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21. 发明申请

WO2021228387A1 CARRIER FOR A ROLLER TRANSPORT SYSTEM, ROLLER TRANSPORT SYSTEM, AND VACUUM PROCESSING APPARATUS 审中-公开
公开(公告)号：WO2021228387A1
公开(公告)日：2021-11-18
申请号：PCT/EP2020/063373
申请日：2020-05-13
申请人： APPLIED MATERIALS, INC. , EHMANN, Christian Wolfgang , KLEIN, Wolfgang , LINDENBERG, Ralph
发明人： EHMANN, Christian Wolfgang , KLEIN, Wolfgang , LINDENBERG, Ralph
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , C23C16/458 , C23C16/54 , C23C14/50 , H01L21/677 , B65D19/00 , B65D81/02 , B65G13/00 , B65G54/02 , C23C14/042 , C23C14/562 , C23C14/568 , C23C16/042 , C23C16/4587 , C23C16/545 , H01L21/67706 , H01L21/67709 , H01L21/67712
摘要： A carrier (100) for being transported in a transport direction (X) on a roller transport track (200a, 200b), the carrier (100) comprises a first rail (120) with a first roller contact surface configured for supporting the carrier (100) on at least one first roller (210a, 210b) on the roller transport track (200a, 200b); the first rail (120) comprises a first main section (124) with a first main roller contact surface (126) and a first forward end section (150) with a first forward end surface (160), the first roller contact surface being formed by the first main roller contact surface (126) and the first forward end surface (160); wherein the first forward end surface (160) is a sloped surface (160) and/or the first forward end section (126) of the first rail (120) is flexible.

22. 发明申请

WO2020126040A1 MAGNETIC LEVITATION SYSTEM, CARRIER FOR A MAGNETIC LEVITATION SYSTEM, VACUUM SYSTEM, AND METHOD OF TRANSPORTING A CARRIER 审中-公开
公开(公告)号：WO2020126040A1
公开(公告)日：2020-06-25
申请号：PCT/EP2018/086639
申请日：2018-12-21
申请人： APPLIED MATERIALS, INC. , EHMANN, Christian Wolfgang , LINDENBERG, Ralph
发明人： EHMANN, Christian Wolfgang , LINDENBERG, Ralph
IPC分类号： H01L21/677
摘要： A magnetic levitation system (100) for transporting a carrier (10) in a transport direction (T) is described. The magnetic levitation system includes one or more magnetic levitation units (120, 220) for holding a carrier (10) in a carrier transportation space (15), and a drive unit (130) for moving the carrier (10) in a transport direction (T), the drive unit (130) comprising a stator part (132) of an asynchronous linear motor being arranged laterally with respect to the carrier transportation space (15). Further, a carrier for a magnetic levitation system, as well as a method of transporting a carrier, are described.

23. 发明申请

WO2020001762A1 DEPOSITION APPARATUS, DEPOSITION SYSTEM, AND METHOD OF DEPOSITING A SEED LAYER 审中-公开
公开(公告)号：WO2020001762A1
公开(公告)日：2020-01-02
申请号：PCT/EP2018/067269
申请日：2018-06-27
申请人： APPLIED MATERIALS, INC. , LINDENBERG, Ralph
发明人： LINDENBERG, Ralph
IPC分类号： C23C14/34 , C23C14/56 , H01J37/34
摘要： A deposition apparatus is described. The deposition apparatus includes a vacuum chamber sized to accommodate a rectangular large area substrate of generation GEN 2 or higher, and an array of deposition sources having at least a first deposition source, a second deposition source, and a third deposition source having a target pitch in a first direction, the array of deposition sources being configured to deposit a material in a processing area in the vacuum chamber in a stationary deposition process, wherein a ratio of a deposition source pitch to a deposition source dimension in the first direction is 1.8 or above.

