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    • 12. 发明申请
    • RADIO FREQUENCY MEMS SWITCH
    • 无线电频率MEMS开关
    • WO2009057988A2
    • 2009-05-07
    • PCT/MY2008000122
    • 2008-10-22
    • MIMOS BERHADSULAIMAN SURAYASYONO MOHD ISMAHADI
    • SULAIMAN SURAYASYONO MOHD ISMAHADI
    • H01L29/00H01H59/00
    • H01H1/0036H01G5/18H01H59/0009
    • There is disclosed a method of fabricating radio frequency surface microelectromechanical (MEMS) switch. The method utilizes four masks, each configured through photolithography process at different stages that resulted in substantially planar silicon dioxide, critical in providing better mechanical performance of the RF MEMS switch. The steps include, among others, depositing silicon on glass liquid to fill small holes for a smooth silicon oxide surface, employing back etch process and performing wet etching by using chemical solution called Pad Etch. An RF MEMS switch that comprise of a lower electrode (30) formed on the surface of a silicon substrate (31), an aluminum membrane (32) suspended over the electrode and a dielectric layer (33) covering the lower electrode fabricated through the process is also disclosed.
    • 公开了一种制造射频表面微机电(MEMS)开关的方法。 该方法利用四个掩模,每个掩模均通过不同阶段的光刻工艺配置,导致基本平面的二氧化硅,这对于提供RF MEMS开关的更好的机械性能至关重要。 其中的步骤包括在玻璃液体上沉积硅以填充平滑氧化硅表面的小孔,采用背面蚀刻工艺并通过使用称为刮板蚀刻的化学溶液进行湿法蚀刻。 一种RF MEMS开关,包括形成在硅衬底(31)表面上的下电极(30),悬置在电极上的铝膜(32)和覆盖通过该工艺制造的下电极的介电层(33) 也被披露。
    • 14. 发明申请
    • CANTILEVER MICROVALVE STRUCTURE AND METHOD OF FABRICATING SAME
    • CANTILEVER微型结构及其制造方法
    • WO2011008070A1
    • 2011-01-20
    • PCT/MY2010/000117
    • 2010-07-12
    • MIMOS BERHADLEE, Hing WahSYONO, Mohd, IsmahadiBIEN, Daniel, Chia Seng
    • LEE, Hing WahSYONO, Mohd, IsmahadiBIEN, Daniel, Chia Seng
    • B81B5/00B01L99/00B81B3/00F16K99/00H01L21/00
    • F16K99/0001F16K99/0013F16K99/0057F16K2099/008
    • A passive microvalve actuated by the deformation of the microvalve structure (20) (such as bending and rotation) due to fluid pressure exerted is disclosed. The deformation of the valve structure (20) directs fluid flow to a desired pathway and reduce occurrence of dead volume. A basic embodiment of our microvalve is comprised in a semiconductor-fabricated body (10) regulating fluid flow between at least a first channel (12) and a second channel (14) in a passive manner, with the microvalve fabricated as an integral cantilever structure (20) comprising a stem (22) with base (24) rigidly affixed to a substrate (15); and at least a lever arm (26) extending at about tangentially from distal end of the stem (22), forming an elbow (28) thereat. The cantilever structure (20) may comprise of any one of L-shape or T-shape structure formed via MEMS processes, particularly surface micromachining (SMM) processes so that our proposed valve may be fabricated cost-effectively, robust and easily integrated into semiconductor devices.
    • 公开了由于施加的流体压力而由微型阀结构(20)的变形(例如弯曲和旋转)致动的被动微型阀。 阀门结构(20)的变形将流体流引导到期望的通道并减少死体积的发生。 我们的微型阀的基本实施例包括在以被动方式调节至少第一通道(12)和第二通道(14)之间的流体流动的半导体制造体(10)中,微型阀被制造为整体式悬臂结构 (20)包括具有刚性地固定到基底(15)的基部(24)的杆(22); 以及至少一个杠杆臂(26),其在所述杆(22)的远端的大致切线处延伸,在其上形成肘部(28)。 悬臂结构(20)可以包括通过MEMS工艺,特别是表面微加工(SMM)工艺形成的L形或T形结构中的任何一个,使得我们提出的阀可以经济有效地,鲁棒地并且容易地集成到半导体中 设备。
    • 18. 发明申请
    • A VERTICAL THIN POLYSILICON SUBSTRATE ISFET
    • 垂直薄多晶硅衬底ISFET
    • WO2009045091A2
    • 2009-04-09
    • PCT/MY2008/000116
    • 2008-09-29
    • MIMOS BERHADSYONO, Mohd, IsmahadiABDUL RANI, Rozina
    • SYONO, Mohd, IsmahadiABDUL RANI, Rozina
    • G01N27/333G01N27/30
    • G01N27/4148
    • The present invention generally relates to a vertical thin polysilicon substrate ISFET for the measurement of hydrogen ions (pH) and other ion activity in solution characterized in that wherein the present invention comprises of a method of making polysilicon vertical ISFET which is fully CMOS compatible and wherein the substrate is the polysilicon which is vertically sandwiched between a source and a drain and wherein a very high drive current is possible to achieve due to the thin polysilicon material and wherein the sandwiched structure is designed to ensure excellent noise isolation and wherein the gate lies on the same surface level as the drain and hence a very large area for better gate sensitivity is possible.
    • 本发明总体上涉及用于测量溶液中的氢离子(pH)和其它离子活性的垂直薄多晶硅基底ISFET,其特征在于,其中本发明包括制造多晶硅垂直 ISFET,其完全CMOS兼容,并且其中衬底是垂直夹在源极和漏极之间的多晶硅,并且其中由于薄多晶硅材料而可以实现非常高的驱动电流,并且其中夹层结构被设计为确保优异 噪声隔离,并且其中栅极位于与漏极相同的表面水平上,因此为了更好的栅极灵敏度而可以有非常大的面积。