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11. 发明申请

WO2008034592A1 METHOD FOR DEVELOPING AND SEALING OF LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：用于开发和密封平版印刷板的方法
公开(公告)号：WO2008034592A1
公开(公告)日：2008-03-27
申请号：PCT/EP2007/008129
申请日：2007-09-18
申请人： EASTMAN KODAK COMPANY , SIMPSON, Christopher , STREHMEL, Bernd , BAUMANN, Harald , FIEBAG, Ulrich , JAREK, Mathias
发明人： SIMPSON, Christopher , STREHMEL, Bernd , BAUMANN, Harald , FIEBAG, Ulrich , JAREK, Mathias
IPC分类号： G03F7/32
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/322
摘要： A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound copolymerizable with the free radical polymerizable group of (i) and comprising at least one functional group with pK s
摘要翻译：描述了一种用于生产成像平版印刷版的方法，其中显影剂包括亲水性聚合物，其包含（m1）衍生自至少一种包含聚环氧烷链和自由基可聚合基团的化合物的结构单元，和（m2）结构单元衍生自至少一种可与（i）的自由基可聚合基团共聚并且包含至少一个具有pK <5的官能团的化合物。

12. 发明申请

WO2006053689A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS 审中-公开
标题翻译：具有低分子或聚合物敏感剂的平版印刷机前驱体（LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC或POLYMERIC SENSITIZERS）
公开(公告)号：WO2006053689A1
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012136
申请日：2005-11-11
申请人： KODAK POLYCHROME GRAPHICS GMBH , STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
发明人： STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
IPC分类号： G03F7/031 , G03F7/029
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π 1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R 1 and R 2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group -NR 3 R 4 and a group -OR 5 , each R 3 , R 4 and R 5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译：该平版印刷版前体包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物。

13. 发明申请

WO2007077207A3 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
公开(公告)号：WO2007077207A3
公开(公告)日：2007-07-12
申请号：PCT/EP2007/000009
申请日：2007-01-02
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , STREHMEL, Bernd , DWARS, Udo , MÜLLER, Ursula
发明人： BAUMANN, Harald , STREHMEL, Bernd , DWARS, Udo , MÜLLER, Ursula
IPC分类号： G03F7/027 , B41C1/10 , B41M5/40
摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

14. 发明申请

WO2006087102A2 PROCESS FOR THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：生产平版印刷板的方法
公开(公告)号：WO2006087102A2
公开(公告)日：2006-08-24
申请号：PCT/EP2006/000878
申请日：2006-02-01
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , FIEBAG, Ulrich , DWARS, Udo , STREHMEL, Bernd , FLUGEL, Michael , TIMPE, Hans-Joachim
发明人： BAUMANN, Harald , FIEBAG, Ulrich , DWARS, Udo , STREHMEL, Bernd , FLUGEL, Michael , TIMPE, Hans-Joachim
CPC分类号： G03F7/322
摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt. -% of at least one compound of formula (I) wherein R 1 , R 2 , R 3 and R 4 are each independently selected from C 1 -C 12 alkyl groups and aryl groups, X is selected from -CH=CH-, -C≡C-,formula (II), formula (III), and formula (IV), n + m results in a value of 2 to 30 and p + q results in a value of 0 to 30, wherein in the case of p + q ≠ 0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.
摘要翻译：制备平版印刷版的方法包括（a）向平版印刷基材提供亲水表面; （b）将负性辐射敏感组合物施加到所述亲水性表面上，其中所述组合物包含：（i）一种或多种类型的单体和/或低聚物和/或聚合物，其各自包含至少一个烯键式不饱和基团自由基聚合，（ii）至少一种敏化剂，其在至少一种共引发剂的存在下，并且在暴露于300至<480nni或> 750至1,100nm的波长的辐射下引发组分的自由基聚合一世）; 和（iii）至少一种具有酸性官能团的粘合剂，并且对480至750nm的波长范围基本上不敏感; （c）根据所使用的敏化剂或引发剂体系，将得到的负性工作平版印刷版原版成像曝光于从300至<480nm或> 750至1,100nm的波长范围内的辐射; 和（d）通过用pH值在9至14范围内的碱性显影剂处理除去未照射的区域，其包含（i）水，（ii）一种或多种足以调节的碱金属氢氧化物 pH值在9至14的范围内; 和（iii）1〜30wt。 - 至少一种其中R 1，R 2，R 3和R 4的式（I）化合物的％ SUP>各自独立地选自C 1 -C 12烷基和芳基，X选自-CH = CH-，-C = C-，式（ II），式（III）和式（IV）中，n + m的值为2〜30，p + q的值为0〜30，其中，在p +q≥2的情况下， 0环氧乙烷和环氧丙烷单元以块或随机分布存在。

