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1. 发明申请

US20120142193A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：使用相同的底漆膜组合物和图案处理方法
公开(公告)号：US20120142193A1
公开(公告)日：2012-06-07
申请号：US13292696
申请日：2011-11-09
申请人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
发明人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
IPC分类号： H01L21/3105 , C08L61/12 , C08L61/08 , C08G8/04
CPC分类号： G03F7/11 , G03F7/091 , G03F7/095
摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or general formula (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要翻译：公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种下列通式（1-1）和/或通式（1-2）表示的化合物的缩合得到的聚合物，和一种或多种由以下通式（2）表示的化合物和/或其等同体。可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值的下层膜）的三层抗蚀剂工艺的下层膜组合物，优异的填充性，高图案抗菌性，特别是在薄于60nm的高纵横线上，特别是在蚀刻后不会引起线下落或摆动，以及使用其的图案化处理。

2. 发明申请

US20120171868A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：使用相同的底漆膜组合物和图案处理方法
公开(公告)号：US20120171868A1
公开(公告)日：2012-07-05
申请号：US13311137
申请日：2011-12-05
申请人： Tsutomu OGIHARA , Takeru WATANABE , Yusuke BIYAJIMA , Daisuke KORI , Takeshi KINSHO , Toshihiko FUJII
发明人： Tsutomu OGIHARA , Takeru WATANABE , Yusuke BIYAJIMA , Daisuke KORI , Takeshi KINSHO , Toshihiko FUJII
IPC分类号： H01L21/311 , C09D165/02 , C08G61/02
CPC分类号： G03F7/091 , G03F7/094
摘要： There is disclosed A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), one or more kinds of a compound represented by the following general formula (2), and one or more kinds of a compound, represented by the following general formula (3), and/or an equivalent body thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要翻译：公开了抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种下列通式（1-1）和/或（1-2）表示的化合物的缩合得到的聚合物：一种或多种由以下通式（2）表示的化合物的种类以及由以下通式（3）表示的化合物和/或其等同体的一种或多种。可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值作为抗反射膜的下层膜）的三层抗蚀剂工艺的下层膜组合物，特别是在60nm以上的高方位线上，特别是在蚀刻后，不会引起线下落或翘曲，以及使用其的图案化处理。

3. 发明申请

US20120184103A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：使用相同的底漆膜组合物和图案处理方法
公开(公告)号：US20120184103A1
公开(公告)日：2012-07-19
申请号：US13313650
申请日：2011-12-07
申请人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
发明人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Takeru WATANABE , Toshihiko FUJII , Takeshi KINSHO
IPC分类号： H01L21/3105 , C08L61/12 , C08L61/08 , C08G8/04
CPC分类号： C08G10/02 , G03F7/094
摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要翻译：公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种由以下通式（1-1）和/或（1-2）表示的化合物的缩合得到的聚合物，以及一种或更多种由以下通式（2-1）和/或（2-2）表示的化合物和/或其等价物。可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值作为抗反射膜的下层膜）的三层抗蚀剂工艺的下层膜组合物，特别是在60nm以上的高方位线上，特别是在蚀刻后，不会引起线下落或翘曲，以及使用其的图案化处理。

4. 发明申请

US20120108071A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：使用相同的底漆膜组合物和图案处理方法
公开(公告)号：US20120108071A1
公开(公告)日：2012-05-03
申请号：US13269290
申请日：2011-10-07
申请人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Toshihiko FUJII , Takeru WATANABE , Takeshi KINSHO
发明人： Tsutomu OGIHARA , Daisuke KORI , Yusuke BIYAJIMA , Toshihiko FUJII , Takeru WATANABE , Takeshi KINSHO
IPC分类号： H01L21/312 , C09D161/12 , C09D161/08
CPC分类号： G03F7/091 , G03F7/094
摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, namely, an underlayer film having optimum n-value and k-value, excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要翻译：公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种下列通式（1-1）和/或（1-2）表示的化合物缩合得到的聚合物，以及一种或多种更多种由下列通式（2）表示的化合物和/或其等价物。可以提供一种特别用于三层抗蚀剂工艺的下层膜组合物，其可以形成具有降低的反射率的下层膜，即具有最佳n值和k值的底层膜，优异的填充性，抗蚀性能，并且特别是在比60nm薄的高方位线中，特别是在蚀刻后不会引起线下落或摆动，以及使用其的图案化工艺。

