surface inspection scan.
摘要翻译：提供检查系统，电路和方法以通过解决阳极饱和作为光电倍增管（PMT）检测器的测量检测范围的限制因素来增强缺陷检测。还提供了检测系统，电路和方法，通过解决放大器和模拟 - 数字电路的饱和水平作为检测系统测量检测范围的限制因素来增强缺陷检测。此外，通过在表面检查扫描期间动态地改变提供给样本的入射激光束功率水平，提供了检查系统，电路和方法以通过减少对大颗粒的热损伤来增强缺陷检测。

8. 发明申请

WO2006063268A3 COMPUTER-IMPLEMENTED METHODS FOR DETECTING AND/OR SORTING DEFECTS IN A DESIGN PATTERN OF A RETICLE 审中-公开
公开(公告)号：WO2006063268A3
公开(公告)日：2006-06-15
申请号：PCT/US2005/044695
申请日：2005-12-07
申请人： KLA-TENCOR TECHNOLOGIES CORP. , WU, Kenong , RANDALL, David , NAFISI, Kourosh , YNZUNZA, Ramon , PETERSON, Ingrid, B. , TRIBBLE, Ariel , KOWALSKI, Michal , GAO, Lisheng , KULKARNI, Ashok
发明人： WU, Kenong , RANDALL, David , NAFISI, Kourosh , YNZUNZA, Ramon , PETERSON, Ingrid, B. , TRIBBLE, Ariel , KOWALSKI, Michal , GAO, Lisheng , KULKARNI, Ashok
IPC分类号： G03F7/20 , G03F1/00 , G01N21/956
摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

9. 发明申请

WO2006044426A2 COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR CLASSIFYING DEFECTS ON A SPECIMEN 审中-公开
标题翻译：计算机实现方法和系统，用于分析样本中的缺陷
公开(公告)号：WO2006044426A2
公开(公告)日：2006-04-27
申请号：PCT/US2005/036598
申请日：2005-10-12
申请人： KLA-TENCOR TECHNOLOGIES CORP. , TEH, Cho, Huak , TORELLI, Tommaso , DAVID, Dominic , YEUNG, Chiuman , SCOTT, Michael, Gordon , BALASUBRAMANIAN, Lalita, A. , GAO, Lisheng , HUANG, Tong , ZHANG, Jianxin , KOWALSKI, Michal , OAKLEY, Jonathan
发明人： TEH, Cho, Huak , TORELLI, Tommaso , DAVID, Dominic , YEUNG, Chiuman , SCOTT, Michael, Gordon , BALASUBRAMANIAN, Lalita, A. , GAO, Lisheng , HUANG, Tong , ZHANG, Jianxin , KOWALSKI, Michal , OAKLEY, Jonathan
IPC分类号： G01N21/00 , H01J3/14
CPC分类号： G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.
摘要翻译：提供了用于对样本上的缺陷进行分类的各种计算机实现的方法。一种方法包括基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。该方法还包括向用户显示关于缺陷组的信息。此外，该方法包括允许用户为每个缺陷组分配分类。还提供了配置为对样品上的缺陷进行分类的系统。一个系统包括可在处理器上执行的程序指令，用于基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。该系统还包括被配置为向用户显示关于缺陷组的信息的用户界面，并允许用户为每个缺陷组分配分类。

10. 发明申请

WO2005068971A1 METHODS AND SYSTEMS FOR DYNAMIC RANGE EXPANSION 审中-公开
标题翻译：动态范围扩展的方法与系统
公开(公告)号：WO2005068971A1
公开(公告)日：2005-07-28
申请号：PCT/US2005/001866
申请日：2005-01-13
申请人： LUMINEX CORPORATION , ROTH, Wayne, D.
发明人： ROTH, Wayne, D.
IPC分类号： G01N15/14
CPC分类号： B82Y20/00 , B82Y10/00 , G01N15/14
摘要： Methods and systems for expanding the dynamic range of a system are provided. One method includes splitting fluorescent light emitted by a particle into multiple light paths having different intensities, detecting the fluorescent light in the multiple light paths with different channels to generate multiple signals, and determining which of the channels is operating in a linear range based on the multiple signals. The method also includes altering the signal generated by the channel operating in the linear rang to compensate for the different intensities. Another method includes illuminating a particle in multiple illumination zones with light having different intensities and separately detecting fluorescent light emitted by the particle while located in the multiple illumination zones to generate multiple signals. The method also includes determining which of the signals is located in a linear range and altering the signal located in the linear range to compensate for the different intensities.
摘要翻译：提供了扩展系统动态范围的方法和系统。一种方法包括将由颗粒发射的荧光分成具有不同强度的多个光路，检测具有不同通道的多个光路中的荧光以产生多个信号，以及基于以下步骤确定哪个通道在线性范围内操作多个信号。该方法还包括改变由在线性范围中操作的通道产生的信号以补偿不同的强度。另一种方法包括用具有不同强度的光照射多个照明区域中的颗粒，并分别检测位于多个照明区域中的颗粒发射的荧光，以产生多个信号。该方法还包括确定哪个信号位于线性范围内并且改变位于线性范围内的信号以补偿不同的强度。

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