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    • 9. 发明授权
    • Focal plane array and method for manufacturing the same
    • 焦平面阵列及其制造方法
    • US08952479B2
    • 2015-02-10
    • US13582103
    • 2011-03-01
    • Adriana LapadatuGjermund Kittilsland
    • Adriana LapadatuGjermund Kittilsland
    • H01L31/058H01L27/146
    • H01L27/1467H01L27/14625H01L27/14632H01L27/14636H01L27/14683H01L27/14685H01L27/14687
    • A method of forming a focal plane array by: preparing a first wafer having sensing material provided on a surface, which is covered by a sacrificial layer; preparing a second wafer including read-out integrated circuit and a contact pad, which is covered by another sacrificial layer into which are formed support legs in contact with the contact pad, the support legs being covered with a further sacrificial layer; bonding the sacrificial layers of the first and second wafers together such that the sensing material is transferred from the first wafer to the second wafer when a sacrificial bulk layer of the first wafer is removed; defining a pixel in the sensing material and forming a conductive via through the pixel for providing a connection between an uppermost surface of the pixel and the supporting legs; and removing the sacrificial layers to release the pixel, with the supporting legs underneath it.
    • 一种通过以下步骤形成焦平面阵列的方法:制备具有设置在由牺牲层覆盖的表面上的感测材料的第一晶片; 制备包括读出集成电路和接触焊盘的第二晶片,其被另一牺牲层覆盖,其中形成有与接触焊盘接触的支撑腿,所述支撑腿被另外的牺牲层覆盖; 将第一和第二晶片的牺牲层结合在一起,使得当去除第一晶片的牺牲体层时,感测材料从第一晶片转移到第二晶片; 在所述感测材料中限定像素并形成通过所述像素的导电通孔,以提供所述像素的最上表面与所述支撑腿之间的连接; 并且移除牺牲层以释放像素,其中支撑腿在其下方。