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11. 发明申请

WO2004068186A2 INTERFEROMETRIC CONFOCAL MICROSCOPY INCORPORATING A PIHNOLE ARRAY BEAM-SPLITTER 审中-公开
标题翻译：包含PIHNOLE阵列光束分离器的干涉微晶体
公开(公告)号：WO2004068186A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002165
申请日：2004-01-27
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G01B9/02007 , A45D2008/006 , G01B9/02002 , G01B9/0201 , G01B9/02014 , G01B9/02022 , G01B9/02042 , G01B9/02079 , G01B9/04 , G01B2290/70 , G02B21/0056 , G02B21/14 , G02B27/017 , G02B27/108 , G02B27/126 , G02B27/143 , G02B27/144 , G02B27/145
摘要： A confocal interferometry system for making interferometric measurements of an object, the system including an array of pinholes positioned to receive a source beam and, for each pinhole in the array of pinholes, separate the source beam into a corresponding reference beam on one side of the array of pinholes and a corresponding measurement beam on the other side of the array of pinholes; a first imaging system arranged to image the array of pinholes onto an array of spots on or in the object so that the corresponding measurement beam for each pinhole of the array of pinholes is directed to a different corresponding spot of the array of spots and produces for that spot a corresponding return measurement beam, the first imaging system also arranged to image the array of spots onto the array of pinholes so that the corresponding return measurement beam from each spot of the array of spots is directed back to a corresponding different pinhole in the array of pinholes, wherein for each pinhole the pinhole array combines the return measurement and reference beams for that pinhole to produce a corresponding combined beam; and a detector assembly including an array of detector elements aligned with the array of pinholes so that the corresponding combined beam for each pinhole is directed to different corresponding detector element of the array of detector elements.
摘要翻译：一种用于对物体进行干涉测量的共焦干涉测量系统，所述系统包括定位成接收源光束的针孔阵列，并且对于针孔阵列中的每个针孔将源光束分离成相应的参考光束针孔阵列和针孔阵列另一侧的相应测量光束; 第一成像系统被布置成将针孔阵列成像到物体上或物体上的点阵列上，使得针孔阵列的每个针孔的对应测量光束被引导到阵列阵列的不同对应点，并产生用于该点对应的返回测量光束，第一成像系统还布置成将斑点阵列成像到针孔阵列上，使得来自点阵列的每个点的相应的返回测量光束被引导回到相应的不同针孔针孔阵列，其中对于每个针孔，针孔阵列组合用于该针孔的返回测量和参考光束以产生相应的组合光束; 以及检测器组件，其包括与针孔阵列对准的检测器元件的阵列，使得用于每个针孔的相应组合光束被引导到检测器元件阵列的不同对应的检测器元件。

12. 发明申请

WO2005114095A2 APPARATUS AND METHODS FOR OVERLAY, ALIGNMENT MARK, AND CRITICAL DIMENSION METROLOGIES BASED ON OPTICAL INTERFEROMETRY 审中-公开
标题翻译：基于光学干涉法的重叠，对准标记和关键尺寸度量的装置和方法
公开(公告)号：WO2005114095A2
公开(公告)日：2005-12-01
申请号：PCT/US2005/018060
申请日：2005-05-23
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01B9/02
CPC分类号： G01B11/2441 , G01B9/02002 , G01B9/02014 , G01B9/02042 , G01B9/02072 , G01B9/02079 , G01B2290/70 , G03F9/7034 , G03F9/7049
摘要： Methods and apparatus based on optical homodyne displacement interferometry, optical coherent-domain reflectometry (OCDR), and optical interferometric imaging are disclosed for overlay, alignment mark, and critical dimension (CD) metrologies that are applicable to microlithography applications and integrated circuit (IC) and mask fabrication and to the detection and location of defects in/on unpatterned and patterned wafers and masks. The metrologies may also be used in advanced process control (APC) in determination of wafer induced shifts (WIS), and in the determination of optical proximity corrections (OPC).
摘要翻译：公开了适用于微光刻应用和集成电路（IC）的叠加，对准标记和临界尺寸（CD）计量的基于光学零差位移干涉测量，光学相干域反射测量（OCDR）和光学干涉成像的方法和装置，和掩模制造以及在未图案化和图案化的晶片和掩模上/之上的缺陷的检测和定位。计量学也可用于高级过程控制（APC），用于确定晶片诱发位移（WIS）和确定光学邻近校正（OPC）。

