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1. 发明申请

WO2011057906A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：WO2011057906A1
公开(公告)日：2011-05-19
申请号：PCT/EP2010/066525
申请日：2010-10-29
申请人： CARL ZEISS SMT GMBH , LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
发明人： LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
IPC分类号： G02B17/06 , G02B5/00 , G02B27/00 , G03F7/20
CPC分类号： G02B17/0657 , G02B5/005 , G02B27/0018 , G03F7/70233 , G03F7/70275
摘要： An imaging optics (7) has a plurality of mirrors (M3; M5, M6, M8) which reflect imaging light (3) and thus image an object field in an object plane into an image field in an image plane. A mirror body (22) of at least one of the mirrors (M8) has a through-opening (21) for the imaging light (3) to pass through. The through-opening (21) has an internal region (23) of a smallest opening width in the mirror body (22). The through-opening (21) expands from the internal region (23) towards both edge regions (24, 25) of the mirror body (22). As a result, an imaging optics is obtained where a disturbing influence of unused light portions is reduced or eliminated completely.
摘要翻译：成像光学器件（7）具有反射成像光（3）的多个反射镜（M3; M5，M6，M8），从而将物平面中的物场映像成图像平面中的图像场。至少一个反射镜（M8）的镜体（22）具有用于成像光（3）穿过的通孔（21）。通孔（21）在镜体（22）中具有最小开口宽度的内部区域（23）。通孔（21）从内部区域（23）向镜体（22）的两个边缘区域（24,25）扩张。结果，获得了其中完全减少或消除未使用的光部分的干扰影响的成像光学元件。

2. 发明申请

WO2012025365A1 IMAGING OPTICAL SYSTEM 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012025365A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/063663
申请日：2011-08-09
申请人： CARL ZEISS SMT GMBH , MÜLLER, Ralf , MANN, Hans-Jürgen
发明人： MÜLLER, Ralf , MANN, Hans-Jürgen
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G03F7/70233 , G03F7/70275
摘要： An imaging optical system (12) for EUV projection lithography has a plurality of mirrors (M1-M4) for imaging an object field (4) in an object plane (5) in an image field (13) in an image plane (14). An image-side numerical aperture of the imaging optical system is at least 0.3. The imaging optical system has a pupil obscuration, which is greater than 0.40. The imaging optical system has an image filed size of at least 1 mm x 10 mm. An imaging optical system results, with which the imaging of an object is possible with high imaging quality.
摘要翻译：用于EUV投影光刻的成像光学系统（12）具有用于对图像平面（14）中的图像场（13）中的物体平面（5）中的物体场（4）进行成像的多个反射镜（M1-M4）。成像光学系统的图像侧数值孔径至少为0.3。成像光学系统具有大于0.40的瞳孔遮蔽。成像光学系统具有至少1mm×10mm的图像尺寸。结果，成像光学系统可以以高成像质量对物体进行成像。

3. 发明申请

WO2012097833A1 METHOD OF OPERATING A PROJECTION EXPOSURE TOOL 审中-公开
标题翻译：投影曝光工具的操作方法
公开(公告)号：WO2012097833A1
公开(公告)日：2012-07-26
申请号：PCT/EP2011/000225
申请日：2011-01-20
申请人： CARL ZEISS SMT GMBH , CONRADI, Olaf , TOTZECK, Michael , LÖRING, Ulrich , JÜRGENS, Dirk , MÜLLER, Ralf , WALD, Christian
发明人： CONRADI, Olaf , TOTZECK, Michael , LÖRING, Ulrich , JÜRGENS, Dirk , MÜLLER, Ralf , WALD, Christian
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70141 , G03F7/70483 , G03F7/70516 , G03F7/708
摘要： A method of operating a projection exposure tool (10) for microlithography is provided. The projection exposure tool (10) has a projection objective (26) for imaging object structures on a mask (20) into an image plane (28) using electromagnetic radiation (13, 13a, 13b), during which imaging the electromagnetic radiation (13b) causes a change in optical properties of the projection objective (26). The method comprises the steps of: providing the layout of the object structures on the mask (20) to be imaged and classifying the object structures according to their type of structure, calculating the change in the optical properties of the projection objective (26) effected during the imaging process on the basis of the classification of the object structures, and using the projection exposure tool (10) for imaging the object structures into the image plane (28), wherein the imaging behavior of the projection exposure tool (10) is adjusted on the basis of the calculated change of the optical properties in order to at least partly compensate for the change of the optical properties of the projection objective (26) caused by the electromagnetic radiation (13, 13a, 13b) during the imaging process.
摘要翻译：提供了一种操作用于微光刻的投影曝光工具（10）的方法。投影曝光工具（10）具有用于使用电磁辐射（13,13a，13b）将掩模（20）上的物体结构成像到图像平面（28）中的投影物镜（26），在此期间对电磁辐射（13b）进行成像）导致投影物镜（26）的光学特性的变化。该方法包括以下步骤：在要成像的掩模（20）上提供对象结构的布局，并根据其结构类型对对象结构进行分类，计算投影物镜（26）的光学特性的变化在所述成像处理期间，基于所述物体结构的分类，以及使用所述投影曝光工具（10）将所述物体结构成像到所述图像平面（28）中，其中所述投影曝光工具（10）的成像特性为基于所计算的光学特性的变化进行调整，以至少部分地补偿由成像过程中的电磁辐射（13,13a，13b）引起的投影物镜（26）的光学特性的变化。