24. 发明申请

WO2019096427A1 MAGNETIC LEVITATION SYSTEM, VACUUM SYSTEM, AND METHOD OF TRANSPORTING A CARRIER 审中-公开
公开(公告)号：WO2019096427A1
公开(公告)日：2019-05-23
申请号：PCT/EP2017/079801
申请日：2017-11-20
申请人： APPLIED MATERIALS, INC. , EHMANN, Christian Wolfgang , LINDENBERG, Ralph
发明人： EHMANN, Christian Wolfgang , LINDENBERG, Ralph
IPC分类号： H01L21/67 , H01L21/677
摘要： A magnetic levitation system for transporting a carrier (10) along a transport path in a transport direction (T) is provided. The magnetic levitation system includes one or more active magnetic bearings (121) configured to hold the carrier (10) in a carrier transportation space (15) in a contactless manner; a side stabilization device (130) with at least one passive magnet (131) configured to apply a restoring force (F) on the carrier (10) in a lateral direction (L) transverse to the transport direction (T); and an adjustment device (150) configured to adjust one or more of the group consisting of: a magnetic field strength of the at least one passive magnet (131), a position of the at least one passive magnet (131) with respect to the carrier transportation space, an orientation or angular position of the at least one passive magnet (131), and a position of a magnetic shielding component (650) with respect to the at least one passive magnet (131). Further, a method of transporting a carrier is provided.

25. 发明申请

WO2018010770A1 SPUTTER DEPOSITION SOURCE, SPUTTER DEPOSITION APPARATUS AND METHOD OF OPERATING A SPUTTER DEPOSITION SOURCE 审中-公开
标题翻译：溅射沉积源，溅射沉积装置和操作溅射沉积源的方法
公开(公告)号：WO2018010770A1
公开(公告)日：2018-01-18
申请号：PCT/EP2016/066551
申请日：2016-07-12
申请人： APPLIED MATERIALS, INC. , LINDENBERG, Ralph , BUSCHBECK, Wolfgang , LOPP, Andreas
发明人： LINDENBERG, Ralph , BUSCHBECK, Wolfgang , LOPP, Andreas
IPC分类号： H01J37/34
摘要： According to one aspect of the present disclosure, a sputter deposition source (100) with at least one electrode assembly (120) configured for two-side sputter deposition is provided. The electrode assembly (120) comprises: a cathode (125) for providing a target material to be deposited, wherein the cathode is configured for generating a first plasma (131) on a first deposition side (10) and a second plasma (141) on a second deposition side (11) opposite to the first deposition side (10); and an anode assembly (130) with at least one first anode (132) arranged on the first deposition side (10) for influencing the first plasma and at least one second anode (142) arranged on the second deposition side (11) for influencing the second plasma. According to a second aspect, a deposition apparatus with a sputter deposition source (100) is provided. Further, methods of operating a sputter deposition source are provided.
摘要翻译：根据本公开的一个方面，提供了具有至少一个配置用于双面溅射沉积的电极组件（120）的溅射沉积源（100）。所述电极组件（120）包括：用于提供待沉积的靶材料的阴极（125），其中所述阴极被配置用于在第一沉积侧（10）和第二等离子体（141）上产生第一等离子体（131）在与所述第一沉积侧（10）相对的第二沉积侧（11）上; 和阳极组件（130），其具有布置在第一沉积侧（10）上用于影响第一等离子体的至少一个第一阳极（132）和布置在第二沉积侧（11）上的至少一个第二阳极（142），用于影响第二个等离子体。根据第二方面，提供了一种具有溅射沉积源（100）的沉积设备。此外，提供了操作溅射沉积源的方法。