13. 发明申请

WO2005108914A2 APPARATUS AND METHODS FOR MEASUREMENT OF CRITICAL DIMENSIONS OF FEATURES AND DETECTION OF DEFECTS IN UV, VUV, AND EUV LITHOGRAPHY MASKS 审中-公开
标题翻译：用于测量特征的关键尺寸的装置和方法以及UV，VUV和EUV光刻掩模中缺陷的检测
公开(公告)号：WO2005108914A2
公开(公告)日：2005-11-17
申请号：PCT/US2005/015781
申请日：2005-05-06
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01B9/02
CPC分类号： G03F1/84 , G01N21/45 , G01N21/956 , G01N2021/95676
摘要： Methods and apparatus are disclosed for measurement of critical dimensions (CD) of features and detection of defects in reflecting UV, VUV, and EUV lithography masks and in transmitting UV and VUV lithography masks. The measured CD's may be used in the determination of optical proximity corrections (OPC) and/or in mask fabrication process control. The transmitting masks may comprise binary and various types of phase shift masks.
摘要翻译：公开了用于测量特征的临界尺寸（CD）和检测反射UV，VUV和EUV光刻掩模中的缺陷以及传输UV和VUV光刻掩模的方法和装置。所测量的CD可用于确定光学邻近校正（OPC）和/或掩模制造工艺控制。发射掩模可以包括二进制和各种类型的相移掩模。

14. 发明申请

WO2005026810A2 CATOPTRIC AND CATADIOPTRIC IMAGING SYSTEMS WITH ADAPTIVE CATOPTRIC SURFACES 审中-公开
标题翻译：具有自适应阴离子表面的阴极和阴极成像系统
公开(公告)号：WO2005026810A2
公开(公告)日：2005-03-24
申请号：PCT/US2004/029788
申请日：2004-09-10
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B17/08
CPC分类号： G02B17/086 , G01J1/58 , G02B17/008 , G02B26/06 , G02B27/144 , G02B27/145
摘要： An imaging system for imaging an object point to an image point, the system including : a beam splitter positioned to receive light rays from the object point and separate each of a plurality of rays into a transmitted portion and a reflected portion, the transmitted portions defining a first set of rays and the reflected portions defining a second set of rays; and an array of independently positionable reflecting elements forming a reflecting surface positioned to receive one of the sets of rays from the beam splitter and focus that set of rays towards the image point via the beam splitter.
摘要翻译：一种成像系统，用于将物体点成像到图像点，所述系统包括：分束器，其被定位成接收来自所述物体点的光线并将多个光线中的每一个分离成透射部分和反射部分，所述透射部分限定第一组光线和反射部分限定第二组光线; 以及形成反射表面的可独立定位的反射元件的阵列，其被定位成接收来自分束器的一组射线，并且经由分束器将该组射线聚焦到图像点。