4. 发明申请

WO2011051069A1 CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
标题翻译：包含反射光学元件和测量装置的目标投影目标
公开(公告)号：WO2011051069A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/064380
申请日：2010-09-28
申请人： CARL ZEISS SMT GMBH , BLEIDISTEL, Sascha , GRUNER, Toralf , ZACZEK, Christoph , MÜLLER, Ralf
发明人： BLEIDISTEL, Sascha , GRUNER, Toralf , ZACZEK, Christoph , MÜLLER, Ralf
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70258 , G02B13/143 , G02B17/0856 , G02B17/0892 , G03F7/70225 , G03F7/706
摘要： The invention relates to a catadioptric projection objective for imaging an object field onto an image field by means of an imaging radiation. In this case, the projection objective comprises at least one reflective optical component and a measuring device, wherein the reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. While the rεfleeted, first part of the imaging radiation at least partly contributes to the imaging of the object field, the transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and a monitoring of said imaging radiation with the aid of the measuring
摘要翻译：本发明涉及一种用于通过成像辐射将对象场成像到图像场上的反射折射投影物镜。在这种情况下，投影物镜包括至少一个反射光学部件和测量装置，其中反射光学部件在投影物镜的操作过程中反射成像辐射的第一部分并透射成像辐射的第二部分。虽然反射的，成像辐射的第一部分至少部分地有助于对象场的成像，但是成像辐射的透射的第二部分至少部分地被馈送到测量装置。这允许在图像场的位置处的感光层与成像辐射的同时曝光并且借助于测量来监测所述成像辐射

5. 发明申请

WO2016012425A9 ABBILDENDE OPTIK FÜR EIN METROLOGIESYSTEM ZUR UNTERSUCHUNG EINER LITHOGRAPHIEMASKE 审中-公开
公开(公告)号：WO2016012425A9
公开(公告)日：2016-01-28
申请号：PCT/EP2015/066604
申请日：2015-07-21
申请人： CARL ZEISS SMT GMBH
发明人： RUOFF, Johannes , MÜLLER, Ralf , BEDER, Susanne , MATEJKA, Ulrich , MANN, Hans-Jürgen , NEUMANN, Jens Timo
IPC分类号： G02B17/08 , G02B5/00
摘要： Eine abbildende Optik (40) dient innerhalb eines Metrologiesystems zur Untersuchung einer Lithographiemaske. Die Lithographiemaske ist in einem Objektfeld (3) der abbildenden Optik anordenbar. Das Objektfeld (3) ist durch zwei aufeinander senkrecht stehende Objektfeld-Koordinaten (x, y) aufgespannt. Die abbildende Optik (40) hat eine Aperturblende (42), deren Aspektverhältnis in Richtung der beiden Objektfeld-Koordinaten sich von 1 unterscheidet. Es resultiert eine abbildende Optik, die für die Untersuchung von Lithographiemasken, die für die Projektionsbelichtung mit anamorphotischer Projektionsoptik ausgelegt sind, genutzt werden kann.

