专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2005049274B1 RETAINING RING WITH SHAPED SURFACE 审中-公开
标题翻译：带有成型表面的挡圈
公开(公告)号：WO2005049274B1
公开(公告)日：2005-12-29
申请号：PCT/US2004038083
申请日：2004-11-12
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
IPC分类号： B24B37/32 , B24B37/04
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portion. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可通过机加工或研磨环的底表面而成形，以在底表面中形成成形轮廓。保持环的底表面可以包括平坦的，倾斜的和弯曲的部分。研磨可以使用专门用于研磨扣环底面的机器进行。在研磨过程中，环可以被允许围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

2. 发明申请

WO2005058545B1 RETAINING RING WITH SLURRY TRANSPORT GROOVES 审中-公开
标题翻译：带有泥浆运输槽的挡泥板
公开(公告)号：WO2005058545B1
公开(公告)日：2005-07-28
申请号：PCT/US2004041322
申请日：2004-12-08
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/32
摘要： A retaining ring for chemical mechanical polishing has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The bottom surface includes a plurality of channels, each channel extending from the inner diameter surface to the outer diameter surface and having a rounded ceiling.
摘要翻译：用于化学机械抛光的保持环具有通常为环形的主体，该主体具有顶表面，底表面，内径表面和外径表面。底表面包括多个通道，每个通道从内径表面延伸到外径表面并具有圆形顶部。

3. 发明申请

WO2007143566A3 FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP 审中-公开
标题翻译：快速底板装载在无膜渗透步骤的抛光头上
公开(公告)号：WO2007143566A3
公开(公告)日：2008-09-18
申请号：PCT/US2007070243
申请日：2007-06-01
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , OH JEONGHOON , NAGENGAST ANDREW , ZUNIGA STEVEN M
发明人： CHEN HUNG CHIH , OH JEONGHOON , NAGENGAST ANDREW , ZUNIGA STEVEN M
IPC分类号： B23B31/30
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/67005 , Y10T29/5313 , Y10T279/11
摘要： The present invention relates to an apparatus and method for improving and speeding up a substrate loading process. The apparatus (200) includes a base member (208) having a bottom surface (209) with a plurality of recesses (210) formed therein and passages (224,225) formed within to pump a control gas in or out. The apparatus also includes a flexible membrane (205) that forms a center chamber (206) and an edge chamber (207) that may be inflated and deflated independently. A substrate support (201) is used to load a substrate (202) on the apparatus.
摘要翻译：本发明涉及一种用于改善和加速衬底加载过程的装置和方法。设备（200）包括具有形成在其中的多个凹部（210）的底表面（209）的底部构件（208）和形成在其中以便将控制气体输入或输出的通道（224,225）。该装置还包括形成可以独立地充气和放气的中心室（206）和边缘室（207）的柔性膜（205）。衬底支撑件（201）用于将衬底（202）装载在设备上。

4. 发明申请

WO2010048032A3 PAD CONDITIONER AUTO DISK CHANGE 审中-公开
标题翻译： PAD控制器自动盘更改
公开(公告)号：WO2010048032A3
公开(公告)日：2010-07-15
申请号：PCT/US2009060882
申请日：2009-10-15
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M , OLGADO DONALD J K
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M , OLGADO DONALD J K
IPC分类号： H01L21/304
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译：一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或更多个盘存储站以及具有足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。

5. 发明申请

WO2005049274A3 RETAINING RING WITH SHAPED SURFACE 审中-公开
公开(公告)号：WO2005049274A3
公开(公告)日：2005-11-03
申请号：PCT/US2004038083
申请日：2004-11-12
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
IPC分类号： B24B37/32 , B24B37/04
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portion. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

6. 发明申请

WO0172473A2 CARRIER HEAD WITH CONTROLLABLE EDGE PRESSURE 审中-公开
标题翻译：带控制边缘压力的承载头
公开(公告)号：WO0172473A2
公开(公告)日：2001-10-04
申请号：PCT/US0108070
申请日：2001-03-13
申请人： APPLIED MATERIALS INC
发明人： ZUNIGA STEVEN M , PRABHU GOPALAKRISHNA B , MEAR STEVEN T
IPC分类号： B24B37/30 , H01L21/304 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30
摘要： A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The edge control ring (166) is a generally annular member positioned between the retaining ring (110) and the external membrane (152). The edge control ring (166) includes a cylindrical portion (210) and a flange portion (212) which extends outwardly toward inner surface (118) of retaining ring (110) to maintain the lateral position of the external spacer ring. An overhang (214) formed in the cylindrical portion (210) can fit over the thick portion (186) so that the edge control ring (166) tests on the external membrane (152).
摘要翻译：用于化学机械抛光装置的载体头（100）包括向基底施加载荷的柔性膜（150）。衬底背衬组件（112）包括内膜（150），外膜（152），内膜支撑结构（160），上隔膜间隔环（162），下隔膜间隔环（164）和边缘控制环（166）。边缘控制环（166）是位于保持环（110）和外部膜（152）之间的大致环形的构件。边缘控制环（166）包括圆柱形部分（210）和朝向保持环（110）的内表面（118）向外延伸以保持外部间隔环的横向位置的凸缘部分（212）。形成在圆筒部分（210）中的突出部分（214）可以装配在厚部分（186）上，使得边缘控制环（166）在外部膜（152）上测试。