5. 发明申请

US20110177459A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS 有权
标题翻译：抗静电膜成膜组合物，形成电阻膜和方法的方法
公开(公告)号：US20110177459A1
公开(公告)日：2011-07-21
申请号：US12978978
申请日：2010-12-27
申请人： Tsutomu OGIHARA , Takeru WATANABE , Takeshi KINSHO , Katsuya TAKEMURA , Toshihiko FUJII , Daisuke KORI
发明人： Tsutomu OGIHARA , Takeru WATANABE , Takeshi KINSHO , Katsuya TAKEMURA , Toshihiko FUJII , Daisuke KORI
IPC分类号： G03F7/20 , C08L61/06 , B41L23/20 , B82Y30/00
CPC分类号： G03F7/11 , B82Y10/00 , C08G61/02 , C08G2261/3424 , G03F7/0752 , H01L21/0332 , H01L21/31116 , H01L21/31138 , H01L21/31144
摘要： There is disclosed a resist underlayer film-forming composition comprising, at least: a resin (A) obtained by condensing a compound represented by the following general formula (1) with a compound represented by the following general formula (2) by the aid of an acid catalyst; a compound (B) represented by the general formula (1); a fullerene compound (C); and an organic solvent. There can be a resist underlayer film composition in a multi-layer resist film to be used in lithography, which underlayer film is excellent in property for filling up a height difference of a substrate, possesses a solvent resistance, and is not only capable of preventing occurrence of twisting during etching of a substrate, but also capable of providing an excellently decreased pattern roughness; a process for forming a resist underlayer film by using the composition; and a patterning process.
摘要翻译：公开了一种抗蚀剂下层膜形成组合物，其至少包括：通过以下通式（1）表示的化合物与下列通式（2）表示的化合物缩合得到的树脂（A）：通过酸催化剂; 由通式（1）表示的化合物（B）; 富勒烯化合物（C）; 和有机溶剂。在光刻中使用的多层抗蚀剂膜中可以存在抗蚀剂下层膜组合物，该下层膜具有优异的填充基板的高度差的性能，具有耐溶剂性，并且不仅能够防止在蚀刻基板期间发生扭曲，而且能够提供优异的图案粗糙度; 通过使用该组合物形成抗蚀剂下层膜的方法; 和图案化过程。

6. 发明申请

US20090322175A1 PERMANENT-MAGNET TYPE ELECTRIC ROTATING MACHINE AND PERMANENT-MAGNET TYPE ELECTRIC ROTATING MACHINE SYSTEM FOR AUTOMOBILE OR TRAIN 有权
标题翻译：永磁式电动旋转机和永磁式电动旋转机系统用于汽车或火车
公开(公告)号：US20090322175A1
公开(公告)日：2009-12-31
申请号：US12488923
申请日：2009-06-22
申请人： Daisuke KORI , Mamoru KIMURA , Hiroyuki MIKAMI , Seikichi MASUDA , Masayasu FUJIEDA
发明人： Daisuke KORI , Mamoru KIMURA , Hiroyuki MIKAMI , Seikichi MASUDA , Masayasu FUJIEDA
IPC分类号： H02K1/27
CPC分类号： H02K1/2766 , B60L3/0061 , B60L11/1803 , B60L2200/26 , B60L2240/36 , B60L2260/28 , Y02T10/641 , Y02T10/7005
摘要： A rotor is deployed such that the rotor becomes coaxially rotatable with a stator. A shaft is fixed onto the axis of a rotor iron-core. 1-pole constituting magnet slots are deployed into V-character pattern along an outer circumference portion of the rotor iron-core. Permanent magnets are embedded into the magnet slots. For the 1 pole, the 2 pieces of same-polarity permanent magnets are embedded into the V-character pattern. The configuration of each embedded permanent magnet is designed as follows: From the thickness of the permanent-magnet edge portion on the inner-diameter side of the rotor iron-core, which becomes the center of the V-character pattern, the thickness of the permanent magnet gradually increases toward the outer-diameter side of the rotor iron-core, which become the right and left edge portions of the V-character pattern. Simultaneously, curved lines are provided on both edge portions of the permanent magnet.
摘要翻译：转子被部署成使得转子与定子同轴地旋转。轴固定在转子铁芯的轴线上。 1极构成磁体槽沿着转子铁芯的外周部分展开成V字型。永磁体嵌入到磁体槽中。对于1极，将2块相同极性的永磁体嵌入V字符图案中。每个嵌入式永磁体的结构设计如下：从作为V字符图形的中心的转子铁芯的内径侧的永久磁铁边缘部的厚度，永磁体朝着转子铁芯的外径侧逐渐增大，这变成V字符图形的左右边缘部分。同时，在永磁体的两个边缘部分设置曲线。