6. 发明申请

WO2013174686A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：成像光学系统和投影曝光安装
公开(公告)号：WO2013174686A1
公开(公告)日：2013-11-28
申请号：PCT/EP2013/060004
申请日：2013-05-15
申请人： CARL ZEISS SMT GMBH
发明人： EPPLE, Alexander , MÜLLER, Ralf , ROSTALSKI, Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/0663 , G03F7/70233 , G03F7/7025 , G03F7/70308
摘要： An imaging optical unit serves for imaging an object field in an image field. The imaging optical unit has an obscured pupil (21). This pupil (21) has a center (Z), through which a chief ray of a central field point passes. The imaging optical unit furthermore has a plurality of imaging optical components. A gravity center (SP) of a contiguous pupil obscuration region (18) of the imaging optical unit lies decentrally in the pupil (21) of the imaging optical unit. According to a further aspect, the imaging optical unit is embodied in a catoptric manner, with a last mirror with a passage opening for the passage of imaging light. An edge region of a reflection surface of the last mirror, which edge region surrounds the passage opening, is used contiguously for reflecting the imaging light. A penultimate mirror in the imaging beam path is embodied with a reflection surface which is used in a closed fashion, i.e. without an opening. The passage opening is arranged in such a way that this generates a pupil obscuration region (18), which does not lie centrally in the pupil (21) of the imaging optical unit. Such imaging optical units result in a well corrected imageable field with, at the same time, a high imaging light throughput.
摘要翻译：成像光学单元用于对图像场中的物体场进行成像。成像光学单元具有遮蔽的瞳孔（21）。该光瞳（21）具有中心（Z），中心场点的主射线穿过该中心（Z）。成像光学单元还具有多个成像光学部件。成像光学单元的连续瞳孔遮蔽区域（18）的重心（SP）位于成像光学单元的瞳孔（21）中的分散的位置。根据另一方面，成像光学单元以反射方式实现，具有用于成像光通过的通道开口的最后一个反射镜。最后一个反射镜的反射面的边缘区域，该边缘区域围绕通道开口被连续地用于反射成像光。成像光束路径中的倒数第二个反射镜具有以闭合方式即没有开口使用的反射表面。通道开口以这样的方式布置，使得其产生不位于成像光学单元的光瞳（21）中央的光瞳遮蔽区域（18）。这种成像光学单元导致良好校正的可成像场，同时具有高成像光通量。

7. 发明申请

WO2016078819A1 ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY 审中-公开
标题翻译： EUV投影光刻照明光学单元
公开(公告)号：WO2016078819A1
公开(公告)日：2016-05-26
申请号：PCT/EP2015/072985
申请日：2015-10-06
申请人： CARL ZEISS SMT GMBH
发明人： ENDRES, Martin , MÜLLER, Ralf , BIELING, Stig
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70116 , G03F7/70716
摘要： An illumination optical unit (7) for EUV projection lithography serves to illuminate an object field (8) with illumination light (3). An object (19) to be imaged, which is displaceable in an object displacement direction (y), is arrangeable in the object field (8). A transmission optical unit (14) images field facets of a field facet mirror (5) in a manner superposed on one another into the object field (8) by way of illumination channels, which each have assigned to them one of the field facets and one pupil facet of a pupil facet mirror (10). The superposition optical unit (14) has at least two mirrors (12, 13) for grazing incidence, which are arranged downstream of the pupil facet mirror (10). The mirrors (12, 13) for grazing incidence produce an illumination angle bandwidth of an illumination light overall beam (3G), composed of the illumination channels, in the object field (8), which bandwith is smaller for a plane of incidence (yz) parallel to the object displacement direction (y) than for a plane (xz) perpendicular thereto. What emerges is an illumination optical unit, by means of which a projection optical unit can be adapted to a configuration of an EUV light source for the illumination light.
摘要翻译：用于EUV投影光刻的照明光学单元（7）用于利用照明光（3）照射物场（8）。可以在物体位移方向（y）上移动的要成像的物体（19）可布置在物场（8）中。传输光学单元（14）通过照明通道将场景分面镜（5）的场面以彼此重叠的方式映射到物场（8）中，每个照明通道分配给它们一个场面和瞳孔面镜（10）的一个瞳孔面。叠加光学单元（14）具有至少两个用于放映入射的反射镜（12,13），它们设置在光瞳小面反射镜（10）的下游。用于放映入射的反射镜（12,13）在物场（8）中产生由照明通道组成的照明光总光束（3G）的照射角度带宽，该带宽对于入射平面（yz）较小）平行于物体位移方向（y）比垂直于其的平面（xz）。出现的是照明光学单元，投影光学单元可以适用于用于照明光的EUV光源的配置。

8. 发明申请

WO2015078776A1 BELEUCHTUNGSSYSTEM FÜR DIE EUV-PROJEKTIONSLITHOGRAPHIE 审中-公开
标题翻译：照明系统，极紫外投影光刻
公开(公告)号：WO2015078776A1
公开(公告)日：2015-06-04
申请号：PCT/EP2014/075257
申请日：2014-11-21
申请人： CARL ZEISS SMT GMBH
发明人： PATRA, Michael , MÜLLER, Ralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70183 , G03F7/70008 , G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70991
摘要： Ein Beleuchtungssystem für die EUV-Projektionslithographie hat eine Strahlformungsoptik (6) zur Erzeugung eines EUV-Sammel-Ausgabestrahls (7) aus einem EUV-Rohstrahl (4) einer synchrotronstrahlungsbasierten Lichtquelle (2). Eine Auskoppeloptik (8) dient zur Erzeugung mehrerer EUV-Einzel-Ausgabestrahlen (9 i ) aus dem EUV-Sammel-Ausgabestrahl (7). Jeweils eine Strahlführungsoptik (10) dient zur Führung des jeweiligen EUV-Einzel-Ausgabestrahls (9 i ) hin zu einem Objektfeld (11), in dem eine Lithographiemaske (12) anordenbar ist. Es resultiert ein Beleuchtungssystem mit einer möglichst verlustfreien und gleichzeitig flexiblen Führung von EUV-Licht einer synchrotronstrahlungsbasierten Lichtquelle.
摘要翻译：用于EUV投影光刻的照明系统具有光束成形光学装置（6）用于产生EUV收集器输出光束（7）从EUV原始光束（4）基于同步加速器的光源（2）。输出光学系统（8），用来产生来自EUV收集器输出光束（7）的多个EUV单输出光束（9I）。在每一种情况下，一个光束引导装置（10）用于引导相应的EUV单输出光束（9I）朝向，其中光刻掩模（12）布置的物场（11）。结果是具有无损尽可能并且在基于同步加速器的光源的同时柔性的引导EUV光的照明系统。