15. 发明申请

WO2011094175A1 PROCESSOR SYSTEM WITH PROVISION FOR AUTOMATED CONTROL OF PROCESSING PARAMETERS 审中-公开
标题翻译：具有自动控制加工参数的处理器系统
公开(公告)号：WO2011094175A1
公开(公告)日：2011-08-04
申请号：PCT/US2011/022322
申请日：2011-01-25
申请人： EASTMAN KODAK COMPANY , PLUMER, Lars , KOIFMAN, Danny , KOROLIK, Pavel , BAUMANN, Harald , STREHMEL, Bernd
发明人： PLUMER, Lars , KOIFMAN, Danny , KOROLIK, Pavel , BAUMANN, Harald , STREHMEL, Bernd
IPC分类号： B41C1/10
CPC分类号： B41C1/1083
摘要： The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a plate recognition system that includes a sensing and authenication subsystem. The processor is automated to make adjustments according to the information provided.
摘要翻译：本发明涉及加工成像的前体，如平版印刷版。本发明具体涉及使用包括感测和识别子系统的板识别系统来调整处理装置以获得最佳处理性能。处理器可以根据所提供的信息进行自动调整。

16. 发明申请

WO2010093413A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
标题翻译：负责成像的元素
公开(公告)号：WO2010093413A1
公开(公告)日：2010-08-19
申请号：PCT/US2010/000224
申请日：2010-01-28
申请人： EASTMAN KODAK COMPANY , STREHMEL, Bernd , BAUMANN, Harald , LUMMEL, Daniela
发明人： STREHMEL, Bernd , BAUMANN, Harald , LUMMEL, Daniela
IPC分类号： B41C1/10 , C09D11/10 , G03F7/105
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/10 , B41C2210/22 , B41C2210/24 , G03F7/092 , G03F7/105 , Y10S430/117 , Y10S430/121 , Y10S430/145
摘要： Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a λmax in the range of from 450 to 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation sensitive compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.
摘要翻译：负性可成像元件可用于制备平版印刷版。这些元素包括水溶性对比染料，其具有450至750nm范围内的λmax，并且相对于元件中辐射敏感化合物在用于波长的波长下的吸收，其吸收率低于10％曝光。对比染料以足够的H-聚集形式存在，使得来自对比染料的全部吸收光谱的小于40％由非H聚集形式贡献。

17. 发明申请

WO2012075062A1 DEVELOPER AND ITS USE TO PEPARE LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：开发者及其用途，用于印刷平版印刷版
公开(公告)号：WO2012075062A1
公开(公告)日：2012-06-07
申请号：PCT/US2011/062492
申请日：2011-11-30
申请人： EASTMAN KODAK COMPANY , STREHMEL, Bernd , PIESTERT, Oliver , BAUMANN, Harald
发明人： STREHMEL, Bernd , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： G03F7/32 , B41C1/10
CPC分类号： G03F7/322 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24
摘要： A developer solution can be used to prepare lithographic printing plates from negative-working precursors. The developer solution has a pH of at least 4 and up to and including 11. It also comprises both an ethylene/propylene glycol block copolymer and either or both of a sugar alcohol or a mono- or oligosaccharide. This combination of components provides desired processing to provide lithographic printing plates that can be used for printing without any post-development treatments with other solutions.
摘要翻译：显影剂溶液可用于从负性前体制备平版印刷版。显影剂溶液具有至少4和至多并包括11的pH。它还包括乙烯/丙二醇嵌段共聚物和糖醇或单糖或寡糖中的任一种或两者。这种组合的组合提供所需的处理以提供可以用于印刷的平版印刷版，而不用其他溶液进行任何后期显影处理。