26. 发明申请

WO2015149848A1 SYSTEM FOR SUBSTRATE PROCESSING, VACUUM ROTATION MODULE FOR A SYSTEM FOR SUBSTRATE PROCESSING AND METHOD OF OPERATING A SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：用于基板处理的系统，用于基板处理的系统的真空旋转模块和操作基板处理系统的方法
公开(公告)号：WO2015149848A1
公开(公告)日：2015-10-08
申请号：PCT/EP2014/056604
申请日：2014-04-02
申请人： APPLIED MATERIALS, INC. , BERGER, Thomas , LINDENBERG, Ralph
发明人： BERGER, Thomas , LINDENBERG, Ralph
IPC分类号： H01L21/677 , C23C14/56
CPC分类号： C23C14/568 , H01L21/67712 , H01L21/67715
摘要： A substrate processing system for processing an essentially vertically-oriented substrate is described. The substrate processing system includes a first vacuum chamber having a first dual track transportation system with a first transportation track and a second transportation track, at least one lateral displacement mechanism configured for lateral displacement of the substrate from the first transportation track to the second transportation track or vice versa within the first vacuum chamber, and a vacuum rotation module having a second vacuum chamber, wherein the vacuum rotation module comprises a vertical rotation axis for rotating the substrate around the vertical rotation axis within the second vacuum chamber, wherein the vacuum rotation module having a second dual track transportation system with a first rotation track and a second rotation track, wherein the first rotation track is rotatable to form a linear transportation path with the first transportation track and the second rotation track is rotatable to form a linear transportation path with the second transportation track, and wherein the vertical rotation axis is between the first rotation track and the second rotation track.
摘要翻译：描述了用于处理基本垂直取向的基板的基板处理系统。基板处理系统包括具有第一双轨运输系统的第一真空室，第一双轨运输系统具有第一运输轨道和第二运输轨道，至少一个侧向位移机构，其构造成用于将基板从第一运输轨道横向移位到第二运输轨道或者反之亦然;以及具有第二真空室的真空旋转模块，其中所述真空旋转模块包括用于在所述第二真空室内围绕所述垂直旋转轴旋转所述基板的垂直旋转轴线，其中所述真空旋转模块具有具有第一旋转轨道和第二旋转轨道的第二双轨道运输系统，其中所述第一旋转轨道可旋转以形成具有所述第一运输轨道的线性运输路径，并且所述第二旋转轨道可旋转以形成具有第二条运输轨道，并且其中所述垂直旋转轴线在所述第一旋转轨道和所述第二旋转轨道之间。

27. 发明申请

WO2009156196A1 PROCESSING SYSTEM AND METHOD OF OPERATING A PROCESSING SYSTEM 审中-公开
标题翻译：处理系统和操作处理系统的方法
公开(公告)号：WO2009156196A1
公开(公告)日：2009-12-30
申请号：PCT/EP2009/054149
申请日：2009-04-07
申请人： APPLIED MATERIALS INC. , LINDENBERG, Ralph , KOPARAL, Erkan , BERGER, Thomas
发明人： LINDENBERG, Ralph , KOPARAL, Erkan , BERGER, Thomas
IPC分类号： C23C14/56
CPC分类号： C23C14/568
摘要： A coating system 1 comprises a swing station 2 including a swing module and an arrangement of chambers. The arrangement of chambers comprises a lock chamber 3 and a first coating chamber 4. The lock chamber 3 is configured as a combined lock-in/lock-out chamber. The arrangement of chambers has a first substantially linear transport path T1 indicated by dashed lines, and a second substantially linear transport path T2 indicated by dashed lines. The arrangement of the paths T1 and T2 establishes a dual track. The system 1 includes a transport system for moving a substrate through the arrangement of chambers 3, 4 along the first transport path T1 and/or along the second transport path T2 as indicated by arrows. One or particularly both chambers 3 and 4 comprise transfer means for transferring the substrate/carrier from the first path T1 to the second path T2 by a lateral movement of a dual or triple track section and/or from the second path T2 to the first path T1.
摘要翻译：涂覆系统1包括包括摆动模块和室的排列的摆动站2。室的布置包括锁定室3和第一涂覆室4.锁定室3被构造为组合的锁定/锁定室。室的布置具有由虚线表示的第一基本上线性的传输路径T1和由虚线表示的第二基本上线性的传输路径T2。路径T1和T2的布置建立双轨道。系统1包括用于沿着第一传送路径T1和/或沿箭头所示的第二传送路径T2移动基板通过室3,4的布置的传送系统。一个或特别是两个腔室3和4包括传送装置，用于通过双轨道或三轨道部分的横向运动和/或从第二路径T2到第一路径将衬底/载体从第一路径T1传送到第二路径T2 T1。