7. 发明申请

US20130056654A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：积极的组合和绘图过程
公开(公告)号：US20130056654A1
公开(公告)日：2013-03-07
申请号：US13586602
申请日：2012-08-15
申请人： Jun HATAKEYAMA , Daisuke KORI
发明人： Jun HATAKEYAMA , Daisuke KORI
IPC分类号： G03F7/004 , G21K5/00 , G03F7/20
CPC分类号： G03F1/00 , G03F7/0397 , G03F7/085 , G03F7/105
摘要： The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process.
摘要翻译：本发明提供一种正型抗蚀剂组合物，其包含作为其中所含的基础树脂的（A）重均分子量为1000〜500000的聚合物，其含有具有取代基的羧基的氢原子的结构的重复单元具有环状结构的酸不稳定基团和（B）取代或未取代的荧光素的酚醛清漆树脂，另外还有光酸产生剂。可以提供具有适当吸收的正性抗蚀剂组合物，以在曝光后具有优异的图案轮廓的高反射性基板上形成图案，在非平面基板上粘附，注入特性，此外，此时的离子注入电阻的离子注入; 并提供图案化工艺。

8. 发明申请

US20100194221A1 PERMANENT MAGNET ELECTRICAL ROTATING MACHINE, WIND POWER GENERATING SYSTEM, AND A METHOD OF MAGNETIZING A PERMANENT MAGNET 有权
标题翻译：永磁电动旋转机，风力发电系统，以及永磁体磁化方法
公开(公告)号：US20100194221A1
公开(公告)日：2010-08-05
申请号：US12754047
申请日：2010-04-05
申请人： Daisuke KORI , Tetsuo Fujigaki , Shuji Aizawa , Motonobu Iizuka , Yasushi Iwai , Hiroyuki Mikami , Mamoru Kimura
发明人： Daisuke KORI , Tetsuo Fujigaki , Shuji Aizawa , Motonobu Iizuka , Yasushi Iwai , Hiroyuki Mikami , Mamoru Kimura
IPC分类号： H02K1/32 , F03D9/00
CPC分类号： H02K1/325 , H02K1/223 , H02K1/276 , H02K1/2766 , H02K7/1838 , H02K2213/03
摘要： A permanent magnet electrical rotating machine having a permanent magnet rotor and a stator, wherein:a plurality of permanent magnets are disposed in a rotor iron core of the permanent magnet rotor along a periphery of the rotor iron core, polarities thereof being alternately changed;a cooling airflow channel is formed between each pair of adjacent opposite poles on the rotor iron core; and the cooling airflow channel has an approximately trapezoidal shape on an outer periphery side of the rotor iron core; and extends from an end on a central side in a radial direction of the approximately trapezoidal shape to a radial center.
摘要翻译：一种具有永磁转子和定子的永磁电动旋转机械，其特征在于：永久磁铁转子的转子铁芯沿转子铁芯的周边配置多个永久磁铁，其极性交替变化; 在转子铁芯上的每对相邻的相对极之间形成冷却气流通道; 并且冷却气流通道在转子铁心的外周侧具有大致梯形形状; 并从大致梯形形状的径向的中央侧的端部延伸到径向中心。

