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11. 发明申请

WO2013104499A1 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物和方法用于LITHOGRAPHY
公开(公告)号：WO2013104499A1
公开(公告)日：2013-07-18
申请号：PCT/EP2012/075989
申请日：2012-12-18
申请人： ASML NETHERLANDS B.V.
发明人： BRIZARD, Aurelie , KOOLE, Roelof , PEETERS, Emiel
IPC分类号： B82Y30/00 , B81C1/00
CPC分类号： B05D3/107 , B05D1/28 , B05D1/60 , B05D3/007 , B82Y40/00 , C08L53/00 , G03F7/0002
摘要： A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.
摘要翻译：公开了一种形成定向以形成交替畴的有序阵列的自组装嵌段聚合物层的方法。该方法包括在衬底上提供一层可自组装的嵌段共聚物，并在引导层的自组装形成畴的有序阵列之前，在层的外表面上沉积第一表面活性剂。第一表面活性剂具有疏水性尾巴和亲水性头基，并且用于降低嵌段共聚物层的外表面处的界面能，以促进嵌段共聚物聚合物组装成具有交替域的有序阵列。

12. 发明申请

WO2011128120A1 METHOD FOR PROVIDING AN ORDERED LAYER OF SELF-ASSEMBLABLE POLYMER FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：用于提供自组装聚合物的订购层的方法用于LITHOGRAPHY
公开(公告)号：WO2011128120A1
公开(公告)日：2011-10-20
申请号：PCT/EP2011/050668
申请日：2011-01-19
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
发明人： PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography.
摘要翻译：在衬底的表面提供有序聚合物层的方法包括将可自组装的聚合物层直接沉积在基底上的底漆层上，以提供可自组装的聚合物层和底漆层之间的界面，以及处理自身可以将聚合物层自组装成有序聚合物层，例如在界面处具有第一和第二域类型的嵌段共聚物。响应于在自组装聚合物层的自组装期间在界面处的自组装聚合物中存在相应的畴型，引物层适于改善其在界面处对每种畴型的化学亲和力有序聚合物层。这可能导致有序聚合物层的缺陷水平和/或改善的持续长度的降低。该方法可用于形成用于器件光刻的抗蚀剂层。

13. 发明申请

WO2014139793A1 METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
标题翻译：通过嵌段共聚物自组装提供基板上的刻蚀特征的方法
公开(公告)号：WO2014139793A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/053692
申请日：2014-02-26
申请人： ASML NETHERLANDS B.V.
发明人： WUISTER, Sander , PEETERS, Emiel
IPC分类号： H01L21/027 , B81C1/00
CPC分类号： H01L21/31058 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , H01L21/0271 , H01L21/0274 , H01L21/0337 , H01L21/76802
摘要： Causing a self-assemblable block copolymer (BCP) having first and second blocks to migrate from a region surrounding a lithography recess of the substrate and a dummy recess on the substrate to within the lithography recess and the dummy recess, causing the BCP to self-assemble into an ordered layer within the lithography recess, the layer having a first block domain and a second block domain, and selectively removing the first domain to form a lithography feature having the second domain within the lithography recess, wherein a width of the dummy recess is smaller than the minimum width required by the BCP to self-assemble, the dummy recess is within the region of the substrate surrounding the lithography recess from which the BCP is caused to migrate, and the width between portions of a side-wall of the lithography recess is greater than the width between portions of a side-wall of the dummy recess.
摘要翻译：引起具有第一和第二嵌段的自组装嵌段共聚物（BCP）从基板的光刻凹槽周围的区域和基板上的虚设凹槽迁移到光刻凹槽和虚设凹槽内，使BCP自对准，组装成光刻凹槽内的有序层，该层具有第一块区域和第二块区域，并且选择性地去除第一区域以形成在光刻凹槽内具有第二区域的光刻特征，其中虚设凹槽小于BCP自组装所需的最小宽度，虚拟凹槽位于围绕光刻凹槽的基底的区域内，BCP从其移动，并且侧壁的部分之间的宽度光刻凹槽大于虚拟凹槽的侧壁的部分之间的宽度。

14. 发明申请

WO2013160027A1 METHODS AND COMPOSITIONS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
标题翻译：通过块状共聚物自组装提供基板上的间距平面特征的方法和组合
公开(公告)号：WO2013160027A1
公开(公告)日：2013-10-31
申请号：PCT/EP2013/055689
申请日：2013-03-19
申请人： ASML NETHERLANDS B.V.
发明人： WUISTER, Sander , PEETERS, Emiel
IPC分类号： G03F7/00
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C08L53/00 , G03F7/0002
摘要： A method is disclosed to form a row of mutually spaced elongate lithography features along an axis on a substrate, for instance for use as contact electrodes for a NAND device. The method involves directing alignment of self-assemblable block copolymer (BCP) composition in a trench in a resist layer on the substrate, having the substrate as base, with an epitaxy feature in the trench to cause the ordered BCP layer to have elongate domains stretching across the trench width, substantially parallel to each other and to the substrate. The ordered BCP layer is then used as a resist to pattern the substrate. A BCP composition adapted to assemble with spaced discontinuous elongate elliptical domains is disclosed. The method may allow for sub-resolution contact arrays to be formed using UV lithography.
摘要翻译：公开了一种形成沿衬底上的轴线的相互间隔的细长光刻特征行的方法，例如用作NAND器件的接触电极。该方法包括将自组装嵌段共聚物（BCP）组合物定向在衬底上的抗蚀剂层中的沟槽中，其具有衬底作为基底，在沟槽中具有外延特征，以使有序的BCP层具有伸长的畴伸长横跨沟槽宽度，基本上彼此平行并且与基底平行。然后将有序的BCP层用作抗蚀剂以对基底进行图案化。公开了适于与间隔不连续的细长椭圆域组装的BCP组合物。该方法可以允许使用UV光刻形成亚分辨率接触阵列。

15. 发明申请

WO2012175342A2 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物和方法用于光刻
公开(公告)号：WO2012175342A2
公开(公告)日：2012-12-27
申请号：PCT/EP2012/060783
申请日：2012-06-07
申请人： ASML NETHERLANDS B.V. , BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
发明人： BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

16. 发明申请

WO2012025316A1 IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM 审中-公开
标题翻译：印刷地图法和可变介质
公开(公告)号：WO2012025316A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/062553
申请日：2011-07-21
申请人： ASML NETHERLANDS B.V. , VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
发明人： VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译：公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是随后用作图案化基板的抗蚀剂。还公开了适用于该方法的压印光刻的压印介质。

17. 发明申请

WO2011104045A1 METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：用于处理自组装聚合物层的方法和装置，用于在LITHOGRAPHY中使用
公开(公告)号：WO2011104045A1
公开(公告)日：2011-09-01
申请号：PCT/EP2011/050126
申请日：2011-01-06
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim , KOOLE, Roelof , WUISTER, Sander , PEETERS, Emiel
发明人： BANINE, Vadim , KOOLE, Roelof , WUISTER, Sander , PEETERS, Emiel
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译：公开了在衬底表面处理包含可自组装聚合物的层。在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。

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