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    • 25. 发明申请
    • MULTIJUNCTION PHOTOVOLTAIC CELLS
    • 多功能光伏电池
    • WO2009085601A3
    • 2010-06-24
    • PCT/US2008086104
    • 2008-12-09
    • QUALCOM MEMS TECHNOLOGIES INCKOTHARI MANISHTUNG YEH-JIUN
    • KOTHARI MANISHTUNG YEH-JIUN
    • H01L31/0216H01L31/052H01L31/068H01L31/075
    • H01L31/076H01L31/02165H01L31/02167H01L31/056H01L31/0687Y02E10/52Y02E10/544Y02E10/548Y02P70/521
    • A plurality of dichroic filters are included in multifunction photovoltaic cells to increase efficiency. For example, in a multi-junction photovoltaic cell comprising blue, green, and red active layers, blue, green, and red dichroic filters that reflect blue, green, and red light, respectively, may be disposed proximal to the blue, green, and red active layers to reflect back light not absorbed on the first past. The dichroic filters may be used to demultiplex white light incident on the PV cell and deliver suitable wavelengths to the appropriate active layer, e.g., blue wavelengths to the blue active layer, green wavelengths to the green active layer, red wavelengths to the red active layer. The PV cell may additionally be interferometrically tuned to increase absorption efficiency. Accordingly, optical resonant layers and cavities may be employed in certain embodiments.
    • 多功能光伏电池中包括多个二向色滤光片以提高效率。 例如,在包括蓝色,绿色和红色活性层的多结光伏电池中,分别反映蓝色,绿色和红色光的蓝色,绿色和红色二向色滤光片可以设置在蓝色,绿色和红色活性层的近旁, 和红色活性层,以反射第一次过去不吸收的背光。 二向色滤光器可以用于对入射在PV电池上的白光进行解复用,并将合适的波长传送到适当的有源层,例如蓝色波长到蓝色有源层,绿色波长到绿色有源层,红色波长到红色有源层 。 PV电池还可以进行干涉式调谐,以提高吸收效率。 因此,在某些实施例中可以采用光学谐振层和腔。
    • 27. 发明申请
    • SYSTEM AND METHOD FOR PROVIDING RESIDUAL STRESS TEST STRUCTURES
    • 用于提供残余应力测试结构的系统和方法
    • WO2007081547A2
    • 2007-07-19
    • PCT/US2006049148
    • 2006-12-22
    • QUALCOMM INCKOTHARI MANISHKOGUT LIORCHUI CLARENCE
    • KOTHARI MANISHKOGUT LIORCHUI CLARENCE
    • G01L5/0047G02B26/001
    • The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.
    • 本发明包括确定残余应力的系统和方法,例如在干涉式调制器中发现的。 在一个示例中,测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜,其中膜被构造为平行四边形,其中每侧的至少一部分附着到基底,以及形成在膜的一部分和基底的一部分之间的干涉腔, 并且其中膜被配置为基于膜中的残余应力而变形并且调制指示膜变形量的光。
    • 29. 发明申请
    • METHOD AND DEVICE FOR SELECTIVE ADJUSTMENT OF HYSTERESIS WINDOW
    • 用于选择性调整HYSTERESIS窗口的方法和装置
    • WO2006036427A2
    • 2006-04-06
    • PCT/US2005030682
    • 2005-08-29
    • IDC LLCCHUI CLARENCEKOTHARI MANISH
    • CHUI CLARENCEKOTHARI MANISH
    • G02B26/00
    • G02B26/001
    • The width and location of a hysteresis window of an interferometric modulator may be altered by adjusting various physical characteristics of the interferometric modulator. Thus, depending on the particular application for which the interferometric modulators are manufactured, the width and location of the hysteresis window may be altered. For example, in some applications, reducing the power required to operate an array of interferometric modulators may be an important consideration. In other applications, the speed of the interferometric modulators may be of more importance, where the speed of an interferometric modulator, as used herein, refers to the speed of actuating and relaxing the movable mirror. In other applications, the cost and ease of manufacturing may be of most importance. Systems and methods are introduced that allow selection of a width and location of a hysteresis window by adjusting various physical characteristics.
    • 可以通过调整干涉式调制器的各种物理特性来改变干涉式调制器的滞后窗的宽度和位置。 因此,根据制造干涉式调制器的特定应用,可以改变滞后窗口的宽度和位置。 例如,在某些应用中,降低操作干涉式调制器阵列所需的功率可能是重要的考虑因素。 在其他应用中,干涉式调制器的速度可能更为重要,其中如本文所使用的干涉式调制器的速度是指致动和放松可移动反射镜的速度。 在其他应用中,制造的成本和易用性可能是最重要的。 引入了通过调整各种物理特性来选择滞后窗口的宽度和位置的系统和方法。