9. 发明申请

US20110241350A1 PERMANENT MAGNETIC ROTATING ELECTRIC MACHINE AND WIND POWER GENERATING SYSTEM 有权
标题翻译：永磁旋转电机和风力发电系统
公开(公告)号：US20110241350A1
公开(公告)日：2011-10-06
申请号：US13029287
申请日：2011-02-17
申请人： Daisuke KORI , Shogo Serita , Tetsuo Fujigaki , Masaaki Endo , Yoshihiro Yasui , Ai Nagano , Mamoru Kimura , Motonobu Ilzuka , Akiyoshi Komura
发明人： Daisuke KORI , Shogo Serita , Tetsuo Fujigaki , Masaaki Endo , Yoshihiro Yasui , Ai Nagano , Mamoru Kimura , Motonobu Ilzuka , Akiyoshi Komura
IPC分类号： F03D9/00 , H02K9/18
CPC分类号： H02K1/20 , H02K1/276 , H02K9/10
摘要： The permanent magnet rotating electric machine comprising a stator with a stator coil wound on a stator iron core, a rotor with a plurality of permanent magnets disposed in the circumferential direction in a rotor iron core, which is disposed opposite to the stator iron core of the stator with a predetermined spacing therebetween and is fixed to a shaft, a water-cooling unit disposed around the outer circumference of the stator iron core, and a fan fixed to the shaft on the same side as at least one axial end of the rotor iron core to circulate cooling air in the permanent magnet rotating electric machine;further comprising ventilation paths, through which the cooling air flows, formed around the outer circumference of the water-cooling unit;wherein after the cooling air has been circulated by the fan in the machine for cooling, the cooling air is led to the ventilation paths to perform heat exchange between the cooling air flowing in the ventilation paths and the water-cooling unit, after which the cooling air is circulated again in the machine.
摘要翻译：所述永久磁铁旋转电机包括具有卷绕在定子铁芯上的定子线圈的定子，具有沿转子铁芯的圆周方向设置的多个永久磁铁的转子，其与所述定子铁心的定子铁心相对设置定子，其间具有预定的间隔，并固定在轴上，设置在定子铁心的外周周围的水冷单元，以及与转子铁的至少一个轴向端部相同侧固定在轴上的风扇将永磁旋转电机中的冷却空气循环; 还包括围绕所述水冷单元的外周形成冷却空气流过的通风路径; 其中在冷却空气已经被冷却机器中的风扇循环之后，冷却空气被引导到通风路径，以在通风路径中流动的冷却空气与水冷单元之间进行热交换，之后冷却空气在机器中再次循环。

10. 发明申请

US20100026145A1 SEALED TYPE ELECTRIC ROTATING MACHINE 审中-公开
标题翻译：密封式电动旋转机
公开(公告)号：US20100026145A1
公开(公告)日：2010-02-04
申请号：US12510405
申请日：2009-07-28
申请人： Yasushi IWAI , Kengo IWASHIGE , Motonobu IIZUKA , Tetsuo FUJIGAKI , Mamoru KIMURA , Daisuke KORI
发明人： Yasushi IWAI , Kengo IWASHIGE , Motonobu IIZUKA , Tetsuo FUJIGAKI , Mamoru KIMURA , Daisuke KORI
IPC分类号： H02K9/10
CPC分类号： H02K9/18 , H02K1/20 , H02K1/32 , H02K5/10
摘要： In a sealed type electric rotating machine, in which a cooling medium inflows from both end sides of a rotating shaft of a claw-pole type rotor, a cooling medium having passed through a heat exchanging part divides into one on an exhaust side and one on an intake air side to be used again for cooling of the claw-pole type rotor and a stator. On the exhaust side, a cooling medium being high in temperature as compared with that on the intake air side performs cooling, and the rotor and the stator are made higher in temperature on the exhaust side than on the intake air side. In order to level temperature profiles of the claw-pole type rotor and the stator in an axial direction, a partition, which cuts off an axial duct, is provided toward the exhaust side relative to a center in the axial direction.
摘要翻译：在冷却介质从爪极型转子的旋转轴的两端流入的密闭型旋转电机中，通过热交换部的冷却介质在排气侧分为一个，一个在再次用于冷却爪极型转子和定子的进气侧。在排气侧，与进气侧相比，温度高的冷却介质进行冷却，使排气侧的转子和定子的温度高于进气侧。为了使爪极型转子和定子在轴向上的温度曲线平坦化，切断轴向管道的隔板相对于轴向的中心向排气侧设置。

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