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    • 9. 发明申请
    • Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
    • 用于形成精细图案的过涂层剂和使用这种试剂形成精细图案的方法
    • US20100139838A1
    • 2010-06-10
    • US12457765
    • 2009-06-19
    • Yoshiki SugetaFumitake KanekoToshikazu Tachikawa
    • Yoshiki SugetaFumitake KanekoToshikazu Tachikawa
    • B32B37/00C08K5/095C08K5/05
    • G03F7/40G03F7/0046
    • It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to form or define fine trace patterns, further characterized by containing a water-soluble polymer and a water-soluble fluorine compound (e.g. a fluoroalkyl alcohol or a fluoroalkyl carboxylic acid). Also disclosed is a method of forming fine-line patterns using the over-coating agent. According to the invention, one can reduce microfoaming and defects to produce fine-line patterns that have good leveling and coating properties and which also present satisfactory profiles and meet the characteristics required of today's semiconductor devices.
    • 公开了一种用于形成精细图案的覆盖剂,其用于覆盖其上具有光致抗蚀剂图案的基底并且允许在加热下收缩,使得相邻的光致抗蚀剂图案之间的间隔被减小,涂覆剂的涂布膜 基本上完全除去以形成或限定精细痕迹图案,其特征还在于含有水溶性聚合物和水溶性氟化合物(例如氟烷基醇或氟代烷基羧酸)。 还公开了使用过涂层剂形成细线图案的方法。 根据本发明,可以减少微发泡和缺陷,以产生具有良好流平性和涂层性能的细线图案,并且还具有令人满意的轮廓并满足当今半导体器件所需的特性。