15. 发明申请

WO2005008214A2 APPARATUS AND METHOD FOR ELLIPSOMETRIC MEASUREMENTS WITH HIGH SPATIAL RESOLUTION 审中-公开
标题翻译：具有高空间分辨率的测量方法的装置和方法
公开(公告)号：WO2005008214A2
公开(公告)日：2005-01-27
申请号：PCT/US2004/021544
申请日：2004-07-07
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01N
CPC分类号： G01N21/9501 , G01N21/211 , G01N2021/214
摘要： A method of detecting non-uniform ellipsometric properties of a substrate surface wherein the non-uniform ellipsometric properties are characterized by a characteristic dimension, the method involving: generating an input beam for illuminating a spot at a selected location on or in the substrate that has a size L that is substantially larger than the characteristic dimension; deriving a measurement beam and a reference beam from the input beam; directing the measurement beam onto the substrate as an incident measurement beam that illuminates the spot at that selected location to produce a scattered measurement beam; for each orientation of a plurality of different orientations of the reference beam relative to the scattered measurement beam, interfering the scattered measurement beam with the reference beam to produce a corresponding interference beam, wherein each of the different orientations of the reference beam is selected to produce a peak sensitivity for a portion of the scattered measurement beam that emanates from the object at a corresponding different diffraction angle of a plurality of diffraction angles; for each orientation of the plurality of different orientations of the reference beam relative to the scattered measurement beam, converting the interference beam for that selected location into an interference signal; and using the interference signals for each orientation of the plurality of different orientations to determine whether any non-uniform ellipsometric properties that are characterized by the characteristic dimension are present anywhere within a region on or in the substrate defined by the spot at that selected location.
摘要翻译：一种检测衬底表面的不均匀椭偏特性的方法，其中所述非均匀椭偏特性由特征尺寸表征，所述方法包括：产生用于照亮所述衬底上或所述衬底中的选定位置处的点的输入光束，所述位置具有尺寸L大大大于特征尺寸; 从输入光束导出测量光束和参考光束; 将测量光束作为入射测量光束引导到衬底上，该入射测量光束照亮该选定位置处的光斑以产生散射的测量光束; 对于参考光束相对于散射测量光束的多个不同取向的每个取向，干扰散射的测量光束与参考光束以产生相应的干涉光束，其中参考光束的不同取向中的每一个被选择以产生对于在多个衍射角的相应不同衍射角处从物体发出的散射测量光束的一部分的峰值灵敏度; 对于参考光束相对于散射测量光束的多个不同取向的每个取向，将该选定位置的干涉光束转换成干涉信号; 以及使用所述多个不同取向中的每个取向的所述干涉信号来确定是否存在由所述特征尺寸表征的任何不均匀椭圆特性是否存在于由所述选定位置处的所述点定义的所述基板上或其中的区域内的任何地方。

16. 发明申请

WO2004072688A2 MULTIPLE-SOURCE ARRAYS FED BY GUIDED-WAVE STRUCTURES AND RESONANT GUIDED-WAVE STRUCTURE CAVITIES 审中-公开
标题翻译：导波结构和谐波导波结构的多源阵列
公开(公告)号：WO2004072688A2
公开(公告)日：2004-08-26
申请号：PCT/US2004/003377
申请日：2004-02-06
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G02B6/4206 , G02B6/124 , G02B6/4215 , G02B21/0056
摘要： A multiple source array including a guided-wave structure having a dielectric core and a cladding covering the dielectric core; and an array of dielectric-filled, guided-wave cavities in the cladding extending transversely from the dielectric core and forming an array of apertures through which optical energy that is introduced into the core exits from the core.
摘要翻译：包括具有电介质芯和覆盖所述电介质芯的包层的导波结构的多源阵列; 以及在包层中的介质填充的导波腔阵列，其从介质芯横向延伸并形成孔的阵列，通过该阵列孔引入到芯中的光能从芯排出。

