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1. 发明申请

US20120142193A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：使用相同的底漆膜组合物和图案处理方法
公开(公告)号：US20120142193A1
公开(公告)日：2012-06-07
申请号：US13292696
申请日：2011-11-09
申请人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
发明人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
IPC分类号： H01L21/3105 , C08L61/12 , C08L61/08 , C08G8/04
CPC分类号： G03F7/11 , G03F7/091 , G03F7/095
摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or general formula (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要翻译：公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种下列通式（1-1）和/或通式（1-2）表示的化合物的缩合得到的聚合物，和一种或多种由以下通式（2）表示的化合物和/或其等同体。可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值的下层膜）的三层抗蚀剂工艺的下层膜组合物，优异的填充性，高图案抗菌性，特别是在薄于60nm的高纵横线上，特别是在蚀刻后不会引起线下落或摆动，以及使用其的图案化处理。

2. 发明授权

US07939609B2 Redispersing agents for redispersible polymer powders and redispersible polymer powders including same 有权
标题翻译：用于可再分散聚合物粉末的再分散剂和包括其的可再分散聚合物粉末
公开(公告)号：US07939609B2
公开(公告)日：2011-05-10
申请号：US11664321
申请日：2005-09-22
申请人： Valentino De Fazio
发明人： Valentino De Fazio
IPC分类号： C08G14/08 , C08G14/10 , C08L61/08 , C08L61/24 , C08L61/28
CPC分类号： C04B40/0042 , C04B26/06 , C04B2103/0057 , C04B2103/0065 , C04B2103/0066 , C08L33/14 , C08L61/24 , C04B24/2688 , C04B24/305 , C04B24/307 , C04B24/2641 , C04B24/2623 , C04B24/2676 , C08L2666/04
摘要： A redispersible polymer powder including: a polymer to be redispersed; and an ortho-cresol based condensation product or salt thereof; wherein the ortho-cresol based condensation product or salt thereof includes N-containing units derived from a N-based component incorporated into the ortho-cresol based condensation product or salt thereof during polymerization.
摘要翻译：一种可再分散的聚合物粉末，包括：待再分散的聚合物; 和邻甲酚基缩合产物或其盐; 其中所述邻甲酚基缩合产物或其盐包含衍生自聚合期间加入到邻甲酚基缩合产物或其盐中的N-基组分的含N单元。

3. 发明申请

US20050228079A1 Thermosetting resin composition and adhesive films 审中-公开
标题翻译：热固性树脂组合物和粘合膜
公开(公告)号：US20050228079A1
公开(公告)日：2005-10-13
申请号：US10509023
申请日：2003-03-26
申请人： Toru Fujiki , Toshiki Mori , Hironobu Iyama , Shigeki Naitoh
发明人： Toru Fujiki , Toshiki Mori , Hironobu Iyama , Shigeki Naitoh
IPC分类号： C08L63/00 , C08L15/00 , C08L61/06 , C08L61/08 , C08L65/00 , C09J7/00 , C09J7/02 , C09J123/02 , C09J161/06 , C09J163/00
CPC分类号： C08L61/06 , C08L63/00 , C09J7/10 , C09J2461/00 , C09J2463/00 , C08L2666/22
摘要： The present invention provides a thermosetting resin composition containing the following (A) component and (B) component, an adhesive containing the thermosetting resin composition and an organic solvent and/or water, and an adhesive film containing the thermosetting resin composition. (A) component: at least one kind of phenol resin selected from the group consisting of alkylphenol novolak, a phenol adduct of an aliphatic polymer containing a double bond, and a phenol adduct of an alicyclic polymer containing a double bond (B) component: epoxy group—containing ethylene-based copolymer obtained by polymerizing the following (b1) and (b2): (b1) ethylene and/or propylene (b2) monomer represented by the following formula (1): (wherein R represents a hydrocarbon group of a carbon number of 2 to 18 having a double bond, wherein at least one of hydrogen atoms of the hydrocarbon group may be substituted with a halogen atom, a hydroxyl group or a carboxyl group, and X represents a single bond or a carbonyl group).
摘要翻译：本发明提供一种含有下述（A）成分和（B）成分的热固性树脂组合物，含有热固性树脂组合物和有机溶剂和/或水的粘合剂和含有热固性树脂组合物的粘合剂膜。（A）成分：选自烷基酚酚醛清漆，含有双键的脂肪族聚合物的苯酚加合物和含有双键的脂环式聚合物（B）成分的苯酚加合物中的至少一种酚醛树脂：通过聚合以下（b 1/2）和（b 2/2）：乙烯和（b 1/2）乙烯获得的含环氧基的乙烯基共聚物和 /或由下式（1）表示的丙烯（b 2/2）单体：（其中R表示具有双键的碳数为2至18的烃基，其中至少一个氢烃基的原子可以被卤素原子，羟基或羧基取代，X表示单键或羰基）。

