专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2021048082A2 WAFER ALIGNMENT USING MULTI-SCANNING ELECTRON MICROSCOPY 审中-公开
公开(公告)号：WO2021048082A2
公开(公告)日：2021-03-18
申请号：PCT/EP2020/075006
申请日：2020-09-08
申请人： CARL ZEISS SMT GMBH
发明人： SARASWATULA, Jagdish Chandra , NEUMANN, Jens Timo , HÜTHWOHL, Philipp , KORB, Thomas , NAYAK, Raghavendra Hanumantha
IPC分类号： G06T7/00 , G06T7/33 , G06T7/70 , H01J37/00 , H01L23/544
摘要： A method includes controlling a multi-scanning electron microscope, mSEM (32), to capture a first image (601) of a wafer (100) attached to a motorized handling stage (90) while the motorized handling stage (90) is in a first position, the first image (601) comprising at least a part of a notch (201) of the wafer (100); and determining a radial axis (205) of the wafer (100) based on the first image (601); and controlling the motorized handling stage (90) to shift the wafer (100) along the radial axis (205) by half a diameter of the wafer (100), so that the motorized handling stage (90) is in a second position; and controlling the mSEM (32) to capture a second image (602) of the wafer (100) while the motorized handling stage (90) is in the second position, the second image (602) comprising wafer structures (112, 112-1 – 112-4, 113, 261, 262, 272); and determining a reference position (209) of the wafer (100) based on a structure recognition of the wafer structures (112, 112-1 – 112-4, 113, 261, 262, 272) of the second image (602); and registering a wafer coordinate system (192) of the wafer (100) to a stage coordinate system (191) of the motorized handling stage (90) based on the reference position (209) and the radial axis (205).

2. 发明申请

WO2020244795A1 CROSS SECTION IMAGING WITH IMPROVED 3D VOLUME IMAGE RECONSTRUCTION ACCURACY 审中-公开
公开(公告)号：WO2020244795A1
公开(公告)日：2020-12-10
申请号：PCT/EP2020/000101
申请日：2020-05-25
申请人： CARL ZEISS SMT GMBH , CARL ZEISS SMT INC.
发明人： KORB, Thomas , NEUMANN, Jens Timo , FOCA, Eugen , BUXBAUM, Alex , AVISHAI, Amir , LEE, Keumsil , SCHULMEYER, Ingo , KLOCHKOV, Dmitry
IPC分类号： G06T7/33 , G06T7/00 , G01N23/2251 , H01J37/28 , G06T2207/10061 , G06T2207/20164 , G06T2207/30148 , G06T7/0004
摘要： The present invention relates to a three-dimensional circuit pattern inspection technique by cross sectioning of integrated circuits and, more particularly, to a method, computer program product and apparatus for obtaining a 3D volume image of an integrated semiconductor sample. The method employs a feature based alignment of cross section images based on features of an integrated semiconductor sample.

3. 发明申请

WO2016012425A9 ABBILDENDE OPTIK FÜR EIN METROLOGIESYSTEM ZUR UNTERSUCHUNG EINER LITHOGRAPHIEMASKE 审中-公开
公开(公告)号：WO2016012425A9
公开(公告)日：2016-01-28
申请号：PCT/EP2015/066604
申请日：2015-07-21
申请人： CARL ZEISS SMT GMBH
发明人： RUOFF, Johannes , MÜLLER, Ralf , BEDER, Susanne , MATEJKA, Ulrich , MANN, Hans-Jürgen , NEUMANN, Jens Timo
IPC分类号： G02B17/08 , G02B5/00
摘要： Eine abbildende Optik (40) dient innerhalb eines Metrologiesystems zur Untersuchung einer Lithographiemaske. Die Lithographiemaske ist in einem Objektfeld (3) der abbildenden Optik anordenbar. Das Objektfeld (3) ist durch zwei aufeinander senkrecht stehende Objektfeld-Koordinaten (x, y) aufgespannt. Die abbildende Optik (40) hat eine Aperturblende (42), deren Aspektverhältnis in Richtung der beiden Objektfeld-Koordinaten sich von 1 unterscheidet. Es resultiert eine abbildende Optik, die für die Untersuchung von Lithographiemasken, die für die Projektionsbelichtung mit anamorphotischer Projektionsoptik ausgelegt sind, genutzt werden kann.

