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1. 发明申请

WO2006028440A1 INTERLAYER FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：层间印刷板中间层
公开(公告)号：WO2006028440A1
公开(公告)日：2006-03-16
申请号：PCT/US2004/028341
申请日：2004-09-01
申请人： KODAK POLYCHROME GRAPHICS LLC , STREHMEL, Bernd , BAUMANN, Harald , HAYAKAWA, Eiji , HAYASHI, Koji , HUANG, Jianbing , SAKURAI, Hideo , SARAIYA, Shashikant , PIETSCH, Detlef
发明人： STREHMEL, Bernd , BAUMANN, Harald , HAYAKAWA, Eiji , HAYASHI, Koji , HUANG, Jianbing , SAKURAI, Hideo , SARAIYA, Shashikant , PIETSCH, Detlef
IPC分类号： G03F7/11
CPC分类号： G03F7/11 , B41N1/086 , B41N1/14 , B41N3/036 , Y10T428/24802 , Y10T428/273 , Y10T428/31515 , Y10T428/31935
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) an interlayer applied onto the aluminum oxide layer comprising a hydrophilic polymer comprising structural units derived from the following compounds: (a1) at least one compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (a2) at least one monomer capable of copolymerizing with the free-radical polymerizable structural unit of (a1) and furthermore comprising at least one acidic functional group with pKs
摘要翻译：平版印刷基材包括（a）尺寸稳定的板状或箔状载体，（b）设置在载体（a）的至少一侧的氧化铝层，和（c）施加到氧化铝层上的中间层，包含衍生自以下化合物的结构单元的亲水性聚合物：（a1）至少一种包含聚环氧烷链和至少一个可自由基聚合的结构单元的化合物，和（a2）至少一种能够与（a1）的自由基可聚合结构单元，还包含至少一个pK <5的酸性官能团，其中酸性官能团可以游离酸基团或盐形式存在。

2. 发明申请

WO2007009580A2 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：光刻胶组合物适用于平版印刷板
公开(公告)号：WO2007009580A2
公开(公告)日：2007-01-25
申请号：PCT/EP2006/006462
申请日：2006-07-03
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
发明人： BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X 1 , X 2 and X 3 are independently selected from straight-chain or cyclic C 4 -C 12 alkylene and C 6 -C 10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R 1 , R 2 and R 3 are independently selected from (II) and (III) with the proviso that (1) n = 0 in at least one of the groups R 1 , R 2 and R 3 , and (2) n > 2 in at least one of the groups R 1 , R 2 and R 3 , and (3) at least one group R 6 is different from H in formula (III).
摘要翻译：辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

3. 发明申请

WO2006026230A1 PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE 审中-公开
标题翻译：生产平版印刷版的方法
公开(公告)号：WO2006026230A1
公开(公告)日：2006-03-09
申请号：PCT/US2005/029800
申请日：2005-08-23
申请人： KODAK POLYCHROME GRAPHICS, GMBH , STREHMEL, Bernd , BAUMANN, Harald , FIEBAG, Ulrich , EBHARDT, Tanja , PIETSCH, Detlef
发明人： STREHMEL, Bernd , BAUMANN, Harald , FIEBAG, Ulrich , EBHARDT, Tanja , PIETSCH, Detlef
IPC分类号： B41N3/08
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pK s
摘要翻译：用于后成像平版印刷版的后处理的方法，包括（a）提供平版印刷版，所述平版印刷版包括在平版印刷基板上的图像区域和非图像区域; （b）使步骤（a）的平版印刷版与包含亲水性聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个无结构的结构单元的化合物（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个酸性官能团与pK

4. 发明申请

WO2006053689A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS 审中-公开
标题翻译：具有低分子或聚合物敏感剂的平版印刷机前驱体（LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC或POLYMERIC SENSITIZERS）
公开(公告)号：WO2006053689A1
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012136
申请日：2005-11-11
申请人： KODAK POLYCHROME GRAPHICS GMBH , STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
发明人： STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
IPC分类号： G03F7/031 , G03F7/029
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π 1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R 1 and R 2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group -NR 3 R 4 and a group -OR 5 , each R 3 , R 4 and R 5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译：该平版印刷版前体包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物。

5. 发明申请

WO2004074930A2 RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
标题翻译：包含氧唑衍生物和可成像元素的辐射敏感组合物
公开(公告)号：WO2004074930A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/001706
申请日：2004-02-20
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , FLUGEL, Michael
发明人： BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , FLUGEL, Michael
IPC分类号： G03F
CPC分类号： G03F7/029 , G03F7/031
摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX 3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R 1 , R 2 and R 3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group -NR 4 R 5 and a group - OR6 , wherein R 4 and R 5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R 6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.
摘要翻译：辐射敏感元件包括：（a）一种或多种类型的单体，每种单体各自包含可自由基聚合的至少一个烯键式不饱和基团，（b）至少一种敏化剂，（c）至少一种能形成游离基的共引发剂自由基与敏化剂（b）一起并选自以下类别的化合物：金属茂; 具有一至三个CX 3基团的1,3,5-三嗪衍生物，其中X表示氯或溴; 过氧化物; hexaarylbiimidazoles; 肟醚肟酯 N-芳基甘氨酸及其衍生物; 硫醇化合物; 具有至少2个羧基的N-芳基，S-芳基和O-芳基多元羧酸，其中至少一个与芳基单元的N，S或O原子键合; alkyltriarylborates; 苯偶姻醚; 苯偶姻酯; trihalogenomethylarylsulfones; 胺; N，N-二烷基氨基苯甲酸酯; 芳香族磺酰卤; trihalogenomethylsulfones; 酰亚胺; diazosulfonates; 9,10-二氢蒽衍生物; α-羟基和α-氨基苯乙酮; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分，其特征在于所述至少一种敏化剂是式（I），其中每个R 1，R 2和R 3独立地选自卤素原子，任选取代的烷基，任选取代的芳基，其也可以稠合，任选地取代的芳烷基，基团-NR 4 R 5和基团-OR 6，其中R 4和R 5独立地选自氢原子，烷基，芳基或R 1烷基，R 6是烷基，芳基或芳烷基或氢原子，k，m和n分别为0或1〜5的整数。

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