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    • 27. 发明申请
    • ULTRAVIOLET WASTEWATER DISINFECTION SYSTEM AND METHOD
    • ULTRAVIOLET废水消毒系统及方法
    • WO02055438A2
    • 2002-07-18
    • PCT/US2001/044885
    • 2001-11-28
    • A61L2/10C02F1/00C02F1/28C02F1/32C02F1/72C02F
    • A61L2/10C02F1/281C02F1/325C02F1/725C02F2201/3221C02F2201/3224C02F2201/3227C02F2201/3228C02F2301/024C02F2303/04
    • An ultraviolet (UV) disinfection system and method for treating waste-containing fluids including a configuration and design to function effectively with at least one UV light source (310) or lamp that is not submerged in the fluid. The UV light source is positioned outside the fluid (210,230) to be disinfected via exposure to at least one UV dose zone outside the fluid being treated wherein UV light is projected into the at least one dose zone in a vertical riser configuration (200). At least one interface plate (240) is used to provide a surface zone for UV disinfection and to provide treatment means for balancing pH, affecting effluent chemistry, and reducing organic chemicals. Fluid to be treated enters the vertical riser configuration (200) via pipe (120) and exists via pipe (140).
    • 一种用于处理含废液的紫外线(UV)消毒系统和方法,其包括具有至少一个UV光源(310)或未浸没在流体中的灯有效地起作用的构造和设计。 UV光源位于流体外部,通过暴露于待处理流体外的至少一个UV剂量区域进行消毒,其中UV光以垂直提升管构型(200)投射到至少一个剂量区域中。 至少一个界面板(240)用于提供用于紫外线消毒的表面区域,并提供用于平衡pH,影响流出物化学和还原有机化学物质的处理装置。 待处理的流体经由管道(120)进入垂直提升管构造(200)并且经由管道(140)存在。
    • 28. 发明申请
    • ULTRAVIOLET FLUID DISINFECTION SYSTEM AND METHOD
    • 超紫外线消毒系统及方法
    • WO02009774A1
    • 2002-02-07
    • PCT/US2001/023974
    • 2001-07-31
    • A61L2/10C02F1/00C02F1/32C02F1/72A61L2/00
    • C02F1/325A61L2/10C02F1/725C02F2201/3221C02F2201/3224C02F2201/3227C02F2201/3228C02F2301/024C02F2303/04
    • An ultraviolet (UV) disinfection system and method for treating fluids including a configuration and design to function effectively with at least one UV light source or lamp (56) that is not submerged in the fluid. The UV light source (56) is positioned outside the fluid to be disinfected via exposure to at least one UV dose zone (57, 53, 52) outside the fluid being treated wherein UV light (55) is projected into the at least one dose zone (57, 53, 52). The UV light source (56) may be presented in a vertical riser configuration, wherein the UV light source (56) is positioned above the fluid to be treated and projecting a UV dose zone (57, 53, 52) downward toward and into the fluid to be treated, with the fluid moving upward toward the UV light source (56). Alternatively, the UV light source (56) may be presented in a planar or horizontal design, wherein the UV light source (56) is positioned above the fluid to be treated and projecting a UV dose zone (57, 53, 52) downward toward and into the fluid to be treated, with the fluid moving in a direction substantially perpendicular to the UV dose zone (57, 53, 52). At least one interface plate (59) is used to provide a surface zone (53) for UV disinfection above the fluid and to provide additional treatment means for balancing pH, affecting effluent chemistry, and the like.
    • 一种用于处理流体的紫外线(UV)消毒系统和方法,包括具有不被浸没在流体中的至少一个UV光源或灯(56)有效地起作用的构型和设计。 UV光源(56)通过暴露于待处理流体外的至少一个UV剂量区(57,53,52)而定位在要消毒的流体的外部,其中UV光(55)投射到至少一个剂量 区(57,53,52)。 UV光源(56)可以呈垂直提升管构造,其中UV光源(56)位于待处理的流体上方,并将UV剂量区域(57,53,52)向下并向下投射到 待处理的流体,其中流体朝向UV光源(56)向上移动。 或者,UV光源(56)可以以平面或水平设计呈现,其中UV光源(56)位于待处理的流体上方,并将UV剂量区域(57,53,52)向下朝向 并且流体在基本上垂直于UV剂量区域(57,53,52)的方向上移动。 至少一个界面板(59)用于提供用于在流体上方进行紫外消毒的表面区域(53),并提供用于平衡pH,影响流出物化学等的附加处理装置。
    • 30. 发明申请
    • FLUID STERILIZATION APPARATUS
    • 流体灭菌装置
    • WO00075081A1
    • 2000-12-14
    • PCT/CA2000/000674
    • 2000-06-05
    • A61L2/10C02F1/00C02F1/32C02F9/00
    • C02F9/005A61L2/10C02F1/325C02F2201/3223C02F2201/3228C02F2201/326C02F2301/024C02F2301/026
    • Apparatus for treating water or other fluid with radiant energy from an ultraviolet lamp (90) includes a helical shaped input fluid flow guide or helical ramp (60) disposed at or near one end an elongated annular chamber around the lamp. The guide or ramp serves to impart input spiral flow momentum to the fluid upon entry to the chamber. A corresponding output fluid flow guide or helical ramp (70) may be disposed at or near the opposed end of the chamber to impart output spiral flow momentum to the fluid as it approaches discharge from the chamber. Spiral flow serves to extend the time that the fluid is exposed to ultraviolet light and thereby increases the probability that any microbiological contaminants present in the fluid will be killed. The use helical shaped guides or ramps better serves to establish such a flow in circumstances where the available fluid pressure is relatively low.
    • 用于处理来自紫外灯(90)的辐射能的水或其它流体的设备包括螺旋形输入流体流动引导件或螺旋斜坡(60),其设置在灯头周围的细长环形室的一端或附近。 引导或斜坡用于在输入到腔室时将流体的输入螺旋流量动量传递给流体。 相应的输出流体流动引导件或螺旋斜坡(70)可以设置在腔室的相对端处或附近,以在流体从腔室排出时向流体施加输出螺旋流动力。 螺旋流用于延长流体暴露于紫外线的时间,从而增加存在于流体中的任何微生物污染物将被杀死的可能性。 在可用的流体压力相对较低的情况下,使用螺旋形引导件或斜面更好地用于建立这种流动。