4. 发明申请

WO2023072557A1 METHOD TO ACQUIRE A 3D IMAGE OF A SAMPLE STRUCTURE 审中-公开
公开(公告)号：WO2023072557A1
公开(公告)日：2023-05-04
申请号：PCT/EP2022/077969
申请日：2022-10-07
申请人： CARL ZEISS SMT GMBH , CARL ZEISS X-RAY MICROSCOPY INC.
发明人： PICHUMANI, Ramani , GRAF VOM HAGEN, Christoph Hilmar , NEUMANN, Jens Timo , RUOFF, Johannes , GREGORICH, Thomas Matthew
IPC分类号： G01N23/046 , G06T11/00
摘要： In a method to acquire a 3D image of a sample structure initially a first raw 2D set of 2D images of a sample structure is acquired at a limited number of raw sample planes. From this first raw 2D set a 3D image of the sample structure being represented by a 3D volumetric image data set is calculated and a measurement parameter is extracted from the 3D volumetric image data set. Such measurement parameter is assigned to the number of 2D image acquisitions recorded during the acquisition step. Then, a further interleaving 2D set of 2D images of the sample structure is required by recording a further number of interleaving 2D image acquisitions at a further number of interleaved sample planes which do not coincide with the previous acquisition sample planes. The steps "calculating," "extracting" and "assigning" are repeated for the further interleaving 2D set. The actual and the last extracted measurement parameters are compared to check whether a convergence criterion is met. If not, the steps "acquiring," "calculating," "extracting," "assigning" and "comparing" are repeated for a further interleaving 2D set including a further number of interleaving 2D image acquisitions at a further number of interleaved sample planes which do not coincide with the previous acquisition sample planes. This is done until the convergence criterion is met or until a given maximum number of 2D image acquisitions is recorded. The measurement parameter and a total number of recorded 2D image acquisitions are output. A projection system used for such method comprises a projection light source, a rotatable sample structure holder and a spatially resolving detector. Alternatively or in addition, such method can be used by a data processing system to acquire virtual tomographic images of a sample. With such method, a sample throughput is improved.

5. 发明申请

WO2023061712A1 METHOD FOR MEASURING A SAMPLE AND MICROSCOPE IMPLEMENTING THE METHOD 审中-公开
公开(公告)号：WO2023061712A1
公开(公告)日：2023-04-20
申请号：PCT/EP2022/076232
申请日：2022-09-21
申请人： CARL ZEISS SMT GMBH
发明人： FOCA, Eugen , AVISHAI, Amir , KLOCHKOV, Dmitry , KORB, Thomas , NEUMANN, Jens Timo , LEE, KeumSil
IPC分类号： G01B11/26
摘要： The present invention relates to a method (200) for measuring a sample (100) with a microscope, the method comprising the steps of: measuring (S210) a tilt (131, 132) of the sample (100), correcting (S220) an orientation of the sample (100) based on the tilt (131, 132), scanning (S230) the sample.

6. 发明申请

WO2022096144A1 TRANSFERRING ALIGNMENT INFORMATION IN 3D TOMOGRAPHY FROM A FIRST SET OF IMAGES TO A SECOND SET OF IMAGES 审中-公开
公开(公告)号：WO2022096144A1
公开(公告)日：2022-05-12
申请号：PCT/EP2021/025402
申请日：2021-10-14
申请人： CARL ZEISS SMT GMBH
发明人： KORB, Thomas , BUXBAUM, Alex , FOCA, Eugen , NEUMANN, Jens Timo , AVISHAI, Amir , KLOCHKOV, Dmitry
IPC分类号： G06T11/00 , G06T7/38 , G06T7/33 , H01J37/22
摘要： The invention is directed to transferring alignment information from a first set of images to a second set of images. A first set of cross- section images taken at times Tai in a first imaging mode is obtained. A second set of cross-section images taken at times Tbj different from Tai in a second imaging mode is obtained. Obtaining the first and second set of images comprises subsequently removing a cross- section surface layer of a sample, and imaging the new cross-section of the sample in the first imaging mode or in the second imaging mode. Switching is performed between the first imaging mode and the second imaging mode during obtaining the first and the second set of cross-section images. Alignment information is transferred from the images of the first set to the second set comprising time- dependent interpolation of the alignment information.