4. 发明授权

US5296566A Polymerizable compositions containing olefin metathesis catalysts and cocatalysts, and methods of use therefor 失效
标题翻译：含有烯烃复分解催化剂和助催化剂的可聚合组合物及其使用方法
公开(公告)号：US5296566A
公开(公告)日：1994-03-22
申请号：US992381
申请日：1992-12-16
申请人： Katherine A. Brown-Wensley , Michael C. Palazzotto , William M. Lamanna , Larry D. Boardman , John E. Gozum , Fred B. McCormic
发明人： Katherine A. Brown-Wensley , Michael C. Palazzotto , William M. Lamanna , Larry D. Boardman , John E. Gozum , Fred B. McCormic
IPC分类号： C08F4/06 , C08F4/42 , C08F4/80 , C08G61/06 , C08G61/08 , C08L61/08
CPC分类号： C08G61/08 , Y10S526/943
摘要： Polymerization of ring-strained cyclic olefins takes place in the presence of a one-part or two-part catalyst which is air and moisture stable and which comprises a transition metal-containing compound.The one-part transition metal-containing catalyst is selected from the group consisting of(a) compounds of the formula(L.sup.1)(L.sup.2)Q whereinQ represents Mo or W;L.sup.1 represents one to six CO (carbonyl) ligands;L.sup.2 represents none to 5 ligands, each of which is a non-ionic compound or unit of a polymer which can be the same or different, each contributes two, four, or six electrons to the metal and is different from L.sup.1 ; wherein the sum of the valence electrons of Q and the electrons contributed by the ligands L.sup.1 and L.sup.2 is 18,(b) at least one of cationic ruthenium and osmium-containing organometallic salts having at least one polyene ligand, and(c) [Ir(RO.sub.2 CHC.dbd.CHCO.sub.2 R).sub.2 Cl].sub.2 wherein each R independently is hydrogen or lower alkyl (C.sub.1 to C.sub.4), provided that the oxidation state of the metal is in the range of +3 to 0, and that cocatalysts containing C-halogen bonds are not present.The two-part catalyst comprises(a) a transition metal-containing catalyst, provided that the oxidation state of the transition metal is in the range of +3 to 0, and(b) a cocatalyst selected from the group consisting of(i) terminal or silyl alkynes,(ii) organosilanes containing at least one of ##STR1## groups, (iii) oxidative salts or oxidative compounds containing an oxygen atom to non-oxygen atom double bond, and(iv) heteroatom-containing alkenes.The polymerized composition is useful to provide molded articles, elastomers, dielectric supports, ionophoric or biologically active materials, composite materials, and the like.
摘要翻译：环应变环状烯烃的聚合在其为空气和湿气稳定的，并且其包括一个含过渡金属的化合物的一部分或两部分催化剂的存在下进行。单部分含过渡金属的催化剂选自（a）式（L1）（L2）Q，其中Q代表Mo或W的化合物的组中选择; L1代表一至六个CO（羰基）配体; L2代表无5个配体，它们各自是可以相同或不同的非离子化合物或聚合物单元，每个赋予金属二，四或六个电子，并且不同于L1; 其中Q和由配体L1和L2贡献的电子的价数之和为18，（b）至少一种具有至少一个多烯配体的阳离子钌和含锇的有机金属盐，和（c）（Ir （RO2CHC = CHCO2R）2Cl）2，其中每个R独立地为氢或低级烷基（C1-C4），条件是金属的氧化态在+3至0的范围内，并且含有C-卤键的助催化剂为不存在。两部分催化剂包括（a）含过渡金属的催化剂，条件是过渡金属的氧化态在+3至0的范围内，和（b）选自（i）的助催化剂，末端或甲硅烷基炔，（ii）含有（*化学结构*）基团中的至少一个的有机硅烷，（iii）含氧原子与非氧原子双键的氧化性盐或氧化性化合物，和（iv）含杂原子的烯烃。所述聚合的组合物是提供模塑制品，弹性体，电介质支撑件，离子载体或生物活性材料，复合材料，等是有用的。