7. 发明申请

WO0204172A3 CARRIER HEAD WITH FLEXIBLE MEMBRANES TO CONTROL THE APPLIED LOAD AND THE DIMENSION OF THE LOADING AREA 审中-公开
标题翻译：具有柔性膜的载体头控制应用负载和加载区域的尺寸
公开(公告)号：WO0204172A3
公开(公告)日：2002-07-18
申请号：PCT/US0121967
申请日：2001-07-11
申请人： APPLIED MATERIALS INC
发明人： ZUNIGA STEVEN M , CHEN HUNG CHIH , TSENG MING KUIE
IPC分类号： B24B37/30 , B24B49/16 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , B24B49/16
摘要： A carrier head (300) for a chemical mechanical polishing apparatus includes two membranes (352, 350). The external membrane (352) includes a central portion (380) that provides a mounting surface to engage the substrate (10), a lip portion (382), and a perimeter portion (384) that extends in a convoluted path between the spacer rings (362, 364, 366) to be secured to the base assembly. The internal membrane (350) includes a central portion (370) that will contact the upper surface of the external membrane (352) in a controllable annular area, a relatively thick annular portion (372), an annular outer flap (374) that extends from the outer rim of the thick portion (372), an annular inner flap (376) that extends from the inner edge of the thick portion (372). The contact area of the internal membrane (350) against the external membrane (352), thus the loading area in which pressure is applied to the substrate (10), may be controlled by varying the pressure in the chambers (354, 356, 358) formed between the two membranes (350, 352) and the housing (302).
摘要翻译：用于化学机械抛光装置的载体头（300）包括两个膜（352,350）。外部膜（352）包括中心部分（380），其提供与衬底（10）接合的安装表面，唇缘部分（382）和周边部分（384），其在间隔环之间的回旋路径中延伸（362,364,366）以固定到基座组件。内部薄膜（350）包括中心部分（370），该中心部分将在可控的环形区域中接触外部薄膜（352）的上表面，相对较厚的环形部分（372），环形的外部薄片（374）从所述厚部分（372）的外边缘延伸出从所述厚部分（372）的内边缘延伸的环形内部折片（376）。可以通过改变腔室（354,356,358）中的压力来控制内部膜（350）与外部膜（352）的接触面积，从而将压力施加到基底（10）的装载区域）形成在两个膜（350,352）和壳体（302）之间。

8. 发明申请

WO0189763A3 MULTILAYER RETAINING RING FOR CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：用于化学机械抛光的多层保持环
公开(公告)号：WO0189763A3
公开(公告)日：2002-03-07
申请号：PCT/US0116194
申请日：2001-05-17
申请人： APPLIED MATERIALS INC
发明人： WANG JUNSHI , ZUNIGA STEVEN M
IPC分类号： B24B37/32 , H01L21/304 , B24B37/04 , B24B41/06
CPC分类号： B24B37/32
摘要： A carrier head (100) for a chemical mechanical polishing apparatus includes a retaining ring (110) having a flexible lower portion (108) and a rigid upper portion (184). A shim (202) can be inserted between the retaining ring (110) and a base (104) of the carrier head to improve the retaining ring (110) lifetime. A seal (200) may be inserted between the retaining ring (110) and a flexible membrane to seal the chamber (190) between the flexible membrane and the base.
摘要翻译：用于化学机械抛光装置的承载头（100）包括具有柔性下部（108）和刚性上部（184）的保持环（110）。可以在保持环（110）和承载头的基座（104）之间插入垫片（202），以改善保持环（110）的寿命。可以在保持环（110）和柔性膜之间插入密封件（200），以密封柔性膜和基底之间的腔室（190）。

9. 发明申请

WO0172472A3 CARRIER HEAD WITH A FLEXIBLE MEMBRANE HAVING PARTS MADE WITH DIFFERENT ELASTOMERS 审中-公开
标题翻译：具有柔性膜的载体头部具有不同弹性体的部件
公开(公告)号：WO0172472A3
公开(公告)日：2002-05-10
申请号：PCT/US0107974
申请日：2001-03-12
申请人： APPLIED MATERIALS INC
发明人： ZUNIGA STEVEN M , CHEN HUNG CHIH , TSENG MING KUIE
IPC分类号： B24B7/22 , B24B37/30 , F16J3/02 , H01L21/304 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , F16J3/02
摘要： A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The volume between the base assembly (104) and the internal membrane (150) forms the upper chamber (154) and the internal chamber (156), and the volume between the internal membrane (150) and the external membrane (152) forms the outer chamber (158). The internal membrane (150) includes a circular central portion (170), a relatively thick annular portion (174), an annular inner flap (176) that extends from the corner of the thick portion (174), an annular outer flap (178) that extends from the outer rim of the thick portion (174) and an annular connector portion (172). The inner flap (176) and the outer flap (178) can be formed of a first elastomer, whereas the thick portion (174) and connector portion (172) can be formed of a second elastomer.
摘要翻译：用于化学机械抛光装置的载体头（100）包括向基底施加载荷的柔性膜（150）。衬底背衬组件（112）包括内膜（150），外膜（152），内膜支撑结构（160），上隔膜间隔环（162），下隔膜间隔环（164）和边缘控制环（166）。基部组件（104）和内膜（150）之间的体积形成上室（154）和内室（156），并且内膜（150）和外膜（152）之间的体积形成外室（158）。内膜（150）包括圆形中心部分（170），相对厚的环形部分（174），从厚部分（174）的角部延伸的环形内部折片（176），环形外部皮瓣（178）），其从所述厚部（174）的外缘延伸并且环形连接器部分（172）延伸。内翼片（176）和外翼片（178）可以由第一弹性体形成，而厚部分（174）和连接器部分（172）可以由第二弹性体形成。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式