7. 发明申请

WO2022223229A1 SEGMENTATION OR CROSS SECTIONS OF HIGH ASPECT RATIO STRUCTURES 审中-公开
公开(公告)号：WO2022223229A1
公开(公告)日：2022-10-27
申请号：PCT/EP2022/057656
申请日：2022-03-23
申请人： CARL ZEISS SMT GMBH
发明人： KLOCHKOV, Dmitry , NEUMANN, Jens Timo , KORB, Thomas , TÖPPE, Eno , PERSCH, Johannes , SRIKANTHA, Abhilash , FREYTAG, Alexander
IPC分类号： G06T7/00 , G06T7/11 , G06T7/12 , G06T7/149 , G06T7/62
摘要： The present invention relates to identifying ring structures in pillars of high aspect ratio (HAR) structures. For segmentation of rings, a machine learning-logic is used. A two-step training method for the machine learning logic is described.

8. 发明申请

WO2020157249A1 VERARBEITUNG VON BILDDATENSÄTZEN 审中-公开
公开(公告)号：WO2020157249A1
公开(公告)日：2020-08-06
申请号：PCT/EP2020/052380
申请日：2020-01-31
申请人： CARL ZEISS SMT GMBH
发明人： NEUMANN, Jens Timo , SRIKANTHA, Abhilash , WOJEK, Christian , KORB, Thomas
IPC分类号： G06T7/00
摘要： Ein Verfahren umfasst das Erhalten eines Bilddatensatzes (100), der Halbleiter-Bauelemente abbildet. Das Verfahren umfasst auch das Anwenden einer hierarchischen Kachelung (201) auf den Bilddatensatz (100). Dabei weist die Kachelung (201) mehrere Kacheln (211-214, 213-1, 213-2, 213-3, 213-2-1, 214-1-1) auf mehreren Hierarchieebenen (251-253) auf. Die Kacheln (211-214, 213-1, 213-2, 213-3, 213-2-1, 214-1-1) auf unterschiedlichen Hierarchieebenen (251-253) weisen unterschiedliche Bildelementgrößen von entsprechenden Bildelementen (290) auf.

9. 发明申请

WO2020070156A1 METHOD OF RECORDING AN IMAGE USING A PARTICLE MICROSCOPE 审中-公开
公开(公告)号：WO2020070156A1
公开(公告)日：2020-04-09
申请号：PCT/EP2019/076637
申请日：2019-10-01
申请人： CARL ZEISS SMT GMBH
发明人： ZEIDLER, Dirk , KORB, Thomas , HÜTHWOHL, Philipp , NEUMANN, Jens Timo , RIEDESEL, Christof , WOJEK, Christian , CORREA, Joaquin , HÖGELE, Wolfgang
IPC分类号： G06T7/246
摘要： A method of recording an image using a particle microscope comprises: recording of plural images of an object, wherein intensity values of image data associated with locations in a coordinate system of the recorded image and with locations on the object; determining regions of interest associated with locations; determining image regions containing regions of interest; determining displacement vectors associated with the image regions determined by correlating the image data associated with a given image region with image data of other image regions also associated with the given region of interest; and generating a resulting image based on the image data of the recorded images, wherein locations in the coordinate system of the resulting image are determined based on the displacement vectors associated with the image regions.

10. 发明申请

WO2014139651A1 MEASURING AN OPTICAL SYMMETRY PROPERTY ON A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：测量投影曝光装置的光学对称性
公开(公告)号：WO2014139651A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/000588
申请日：2014-03-07
申请人： CARL ZEISS SMT GMBH
发明人： NEUMANN, Jens Timo , SCHLESENER, Frank
IPC分类号： G03F7/20 , G01J1/04
CPC分类号： G03F7/70133 , G01M11/0207 , G01M11/0242 , G03F7/70591 , G03F7/706 , G03F7/7085
摘要： A method for measuring an optical symmetry property on a microlithographic projection exposure apparatus (10) is provided. The method comprises arranging at least one measurement structure (60; 66) in an exposure beam path (32) of the projection exposure apparatus, wherein the measurement structure comprises a pinhole stop (62) and a diffraction grating (64) arranged within an aperture (63) of the pinhole stop. Furthermore, the method comprises measuring an intensity of a diffracted radiation generated at the diffraction grating (64) after interaction of the radiation with at least one optical element (22) of the projection exposure apparatus.
摘要翻译：提供了一种用于在微光刻投影曝光装置（10）上测量光学对称性的方法。该方法包括在投影曝光设备的曝光光束路径（32）中布置至少一个测量结构（60; 66），其中所述测量结构包括布置在孔径（62）内的针孔光阑（62）和衍射光栅（64）（63）针孔停止。此外，该方法包括在辐射与投影曝光设备的至少一个光学元件（22）相互作用之后测量在衍射光栅（64）处产生的衍射辐射的强度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式