9. 发明申请

WO2016184560A1 METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：操作微波投影仪的方法
公开(公告)号：WO2016184560A1
公开(公告)日：2016-11-24
申请号：PCT/EP2016/000802
申请日：2016-05-14
申请人： CARL ZEISS SMT GMBH
发明人： ZIMMERMANN, Jörg , NEUMANN, Jens, Timo , SCHLESENER, Frank , MÜLLER, Ralf
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70116 , G02B26/0833 , G03F7/702
摘要： A method of operating a microlithographic projection apparatus comprises the step of providing a mask (16), an illumination system (12) and a projection objective (20) configured to form an image of an object field (14), which is illuminated on the mask (16) in a mask plane, on an image field positioned on a light sensitive surface (22). Edge placement errors are determined at different field points in the image field. The mask (16) is then illuminated with projection light having an improved field dependency of the angular irradiance distribution. The angular irradiance distribution according to the improved field dependency varies over the object field (14) in such a way that the edge placement errors determined in step b) are reduced at the different field points.
摘要翻译：一种操作微光刻投影设备的方法包括提供掩模（16），照明系统（12）和投影物镜（20）的步骤，该物镜被配置为形成物场（14）的图像掩模（16）在掩模平面上，位于光敏表面（22）上的图像场上。在图像字段中的不同场点确定边缘放置误差。然后用具有改进的角度辐照度分布的场依赖性的投影光照射掩模（16）。根据改进的场依赖性的角度辐照度分布以对象场（14）的方式变化，使得在步骤b）中确定的边缘放置误差在不同的场点减小。

10. 发明申请

WO2016078818A1 OPTICAL SUBSYSTEM FOR PROJECTION LITHOGRAPHY AND ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：用于投影光刻的光学子系统用于投影光刻的照相和照明光学单元
公开(公告)号：WO2016078818A1
公开(公告)日：2016-05-26
申请号：PCT/EP2015/072983
申请日：2015-10-06
申请人： CARL ZEISS SMT GMBH
发明人： SCHWAB, Markus , MÜLLER, Ralf
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70116 , G03F7/70716
摘要： An optical subsystem (15) for projection lithography has a projection optical unit (7) for imaging an object field (4), in which an object to be imaged is arrangeable, into an image field (8). The projection optical unit (7) has a plurality of mirrors (Ml to M8) for guiding imaging light (3) from the object field (4) to the image field (8). A pupil (18) of the projection optical unit (7) is arranged in the beam path of the imaging light (3) downstream of the object field (4). An imaging optical subunit (16) images an arrangement plane (17) lying upstream of the object field (4) in the beam path of the imaging light (3) into the pupil plane. The imaging optical subunit (16) is configured in such a way that it only causes grazing deflection of the imaging light (3) in the beam path upstream of the object field (4) and it has a GI mirror (23) as last mirror in the beam path upstream of the object field (4). What emerges is an illumination optical unit, by means of which projection optical units having a pupil lying downstream of the object field in the beam path of the imaging light can be used with a low transmission loss of the illumination or imaging light.
摘要翻译：用于投影光刻的光学子系统（15）具有投影光学单元（7），用于将其中要被成像的物体可配置的物场（4）成像到图像场（8）中。投影光学单元（7）具有用于将成像光（3）从物场（4）引导到图像场（8）的多个反射镜（M1至M8）。投影光学单元（7）的光瞳（18）被布置在物场（4）下游的成像光（3）的光束路径中。成像光学子单元（16）将位于成像光（3）的光束路径中的物场（4）的上游的配置平面（17）成像到光瞳平面中。成像光学子单元16被配置为仅使得成像光（3）在物场（4）上游的光束路径中的放牧偏转，并且其具有作为最后镜的GI反射镜（23）在对象场（4）的上游的光束路径中。出现的是照明光学单元，通过该照明光学单元，可以以较低的照明或成像光的传输损耗来使用具有位于成像光的光束路径中的物场下游的光瞳的投影光学单元。

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