17. 发明申请

WO2004070434A2 COMPENSATION FOR EFFECTS OF MISMATCH IN INDICES OF REFRACTION AT A SUBSTRATE-MEDIUM INTERFACE IN NON-CONFOCAL, CONFOCAL, AND INTERFEROMETRIC CONFOCAL MICROSCOPY 审中-公开
标题翻译：补偿在非共焦，共焦和干涉微结构显微镜的基板 - 介质界面上的折射指标中的失调效应
公开(公告)号：WO2004070434A2
公开(公告)日：2004-08-19
申请号：PCT/US2004/003062
申请日：2004-02-04
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G02B21/0056 , G02B21/0024 , G02B21/14 , G02B27/1086 , G02B27/147
摘要： An interferometric microscope for making interferometric measurements of locations within an object that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope including a source for generating an input beam; an interferometer which is configured to receive the input beam and generate therefrom a measurement beam, to focus the measurement beam onto a selected spot in the object and produce for that selected spot a return measurement beam, and to combine the return measurement beam and a reference beam to produce an interference beam; and a detector system which is positioned to receive the interference beam, wherein the return measurement beam travels along a path from the object to the detector system and wherein the interferometer includes a compensating layer of material positioned in the path of the return measurement beam, the compensating layer producing a mismatch in the index of refraction along the path of the return measurement beam that compensates for the mismatch between the indices of refraction of the object and the medium.
摘要翻译：一种干涉测量显微镜，用于对位于介质中的物体内的位置进行干涉测量，所述物体和所述介质的折射率不匹配，所述显微镜包括用于产生输入光束的光源; 干涉仪，其被配置为接收输入光束并从中产生测量光束，以将测量光束聚焦到物体中的选定光点上，并为该选定光点产生返回测量光束，并将返回测量光束和参考光光束产生干涉光束; 以及检测器系统，其被定位成接收所述干涉光束，其中所述返回测量光束沿着从所述物体到所述检测器系统的路径传播，并且其中所述干涉仪包括位于所述返回测量光束的路径中的材料的补偿层，补偿层产生沿着返回测量光束的路径的折射率的不匹配，其补偿对象和介质的折射率之间的失配。

18. 发明申请

WO2004068065A2 LEAKY GUIDED-WAVE MODES USED IN INTERFEROMETRIC CONFOCAL MICROSCOPY TO MEASURE PROPERTIES OF TRENCHES 审中-公开
标题翻译：用于干涉滤波显微镜测量雷达特性的漏洞导波模式
公开(公告)号：WO2004068065A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002156
申请日：2004-01-27
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01B
CPC分类号： G01B9/04 , A45D2008/006 , G02B21/0056 , G02B21/006 , G02B27/108 , G02B27/143
摘要： A method of using an interferometric confocal microscope to measure features of a trench or via in a. substrate, wherein the interferometric confocal microscope produces a measurement beam, the method involving: focusing the measurement beam at a selected location at or near the bottom of the trench or via to excite one or more guided-wave modes within the trench or via; measuring properties of a return measurement beam that is produced when the measurement beam is focused at the selected location, wherein the return measurement beam includes a component corresponding to a radiated field from the one or more guided-wave modes that are excited within the trench; and determining the features of the trench or via from the measured properties of the return measurement beam.
摘要翻译：一种使用干涉式共焦显微镜来测量沟槽或通孔中的特征的方法。衬底，其中所述干涉式共焦显微镜产生测量光束，所述方法包括：将所述测量光束聚焦在所述沟槽或通孔的底部处或其附近的选定位置处，以激发所述沟槽或通孔内的一个或多个导波模式; 当所述测量光束聚焦在所选择的位置时产生的返回测量光束的测量特性，其中所述返回测量光束包括对应于在所述沟槽内激发的所述一个或多个导波模式的辐射场的分量; 以及从测量的测量光束的测量特性确定沟槽或通孔的特征。

19. 发明申请

WO2002010828A3 CONTROL OF POSITION AND ORIENTATION OF SUB-WAVELENGTH APERTURE ARRAY IN NEAR-FIELD MICROSCOPY 审中-公开
公开(公告)号：WO2002010828A3
公开(公告)日：2002-02-07
申请号：PCT/US2001/023656
申请日：2001-07-27
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B21/00
摘要： Systems and methods for near-field, interferometric microscopy are disclosed in which a mask having an array of sub-wavelength apertures is used to couple near-field probe beams to a sample. The periphery of the mask further includes one or more larger apertures to couple light to the sample that forms the basis of an interferometric signal indicative of the relative distance between the mask and the sample. The interferometric signal can be the basis of a control signal in a servo system that dynamically positions the mask relative to the sample.

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