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    • 11. 发明申请
    • MEMORY DEVICE
    • 内存设备
    • WO2012036001A1
    • 2012-03-22
    • PCT/JP2011/070095
    • 2011-08-30
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.KOYAMA, JunYAMAZAKI, Shunpei
    • KOYAMA, JunYAMAZAKI, Shunpei
    • H01L21/8242H01L27/108H01L29/786
    • G11C11/407G11C5/025G11C8/08G11C11/404G11C11/4097
    • In a memory device, memory capacity per unit area is increased while a period in which data is held is ensured. The memory device includes a driver circuit provided over a substrate, and a plurality of memory cell arrays which are provided over the driver circuit and driven by the driver circuit. Each of the plurality of memory cell arrays includes a plurality of memory cells. Each of the plurality of memory cells includes a first transistor including a first gate electrode overlapping with an oxide semiconductor layer, and a capacitor including a source electrode or a drain electrode, a first gate insulating layer, and a conductive layer. The plurality of memory cell arrays is stacked to overlap. Thus, in the memory device, memory capacity per unit area is increased while a period in which data is held is ensured.
    • 在存储装置中,确保了保持数据的期间的每单位面积的存储容量。 存储器件包括设置在衬底上的驱动器电路和设置在驱动器电路上并由驱动器电路驱动的多个存储单元阵列。 多个存储单元阵列中的每一个包括多个存储单元。 多个存储单元中的每一个包括第一晶体管,其包括与氧化物半导体层重叠的第一栅电极,以及包括源电极或漏电极,第一栅绝缘层和导电层的电容器。 堆叠多个存储单元阵列以重叠。 因此,在存储装置中,确保了保持数据的期间的每单位面积的存储容量。
    • 19. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 半导体器件及其制造方法
    • WO2011058913A1
    • 2011-05-19
    • PCT/JP2010/069540
    • 2010-10-27
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.YAMAZAKI, ShunpeiKOYAMA, Jun
    • YAMAZAKI, ShunpeiKOYAMA, Jun
    • H01L29/786H01L21/28H01L21/336H01L21/8234H01L27/088H01L29/417
    • H01L27/1207H01L21/8221H01L27/0688H01L27/1225H01L29/24
    • An object is to provide a semiconductor device with a novel structure. A semiconductor device includes a first transistor, which includes a channel formation region provided in a substrate including a semiconductor material, impurity regions, a first gate insulating layer, a first gate electrode, and a first source electrode and a first drain electrode, and a second transistor, which includes an oxide semiconductor layer over the substrate including the semiconductor material, a second source electrode and a second drain electrode, a second gate insulating layer, and a second gate electrode. The second source electrode and the second drain electrode include an oxide region formed by oxidizing a side surface thereof, and at least one of the first gate electrode, the first source electrode, and the first drain electrode is electrically connected to at least one of the second gate electrode, the second source electrode, and the second drain electrode.
    • 目的是提供具有新颖结构的半导体器件。 半导体器件包括第一晶体管,其包括设置在包括半导体材料的衬底中的沟道形成区域,杂质区域,第一栅极绝缘层,第一栅极电极和第一源极电极以及第一漏极电极, 第二晶体管,其包括在包括半导体材料的衬底上的氧化物半导体层,第二源电极和第二漏电极,第二栅极绝缘层和第二栅电极。 第二源电极和第二漏极包括通过氧化其侧表面而形成的氧化物区域,并且第一栅电极,第一源电极和第一漏极电极中的至少一个电连接到 第二栅电极,第二源电极和第二漏电极。