5. 发明授权

US5169880A Process for making foundry sand mold 失效
标题翻译：制作砂金模具的工艺
公开(公告)号：US5169880A
公开(公告)日：1992-12-08
申请号：US666203
申请日：1991-03-07
申请人： Akira Yoshida , Shigeo Nakai , Naoki Kyochika , Akio Mamba
发明人： Akira Yoshida , Shigeo Nakai , Naoki Kyochika , Akio Mamba
IPC分类号： B22C1/20 , B22C1/22 , C08K5/10 , C08L61/04 , C08L61/08
CPC分类号： B22C1/2253 , B22C1/205
摘要： A foundry sand mold is produced by molding a granular refractory material with the use of (1) a binder comprising a silane coupling agent, a water-soluble phenolic resin and a silane compound selected from an alkyl silicate having 1 to 8 carbon atoms in the alkyl group, its lower condensate, a silicone oil and a modified silicone oil and (2) a hardening agent comprising an organic ester.
摘要翻译：通过使用（1）包含硅烷偶联剂，水溶性酚醛树脂和选自具有1至8个碳原子的烷基硅烷的硅烷化合物的粘合剂来模制粒状耐火材料来生产铸造砂模具烷基，其低级缩合物，硅油和改性硅油，和（2）包含有机酯的硬化剂。

6. 发明授权

US5157080A Coating composition 失效
公开(公告)号：US5157080A
公开(公告)日：1992-10-20
申请号：US677507
申请日：1991-04-03
申请人： Kenneth J. Gardner , Gary T. X. Mallalieu
发明人： Kenneth J. Gardner , Gary T. X. Mallalieu
IPC分类号： C08L25/08 , C08L61/06 , C08L61/08 , C09D125/08 , C09D129/02 , C09D161/06 , C09D163/00 , C09D167/00
CPC分类号： C09D161/06 , C08L61/06 , C09D125/08 , C09D129/02 , C09D163/00 , C09D167/00 , C08L25/08
摘要： A crosslinker composition comprising an etherified phenol-formaldehyde resin modified by addition of a styrene (meth)-allyl alcohol copolymer is used to provide epoxy and polyester-alkoxymethylmelamine coil coating compositions of enhanced gloss, hardness, chemical resistance, adhesion and flexibility.

7. 发明授权

US5118585A Positive and negative working radiation sensitive mixtures and production of relief patterns 失效
标题翻译：积极和负面的工作辐射敏感性混合物和生产救济模式
公开(公告)号：US5118585A
公开(公告)日：1992-06-02
申请号：US697046
申请日：1991-07-22
申请人： Reinhold Schwalm , Horst Binder
发明人： Reinhold Schwalm , Horst Binder
IPC分类号： G03F7/023 , C08F8/00 , C08F12/22 , C08G8/28 , C08G8/36 , C08K5/372 , C08L25/18 , C08L61/08 , C09D125/18 , C09D161/08 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/38 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045
摘要： Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