28. 发明申请

WO2021244738A1 DEPOSITION APPARATUS, PROCESSING SYSTEM, METHOD OF MAINTAINING A DEPOSITION APPARATUS, AND METHOD OF MANUFACTURING A LAYER OF AN OPTOELECTRONIC DEVICE 审中-公开
公开(公告)号：WO2021244738A1
公开(公告)日：2021-12-09
申请号：PCT/EP2020/065359
申请日：2020-06-03
申请人： APPLIED MATERIALS, INC. , SCHÜHLER, Klaus , LINDENBERG, Ralph , KLEIN, Wolfgang
发明人： SCHÜHLER, Klaus , LINDENBERG, Ralph , KLEIN, Wolfgang
IPC分类号： C23C14/34 , C23C14/56 , H01L21/67 , H01L21/687 , C23C14/3464 , H01L21/6719 , H01L21/68742
摘要： A deposition apparatus for large area substrate processing in a substrate processing system is described. The deposition apparatus includes a vacuum chamber comprising: a source frame segment; an upper lid assembly over the source frame segment and detachable from the source frame segment; and a substrate handling segment below the source frame segment, the substrate handling segment having a first slit opening configured to load and unload a substrate, the first slit opening being at a first side of the substrate handling segment; the deposition apparatus further comprising: a source support assembly provided within the source frame segment; a substrate support within the substrate handling segment; and an actuator coupled to the substrate support to move the substrate support towards the source frame segment or the upper lid assembly, wherein the substrate handling segment comprises: one or more side walls fixedly coupled to the source frame segment or integrally formed with the source frame segment; and a bottom lid assembly detachable from the one or more side walls.

29. 发明申请

WO2020001730A1 CARRIER FOR A SUBSTRATE AND METHOD FOR CARRYING A SUBSTRATE 审中-公开
公开(公告)号：WO2020001730A1
公开(公告)日：2020-01-02
申请号：PCT/EP2018/066937
申请日：2018-06-25
申请人： APPLIED MATERIALS, INC. , LINDENBERG, Ralph
发明人： LINDENBERG, Ralph
IPC分类号： C23C14/50 , C23C16/458 , C23C16/54 , C23C14/56 , H01L21/677
摘要： A carrier configured for holding and transporting a substrate in a transport direction in a vacuum processing system and a method for carrying a substrate in a transport direction during a deposition process in a deposition chamber with a carrier is described. The carrier includes two side edges opposing each other, a joining structure arranged between the side edges, having a flat structure comprising a plurality of apertures, each exposing the same substrate and an aperture ratio of at least 0.5, and a holding assembly configured for holding the substrate adjacent to the joining structure.

30. 发明申请

WO2019001682A1 MOVABLE MASKING ELEMENT 审中-公开
公开(公告)号：WO2019001682A1
公开(公告)日：2019-01-03
申请号：PCT/EP2017/065710
申请日：2017-06-26
申请人： APPLIED MATERIALS, INC. , LINDENBERG, Ralph , GRILLMAYER, Jürgen , CAN, Linh , WHITE, John M. , HANIKA, Markus
发明人： LINDENBERG, Ralph , GRILLMAYER, Jürgen , CAN, Linh , WHITE, John M. , HANIKA, Markus
IPC分类号： C23C14/04 , C23C14/54 , C23C16/04
摘要： A deposition apparatus is provided. The deposition apparatus includes a first deposition source and a second deposition source configured for depositing material in a substrate receiving area. The deposition apparatus includes a masking element. The masking element is configured for masking a substrate edge region extending in a first direction. The masking element is configured to be moved in at least the first direction to compensate for an accumulation of deposition material on the masking element.

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