18. 发明申请

WO2009040104A1 METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：制作平版印刷版的方法
公开(公告)号：WO2009040104A1
公开(公告)日：2009-04-02
申请号：PCT/EP2008/008079
申请日：2008-09-24
申请人： EASTMAN KODAK COMPANY , PIESTER, Oliver , BAUMANN, Harald , FIEBAG, Ulrich , STREHMEL, Bernd , TONDOCK, Uwe , WATKISS, Phil
发明人： PIESTER, Oliver , BAUMANN, Harald , FIEBAG, Ulrich , STREHMEL, Bernd , TONDOCK, Uwe , WATKISS, Phil
IPC分类号： G03F7/32 , B41C1/10
CPC分类号： G03F7/322
摘要： Method for producing an imaged lithographic printing plate comprising the step of developing an imagewise exposed negative working precursor with a developer comprising an alkylene oxide derivative of formula (A), wherein R 1 is a linear or branched C 1 to C 6 alkyl group or H, (n + m) is an integer from 2 to 30, and R 2 R 3 R 4 and R 5 are each independently selected from H, methyl and ethyl, with the proviso that at least one of R 2 and R 3 is not H, and with the further proviso that at least one of R 4 and R 5 is not H.
摘要翻译：一种成像平版印刷版的制造方法，其特征在于，包括用含有式（A）的烯化氧衍生物的显色剂显影成像曝光的负性前体的步骤，其中R1是直链或支链C1至C6烷基或H（n + m）是2至30的整数，并且R 2 R 3 R 4和R 5各自独立地选自H，甲基和乙基，条件是R 2和R 3中的至少一个不是H，条件是在 R4和R5中的至少一个不是H.

19. 发明申请

WO2006077048A2 MATERIAL FOR THE TREATMENT OF LITHOGRAPHIC SUBSTRATES ANS LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：用于光刻胶基板光刻印版的处理材料
公开(公告)号：WO2006077048A2
公开(公告)日：2006-07-27
申请号：PCT/EP2006/000239
申请日：2006-01-12
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , STREHMEL, Bernd , FIEBAG, Ulrich , VON GYLDENFELDT, Friederike , EBHARDT, Tanja , DALLMANN, Ulrike , FRANK, Dietmar
发明人： BAUMANN, Harald , STREHMEL, Bernd , FIEBAG, Ulrich , VON GYLDENFELDT, Friederike , EBHARDT, Tanja , DALLMANN, Ulrike , FRANK, Dietmar
IPC分类号： B41N3/00 , B41C1/10 , C08J5/18
CPC分类号： C08G77/30 , B41N1/083 , B41N1/086 , B41N1/14 , B41N3/038 , B41N3/08 , C08G77/395 , C08K5/5406 , Y10S430/145
摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
摘要翻译：（a）通式（I）和（b）的第一有机硅化合物反应而得到的膦基取代的硅氧烷适合作为平版印刷底材中的夹层材料和后处理显影的平版印刷版，通式（II）的第二有机硅化合物。

20. 发明申请

WO2006028440A1 INTERLAYER FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：层间印刷板中间层
公开(公告)号：WO2006028440A1
公开(公告)日：2006-03-16
申请号：PCT/US2004/028341
申请日：2004-09-01
申请人： KODAK POLYCHROME GRAPHICS LLC , STREHMEL, Bernd , BAUMANN, Harald , HAYAKAWA, Eiji , HAYASHI, Koji , HUANG, Jianbing , SAKURAI, Hideo , SARAIYA, Shashikant , PIETSCH, Detlef
发明人： STREHMEL, Bernd , BAUMANN, Harald , HAYAKAWA, Eiji , HAYASHI, Koji , HUANG, Jianbing , SAKURAI, Hideo , SARAIYA, Shashikant , PIETSCH, Detlef
IPC分类号： G03F7/11
CPC分类号： G03F7/11 , B41N1/086 , B41N1/14 , B41N3/036 , Y10T428/24802 , Y10T428/273 , Y10T428/31515 , Y10T428/31935
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) an interlayer applied onto the aluminum oxide layer comprising a hydrophilic polymer comprising structural units derived from the following compounds: (a1) at least one compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (a2) at least one monomer capable of copolymerizing with the free-radical polymerizable structural unit of (a1) and furthermore comprising at least one acidic functional group with pKs
摘要翻译：平版印刷基材包括（a）尺寸稳定的板状或箔状载体，（b）设置在载体（a）的至少一侧的氧化铝层，和（c）施加到氧化铝层上的中间层，包含衍生自以下化合物的结构单元的亲水性聚合物：（a1）至少一种包含聚环氧烷链和至少一个可自由基聚合的结构单元的化合物，和（a2）至少一种能够与（a1）的自由基可聚合结构单元，还包含至少一个pK <5的酸性官能团，其中酸性官能团可以游离酸基团或盐形式存在。

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