8. 发明授权

US5075199A Radiation sensitive mixture and production of relief patterns 失效
标题翻译：辐射敏感性混合物和放射性物质的生产
公开(公告)号：US5075199A
公开(公告)日：1991-12-24
申请号：US352383
申请日：1989-05-16
申请人： Reinhold Schwalm , Horst Binder
发明人： Reinhold Schwalm , Horst Binder
IPC分类号： G03F7/023 , C08L61/08 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045
摘要： A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid,wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having ##STR1## in copolymerized or cocondensed form or the ##STR2## introduced by polymer analogous reaction with the proviso that the radical R contains from 5 to 9 carbon atoms.
摘要翻译：用于产生浮雕图案的辐射敏感混合物包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物，含有至少一个酸可裂解基团以及在照射时形成强酸的基团，其中聚合物粘合剂（a）含有5至40摩尔％的具有共聚或缩聚形式的单体单元或“IMAGE” 通过聚合物类似反应引入，条件是基团R含有5至9个碳原子。

9. 发明授权

US4906549A Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms 失效
标题翻译：醌二叠层磺酸酯和由具有2-6个碳原子的间甲酚，对甲酚和脂族苯酚制成的酚醛清漆的正性光致抗蚀剂组合物
公开(公告)号：US4906549A
公开(公告)日：1990-03-06
申请号：US182848
申请日：1988-04-18
申请人： Shingo Asaumi , Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Toshimasa Nakayama
发明人： Shingo Asaumi , Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Toshimasa Nakayama
IPC分类号： G03C1/72 , C08G8/12 , C08G8/24 , C08K5/43 , C08L61/08 , G03F7/023 , G03F7/025 , G03F7/22 , H01L21/027
CPC分类号： G03F7/0236 , C08G8/12 , C08G8/24 , C08K5/43
摘要： A positive-working photoresist composition suitable for fine patterning in the manufacturing of semiconductor devices such as VLSIs with high fidelity is proposed. The composition comprises: (A) 100 parts by weight of a phenolic novolac resin prepared by the condensation reaction of a specific ternary mixture of three kinds of phenolic compounds and formaldehyde; and (B) 20-60 parts by weight of a photosensitizer which is preferably an ester of naphthoquinone diazidesulfonic acid and a hydroxylated benzophenone compound. The phenolic mixture is composed of 10-45% by weight of m-cresol, 35-88% by weight of p-cresol and 2-30% by weight of a substituted phenol represented by the general formula R.C.sub.6 H.sub.4.OH, in which R is a monovalent aliphatic hydrocarbon group having 2-6 carbon atoms selected from alkyl and alkenyl groups.
摘要翻译：提出了适用于制造半导体器件（例如具有高保真度的VLSI）的精细图案化的正性光致抗蚀剂组合物。该组合物包括：（A）100重量份通过三种酚类化合物和甲醛的特定三元混合物的缩合反应制备的酚醛清漆树脂; 和（B）20-60重量份的优选萘醌二叠氮磺酸和羟基化二苯甲酮化合物的酯的光敏剂。酚类混合物由10-45重量％的间甲酚，35-88重量％的对甲酚和2-30重量％的由通式R.C 6 H 4.OH表示的取代的苯酚组成，在其中R为选自烷基和烯基的2-6个碳原子的一价脂族烃基。

10. 发明授权

US4412045A Color developer for pressure-sensitive copying paper 失效
标题翻译：压敏复印纸的彩色显影剂
公开(公告)号：US4412045A
公开(公告)日：1983-10-25
申请号：US342537
申请日：1982-01-25
申请人： Toyoji Kikuga , Koji Hirai
发明人： Toyoji Kikuga , Koji Hirai
IPC分类号： B41M5/155 , C08G8/24 , C08L61/06 , C08L61/08 , C08L61/12 , C08L61/34
CPC分类号： C08G8/24 , B41M5/155 , C08L61/06
摘要： A color developer for pressure-sensitive copying papers is prepared by mixing a para-substituted difunctional phenol-aldehyde condensate and tri- or higher-functional phenol-aldehyde condensate. The tri- or higher-functional phenol-aldehyde condensate can be modified by a polyvalent metal.
摘要翻译：通过混合对位取代的双官能酚醛缩合物和三官能或更高官能的酚醛缩合物制备用于压敏复印纸的彩色显影剂。三官能或更高官能度的酚醛缩合物可以被多价金属改性。

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